| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 02/21/1996 | EP0697632A2 Chemically amplified radiation-sensitive composition |
| 02/21/1996 | EP0697631A1 Photosensitive recording material, photosensitive recording medium, and process for producing hologram using this photosensitive recording medium |
| 02/21/1996 | EP0697630A1 X-ray mask support |
| 02/21/1996 | EP0697025A1 Compositions of matter |
| 02/21/1996 | CN1117148A Method of providing sacrificial spacer for micro-mechanical devices |
| 02/20/1996 | US5493402 EGA alignment method using a plurality of weighting coefficients |
| 02/20/1996 | US5493184 Electrodeless lamp with improved efficiency |
| 02/20/1996 | US5493177 For forming a microstructure |
| 02/20/1996 | US5492987 Reacting photoinitiator group substituted unsaturated monomer with fluorine substituted unsaturated monomer |
| 02/20/1996 | US5492942 Pyran derivative, photosensitive resin composition, and hologram recording medium using it |
| 02/20/1996 | US5492861 Process for applying structured layers using laser transfer |
| 02/20/1996 | US5492793 Photoresist composition |
| 02/20/1996 | US5492791 Photosensitive material and method for making color-proofing films |
| 02/20/1996 | US5492790 Gas sensors, color filters |
| 02/20/1996 | US5492789 Process for producing microcapsules containing a diazonium salt compound and a photofixation thermal recording material employing the same |
| 02/18/1996 | CA2155045A1 Off axis alignment system for scanning photolithography |
| 02/15/1996 | WO1996004592A1 Method of repetitively imaging a mask pattern on a substrate |
| 02/15/1996 | WO1996004577A1 High resolution x-ray dispersive and reflective structure |
| 02/15/1996 | WO1996004346A1 Acrylic syrup curable to a crosslinked viscoelastomeric material |
| 02/15/1996 | CA2196169A1 Acrylic syrup curable to a crosslinked viscoelastomeric material |
| 02/14/1996 | EP0696816A2 Emission device with a cadmium lamp |
| 02/14/1996 | EP0696762A1 Exposing apparatus with mask alignment system and method of aligning, exposing, and transferring work |
| 02/14/1996 | EP0696761A1 Flexographic printing plates from photocurable elastomer compositions |
| 02/14/1996 | EP0696518A1 Heat sensitive ink sheet and image forming method |
| 02/14/1996 | EP0696515A1 Ink jet printing process |
| 02/14/1996 | EP0696245A1 Laser-induced thermal transfer process |
| 02/14/1996 | CN2220084Y Enlarging photomechanical copying apparatus |
| 02/14/1996 | CN1116731A 曝光掩模 Exposure mask |
| 02/14/1996 | CN1116730A Method for making photograph name card |
| 02/13/1996 | US5491707 Low cost, high average power, high brightness solid state laser |
| 02/13/1996 | US5491534 Exposure apparatus and microdevice manufacturing method using the same |
| 02/13/1996 | US5491047 Method of removing a silylated or germanium implanted photoresist |
| 02/13/1996 | US5491046 Method of imaging a lithographic printing plate |
| 02/13/1996 | US5490896 Etching resistance; semiconductor devices |
| 02/08/1996 | WO1996003641A1 Scanning probe microscope assembly |
| 02/08/1996 | DE19527681A1 Irradiation projection method for mask exposure in e.g. DRAM chip prodn. |
| 02/08/1996 | DE19525777A1 Dye soln. for non-dampening silicone rubber layered printing plates |
| 02/08/1996 | DE19521390A1 Focusing method for step and repeat photoengraving on semiconductor chips using miniature projection lens |
| 02/08/1996 | DE19519856A1 Verfahren und Vorrichtung zum Abtrennen eines Films Method and apparatus for separating a film |
| 02/07/1996 | EP0695971A1 Photosensitive lithographic printing plate |
| 02/07/1996 | EP0695740A1 Quinonediazine sulfonic acid esters and positive photoresist compositions comprising the same |
| 02/07/1996 | EP0695438A1 Method and apparatus for process control |
| 02/07/1996 | EP0695437A1 Photocurable compositions |
| 02/06/1996 | US5489804 Flexible preformed planar structures for interposing between a chip and a substrate |
| 02/06/1996 | US5489678 Photolabile nucleoside and peptide protecting groups |
| 02/06/1996 | US5489623 Applying polymer to surface, exposing to incident photonicradiation to render portions less soluble or dispersible |
| 02/06/1996 | US5489621 Process for forming colored partial picture element and light-shielding light-sensitive resin composition used therefor |
| 02/06/1996 | US5489505 On a support atleast one silver halide emulsion and atleast one methine dye; storage stability and high sensitivity |
| 02/06/1996 | US5489499 Photosensitive trihalomethyl-s-triazine compound and photopolymerizable composition |
| 02/06/1996 | US5489361 Monitoring electrical characteristics between two electrodesin etchant bath |
| 02/01/1996 | WO1996002491A1 Positive photoactive compounds based on 2,6-dinitrobenzyl groups |
| 02/01/1996 | DE19527683A1 Verfahren zur Herstellung einer Fotomaske für die Fertigung einer Halbleitervorrichtung A process for the manufacture of a photomask for manufacturing a semiconductor device |
| 02/01/1996 | DE19520741A1 Developer for positive lithographic printing plates |
| 01/31/1996 | EP0694817A2 An exposure apparatus |
| 01/31/1996 | EP0694811A1 Image receiving layer for use in a silver salt diffusion transfer process |
| 01/31/1996 | EP0693978A1 Removal of surface contaminants by irradiation |
| 01/31/1996 | CN2218647Y Positioning exposure device for continuous copying and printing board mark |
| 01/31/1996 | CN1115958A Method and device for peeling a film |
| 01/31/1996 | CN1115876A Method of optical lithography using phase shift masking |
| 01/31/1996 | CN1115875A Ablative flashlamp imaging |
| 01/31/1996 | CN1115874A Colour ink-jetting plate-making system |
| 01/31/1996 | CN1115871A Optical guiding device with unit for driving lens system for temperature revising in optical axis |
| 01/30/1996 | US5488514 Method of mounting an optical element |
| 01/30/1996 | US5488246 Semiconductor device and method of manufacturing the same |
| 01/30/1996 | US5488229 Deep ultraviolet microlithography system |
| 01/30/1996 | US5488182 Phenol compounds containing methoxymethyl group or hydroxymethyl group |
| 01/30/1996 | US5487967 Multilayer element for images with silanes with exposure and development |
| 01/30/1996 | US5487966 Photosensitive compositions |
| 01/30/1996 | US5487852 Polyamides, polyester ethers or polyimides for sheets |
| 01/30/1996 | CA2129198A1 Photosensitive polymer composition |
| 01/30/1996 | CA2070257C Optical pellicle holder |
| 01/25/1996 | WO1996002021A1 Original form for lithographic plate and process for preparing lithographic plate |
| 01/25/1996 | WO1996002020A1 Method of removing surface stickiness of relief printing plate made from photosensitive resin |
| 01/25/1996 | DE19525221A1 Light-sensitive material useful as photoresist with short wavelength light |
| 01/24/1996 | EP0693711A1 Initiating the delamination of an image suited for dry processing |
| 01/24/1996 | CN1115496A Anti-reflective layer and method for manufacturing semiconductor device using the same |
| 01/24/1996 | CN1115419A Pattern alignment mark of semiconductor device |
| 01/24/1996 | CN1115416A Reticle and method for measuring rotation error of reticle by use of the reticle |
| 01/24/1996 | CN1115415A A reticle and a method for measuring blind setting accuracy using the same |
| 01/24/1996 | CN1115414A Photomask for the measurement of resolution of exposure equipment |
| 01/24/1996 | CN1115413A Reticle |
| 01/24/1996 | CN1115412A Method for fabricating a phase shift mask |
| 01/24/1996 | CN1115410A Photo mask provided with development rate measuring pattern and method for measuring development rate uniformity |
| 01/24/1996 | CN1115409A Method for forming photoresist patterns |
| 01/23/1996 | US5486919 Inspection method and apparatus for inspecting a particle, if any, on a substrate having a pattern |
| 01/23/1996 | US5486896 Exposure apparatus |
| 01/23/1996 | US5486851 Illumination device using a pulsed laser source a Schlieren optical system and a matrix addressable surface light modulator for producing images with undifracted light |
| 01/23/1996 | US5486701 Method and apparatus for measuring reflectance in two wavelength bands to enable determination of thin film thickness |
| 01/23/1996 | US5486449 Photomask, photoresist and photolithography for a monolithic IC |
| 01/23/1996 | US5486447 Heat resistance, storage stability |
| 01/23/1996 | US5486424 Silylated photoresist layer and planarizing method |
| 01/23/1996 | US5486267 Method for applying photoresist |
| 01/23/1996 | CA1337979C Method of making electrically conductive patterns |
| 01/18/1996 | DE4424236A1 Process for structuring a component surface, esp. a plate, made of a polymer |
| 01/18/1996 | DE19525745A1 Verfahren zur Bildung eines Abdeckungsmusters A method for forming a resist pattern |
| 01/17/1996 | EP0692741A1 Device for making a printing screen |
| 01/17/1996 | EP0692740A1 Process and apparatus for the manufacture of an optical component |
| 01/17/1996 | EP0691990A1 Amphoteric copolymer derived from vinylpyridine & acetoxystyrene |
| 01/17/1996 | CN1115187A Waterless lithographic plate |
| 01/17/1996 | CN1030739C Autodeposition emulsion and method of using thereof to selectively protect metallic surfaces |