| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 08/13/1996 | US5546154 Pressure developer apparatus |
| 08/13/1996 | US5545962 Positioning system |
| 08/13/1996 | US5545902 Electron beam lithography system |
| 08/13/1996 | US5545694 Reactive microgel and photosensitive resin composition containing the reactive microgel for flexographic printing plate |
| 08/13/1996 | US5545676 Ternary photoinitiator system for addition polymerization |
| 08/13/1996 | US5545593 Method of aligning layers in an integrated circuit device |
| 08/13/1996 | US5545570 Method of inspecting first layer overlay shift in global alignment process |
| 08/13/1996 | US5545515 Acrylonitrile compounds as co-developers for black-and-white photothermographic and thermographic elements |
| 08/13/1996 | US5545512 Forming silicon reactive region in surface region of photoresist, softbaking in silicon environment, forming silicon rich region, applying second photoresist layer, patterning, etching with oxygen and forming silicon |
| 08/13/1996 | US5545510 Photodefinable dielectric composition useful in the manufacture of printed circuits |
| 08/13/1996 | US5545509 Photoresist composition with photosensitive base generator |
| 08/13/1996 | US5545507 Ultrahigh contrast, resolution, sharpness |
| 08/13/1996 | US5545506 Method of producing an image using a negative working, peel developable, single sheet color proofing system |
| 08/13/1996 | US5545505 Amine compounds as contrast enhancers for black-and-white photothermographic and thermographic elements |
| 08/13/1996 | US5545498 Atleast one photomask having an effective chip arrangement composed of grid-like pattern |
| 08/13/1996 | US5545353 Includes an organic polar solvent, selected amine compounds and (2-benzothiozolylthio)succinic acid |
| 08/13/1996 | US5545308 Method of using conductive polymers to manufacture printed circuit boards |
| 08/13/1996 | US5544776 Using 4-methoxy-1-butanol, 3-methoxy-1-butanol and propylene carbonate; rinsing |
| 08/13/1996 | CA1338521C Cad/cam stereolithographic data conversion |
| 08/08/1996 | WO1996024089A1 Tension arm developer apparatus |
| 08/08/1996 | WO1996023594A1 Compact disc coating and handling system |
| 08/07/1996 | EP0725559A2 Method and apparatus for applying a film onto a surface |
| 08/07/1996 | EP0725423A2 A process for device fabrication using projection lithography and an apparatus therefor |
| 08/07/1996 | EP0725315A2 Photosensitive resin composition and method for forming pattern using the same |
| 08/07/1996 | EP0725296A2 Projection exposure apparatus |
| 08/07/1996 | EP0725285A1 Pigment-dispersed photoresist composition for color filter of liquid crystal display |
| 08/07/1996 | EP0725106A2 Radiation curable compositions |
| 08/07/1996 | EP0725053A1 Selected O-quinonediazide sulfonic acid esters of phenolic compounds and their use in radiation-sensitive compositions |
| 08/07/1996 | EP0724824A1 Treatment of substrates |
| 08/07/1996 | EP0724768A1 Tellurium lamp |
| 08/07/1996 | EP0724498A1 Full field mask illumination enhancement methods and apparatus |
| 08/07/1996 | CN1128362A Photosensitive resin composition |
| 08/06/1996 | US5544213 Mask holding method, mask and mask chuck, exposure apparatus using the mask and the mask chuck, and device production method using the exposure apparatus |
| 08/06/1996 | US5543890 Process and device for adjusting the distance between a workpiece and a mask |
| 08/06/1996 | US5543286 Dry process silver salt photosensitive material and image forming method making use of the dry process silver salt photosensitive material |
| 08/06/1996 | US5543268 Water, nitrogen containing base, anionic surfactant; high resolution |
| 08/06/1996 | US5543266 Active energy ray-curing resin composition |
| 08/06/1996 | US5543265 Photoresist solution capable of being applied as an aerosol containing 3 to 12 percent by weight solvent |
| 08/06/1996 | US5543263 Washing with acidic exchange resin |
| 08/06/1996 | US5543262 Benzanthrone polymerization gate in photopolymerizable compositions |
| 08/06/1996 | US5543261 Storage stability of a diazo-based imaging element for making a printing plate |
| 08/06/1996 | US5543256 Alignment pattern exposed before exposing device pattern; alignment pattern overlap-exposed after exposing device pattern |
| 08/06/1996 | US5543046 Flattened macroporous support coated with thin membrane layer having etched, shallow channels perpendicular to the layer; antifouling agents |
| 08/01/1996 | DE19603436A1 Water-soluble photocurable resin compsn. useful in black matrix punch |
| 07/31/1996 | EP0724199A1 Method of adjusting projection optical apparatus |
| 07/31/1996 | EP0724198A1 Imaging element and method for making a lithographic printing plate according to the silver salt diffusion transfer process |
| 07/31/1996 | EP0724197A1 Photopolymerizable composition |
| 07/31/1996 | EP0723736A1 Bonding inner layers in printed circuit board manufacture |
| 07/31/1996 | EP0723699A1 Electrodeless map with improved efficacy |
| 07/31/1996 | EP0723677A1 Top anti-reflective coating films |
| 07/31/1996 | EP0648343B1 Lithographically produced stepped lens with a fresnel surface structure and process for producing it |
| 07/31/1996 | CN1128034A Energy-curable cyanate/ethylenically unsaturated compositions |
| 07/31/1996 | CN1127891A Method for making holo-rainbow coil paper |
| 07/31/1996 | CN1127763A Aromatic hydroxycarboxylic acid resins and their use |
| 07/30/1996 | US5541263 Polymer having inert blocking groups |
| 07/30/1996 | US5541235 Organic soluble cationic dyes with fluorinated alkylsulfonyl counterions |
| 07/30/1996 | US5541038 For thick film printing plates, mixture of photoinitiators |
| 07/30/1996 | US5541037 Anti-reflective material and patterning method |
| 07/30/1996 | US5541036 Negative photoresist compositions comprising a photosensitive compound, an alkoxymethylated melamine and novolak resin |
| 07/30/1996 | US5541035 Photosensitive sheets for images and for transferring images to supports |
| 07/30/1996 | US5541034 Production of lithographic printing plates in a dry manner |
| 07/30/1996 | US5541033 Selected o-quinonediazide sulfonic acid esters of phenolic compounds and their use in radiation-sensitive compositions |
| 07/30/1996 | US5541026 Exposure apparatus and photo mask |
| 07/30/1996 | US5541023 X-ray mask, method of manufacturing the x-ray mask and exposure method using the x-ray mask |
| 07/30/1996 | US5540345 Process of producing diffraction grating |
| 07/25/1996 | WO1996022597A1 Laminate |
| 07/25/1996 | WO1996022564A1 Method of developing positive photoresist and compositions therefor |
| 07/25/1996 | WO1996022563A1 Positive resist composition |
| 07/25/1996 | WO1996022288A1 GLYCOPROTEIN IIb/IIIa ANTAGONISTS |
| 07/25/1996 | WO1996008749A3 Method of producing a three-dimensional component or group of components |
| 07/25/1996 | CA2210682A1 Glycoprotein iib/iiia antagonists |
| 07/24/1996 | EP0723387A1 Soldermask gasketing of printed wiring board surface mount pads |
| 07/24/1996 | EP0723283A2 Cadmium discharge lamp of the short arc type and method of producing UV light therewith |
| 07/24/1996 | EP0723205A1 Removing agent composition and method of removing photoresist using the same |
| 07/24/1996 | EP0723204A1 A method and apparatus for obtaining a lithographic plate |
| 07/24/1996 | EP0723203A1 A method for making a lithographic printing plate |
| 07/24/1996 | EP0723202A1 Photosensitive polymer-containing systems with increased shelf-lives |
| 07/24/1996 | EP0723201A1 Phenolic-resins with acid-labile protecting groups |
| 07/24/1996 | EP0723200A2 Image-formable material, image-receiving sheet material and process for forming releasable cushion layer |
| 07/24/1996 | EP0723196A1 Imaging element and method for making a lithographic printing plate according to the silver salt diffusion transfer process |
| 07/24/1996 | EP0723195A1 Imaging element and method for making lithographic printing plates according to the silver salt diffusion transfer process |
| 07/24/1996 | EP0723173A2 Exposure apparatus |
| 07/24/1996 | EP0723167A2 Photopolymerizable composition for a color filter |
| 07/24/1996 | CN1127417A Method of making a shadow mask |
| 07/24/1996 | CN1127192A Print making device |
| 07/23/1996 | US5539764 Laser generated X-ray source |
| 07/23/1996 | US5539568 Method of exposing a light sensitive material |
| 07/23/1996 | US5539567 For projecting an image onto a target |
| 07/23/1996 | US5539521 Method of and apparatus for measuring pattern positions |
| 07/23/1996 | US5539497 Projection exposure apparatus and exposure method |
| 07/23/1996 | US5539249 Method and structure for forming an integrated circuit pattern on a semiconductor substrate |
| 07/23/1996 | US5539080 Photolithography with ultraviolet radiation for integrated circuits |
| 07/23/1996 | US5539064 Applying resist film to substrate surface of printed circuit board to generate pre cured resist film, selectively exposing pre cured film to ultraviolet radiation by using photo tool artwork, developing, and curing |
| 07/23/1996 | US5538841 Use of glow discharge treatment to promote adhesion of aqueous coatings to substrate |
| 07/23/1996 | US5538833 Biasing chrome images of phase shift mask, overexposing resist to compensate |
| 07/23/1996 | US5538832 Developing solution for producing printed circuit boards and a process for producing printed circuit boards wherein the developing solution comprises a quaternary ammonium hydroxide and a quaternary ammonium carbonate |
| 07/23/1996 | US5538831 Thermal transfer film |
| 07/23/1996 | US5538821 Solder resist, resist for electroless deposition of gold, epoxy novalak resin reacted with hydroxyl compound and polybasic unsaturated carboxylic acid |
| 07/23/1996 | US5538820 Reticulation resistant photoresist coating |
| 07/23/1996 | US5538818 Reflection Photomask |