Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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12/27/1995 | EP0689095A1 Visible light sensitizer for photopolymerizing initiator and/or photocrosslinking agent, photosensitive composition, and hologram recording medium |
12/27/1995 | EP0689094A1 Bleaching mask |
12/27/1995 | EP0689077A2 Improvements in and relating to micro-mechanical devices |
12/27/1995 | EP0688445A1 Apparatus for treating photographic originals with a treatment liquid |
12/26/1995 | USRE35135 Photocurable resin composition |
12/26/1995 | US5479238 High resolution imagery systems and methods |
12/26/1995 | US5479233 Photosensitive lithographic printing plate processing apparatus |
12/26/1995 | US5478699 Electroforming patterned metal layer onto portions of mandrel determined by pattern of resist |
12/26/1995 | US5478695 Heat-sensitive imaging element |
12/26/1995 | US5478694 Low adhesive force between colored photopolymerizable layer and adhesive layer |
12/26/1995 | US5478692 Fine patterning for electronics |
12/26/1995 | US5478691 Blend of alkali-soluble novolak resin and 1,2-quinonediazidecompound |
12/26/1995 | US5478690 Alkali developable photosensitive resin composition comprising a binder having betaine side groups |
12/26/1995 | US5478681 Forming negative photoresist film on transparent substrate having transparent electrically conductive layer, exposing separately through pattern masks at different light doses, developing, electrodepositing colored coating, repeating |
12/26/1995 | US5478680 Color filter |
12/26/1995 | US5478434 De-laminator apparatus and method with leader diverter |
12/26/1995 | US5478403 Applying plasma generated by activating gas containing oxygen through plate for capturing charged particles and transmitting neutral species, positioning material where high energy particles impinge thereon with neutral species |
12/26/1995 | CA1337788C Photoresist composition including polyphenol and sensitizer |
12/24/1995 | CA2152558A1 Bleaching mask |
12/23/1995 | CA2152236A1 Positive photoresist |
12/22/1995 | CA2149932A1 Method of providing sacrificial spacer for micro-mechanical devices |
12/21/1995 | WO1995034901A1 Soft x-ray submicron lithography using multiply charged ions |
12/21/1995 | WO1995034845A1 Self-contained imaging assembly and method for forming images therein |
12/21/1995 | DE4421053A1 Illumination device esp. for microlithographic projection exposure |
12/21/1995 | CA2191734A1 Self-contained imaging assembly and method for forming images therein |
12/20/1995 | EP0687957A1 A multi-task semiconductor wafer stepper |
12/20/1995 | EP0687956A1 Illumination device |
12/20/1995 | EP0687945A1 Optical apparatus having lens system drive device for temperature correction in direction of optical axis |
12/20/1995 | EP0687896A1 Optical element for photolithography and method for evaluating an optical element |
12/20/1995 | EP0586497B1 Method and apparatus of exposing light sensitive material by means of a copying machine having a vertically movable laser unit |
12/20/1995 | EP0525070B1 Photovoltaic cells |
12/19/1995 | US5477311 Method and apparatus used in making copies of several various film sizes |
12/19/1995 | US5477304 Projection exposure apparatus |
12/19/1995 | US5477057 Off axis alignment system for scanning photolithography |
12/19/1995 | US5476754 Presensitized; hydrophilic surface on substrate; light sensitive layer containing alkaline water-soluble photocrosslinkable copolycondensed diazo resin |
12/19/1995 | US5476753 Applying mixture of polysilane and acid generator to semiconductor substrate |
12/19/1995 | US5476752 Active energy ray-curing resin composition |
12/19/1995 | US5476751 Phenylacetates and their use in radiation sensitive compositions |
12/19/1995 | US5476750 Pretreatment with ion exchange resin |
12/19/1995 | US5476749 Photosensitive compositions based on acrylates |
12/19/1995 | US5476748 Photosensitive compositions |
12/19/1995 | US5476738 Photolithographic dose determination by diffraction of latent image grating |
12/19/1995 | US5476737 method of forming a phosphor screen of a cathode ray tube |
12/19/1995 | US5476736 Projection exposure method and system used therefor |
12/19/1995 | US5476690 Pattern formed by electroless plating using a photoresist; developable by aqueous alkaline solution |
12/19/1995 | US5476320 Developer preparing apparatus and developer preparing method |
12/19/1995 | CA2018954C Method of developing photopolymerizable printing plates and composition therefor |
12/19/1995 | CA1337771C Unsaturated .beta.-keto-ester acetals and their uses |
12/19/1995 | CA1337765C Titanocenes, the use thereof, and n-substituted pyrroles |
12/14/1995 | WO1995034025A1 Method of repetitively imaging a mask pattern on a substrate, and apparatus for performing the method |
12/14/1995 | WO1995034023A1 Monochromatic and polychromatic proofs of high resolution masters and process and means for their preparation |
12/14/1995 | CA2168773A1 Monochromatic and polychromatic proofs of high resolution masters and process and means for their preparation |
12/13/1995 | EP0686999A2 Pattern formation in the fabrication of microelectronic devices |
12/13/1995 | EP0686877A1 Colored photosensitive resin composition |
12/13/1995 | EP0686480A2 Stereolithographic supports |
12/13/1995 | EP0686477A2 Method and device for peeling a film |
12/13/1995 | EP0686274A1 Novel matrix resin for high-temperature stable photoimageable compositions |
12/13/1995 | EP0686094A1 Clamping device |
12/13/1995 | EP0686021A1 Surgical cutting tool |
12/13/1995 | EP0596941B1 Acid-substituted ternary acetal polymers and use thereof in photosensitive compositions and lithographic printing plates |
12/12/1995 | US5475491 Exposure apparatus |
12/12/1995 | US5475490 Method of measuring a leveling plane |
12/12/1995 | US5474885 Type of modified gelatin and its use in a DTR material |
12/12/1995 | US5474877 Collapse of resist pattern is avoided by relieving surface tension of the rinsing fluid |
12/12/1995 | US5474876 Carboxyl-containing polymeric precursor of heterocyclic polymer which is stable at high temperatures and soluble in polar solvents, copolymerizable unsaturated tertiary sulfonium salt, photoinitiator, polar aprotic organic solvent |
12/12/1995 | US5474875 Photosensitive mixture for producing relief and printing plates |
12/12/1995 | US5474872 A vinyl alcohol copolymer having comonomer protected by acid releasing protective groups; dry etching resistance |
12/12/1995 | US5474844 Image-forming transfer material including a polyester film |
12/12/1995 | US5474807 Method for applying or removing coatings at a confined peripheral region of a substrate |
12/12/1995 | US5474719 Coating surface with layer of viscosity reduced photoformable material, allowing viscosity to increase, imagewise exposing to radiation, repeating until three-dimensional object is formed |
12/12/1995 | US5474666 Using surfactant of alkali salt of acyclated polypeptide |
12/06/1995 | EP0685881A1 Linewidth control apparatus and method |
12/06/1995 | EP0685767A1 Developer for photoresist layers |
12/06/1995 | EP0685766A1 Selected trinuclear novolak oligomers and their use in photo-active compounds and radiation sensitive mixtures |
12/06/1995 | EP0685765A1 Monochromatic and polychromatic proofs of high resolution masters and process and means of their preparation |
12/06/1995 | EP0684906A1 Liquid curable resin composition |
12/06/1995 | EP0606402B1 Lamination of a photopolymerizable solder mask layer to a substrate containing holes using an intermediate photopolymerizable liquid layer |
12/06/1995 | EP0556193B1 Method and apparatus for transferring articles between two controlled environments |
12/06/1995 | EP0482098B1 Aqueous developer composition for developing negative working lithographic printing plates |
12/05/1995 | US5473453 Liquid crystal display with opaque film formed by exposure through microlens |
12/05/1995 | US5473435 Method of measuring the bent shape of a movable mirror of an exposure apparatus |
12/05/1995 | US5473433 Method of high yield manufacture of VLSI type integrated circuit devices by determining critical surface characteristics of mounting films |
12/05/1995 | US5473424 Tilting apparatus |
12/05/1995 | US5473412 Energy amount controlling method |
12/05/1995 | US5473410 Projection exposure apparatus |
12/05/1995 | US5473409 Semiconductor light exposure device |
12/05/1995 | US5473408 For producing a pattern on a target substrate |
12/05/1995 | US5473045 Two-step process; first noncatalyzed reaction of phenolic monomer with aldehyde source, then chain extension |
12/05/1995 | US5472992 Photopolymerizable compositions containing an alkylbisacylphosphine oxide |
12/05/1995 | US5472830 Non-corrosion photoresist stripping composition |
12/05/1995 | US5472829 Method of forming a resist pattern by using an anti-reflective layer |
12/05/1995 | US5472828 Uniformly projecting predetermined pattern onto nonplanar substrate having three dimensionally curved surface by ablating with coherent light source |
12/05/1995 | US5472827 Method of forming a resist pattern using an anti-reflective layer |
12/05/1995 | US5472826 Semiconductor device fabrication method |
12/05/1995 | US5472824 Edge sealing with photopolymerizable composition comprising a thermoplastic elastomer block polymer binder and at least two addition polymerizable acrylate monomers |
12/05/1995 | US5472823 Photosensitive resin composition |
12/05/1995 | US5472822 Mesolonic compounds in the preparation of lithographic printing plate by diffusion transfer |
12/05/1995 | US5472814 Orthogonally separated phase shifted and unphase shifted mask patterns for image improvement |
12/05/1995 | US5472813 Exposing resist layer by use of phase shift of light transmitted through a reticle, developing, exposing corresponding pattern on resist layer using edge parts, patterns exposed to edge parts overlapping |
12/05/1995 | US5472786 Variable index material for optical switching and real time holographic recording |