Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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11/25/1996 | CA2177199A1 Illumination system having spatially separate vertical and horizontal image planes for use in photolithography |
11/25/1996 | CA2177196A1 Hybrid illumination system for use in photolithography |
11/21/1996 | DE19618967A1 Gas discharge lamp |
11/20/1996 | EP0743560A1 Printing endurance of a lithographic printing plate obtained from a diazo-based imaging element |
11/20/1996 | EP0743559A1 Controlled-acidity photosensitive compositions for offset printing |
11/20/1996 | EP0743377A1 Apparatus for chemical surface treatment of flat substrate using active gas |
11/20/1996 | EP0743177A1 Lithographic printing plate for laser direct plate making requiring no liquid developing treatment process and printing method using the same |
11/20/1996 | EP0617709B1 Metal ion reduction in novolak resins |
11/20/1996 | EP0465672B1 Photocurable resin composition and process for producing photocurable resin |
11/20/1996 | CN1136324A Photosolder resist ink, printed circuit board, and process for producing the same |
11/20/1996 | CN1136214A Method of forming fluorescent screen for color cathode-ray tube and exposure system for forming same |
11/19/1996 | US5577092 Cluster beam targets for laser plasma extreme ultraviolet and soft x-ray sources |
11/19/1996 | US5577091 Water laser plasma x-ray point sources |
11/19/1996 | US5576895 Apparatus for holding a lens barrel for providing accurate lens adjustment regardless of environmental conditions |
11/19/1996 | US5576829 Method and apparatus for inspecting a phase-shifted mask |
11/19/1996 | US5576801 Projection exposure apparatus |
11/19/1996 | US5576441 Photosensitive bis(halomethyloxadiazole) compound and photosensitive transfer sheet using the same |
11/19/1996 | US5576399 Epoxy acrylates |
11/19/1996 | US5576359 Deep ultraviolet absorbent composition |
11/19/1996 | US5576357 Epoxy resin, photoinitiator, phosphorus-containing glycidyl ester; flame-resistant injection moldings materials for covering and encapsulating electronic components |
11/19/1996 | US5576164 Photographic element having a polyester substrate with an oxygen modified surface region |
11/19/1996 | US5576147 Formation of microstructures using a preformed photoresist sheet |
11/19/1996 | US5576146 Photosensitive polymer-containing systems with increased shelf-lives |
11/19/1996 | US5576145 Esterified styrene/maleic anhydride polymer and polymer-containing photoimageable composition having improved alkaline process resistance |
11/19/1996 | US5576143 Light-sensitive composition |
11/19/1996 | US5576139 Positive type photoresist composition comprising a novolak resin made with a silica-magnesia solid catalyst |
11/19/1996 | US5576138 Positive-working naphtho quinone diazide sulfonic acid ester photoresist composition containing select combination of additives |
11/19/1996 | US5576137 Matted, radiation-sensitive recording material and printing plate |
11/19/1996 | US5576136 Diazo based imaging element having improved storage stability |
11/19/1996 | US5576127 Color filter and process for producing the color filter |
11/19/1996 | US5576074 Binder converted to supercooled liquid upon exposure to coherent radiation, absorbing radiation with dye to heat exposure to lasers, forming patterns with toners and heating to fuse |
11/19/1996 | US5575883 Apparatus and process for fabricating semiconductor devices |
11/18/1996 | CA2176873A1 Oxazoline modified acid polymers useful in photosensitive compositions and lithographic plates |
11/14/1996 | WO1996035967A1 Variable focus lens by small changes of the equatorial lens diameter |
11/14/1996 | WO1996035756A1 Stereolithographic resin composition and stereolithographic method |
11/14/1996 | DE19618720A1 Hydrolysis resistant soluble bis:acyl-bis:phosphine oxide and sulphide |
11/14/1996 | DE19530395A1 Verfahren und Vorrichtung zur Belichtung Method and apparatus for exposure |
11/13/1996 | EP0742495A1 Chelating reagent containing photoresist stripper composition |
11/13/1996 | EP0742494A1 Novolak containing photoresist stripper composition |
11/13/1996 | EP0742493A1 Benzothiazolylsuccinic acid containing photoresist stripper composition |
11/13/1996 | EP0742492A1 Projection exposure method and apparatus and device manufacturing method |
11/13/1996 | EP0742491A1 Platemaking process with heat developable silver salt diffusion transfer |
11/13/1996 | EP0742490A1 Positive acid catalized resists |
11/13/1996 | EP0742489A1 Positive-working resist composition |
11/13/1996 | EP0742488A2 Photoresist composition |
11/13/1996 | EP0742487A1 Method for preparing high resolution polyimide images using non-photosensitive layers of poly(amic acid) or salts thereof |
11/13/1996 | EP0742486A1 Support for forming colour proofs in the analogic proof system |
11/13/1996 | EP0742484A1 An imaging element and method for making a lithographic printing plate according to the silver salt diffusion transfer process |
11/13/1996 | EP0741914A1 Packaged strain actuator |
11/13/1996 | EP0741643A1 Laminar imaging medium utilizing crosslinked borated polymeric binder |
11/13/1996 | CN1135611A Polymer and application thereof in composition capable of optically imaging |
11/12/1996 | US5574578 Method and apparatus for holding a film transparency in a rotary drum scanner |
11/12/1996 | US5574556 Stage mechanism in exposure apparatus |
11/12/1996 | US5574537 Apparatus for controlling light quantity using acousto-optic modulator for selecting 0th-order diffracted beam |
11/12/1996 | US5574492 Imaging method and semiconductor device manufacturing method using the same |
11/12/1996 | US5574166 Photostability for storage stability, heat resistance, oxidation resistance and radiation resistance |
11/12/1996 | US5573891 Method and apparatus for fine processing |
11/12/1996 | US5573890 Method of optical lithography using phase shift masking |
11/12/1996 | US5573889 Process for adjusting the sensitivity to radiation of photopolymerizable compositions |
11/12/1996 | US5573886 Photosensitive resin composition comprising a polyimide precursor and method for making a polyimide film pattern from the same |
11/12/1996 | US5573885 Image forming method and recording medium |
11/12/1996 | US5573877 Exposure method and exposure apparatus |
11/12/1996 | US5573875 Laser ablation mask and method of fabrication |
11/12/1996 | US5573815 Process for making improved metal stencil screens for screen printing |
11/12/1996 | US5573722 Method and apparatus for production of three-dimensional objects by stereolithography |
11/12/1996 | US5573631 Manually-operable de-laminator apparatus |
11/12/1996 | US5573624 Chemical etch monitor for measuring film etching uniformity during a chemical etching process |
11/12/1996 | CA2022753C Photocurable resin laminate and method for producing printed circuit board by use thereof |
11/11/1996 | CA2175752A1 Support material for making color test prints in the analog proof system |
11/07/1996 | WO1996035145A1 Method for generating proximity correction features for a lithographic mask pattern |
11/07/1996 | WO1996035144A1 Copy print machine having a fixedly adjustable laser unit |
11/07/1996 | WO1996035143A1 Acid bleachable dye containing lithographic printing plate composition |
11/07/1996 | WO1996034747A1 Laser exposure apparatus |
11/07/1996 | WO1996034745A2 Exposure process and device |
11/06/1996 | EP0741335A1 Laser apparatus and process of use |
11/06/1996 | EP0741334A1 Recording material which can be decoated with water, for the production of waterless offset printing plates |
11/06/1996 | EP0741333A1 Photopolymerizable compositions |
11/06/1996 | EP0741332A1 Photosensitive resin composition for sandblast resist |
11/06/1996 | EP0741331A2 Negative working, peel-developable, single sheet color proofing system with improved background color |
11/06/1996 | EP0741330A1 Flexographic element having an infrared ablatable layer and process for making a flexographic printing plate |
11/06/1996 | EP0741329A2 A process for making a flexographic printing plate |
11/06/1996 | EP0741325A1 Image receiving layer for use in a silver salt diffusion transfer process |
11/06/1996 | CN1135089A Plasma displaying plate and method for mfg. same |
11/06/1996 | CN1135049A Polyester precoated photosensitive plate and mfg. method thereof |
11/06/1996 | CA2175759A1 Photopolymerizable compositions |
11/06/1996 | CA2174294A1 Negative working, peel developable, single sheet color proofing system with improved background color |
11/05/1996 | US5572564 Reflecting photo mask for x-ray exposure and method for manufacturing the same |
11/05/1996 | US5572563 Mirror unit and an exposure apparatus using the unit |
11/05/1996 | US5572562 Image mask substrate for X-ray semiconductor lithography |
11/05/1996 | US5572287 Illuminating arrangement for a projection microlithographic exposure apparatus |
11/05/1996 | US5572273 Apparatus and method for making a lithographic offset plate by the silver salt diffusion transfer process |
11/05/1996 | US5572036 Support element for an automatic load platform of a silicon wafer exposure unit |
11/05/1996 | US5571886 Photoresists |
11/05/1996 | US5571741 Membrane dielectric isolation IC fabrication |
11/05/1996 | US5571659 Irradiation polymerization of graft polymer with acrylated polyurethane |
11/05/1996 | US5571658 Photosensitive plate having a photopolymerizable photosensitive layer and a silicone rubber layer for preparing a lithographic printing plate requiring no fountain solution |
11/05/1996 | US5571657 Removing metal ions from organic photoresist solution |
11/05/1996 | US5571644 Method and apparatus for developing resist |
11/05/1996 | US5571642 Photosensitive resin composition, color filter using the same, and method of producing a color filter |
11/05/1996 | US5571641 Diffraction mask for the fabrication of semiconductor devices |