Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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01/16/1996 | US5485499 High throughput reflectivity and resolution x-ray dispersive and reflective structures for the 100 eV to 5000 eV energy range and method of making the devices |
01/16/1996 | US5485498 X-ray interface and condenser |
01/16/1996 | US5485497 Optical element and projection exposure apparatus employing the same |
01/16/1996 | US5485495 X-ray mask, and exposure apparatus and device production using the mask |
01/16/1996 | US5485243 For a radiation beam |
01/16/1996 | US5485181 Having sulfur containing adhesion promoters between the photoresist and the top plate having a noble metal surface |
01/16/1996 | US5484994 Optical scanning head with improved resolution |
01/16/1996 | US5484943 Fluorescent pigments |
01/16/1996 | US5484927 Photoinitiators |
01/16/1996 | US5484919 Migration-resistant halomethyl-1,3,5-triazine photoinitiator |
01/16/1996 | US5484822 Process and composition for cladding optic fibers |
01/16/1996 | US5484821 Photocrosslinked second order nonlinear optical polymers |
01/16/1996 | US5484688 Covering circuit with a solder stop mask |
01/16/1996 | US5484687 Polysilphenylenesiloxane, production process thereof, and resist material and semiconductor device formed thereof |
01/16/1996 | US5484684 Photochemical or mechanical production of flexible printing plates |
01/16/1996 | US5484682 Free radical initiator |
01/16/1996 | US5484672 Method of making a rim-type phase-shift mask |
01/16/1996 | US5484671 Mask for manufacturing semiconductor device and method of manufacture thereof |
01/16/1996 | US5484074 Method for manufacturing a shadow mask |
01/11/1996 | WO1996000931A1 Method for preparing negative-working wash-off relief images and non-photosensitive elements for use therein |
01/11/1996 | WO1996000740A1 Method of generating a reactive species and applications therefor |
01/11/1996 | DE4443934A1 Resist pattern prodn. esp. for integrated circuits |
01/11/1996 | DE4432725C1 Forming three-dimensional components on surface of semiconductor chips etc. |
01/11/1996 | DE4420996A1 Mfg. micro-mechanical and micro-optical components |
01/11/1996 | DE19522362A1 Electron beam printer esp. for high speed operation |
01/11/1996 | CA2190755A1 Method of generating a reactive species and applications therefor |
01/11/1996 | CA2170593A1 Method for preparing negative-working wash-off relief images and non-photosensitive elements for use therein |
01/10/1996 | EP0691802A1 Method of forming a multilayer printed circuit board and product thereof |
01/10/1996 | EP0691674A2 Method of forming micropatterns |
01/10/1996 | EP0691585A2 Apparatus for feeding scanned medium |
01/10/1996 | EP0691578A2 Imaging element and method for making a printing plate according to the silver salt diffusion transfer process |
01/10/1996 | EP0691577A1 Method for making a lithographic printing plate |
01/10/1996 | EP0691576A2 Colouring composition for the formation of transparent coloured micro-paterns |
01/10/1996 | EP0691575A2 Positive photosensitive composition |
01/10/1996 | EP0691357A1 Liquid polyurethane (meth)acrylate photopolymer useful for flexographic printing plate |
01/10/1996 | EP0691312A1 Method for producing silica glass for use with light in a vacuum ultraviolet wavelength range, and silica glass and optical member produced by the method |
01/10/1996 | EP0691095A1 Pillow |
01/10/1996 | EP0691001A1 Water-developable photosensitive plates especially suited for commercial flexographic printing |
01/10/1996 | EP0586500B1 Method and apparatus for automatized exposing of light sensitive material by means of laser light |
01/10/1996 | EP0447544B1 Novel onium salts and the use thereof as photoinitiators |
01/09/1996 | US5483311 Projection exposure apparatus |
01/09/1996 | US5483056 Method of projecting exposure with a focus detection mechanism for detecting first and second amounts of defocus |
01/09/1996 | US5482819 Patterning by masked radiation; double-exposure |
01/09/1996 | US5482818 Printed and integrated circuits, using computer to generate master reticle |
01/09/1996 | US5482817 Absorbers for photoresists for ultraviolet radiation |
01/09/1996 | US5482816 Radiation-sensitive composition |
01/09/1996 | US5482815 Silver halide photographic photosensitive material |
01/09/1996 | US5482814 Thermal developing photosensitive member and image forming method using the thermal developing photosensitive member |
01/09/1996 | US5482804 Resin composition for color filter |
01/09/1996 | US5482803 Process for preparing filter |
01/09/1996 | US5482801 High power phase masks for imaging systems |
01/09/1996 | US5482800 Mulitlayer element for photoresists masking with apertures |
01/09/1996 | US5482566 Mixed with alkanolamine and chelate compound |
01/08/1996 | WO1996023237A1 Polymerizable composition for color filter |
01/04/1996 | WO1996000492A1 Method and device for coating printed-circuit boards, in particular for the manufacture of multi-chip-modules |
01/04/1996 | WO1996000412A1 Increasing the useful range of cationic photoinitiators in stereolithography |
01/04/1996 | WO1996000385A1 The production of electrodes for electrochemical sensing |
01/04/1996 | DE4422913A1 Prodn. of microstructures used in the construction of microsystems |
01/04/1996 | DE19522643A1 Presensitised lithographic plate of silver halide polymerisation type |
01/04/1996 | DE19522542A1 High contrast presensitised lithographic printing plate with little residual colour |
01/04/1996 | DE19520949A1 Dryer for printing plate |
01/04/1996 | DE19519017A1 Method of improving structure with different component elements |
01/04/1996 | CA2193350A1 The production of electrodes for electrochemical sensing |
01/03/1996 | EP0690494A2 Connection and build-up-process for multi-chip-modules |
01/03/1996 | EP0690488A2 Real time measurement of etch rate during a chemical etching process |
01/03/1996 | EP0690349A1 Image formation |
01/03/1996 | EP0690348A2 Photoresist composition for deep ultraviolet radiation and process for its use |
01/03/1996 | EP0690347A1 X-ray lithography method for irradiating an object to form a pattern thereon |
01/03/1996 | EP0690339A1 Spectrally sensitized prefogged direct-positive silver halide photographic material |
01/03/1996 | EP0690111A1 Anti-reflective coating composition |
01/03/1996 | EP0690074A1 Photopolymerization initiator composition and photopolymerizable composition |
01/03/1996 | EP0689941A1 Hydrophilized support material and recording material produced therewith |
01/03/1996 | EP0689940A1 Donor element for laser-induced thermal transfer |
01/03/1996 | EP0689684A1 Chemical functionalization of polymers |
01/03/1996 | EP0502128B1 Anionically polymerizable monomers, polymers thereof, and use of such polymers in photoresists |
01/02/1996 | US5481633 Method and optical device produced of optical polymer components having integrated vertical coupling structures |
01/02/1996 | US5481624 Mask inspecting method and mask detector |
01/02/1996 | US5481470 Boolean layer comparison slice |
01/02/1996 | US5481362 Apparatus for projecting a mask pattern on a substrate |
01/02/1996 | US5481332 Projection exposure method and apparatus for improved image transfer from photomask having periodic and non-periodic patterns |
01/02/1996 | US5481184 Movement actuator/sensor systems |
01/02/1996 | US5481159 Emitter ions from electrodes with spacings and cadmium capsules |
01/02/1996 | US5480994 Development of printing plates |
01/02/1996 | US5480918 Cationic photopolymerization with initiator made by reaction of /a/charge transfer complex of biscyclopentadienyl iron and quinoid with /b/sodium, silver or potassium tetrafluoroborate, hexafluorophosphate or hexafluoroantimonate |
01/02/1996 | US5480764 Gray scale microfabrication for integrated optical devices |
01/02/1996 | US5480763 Method for manufacturing a stamper for high-density recording discs |
01/02/1996 | US5480762 Method for preparing lithographic printing plate |
01/02/1996 | US5480748 Protective structure in microelectronic device: passivation layer overlying conductive layer and with defect exposing conductive layer to photoresist developer, protective film on conductive layer within defect boundary; formed by reaction |
01/02/1996 | US5480585 For removing etched photoresists form semiconductors, alkanolamine, sulfone or sulfoxide, phenolic compound |
01/02/1996 | US5480047 Method for forming a fine resist pattern |
01/02/1996 | CA2002425C Sulfonium salts and use and preparation thereof |
01/02/1996 | CA1337864C Electrodeposition coating process of photoresist for printed circuit board |
01/02/1996 | CA1337851C Photosensitive relief printing plate and photosensitive intaglio printing plate |
12/31/1995 | CA2152721A1 Image formation |
12/28/1995 | WO1995035528A1 Method and apparatus for peeling a laminate |
12/28/1995 | CA2191883A1 Method and apparatus for peeling a laminate |
12/27/1995 | EP0689099A1 Projection exposure apparatus and device manufacturing method using the same |
12/27/1995 | EP0689098A1 Positive working photoresist |
12/27/1995 | EP0689097A1 A polyhydroxy compound and a positive photoresist containing the same |
12/27/1995 | EP0689096A1 Lithographic printing plates utilizing an oleophilic imaging layer |