| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 04/03/1996 | EP0704763A1 Photoactive compound, preparation thereof and use thereof in resist for x-ray or electron beam lithography |
| 04/03/1996 | EP0704762A1 Resist material and pattern formation |
| 04/03/1996 | EP0704761A1 Process for forming a colored image |
| 04/03/1996 | EP0704718A1 Positive photosensitive composition for forming lenses |
| 04/03/1996 | EP0704145A1 Method of manufacturing a device, by irradiating some parts of the surface of the device directly through a mask, and other parts indirectly through the mask and via a reflecting surface, thereby producing a pattern |
| 04/03/1996 | EP0703937A1 Stabilized cationically-curable compositions |
| 04/03/1996 | EP0465669B1 Photocurable resin composition |
| 04/03/1996 | CN1119731A Temperature control apparatus and method with recirculated coolant |
| 04/03/1996 | CN1119584A Device for producing a screen printing stencil |
| 04/02/1996 | USH1525 Method and system for high speed photolithography |
| 04/02/1996 | US5504830 Optical fibers |
| 04/02/1996 | US5504793 Magnification correction for 1-X proximity X-Ray lithography |
| 04/02/1996 | US5504627 Projection exposure system |
| 04/02/1996 | US5504596 Exposure method and apparatus using holographic techniques |
| 04/02/1996 | US5504515 Laser exposure apparatus for printing forms to be imagewise exposed |
| 04/02/1996 | US5504407 Stage driving system |
| 04/02/1996 | US5504391 Excimer lamp with high pressure fill |
| 04/02/1996 | US5504339 Method of repairing a pattern using a photomask pattern repair device |
| 04/02/1996 | US5504338 Apparatus and method using low-voltage and/or low-current scanning probe lithography |
| 04/02/1996 | US5504035 Process for solder ball interconnecting a semiconductor device to a substrate using a noble metal foil embedded interposer substrate |
| 04/02/1996 | US5503964 Comprises step of evenly hardening resist by treating it in a far-ultraviolet-ray irradiation process and a baking process before injecting a high dose of ions |
| 04/02/1996 | US5503961 Applying photosensitive polyimide precursor on substrate, exposing, inhibiting photosensitivity, applying second layer of precursor, exposing, developing |
| 04/02/1996 | US5503959 Lithographic technique for patterning a semiconductor device |
| 04/02/1996 | US5503958 Method for forming a circuit pattern |
| 04/02/1996 | US5503950 Reflection type mask and manufacture of microdevices using the same |
| 04/02/1996 | US5503902 Light control material |
| 04/02/1996 | US5503897 Shaped articles and method of making same |
| 04/02/1996 | US5503751 Treatment with chemicals, precipitation, filtration |
| 04/02/1996 | US5503732 Method for manufacturing a substrate having window-shaped and frame-shaped coating films on the surface thereof |
| 04/02/1996 | US5503708 Method of and apparatus for removing an organic film |
| 04/02/1996 | US5503074 Photosensitive lithographic printing plate requiring no fountain solution |
| 04/02/1996 | US5502899 Staging apparatus |
| 03/31/1996 | CA2158915A1 Liquid photoimageable resist |
| 03/28/1996 | WO1996009571A1 Protective mask for pellicle |
| 03/28/1996 | WO1996009289A1 Photopolymerizable composition containing squarylium compound |
| 03/28/1996 | WO1996009128A1 Selective removal of material by irradiation |
| 03/28/1996 | WO1996005249A3 Acrylic syrup curable to a crosslinked viscoelastomeric material |
| 03/28/1996 | DE4435022A1 Grey tone mask for lithographic micro-structuring of optical device |
| 03/28/1996 | DE4434009A1 Stepped microstructure arrangement with preformed edge surfaces not damaged during reactive ion etching |
| 03/28/1996 | CA2200199A1 Selective removal of material by irridiation |
| 03/28/1996 | CA2176931A1 Photopolymerizable composition containing squarylium compound |
| 03/27/1996 | EP0703500A1 Process for the manufacture of a planographic printing form |
| 03/27/1996 | EP0703499A1 Top coats for shoot and run printing plates |
| 03/27/1996 | EP0703498A1 Photosensitive resin composition and method for forming a photoresist pattern |
| 03/27/1996 | EP0702806A1 Method of photolithographically metallizing at least the inside of holes arranged in accordance with a pattern in a plate of an electrically insulating material |
| 03/27/1996 | EP0624263B1 Method for the dry development of a silicon-containing lacquer film sensitive to uv and/or electron-beam radiation |
| 03/27/1996 | EP0482051B1 Laser machining |
| 03/27/1996 | CN1119404A Method and apparatus for removing film |
| 03/27/1996 | CN1119340A Method for forming resist patterns |
| 03/27/1996 | CN1119323A Method of manufacturing an optical information carrier, arrangement for carrying out the method, and optical information carrier obtained by means of the method |
| 03/26/1996 | US5502654 Method for analyzing light intensity distribution in projection systems |
| 03/26/1996 | US5502581 Hologram manufacturing method and apparatus |
| 03/26/1996 | US5502313 Exposure apparatus and method having a measuring unit for measuring distances between a mask surface and a projection optical system |
| 03/26/1996 | US5502311 Method of and apparatus for detecting plane position |
| 03/26/1996 | US5501944 Ablative imaging by proximity lithography |
| 03/26/1996 | US5501943 Tetramethoxysilane, tetraisopropoxy titanate |
| 03/26/1996 | US5501942 Crosslinkable acrylate polymers |
| 03/26/1996 | US5501941 Polymers for microelectronics from hexafluoroisopropylidenebis phthalic acid, polymethylphenylenediamines and benzophenone tetracarboxylic acids |
| 03/26/1996 | US5501940 Process for protecting a binary image with a siloxane durable layer that is not removable by hexane, isopropanol or water |
| 03/26/1996 | US5501939 Spectrally sensitized prefogged direct-positive silver halide photographic material |
| 03/26/1996 | US5501936 Positive-working quinonediazide photoresist composition containing a cyclohexyl-substituted triphenylmethane compound |
| 03/26/1996 | US5501870 Method and apparatus for hydrophobic treatment |
| 03/26/1996 | US5501824 Thermal stereolithography |
| 03/26/1996 | US5501150 Process for the production of a printing plate by inkjet |
| 03/26/1996 | CA1338178C Positive and negative working radiation sensitive mixtures and production of relief patterns |
| 03/26/1996 | CA1338177C Radiation sensitive mixture and production of relief patterns |
| 03/21/1996 | WO1996008751A1 Photolithographic method of producing structural features |
| 03/21/1996 | WO1996008750A1 Photolithographic method of producing structural features |
| 03/21/1996 | WO1996008749A2 Method of producing a three-dimensional component or group of components |
| 03/21/1996 | WO1996008525A1 Process for producing photosensitive resin and liquid photosensitive resin composition |
| 03/21/1996 | WO1996008472A1 Negative-type radiation-sensitive resin composition and method of forming resin pattern therefrom |
| 03/21/1996 | WO1996008360A1 Process for producing a three-dimensional object |
| 03/21/1996 | DE4433118A1 Verfahren zur Herstellung eines dreidimensionalen Objektes A process for preparing a three dimensional object |
| 03/20/1996 | EP0702272A1 Exposure apparatus and exposure method |
| 03/20/1996 | EP0702271A1 Positive working printing plate |
| 03/20/1996 | EP0702270A2 Photosensitive polyimide resin composition |
| 03/20/1996 | EP0702269A1 Process for producing a cutting die |
| 03/20/1996 | EP0702042A1 Epoxy resin, process for producing the same, and photocurable resin composition and powder coating resin composition both containing said resin |
| 03/20/1996 | EP0504431B1 Method of removing organic coating |
| 03/20/1996 | CN1118936A Method for forming submicroscopic patterns |
| 03/20/1996 | CN1118886A Waterborne photoresists having associate thickeners |
| 03/19/1996 | US5500453 (Oxo)sulfonium complex, polymerizable composition containing the complex, and method of polymerizing the composition |
| 03/19/1996 | US5500327 Photopolymerization |
| 03/19/1996 | US5500326 Method of producing master and working pattern plates for etching and photolithographic apparatus therefor |
| 03/19/1996 | US5500315 An article comprising an image pattern on a substrate |
| 03/19/1996 | US5500073 Semiconductor wafers, electrodes in etch bath but not contacting wafers, monitoring impedance, capacitance, resistance, etc |
| 03/19/1996 | US5499733 Optical techniques of measuring endpoint during the processing of material layers in an optically hostile environment |
| 03/14/1996 | WO1996007954A1 Microstructures and methods for manufacturing microstructures |
| 03/14/1996 | WO1996007662A1 Novel acylphosphine oxides |
| 03/14/1996 | DE4442712C1 Filtration of photographic developer solution |
| 03/14/1996 | CA2198865A1 Microstructures and methods for manufacturing microstructures |
| 03/14/1996 | CA2197787A1 Novel acylphosphine oxides |
| 03/13/1996 | EP0701174A1 Alignment mark and exposure process using the same |
| 03/13/1996 | EP0701173A1 Method for producing lithographic plates with imaging elements comprising a photosensitive acid precusor |
| 03/13/1996 | EP0701172A1 A method for making imaging elements suitable for use in the silver salt diffusion transfer process |
| 03/13/1996 | EP0701171A1 Resist compositions |
| 03/13/1996 | EP0701170A2 Photosensitive lithographic printing plate requiring no fountain solution and process for producing the same |
| 03/13/1996 | EP0701169A1 Radiation-sensitive compositions containing fully substituted novolak polymers |
| 03/13/1996 | EP0700909A1 Photosensitive bis(halomethyloxadiazole) compound and photosensitive transfer sheet using the same |
| 03/13/1996 | EP0700752A1 Method of patterning a coating on a substrate |