| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 09/25/1996 | EP0734147A1 Intensity modulated stochastic screening for preparing a lithographic printing plate |
| 09/25/1996 | EP0733954A2 Method and apparatus for processing photosensitive lithographic printing plate |
| 09/25/1996 | EP0733953A1 A kit for making a processing liquid for processing a lithographic printing plate |
| 09/25/1996 | EP0733952A1 Photoresist compositions |
| 09/25/1996 | EP0733951A2 Process and apparatus for the fabrication of a printing screen |
| 09/25/1996 | EP0733683A1 Photosolder resist ink, printed circuit board, and process for producing the same |
| 09/25/1996 | EP0733665A1 Process for the preparation of polybenzoxazol precursors and their corresponding resist solutions |
| 09/25/1996 | EP0733649A1 Peroxycarboxylic ester initiators derived from nitrogen heterocycles |
| 09/25/1996 | CN1131754A Negative type resist and method of forming resist pattern |
| 09/24/1996 | US5559816 Narrow-band laser apparatus |
| 09/24/1996 | US5559629 Unit magnification projection system and method |
| 09/24/1996 | US5559598 Apparatus for detecting misalignment between diffraction gratings and the position of a diffraction grating based on the phases or the phase difference between electrical signals |
| 09/24/1996 | US5559584 Exposure apparatus |
| 09/24/1996 | US5559583 Exposure system and illuminating apparatus used therein and method for exposing a resist film on a wafer |
| 09/24/1996 | US5559582 Exposure apparatus |
| 09/24/1996 | US5559338 Deep ultraviolet optical imaging system for microlithography and/or microfabrication |
| 09/24/1996 | US5558978 Photoresist compositions containing copolymers having acid-labile groups and recurring units derived from either N-(hydroxymethyl)maleimide or N-(acetoxymethyl)maleimide or both |
| 09/24/1996 | US5558976 Pattern formation method |
| 09/24/1996 | US5558975 Liquid jet recording head and recording apparatus having same |
| 09/24/1996 | US5558971 Hydroxystyrene polymer derivatives, photoacid generator |
| 09/24/1996 | US5558963 Method of producing photomask and exposing |
| 09/24/1996 | US5558937 Optical fiber primary coatings and fibers coated therewith |
| 09/24/1996 | US5558820 Process for preparing microcapsules |
| 09/24/1996 | US5557857 Apparatus for the aftertreatment of photopolymerizable printing plates |
| 09/24/1996 | US5557855 Reticle |
| 09/19/1996 | WO1996028829A1 Method and apparatus for micromachining using hard x-rays |
| 09/19/1996 | WO1996028764A1 Photosensitive resin composition, and coating film, resist ink, resist, solder resist and printed circuit board each produced therefrom |
| 09/19/1996 | WO1996028763A1 Liquid photocurable compositions |
| 09/19/1996 | WO1996028762A1 Liquid photocurable compositions |
| 09/19/1996 | WO1996028751A1 Method for particle wave reconstruction in a particle-optical apparatus |
| 09/19/1996 | DE19609652A1 Correcting photo-mask patterns for use in photolithography for semiconductor mfr. |
| 09/19/1996 | DE19609297A1 Photolithographic etching of semiconductors by projected light |
| 09/19/1996 | DE19543010A1 Illumination method for forming luminous layer in colour cathode ray tube |
| 09/18/1996 | EP0732871A1 Method and apparatus for continuously supplying a continuous film in a film applying apparatus |
| 09/18/1996 | EP0732628A1 Aqueous alkaline solution for developing offset printing plate |
| 09/18/1996 | EP0732627A1 A kit for preparing a processing liquid for use in the preparation of a lithographic printing plate according to the silver salt diffusion transfer process |
| 09/18/1996 | EP0732626A2 Radiation sensitive composition comprising polymer having inert blocking groups |
| 09/18/1996 | EP0732625A2 Stabilization of liquid radiation-curable compositions against premature polymerization |
| 09/18/1996 | EP0732624A2 Fabrication method with energy beam and fabrication apparatus therewith |
| 09/18/1996 | EP0732623A2 Positive-acting photosensitive element |
| 09/18/1996 | EP0732605A2 Exposure apparatus |
| 09/18/1996 | EP0731909A1 Sensors employing interference of electromagnetic waves passing through waveguides having functionalized surfaces |
| 09/17/1996 | US5557469 Beamsplitter in single fold optical system and optical variable magnification method and system |
| 09/17/1996 | US5557411 Position detection method |
| 09/17/1996 | US5557314 Exposure method and pattern data preparation system therefor, pattern data preparation method and mask as well as exposure apparatus |
| 09/17/1996 | US5557150 Overmolded semiconductor package |
| 09/17/1996 | US5557147 Semiconductor integrated circuit device, process for fabricating the same, and apparatus for fabricating the same |
| 09/17/1996 | US5556924 Maleic anhydride, maleic acid or esters and isopropenyl dimethylbenzyl isocyanate copolymers |
| 09/17/1996 | US5556812 Connection and build-up technique for multichip modules |
| 09/17/1996 | US5556735 Patterned solder resist on a printed circuit |
| 09/17/1996 | US5556734 Radiation sensitive resin composition comprising copolymer of isopropenylphenol and T-butyl(meth)acrylate |
| 09/17/1996 | US5556726 Photoresists to be bleached, masking with transparent and semitransparent regions providing partial transmission, exposure to light, measurement of energy and calculating exposure dosage |
| 09/17/1996 | US5556665 Meniscus coating of CRT screens |
| 09/17/1996 | US5556590 Apparatus for production of three-dimensional objects by stereolithography |
| 09/17/1996 | US5556499 Delaminating method and apparatus |
| 09/17/1996 | US5556482 Polar solvent and basic amine for substrates with photoresists and phenol compounds |
| 09/14/1996 | CA2171504A1 Stabilization of liquid radiation-curable compositions against undesired premature polymerization |
| 09/12/1996 | WO1996027821A1 Process control strip and a method of recording |
| 09/12/1996 | WO1996027628A1 Energy-polymerizable compositions comprising a cyanate ester monomer or oligomer and a polyol |
| 09/12/1996 | DE19508170A1 Transfer method for picture pattern |
| 09/11/1996 | EP0731490A2 Ultra-fine microfabrication method using an energy beam |
| 09/11/1996 | EP0731388A2 An energy-sensitive resist material and a process for device fabrication using an energy-sensitive resist material |
| 09/11/1996 | EP0731147A2 Organic soluble cationic dyes with fluorinated alkylsulfonyl counterions |
| 09/11/1996 | EP0731113A2 Polymers and photosensitive compositions obtained therefrom |
| 09/11/1996 | EP0731074A2 Tetraphenol compounds, process for producing the same and their use as photosensitisers |
| 09/11/1996 | EP0457843B1 Method and apparatus for measuring registration between layers of a semiconductor wafer |
| 09/11/1996 | CN1130632A Alkoxyphenyl substituted bisacylphosphine oxides |
| 09/10/1996 | US5555479 Reduction projection lens system including refractive and diffractive optical elements |
| 09/10/1996 | US5555234 Developing method and apparatus |
| 09/10/1996 | US5555135 Illumination system |
| 09/10/1996 | US5555089 Absolute distance measuring interferometry using multi-pass resonant cavity referenced to a stabilized laser source |
| 09/10/1996 | US5554797 Enhance photosensitivity and/or rate of development of photoresists |
| 09/10/1996 | US5554760 2-(2-hydroxy-3-α-cumyl-5-nonylor 5-dodecylphenyl)-2H-benzotriazole |
| 09/10/1996 | US5554712 Aqueous developable photosensitive polyurethane-(meth)acrylate |
| 09/10/1996 | US5554684 Forming polyimide coating by screen printing |
| 09/10/1996 | US5554663 α-aminoacetophenones as photoinitiators |
| 09/10/1996 | US5554489 Method of forming a fine resist pattern using an alkaline film covered photoresist |
| 09/10/1996 | US5554488 Semiconductor device structure and method of formation thereof |
| 09/10/1996 | US5554487 Resist formation made by applying, drying and reflowing a suspension of photocurable material |
| 09/10/1996 | US5554486 Techniques for uniformizing photoresist thickness and critical dimension of underlying features through aerosol application of photoresist |
| 09/10/1996 | US5554485 Mid and deep-UV antireflection coatings and methods for use thereof |
| 09/10/1996 | US5554484 Gamma radiation sensitive resist materials for semiconductor lithography |
| 09/10/1996 | US5554482 Silver halide light-sensitive material containing base precursor and polyvinyl alcohol |
| 09/10/1996 | US5554481 Naphthoquinonediazide sulfonate of a polyaryl polyhydroxy compound, alkali solubile resin |
| 09/10/1996 | US5554465 Photolithography |
| 09/10/1996 | US5554336 Method and apparatus for production of three-dimensional objects by stereolithography |
| 09/10/1996 | US5554312 Polar solvent, amine, polyethylene glycol or polypropylene glycol |
| 09/10/1996 | US5553994 Thermal process module for substrate coat/develop system |
| 09/09/1996 | CA2147388A1 Method for manufacturing superior ink-water balance and alkaline resistant ps plates |
| 09/05/1996 | DE19507665A1 Verfahren zur Kalibrierung und Kontrolle einer Belichtung und Belichtungs-Kontrollstreifen Methods for the calibration and control of exposure and exposure control strip |
| 09/04/1996 | EP0730204A1 Auto-aperture apparatus |
| 09/04/1996 | EP0730203A2 Silk screen coating apparatus |
| 09/04/1996 | EP0730202A2 A method for preparing an aluminium foil for use as a support in lithographic printing plates |
| 09/04/1996 | EP0730201A1 Sensitized photopolymerizable compositions and use thereof in lithographic printing plates |
| 09/04/1996 | EP0729945A1 Photopolymerizable composition containing squarylium compound |
| 09/04/1996 | EP0713586A4 Ablation transfer onto intermediate receptors |
| 09/04/1996 | EP0684906A4 Liquid curable resin composition. |
| 09/04/1996 | EP0569488B1 Borate coinitiators for photopolymerizable compositions |
| 09/04/1996 | CN1130263A Method for making quantum line ultra-fine figure |
| 09/04/1996 | CN1130260A Loading and unloading device for reticle sheet |