| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 07/03/1996 | EP0719183A1 Hybrid pulsed valve for thin film coating and method |
| 07/03/1996 | CN1125917A Removal of surface contaminants by irradiation |
| 07/03/1996 | CN1125850A Bleaching mask |
| 07/03/1996 | CN1032233C Method for photolithographically forming selfaligned mask using back-side exposure and non-specular reflecting layer |
| 07/02/1996 | US5533170 Rasterizer for a pattern generation apparatus |
| 07/02/1996 | US5533083 Vacuum optical system |
| 07/02/1996 | US5532934 Floorplanning technique using multi-partitioning based on a partition cost factor for non-square shaped partitions |
| 07/02/1996 | US5532903 Membrane electrostatic chuck |
| 07/02/1996 | US5532871 Two-wavelength antireflection film |
| 07/02/1996 | US5532822 Method of measuring orthogonality of stage unit |
| 07/02/1996 | US5532722 Image forming device and method for transferring ink using a heated pneumatic drum |
| 07/02/1996 | US5532497 Optical aligner equipped with luminance sensor on movable stage |
| 07/02/1996 | US5532467 For reading and decoding information encoded in a bar code |
| 07/02/1996 | US5532373 Aluminate complex and use thereof in photopolymerizable composition and image-forming material |
| 07/02/1996 | US5532320 One of two polymers containing nonlinear component; combining first prepolymer with monomer reacting to form second polymer; electrooptics |
| 07/02/1996 | US5532192 Method of spiral resist deposition |
| 07/02/1996 | US5532116 Alkylnaphthalene sulfonate salts and with polyoxyethylene groups |
| 07/02/1996 | US5532115 Process for forming a colored image utilizing a non-photosensitive/photosensitive combination |
| 07/02/1996 | US5532114 Four photo masks |
| 07/02/1996 | US5532113 Method of making microelectronic structures utilzing photoresists containing C3 C12 water soluble sugar crosslinking agents |
| 07/02/1996 | US5532112 Photopolymerization |
| 07/02/1996 | US5532111 Reactive polymeric dyes |
| 07/02/1996 | US5532110 Photoimageable polyimide coating |
| 07/02/1996 | US5532109 Low temperature prebake resistant |
| 07/02/1996 | US5532107 Positive resist composition |
| 07/02/1996 | US5532106 Microelectronics with polymers, photoactive agents and dissolution inhibitors |
| 07/02/1996 | US5532105 Having good adhesion to plated copper |
| 07/02/1996 | US5532090 Method and apparatus for enhanced contact and via lithography |
| 07/02/1996 | US5531889 Method and apparatus for removing resist particles from stripping solutions for printed wireboards |
| 07/02/1996 | US5531857 Removal of surface contaminants by irradiation from a high energy source |
| 07/02/1996 | US5531854 De-laminator apparatus and method |
| 07/02/1996 | CA2047621C Resin composition for image formation |
| 06/28/1996 | CA2165855A1 Multiple color proof temporary supports, photopolymerizable materials and pigmented transfer materials |
| 06/28/1996 | CA2165854A1 Process for preparing multiple color proofs |
| 06/27/1996 | WO1996019753A1 Selective i-line barl etch process |
| 06/27/1996 | WO1996019722A1 Variable spot-size scanning apparatus |
| 06/27/1996 | DE4446196A1 Multi layer films for the prepn. of high quality, detailed plates for surface, gravure, flexographic or relief printing |
| 06/27/1996 | DE19548447A1 Verfahren und Vorrichtung zum Auftragen eines Photoresistfilms Method and apparatus for applying a photoresist film |
| 06/27/1996 | DE19547739A1 Photosensitive modified alicyclic epoxide] resin developed by water |
| 06/27/1996 | DE19544047A1 Laminiervorrichtung mit weicher Laminierwalze Laminator laminating soft |
| 06/26/1996 | EP0718875A2 Contact photolithographic process for realizing metal lines on a substrate |
| 06/26/1996 | EP0718696A2 A photosensitive polyimide composition |
| 06/26/1996 | EP0718695A2 Water-developable photosensitive resin composition |
| 06/26/1996 | EP0718694A2 Radiation-curable composition |
| 06/26/1996 | EP0718693A2 Photoresist compositions and components |
| 06/26/1996 | EP0718692A1 Photosensitive films having a thermally sensitive material containing layer and process for using the same |
| 06/26/1996 | EP0718689A1 Photographic element containing a novel cyan dye forming coupler and process for its use |
| 06/26/1996 | EP0718317A2 Photoresist compositions |
| 06/26/1996 | EP0718316A2 Crosslinked polymers |
| 06/26/1996 | EP0718315A1 Process for the preparation of partially protected phenolic resins |
| 06/26/1996 | CN1125456A Stabilized cationically-curable compositions |
| 06/25/1996 | US5530564 Holographic interference exposing device |
| 06/25/1996 | US5530552 Double sided wafer, alignment technique |
| 06/25/1996 | US5530518 Projection exposure apparatus |
| 06/25/1996 | US5530516 Large-area projection exposure system |
| 06/25/1996 | US5530468 Apparatus for and of recording an image using a photosensitive drum for exposure and having a built-in web cutting assembly |
| 06/25/1996 | US5529888 Containing water soluble copolymer of n-vinylpyrrolidone and another vinyl monomer, fluorinated organic acid |
| 06/25/1996 | US5529887 Comprising a diglycol monoalkyl ether, a glycol monoalkyl ether and an alkali hydroxide; chemical resist to circuit boards |
| 06/25/1996 | US5529886 Photosensitive mixture of a compound which on exposure to actinic radiation forms acid, and an acid-cleavable acrylate homo or copolymer |
| 06/25/1996 | US5529885 An alkali-soluble resin, a photo acid generating system and a crosslinking agent; storage stability; high aspect ratios |
| 06/25/1996 | US5529883 Photosensitive material for the production of a colored image utilizing adhesion promoting layer |
| 06/25/1996 | US5529882 Positive type photosensitive anionic electrocating composition |
| 06/25/1996 | US5529881 Alkali-soluble resin and 1,2-naphthoquinonediazide sulfonic acid ester of specified polyhydroxy compound as photosensitive compound |
| 06/25/1996 | US5529880 Photoresist with a mixture of a photosensitive esterified resin and an o-naphthoquinone diazide compound |
| 06/25/1996 | US5529879 Having heat-fusible, peelable release layers and colored photosensitive layer on substrate, for accurate forming or transferring of multicolored images |
| 06/25/1996 | US5529878 Color proofing system |
| 06/25/1996 | US5529681 Forming patterned resist layers, depositing metal layers; optical waveguide networks |
| 06/25/1996 | US5529626 Spincup with a wafer backside deposition reduction apparatus |
| 06/25/1996 | US5529473 For fabricating an integral three-dimensional object |
| 06/20/1996 | WO1996019012A1 Forming polyimide coatings by screen printing |
| 06/20/1996 | WO1996019000A1 Exit window for x-ray lithography beamline |
| 06/20/1996 | WO1996018932A1 Photosensitive compositions and clean running photopolymer printing plates therefrom |
| 06/20/1996 | WO1996013538A3 Visible-light curable epoxy system with enhanced depth of cure |
| 06/20/1996 | DE19546795A1 Catadioptric system for illumination device in photolithographic manufacture of semiconductor, LCD |
| 06/20/1996 | CA2207591A1 Photosensitive compositions and clean running photopolymer printing plates therefrom |
| 06/19/1996 | EP0717444A2 Programming a logic level within an integrated circuit |
| 06/19/1996 | EP0717321A1 Method for making a lithographic printing plate |
| 06/19/1996 | EP0717320A1 Soft relief photopolymer printing plates for flexographic printing |
| 06/19/1996 | EP0717319A1 Photoacid generating composition used in radiation-sensitive compositions |
| 06/19/1996 | EP0717318A1 Method of adjusting thixotropy of a photoimageable composition |
| 06/19/1996 | EP0717317A2 Radiation-sensitive composition |
| 06/19/1996 | EP0717299A1 Exposure apparatus |
| 06/19/1996 | EP0716934A1 Laser ablative recording element |
| 06/19/1996 | CN1124912A Photosensitive resin composition and method for using the same in manufacture of circuit boards |
| 06/18/1996 | US5528390 Exposure apparatus for reproducing a mask pattern onto a photo-sensitive surface of a substrate using holographic techniques |
| 06/18/1996 | US5528118 Guideless stage with isolated reaction stage |
| 06/18/1996 | US5528027 Scanning exposure apparatus having a scanning device for scanning light beams along the movement direction of a moving mask stage |
| 06/18/1996 | US5528016 Drying apparatus for use in photosensitive material processing system |
| 06/18/1996 | US5527925 Photoinitiators; modify surfaces of contact lenses |
| 06/18/1996 | US5527921 Useful in photopolymerizable compositions and photosensitive elements |
| 06/18/1996 | US5527872 Electronic device with a spin-on glass dielectric layer |
| 06/18/1996 | US5527757 Comprising at least two layers containing a metal salt in thermal working relationship with an organic reducing agent and at least one heat-attenuating spacer layer |
| 06/18/1996 | US5527681 Immobilized molecular synthesis of systematically substituted compounds |
| 06/18/1996 | US5527662 Depositing resist film containing (methylol)melamine, a photo acid generator and an electroconductive polymer on semiconductor substrate, then heating, exposure to radiation beam and more heating |
| 06/18/1996 | US5527660 Peel-developable imaging medium having cycloaliphatic diepoxide compound in image-forming layer or release layer |
| 06/18/1996 | US5527659 Photosensitivity |
| 06/18/1996 | US5527656 Positive type electrodeposition photoresist compositions |
| 06/18/1996 | US5527655 Radiation-sensitive adducts comprising diazonium cations, quaternary cations, and sulfonated polyester anions |
| 06/18/1996 | US5527654 Process for the production of a color image utilizing transferred white pigment layer |
| 06/18/1996 | US5527649 Coating positive photosensitive film on transparent electroconductive layer, then exposure using light transmitting mask, development and removal of exposed parts, electrodeposition of dark coating on exposed areas |