Patents
Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
04/1996
04/25/1996WO1996011895A1 Method of treating an anti-reflective coating on a substrate
04/25/1996DE4437284A1 Verfahren zum Kalibrieren einer Steuerung zur Ablenkung eines Laserstrahls A method for calibrating a controller for deflecting a laser beam
04/25/1996DE19529645A1 Alignment precision measuring mark for e.g. MOS transistor
04/24/1996EP0708550A2 Ablation-transfer-imaging using zero order laser beams in a flat-field scanner
04/24/1996EP0708373A1 Imaging element comprising a hydrophobic photopolymerizable composition and method for producing lithographic plates therewith
04/24/1996EP0708372A1 A single resist layer lift-off process for forming patterned layers on a substrate
04/24/1996EP0708371A2 Additive for improving the performance of diffusion transfer printing plates
04/24/1996EP0708370A2 Process for manufacturing diffusion transfer printing plates
04/24/1996EP0708369A1 Solvent system for forming films of photoimageable compositions
04/24/1996EP0708368A1 Positive-working photosensitive composition
04/24/1996EP0708364A2 A method for making an offset printing plate according to the silver salt diffusion transfer process
04/24/1996EP0707980A1 A dampening solution for printing with a lithographic printing plate and a method for printing therewith
04/24/1996EP0451170B1 Selected trinuclear novolak oligomer derivatives as photoactive compounds and their use in radiation sensitive mixtures
04/24/1996CN1121240A A method of manufacturing a matrix for producing optical disks without the medium of a master
04/24/1996CN1121190A Positive photoresist
04/24/1996CN1121189A Pohto mask and method for manufacturing the same
04/23/1996USRE35217 Alkaline development of exposed novolak/o-quinonediazide photoresist latent image
04/23/1996US5510892 Inclination detecting apparatus and method
04/23/1996US5510628 Using diamine as cell adhesion promoter
04/23/1996US5510540 For sensitive, high resolution, rapid hardening photoresists
04/23/1996US5510539 Liquid photoinitiator mixtures
04/23/1996US5510420 Matarix resin for high-temperature stable photoimageable compositions
04/23/1996US5510290 Method for forming a field oxide layer in a semiconductor device which prevents bird beak by nitradation of pad oxide
04/23/1996US5510270 Generating pattern of light and dark areas by selectively irradiating surface areas; deprotecting; contacting with receptor to identify oligonucleotide showing complementarity to receptor
04/23/1996US5510230 Device fabrication using DUV/EUV pattern delineation
04/23/1996US5510226 Stereolithography using vinyl ether-epoxide polymers
04/23/1996US5510224 Photosensitive microcapsule for photoimaging and thermal development recording media
04/23/1996US5510216 Using ligatrig material, electroless metallization catalysts and electroless plating solution
04/23/1996US5510215 Method for patterning multilayer dielectric color filter
04/23/1996US5509995 Process for anisotropically etching semiconductor material
04/23/1996CA2032630C Visible radiation sensitive composition
04/18/1996WO1996011480A1 Radiation cured radiographic intensifying screen
04/18/1996WO1996011376A1 On-axis mask and wafer alignment system
04/18/1996WO1996011239A1 Photosolder resist ink, printed circuit board, and process for producing the same
04/18/1996DE19537716A1 Verfahren zur Erzeugung eines Photoresistmusters A method for generating a photoresist pattern
04/18/1996CA2204625A1 Radiation cured radiographic intensifying screen
04/17/1996EP0707237A1 Process for the fabrication of holes in photoresist layers, use for the fabrication of electron sources comprising emissive cathodes with microtips and flat display screens
04/17/1996EP0707231A2 Method for repairing a defective color filter
04/17/1996EP0707015A1 Polymers
04/17/1996EP0706899A1 Thermal imaging element
04/17/1996EP0706678A1 Method of photolithographically producing a copper pattern on a plate of an electrically insulating material
04/17/1996EP0706451A1 Method of forming a three-dimensional coloured article
04/17/1996CN1120866A Method and apparatus for process control
04/17/1996CN1120683A Exposure method and exposure apparatus
04/16/1996US5509041 X-ray lithography method for irradiating an object to form a pattern thereon
04/16/1996US5508808 Development sensor apparatus for monitoring the progression of development of an optical disk master
04/16/1996US5508803 For imaging a gray scale feature
04/16/1996US5508528 Illumination unit having a facility for preventing contamination of optical components, and photolithographic apparatus including such an illumination unit
04/16/1996US5508518 Lithography tool with vibration isolation
04/16/1996US5508144 Exposing parts of energy-sensitive polymeric imaging layer to form pattern, then applying reagent containing refractory compound which will selectively bind to polymer and development
04/16/1996US5508142 Imaging element and method for making lithographic printing plate according to the silver salt diffusion transfer process
04/16/1996US5508141 Aqueous acidic photoresist emulsion containing resin, positive-acting photoactive functionality, acid, oxidizing agent, surfactant
04/16/1996US5508064 Method for matting a recording material and atomizing device therefor
04/16/1996US5507978 Novolak containing photoresist stripper composition
04/12/1996CA2159962A1 Solvent system for forming films of photoimageable compositions
04/11/1996WO1996010832A1 Magnetic arrays
04/11/1996WO1996010485A1 Actinic activation article shaping system and method
04/11/1996WO1996010469A1 X-y-υ positioning mechanism
04/11/1996DE4435924A1 Spin coating appts. for prodn. of thin polymer films on substrates
04/11/1996DE19534132A1 Light proximity-correction system for integrated circuit mfr.
04/11/1996CA2201747A1 Actinic activation article shaping system and method
04/10/1996EP0706210A1 Transparent optical chuck incorporating optical monitoring
04/10/1996EP0706201A2 Mercury vapour lamp with short arc
04/10/1996EP0706093A1 Method and apparatus for aligning a mask and a workpiece
04/10/1996EP0706092A1 Process for imaging of liquid photopolymer printing plates
04/10/1996EP0706091A1 Liquid photoimageable resist
04/10/1996EP0706090A1 Radiation sensitive resin composition
04/10/1996EP0706089A2 Process for synthesizing quinonediazide ester and positive working photoresist containing the same
04/10/1996EP0706088A1 Photomask for use in etching patterns
04/10/1996EP0705865A1 Photoinitiators compatible with silicones and photosensitive compositions containing the same
04/10/1996EP0705454A1 Method and product for particle mounting
04/10/1996EP0672269A4 Binary vapor adhesion promoters and methods of using the same.
04/10/1996EP0643645B1 A method and a device for retaining a thin medium between two bodies
04/10/1996EP0497819B1 A release layer for an aqueous or semi-aqueous processible flexographic printing plate
04/10/1996EP0465670B1 Photocurable resin composition
04/10/1996EP0433374B1 Process for the production of flexographic printing reliefs
04/09/1996US5506684 Projection scanning exposure apparatus with synchronous mask/wafer alignment system
04/09/1996US5506321 Photosolder resist composition
04/09/1996US5506173 Process of fabricating a dielectric film for a semiconductor device
04/09/1996US5506091 Photosensitive resin composition and method of forming conductive pattern
04/09/1996US5506090 Protective overcoating
04/09/1996US5506089 Photosensitive resin composition
04/09/1996US5506088 Chemically amplified resist composition and process for forming resist pattern using same
04/09/1996US5506087 Three-dimensional solid shapes
04/09/1996US5506086 Selectively removing an infrared ablatable layer by a laser beam
04/09/1996US5506085 Exposure to laser radiation
04/09/1996US5506008 Vaporizing trivinylmethylsilane and octamethylcylcotetrasiloxane and vapor depositing on to a substrate to be masked using high frquency field
04/09/1996US5505863 Processing waste washout liquid containing photopolymer from printing plate manufacture
04/09/1996US5505782 Integrated delivery system for chemical vapor from non-gaseous sources for semiconductor proccessing
04/09/1996US5505781 Hydrophobic processing apparatus including a liquid delivery system
04/04/1996WO1996010324A1 Laser target for use in an apparatus for generating radiation and atomic particles
04/04/1996WO1996010218A1 Photosensitive composition and photosensitive rubber plate
04/04/1996WO1996010217A1 Radiation-sensitive adducts comprising diazonium cations, quaternary cations, and sulfonated polyester anions
04/04/1996WO1996010215A1 Negative working surprint colour proofing system
04/04/1996WO1996010214A1 Negative working overlay colour proofing system
04/04/1996DE4442596C1 Position measuring error correction system for lithography device
04/04/1996DE19534709A1 Safe, environmentally friendly colour proofing using aq. developer
04/03/1996EP0704881A2 Discharge lamp
04/03/1996EP0704765A1 A photoresist composition comprising a polyfunctional vinyl ether compound
04/03/1996EP0704764A1 Photopolymerizable composition and photosensitive lithographic printing plate