Patents
Sitemap › G03 - Photography; Cinematography; Analogous techniques using waves other than optical waves; Electrography; Holography › G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices; Materials therefor; Originals therefor; Apparatus specially adapted therefor › G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
06/1996
06/18/1996US5527648 Sequentially electrodepositing films of different colors and developing photosensitive films on transparent electrically conductive layer on transparent substrate, including black light shielding layer
06/18/1996US5527646 Method of forming a micro structure and an x-ray mask
06/18/1996CA2069813C Optical processing apparatus
06/14/1996CA2165015A1 Soft relief photopolymer printing plates for flexographic printing
06/13/1996WO1996018133A1 High-resolution letterpress printing plates and water-soluble photopolymerizable compositions comprising a polyvinylalcohol derivative useful therefor
06/13/1996DE4443346A1 Large-area stereo image presentation using duplicated half-images
06/13/1996DE19545534A1 Lithographic printing plate for silver complex diffusion transfer
06/13/1996CA2159153A1 Method of adjusting thixotropy of a photoimageable composition
06/12/1996EP0716411A1 Method for fabricating a planer thin film structure
06/12/1996EP0716347A1 Developer for photosensitive lithographic printing plate
06/12/1996EP0716346A1 Photoimageable elements
06/12/1996EP0716345A1 Photoimageable elements
06/12/1996EP0716344A1 Light-sensitive composition and light-sensitive lithographic printing plate using the same
06/12/1996CN1124406A Method of forming a pattern of a semiconductor device
06/12/1996CN1032031C Photosensitive sheet and a method for the formation of images using the same
06/12/1996CN1032030C 一种感光组合物 One photosensitizing composition
06/11/1996US5526094 Exposure apparatus and method
06/11/1996US5526093 Exposure apparatus and method for a semiconductor wafer
06/11/1996US5525542 Aluminum nitride antireflecting layer is sputter deposited over polysilicon or aluminum conductive layer
06/11/1996US5525457 Copolymers of unsaturated carboxylic acid, an epoxy-functional monomer, and cinnamoylphenyl group-monomer; high halation preventing effect, involves no sublimation of radiation absorbing components contained therein, possesses excellent heat resistance, dry etching performance, storage stability
06/11/1996US5525455 Treating solution for lithographic printing plate
06/11/1996US5525454 Multilayer on temporary substrate comprising an alkali-soluble thermoplastic resin blends; high speed without entrapping air bubbles, easy stripping off, easy removal
06/11/1996US5525453 Positive-working radiation-sensitive mixture
06/11/1996US5525192 Method for forming a submicron resist pattern
06/11/1996US5524784 Method for producing ink jet head by multiple development of photosensitive resin, ink jet head produced thereby, and ink jet apparatus with the ink jet head
06/11/1996US5524502 Positioning apparatus including a hydrostatic bearing for spacing apart a supporting surface and a guide surface
06/10/1996CA2164670A1 Water-developable photosensitive resin composition
06/07/1996CA2164048A1 Photoacid generating composition used in radiation-sensitive compositions
06/06/1996WO1996017376A1 Structure and method for exposing photoresist
06/06/1996WO1996017102A1 Method for making electrical devices from ion-implanted conductive polymers
06/06/1996WO1996016821A1 Laminar imaging medium utilizing crosslinked borated polymeric binder
06/06/1996WO1996016805A1 Delaminating method and apparatus
06/06/1996CA2205264A1 Delaminating method and apparatus
06/06/1996CA2182284A1 Laminar imaging medium utilizing crosslinked borated polymeric binder
06/05/1996EP0715490A2 Method of preparing multilayer wiring board
06/05/1996EP0715339A2 Mercury lamp of the short arc type
06/05/1996EP0715215A1 Alignment method and semiconductor exposure method
06/05/1996EP0715213A1 Method of optical projection exposure to light
06/05/1996EP0715212A1 Resin composition for stereolithography
06/05/1996EP0715211A1 Imaging element and method for making a printing plate according to the silver salt diffusion transfer process
06/05/1996EP0714348A1 Light source destructuring and shaping device
06/05/1996DE19544753A1 Electron beam lithographic appts. for semiconductor integrated circuit mfr.
06/05/1996DE19544045A1 Laminierverfahren und Laminiervorrichtung mit einer erhitzten Abstreifleiste zum Ablösen Laminating and laminating with a heated wiper blade for peeling
06/04/1996US5524131 For manufacturing microdevices
06/04/1996US5524042 Exit window for X-ray lithography beamline
06/04/1996US5524039 Projection exposure apparatus
06/04/1996US5523941 X-Y-theta positioning mechanism
06/04/1996US5523843 Position detecting system
06/04/1996US5523841 Distance measuring apparatus using multiple switched interferometers
06/04/1996US5523574 Exposure apparatus
06/04/1996US5523396 Esterification of polyhydroxy compound with 1,2-naphthoquinonediazide-5-sulfonyl chloride in the presence of a basic catalyst
06/04/1996US5523383 Reacting adduct of unsaturated dicarboxylic acid anhydride and conjugated diene polymer with amine to form water and amide, reacting water with remaining anhydride groups to form succinic acid groups, dehydrating, reacting with ester
06/04/1996US5523266 Radiation resistance; purity
06/04/1996US5523193 Light passed through a collimator strikes a spatial light modulator controlled by a computer
06/04/1996US5523192 Support bearing ejection layer of polymer having specified decomposition temperature, heating layer, transfer layer of second polymer with different decomposition temperature, imageable component, thermal amplification additive
06/04/1996US5523191 For fabrication of semiconductors; heat resistance, sensitivity, resolution
06/04/1996US5523186 Split and cover technique for phase shifting photolithography
06/04/1996US5523185 Method for manufacturing stencil mask
06/04/1996US5523184 Chromium pattern formed on a transparent reticle having light exposure energy attenuation
05/1996
05/30/1996WO1996016484A1 Low cost, high average power, high brightness solid state laser
05/30/1996WO1996016356A1 A process for making a flexographic printing plate
05/30/1996WO1996015909A1 Stamp stock, method of forming stamp by the use of same, and stamp manufactured by stamp forming method
05/30/1996WO1996015861A1 Non-aminic photoresist adhesion promoters for microelectronic applications
05/30/1996DE4442293A1 Polysiloxane copolymers for dry developing copying materials
05/30/1996DE4442210A1 Method of producing three=dimensional images
05/30/1996DE19536862A1 Negative resist for processing, giving good resolution, sharpness and shape
05/30/1996CA2205549A1 Non-aminic photoresist adhesion promoters for microelectronic applications
05/30/1996CA2205458A1 Process for polymerizing cyclical olefins and photopolymerizable composition
05/30/1996CA2205423A1 Process for polymerising cyclic olefins and a photopolymerisable composition
05/30/1996CA2201891A1 A process for making a flexographic printing plate
05/29/1996EP0714119A2 Pattern forming process, apparatus for forming said pattern and process for preparing semiconductor device utilizing said pattern forming process
05/29/1996EP0713586A1 Ablation transfer onto intermediate receptors
05/29/1996CN1123466A A signal processing method, a method of adjusting a position detecting optical system, a target pattern, an exposure process, and an exposure apparatus
05/29/1996CN1123420A Method of manufacturing a photo mask for manufacturing a semiconductor device 21678/01
05/28/1996US5521054 Developing solution comprising an aromatic hydrocarbon, an alcohol, and an ester
05/28/1996US5521053 Adduct of maleinized diene polymer and hydroxyalkyl acrylate
05/28/1996US5521052 Semiconductors
05/28/1996US5521034 Substrate with color recorded on surface and metal plate or foil and photosensitive polyimide precursor
05/28/1996US5521033 Process for manufacturing semiconductor integrated circuit device, exposure method and mask for the process
05/28/1996US5521030 Process for making holographic embossing tools
05/28/1996US5520965 Radiation cured radiographic intensifying screen
05/28/1996CA2070880C Structure and method for direct calibration of registration measurement systems to actual semiconductor wafer process topography
05/23/1996DE19542818A1 Resist pattern model evaluation method for semiconductor component mfr.
05/22/1996EP0713324A1 A method for preparing a lithographic printing plate
05/22/1996EP0713147A2 Drum type image transfer apparatus
05/22/1996EP0713146A1 Photoresist processing for improved resolution
05/22/1996EP0713145A1 A kit of parts for making an alkaline processing liquid for processing a lithographic printing plate
05/22/1996EP0713144A2 Photosensitive resin composition
05/22/1996EP0713143A2 Photosensitive planographic printing plate
05/22/1996EP0713140A1 Imaging element and method for making a printing plate according to the silver salt diffusion transfer process
05/22/1996EP0549610B1 Copolymerization process and optical copolymer produced therefrom
05/21/1996US5519752 X-ray transmissive debris shield
05/21/1996US5519136 Lithographic printing plates
05/21/1996US5518875 Iridium compound
05/21/1996US5518866 Method for making an offset printing plate according to the silver salt diffusion transfer process
05/21/1996US5518865 Production of microstructure elements
05/21/1996US5518864 Photosensitive, quinone diazide
05/21/1996US5518861 Element and process for laser-induced ablative transfer
05/21/1996US5518860 Improved adhesion to silicon oxide and nitride substrates
05/21/1996US5518859 Light sensitive elements with coatings
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