Patents
Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
12/1995
12/27/1995EP0689095A1 Visible light sensitizer for photopolymerizing initiator and/or photocrosslinking agent, photosensitive composition, and hologram recording medium
12/27/1995EP0689094A1 Bleaching mask
12/27/1995EP0689077A2 Improvements in and relating to micro-mechanical devices
12/27/1995EP0688445A1 Apparatus for treating photographic originals with a treatment liquid
12/26/1995USRE35135 Photocurable resin composition
12/26/1995US5479238 High resolution imagery systems and methods
12/26/1995US5479233 Photosensitive lithographic printing plate processing apparatus
12/26/1995US5478699 Electroforming patterned metal layer onto portions of mandrel determined by pattern of resist
12/26/1995US5478695 Heat-sensitive imaging element
12/26/1995US5478694 Low adhesive force between colored photopolymerizable layer and adhesive layer
12/26/1995US5478692 Fine patterning for electronics
12/26/1995US5478691 Blend of alkali-soluble novolak resin and 1,2-quinonediazidecompound
12/26/1995US5478690 Alkali developable photosensitive resin composition comprising a binder having betaine side groups
12/26/1995US5478681 Forming negative photoresist film on transparent substrate having transparent electrically conductive layer, exposing separately through pattern masks at different light doses, developing, electrodepositing colored coating, repeating
12/26/1995US5478680 Color filter
12/26/1995US5478434 De-laminator apparatus and method with leader diverter
12/26/1995US5478403 Applying plasma generated by activating gas containing oxygen through plate for capturing charged particles and transmitting neutral species, positioning material where high energy particles impinge thereon with neutral species
12/26/1995CA1337788C Photoresist composition including polyphenol and sensitizer
12/24/1995CA2152558A1 Bleaching mask
12/23/1995CA2152236A1 Positive photoresist
12/22/1995CA2149932A1 Method of providing sacrificial spacer for micro-mechanical devices
12/21/1995WO1995034901A1 Soft x-ray submicron lithography using multiply charged ions
12/21/1995WO1995034845A1 Self-contained imaging assembly and method for forming images therein
12/21/1995DE4421053A1 Illumination device esp. for microlithographic projection exposure
12/21/1995CA2191734A1 Self-contained imaging assembly and method for forming images therein
12/20/1995EP0687957A1 A multi-task semiconductor wafer stepper
12/20/1995EP0687956A1 Illumination device
12/20/1995EP0687945A1 Optical apparatus having lens system drive device for temperature correction in direction of optical axis
12/20/1995EP0687896A1 Optical element for photolithography and method for evaluating an optical element
12/20/1995EP0586497B1 Method and apparatus of exposing light sensitive material by means of a copying machine having a vertically movable laser unit
12/20/1995EP0525070B1 Photovoltaic cells
12/19/1995US5477311 Method and apparatus used in making copies of several various film sizes
12/19/1995US5477304 Projection exposure apparatus
12/19/1995US5477057 Off axis alignment system for scanning photolithography
12/19/1995US5476754 Presensitized; hydrophilic surface on substrate; light sensitive layer containing alkaline water-soluble photocrosslinkable copolycondensed diazo resin
12/19/1995US5476753 Applying mixture of polysilane and acid generator to semiconductor substrate
12/19/1995US5476752 Active energy ray-curing resin composition
12/19/1995US5476751 Phenylacetates and their use in radiation sensitive compositions
12/19/1995US5476750 Pretreatment with ion exchange resin
12/19/1995US5476749 Photosensitive compositions based on acrylates
12/19/1995US5476748 Photosensitive compositions
12/19/1995US5476738 Photolithographic dose determination by diffraction of latent image grating
12/19/1995US5476737 method of forming a phosphor screen of a cathode ray tube
12/19/1995US5476736 Projection exposure method and system used therefor
12/19/1995US5476690 Pattern formed by electroless plating using a photoresist; developable by aqueous alkaline solution
12/19/1995US5476320 Developer preparing apparatus and developer preparing method
12/19/1995CA2018954C Method of developing photopolymerizable printing plates and composition therefor
12/19/1995CA1337771C Unsaturated .beta.-keto-ester acetals and their uses
12/19/1995CA1337765C Titanocenes, the use thereof, and n-substituted pyrroles
12/14/1995WO1995034025A1 Method of repetitively imaging a mask pattern on a substrate, and apparatus for performing the method
12/14/1995WO1995034023A1 Monochromatic and polychromatic proofs of high resolution masters and process and means for their preparation
12/14/1995CA2168773A1 Monochromatic and polychromatic proofs of high resolution masters and process and means for their preparation
12/13/1995EP0686999A2 Pattern formation in the fabrication of microelectronic devices
12/13/1995EP0686877A1 Colored photosensitive resin composition
12/13/1995EP0686480A2 Stereolithographic supports
12/13/1995EP0686477A2 Method and device for peeling a film
12/13/1995EP0686274A1 Novel matrix resin for high-temperature stable photoimageable compositions
12/13/1995EP0686094A1 Clamping device
12/13/1995EP0686021A1 Surgical cutting tool
12/13/1995EP0596941B1 Acid-substituted ternary acetal polymers and use thereof in photosensitive compositions and lithographic printing plates
12/12/1995US5475491 Exposure apparatus
12/12/1995US5475490 Method of measuring a leveling plane
12/12/1995US5474885 Type of modified gelatin and its use in a DTR material
12/12/1995US5474877 Collapse of resist pattern is avoided by relieving surface tension of the rinsing fluid
12/12/1995US5474876 Carboxyl-containing polymeric precursor of heterocyclic polymer which is stable at high temperatures and soluble in polar solvents, copolymerizable unsaturated tertiary sulfonium salt, photoinitiator, polar aprotic organic solvent
12/12/1995US5474875 Photosensitive mixture for producing relief and printing plates
12/12/1995US5474872 A vinyl alcohol copolymer having comonomer protected by acid releasing protective groups; dry etching resistance
12/12/1995US5474844 Image-forming transfer material including a polyester film
12/12/1995US5474807 Method for applying or removing coatings at a confined peripheral region of a substrate
12/12/1995US5474719 Coating surface with layer of viscosity reduced photoformable material, allowing viscosity to increase, imagewise exposing to radiation, repeating until three-dimensional object is formed
12/12/1995US5474666 Using surfactant of alkali salt of acyclated polypeptide
12/06/1995EP0685881A1 Linewidth control apparatus and method
12/06/1995EP0685767A1 Developer for photoresist layers
12/06/1995EP0685766A1 Selected trinuclear novolak oligomers and their use in photo-active compounds and radiation sensitive mixtures
12/06/1995EP0685765A1 Monochromatic and polychromatic proofs of high resolution masters and process and means of their preparation
12/06/1995EP0684906A1 Liquid curable resin composition
12/06/1995EP0606402B1 Lamination of a photopolymerizable solder mask layer to a substrate containing holes using an intermediate photopolymerizable liquid layer
12/06/1995EP0556193B1 Method and apparatus for transferring articles between two controlled environments
12/06/1995EP0482098B1 Aqueous developer composition for developing negative working lithographic printing plates
12/05/1995US5473453 Liquid crystal display with opaque film formed by exposure through microlens
12/05/1995US5473435 Method of measuring the bent shape of a movable mirror of an exposure apparatus
12/05/1995US5473433 Method of high yield manufacture of VLSI type integrated circuit devices by determining critical surface characteristics of mounting films
12/05/1995US5473424 Tilting apparatus
12/05/1995US5473412 Energy amount controlling method
12/05/1995US5473410 Projection exposure apparatus
12/05/1995US5473409 Semiconductor light exposure device
12/05/1995US5473408 For producing a pattern on a target substrate
12/05/1995US5473045 Two-step process; first noncatalyzed reaction of phenolic monomer with aldehyde source, then chain extension
12/05/1995US5472992 Photopolymerizable compositions containing an alkylbisacylphosphine oxide
12/05/1995US5472830 Non-corrosion photoresist stripping composition
12/05/1995US5472829 Method of forming a resist pattern by using an anti-reflective layer
12/05/1995US5472828 Uniformly projecting predetermined pattern onto nonplanar substrate having three dimensionally curved surface by ablating with coherent light source
12/05/1995US5472827 Method of forming a resist pattern using an anti-reflective layer
12/05/1995US5472826 Semiconductor device fabrication method
12/05/1995US5472824 Edge sealing with photopolymerizable composition comprising a thermoplastic elastomer block polymer binder and at least two addition polymerizable acrylate monomers
12/05/1995US5472823 Photosensitive resin composition
12/05/1995US5472822 Mesolonic compounds in the preparation of lithographic printing plate by diffusion transfer
12/05/1995US5472814 Orthogonally separated phase shifted and unphase shifted mask patterns for image improvement
12/05/1995US5472813 Exposing resist layer by use of phase shift of light transmitted through a reticle, developing, exposing corresponding pattern on resist layer using edge parts, patterns exposed to edge parts overlapping
12/05/1995US5472786 Variable index material for optical switching and real time holographic recording