| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 05/21/1996 | US5518857 Image-carrying mask photo-sensitive laminate film for use in making an image carry mask |
| 05/21/1996 | US5518856 Microcapsule suitable for electrostatically coating on substrate |
| 05/21/1996 | US5518843 Optical Film |
| 05/21/1996 | US5518579 Semiconductors |
| 05/21/1996 | US5518550 Stage apparatus for an exposure apparatus including a contant tension spring for canceling out a gravitational force of a movable stage by a tensile force |
| 05/21/1996 | CA2035680C Poly(arylenevinylenesiloxanes) |
| 05/17/1996 | WO1996014603A1 Dimensionally stable flexographic printing plates |
| 05/15/1996 | EP0712047A2 Method of forming a resist pattern |
| 05/15/1996 | EP0712046A1 Substrate having release agent/adhesive mixture coated thereon |
| 05/15/1996 | EP0712019A2 Projection optical system and projection exposure apparatus |
| 05/15/1996 | EP0711780A1 Process for the preparation of liquid crystalline polyorganosiloxanes containing (meth-)acryloxy groups |
| 05/15/1996 | EP0711146A1 Osmotic devices having vapor-permeable coatings |
| 05/15/1996 | DE4440527A1 Construction of multilayered, nodular-surfaced art-forms or ornaments |
| 05/15/1996 | DE19534165A1 Method and appts. for irradiating a workpiece surface using laser light |
| 05/15/1996 | DE19504434C1 Structured mask layer mfr. for dry-etching process |
| 05/15/1996 | CN1031813C Method for manufacturing shadow mask |
| 05/14/1996 | US5517312 Device for measuring the thickness of thin films |
| 05/14/1996 | US5517280 Photolithography system |
| 05/14/1996 | US5517279 Lens array photolithography |
| 05/14/1996 | US5516886 Removing metal ions with ion exchange resin, washing resin with polyacrylic acid, fluorinated carboxylic acid |
| 05/14/1996 | US5516875 Polyamides esterified with vinyl ethers, photoacid catalyzed cleavage of the acid labile esters, imidation |
| 05/14/1996 | US5516626 Resist processing method |
| 05/14/1996 | US5516624 Photopolymerizable elastomeric mixture and recording material containing this mixture, for producing ozone-resistant flexographic printing forms |
| 05/14/1996 | US5516623 Alkyl aromatic hydrocarbon, flexography printing plates |
| 05/14/1996 | US5516622 Element and process for laser-induced ablative transfer utilizing particulate filler |
| 05/14/1996 | US5516621 Photosensitive microcapsule having increased photosensitive sensitivity |
| 05/14/1996 | US5516620 Method of on-press developing lithographic plates utilizing microencapsulated developers |
| 05/14/1996 | US5516608 Method for controlling a line dimension arising in photolithographic processes |
| 05/14/1996 | US5516606 Method for forming a light shielding pattern |
| 05/14/1996 | US5516605 Photo mask provided with development rate measuring pattern and method for measuring development rate uniformity |
| 05/14/1996 | US5516545 Coating processes and apparatus |
| 05/14/1996 | CA2015481C Devices featuring silicone elastomers |
| 05/09/1996 | WO1996013741A1 Beamsplitter in single fold optical system and optical variable magnification method and system |
| 05/09/1996 | WO1996013538A2 Visible-light curable epoxy system with enhanced depth of cure |
| 05/09/1996 | DE4439296A1 Wafer exposure through masks using wafer stepper |
| 05/09/1996 | DE4438413A1 Appts. for prodn. of printing plates |
| 05/08/1996 | EP0711105A2 Method of forming solder mask |
| 05/08/1996 | EP0710890A1 Device fabrication using DUV/EUV pattern delineation |
| 05/08/1996 | EP0710889A2 Light-sensitive recording material |
| 05/08/1996 | EP0710888A2 Lithographic printing plate |
| 05/08/1996 | EP0710887A1 Photopolymerizable composition |
| 05/08/1996 | EP0710886A1 Positive photoresist composition |
| 05/08/1996 | EP0710885A1 Radiation sensitive composition |
| 05/08/1996 | EP0710369A1 Very wide aperture catadioptric reducing object lens for microlithography |
| 05/08/1996 | EP0710232A1 Monomers with cyclic carbonate groups |
| 05/08/1996 | EP0710161A1 Post treatment of a coated substrate with a gas containing excited halogen to remove residues |
| 05/08/1996 | EP0620931A4 Improved mask for photolithography. |
| 05/08/1996 | EP0524246B1 Resist material and process for use |
| 05/08/1996 | CN1122012A Non-polar halftone dot technique |
| 05/08/1996 | CN1121845A System for supplying photoresist |
| 05/07/1996 | US5515410 Irradiation device for deep x-ray lithography |
| 05/07/1996 | US5515207 Multiple mirror catadioptric optical system |
| 05/07/1996 | US5515167 Transparent optical chuck incorporating optical monitoring |
| 05/07/1996 | US5514852 Heat treatment device |
| 05/07/1996 | US5514729 Conductive polyepoxide for traces (wires) on circuit board |
| 05/07/1996 | US5514526 Perfluoroalkyl-ethylene oxide adducts |
| 05/07/1996 | US5514525 Method of preparing a laminar thermal imaging medium |
| 05/07/1996 | US5514522 Synthesis of photoreactive polymeric binders |
| 05/07/1996 | US5514521 Iron arene initiator, aniline sensitizer, cyanine sensitizer, acrylate monomer |
| 05/07/1996 | US5514520 Negative-acting |
| 05/07/1996 | US5514519 Multicolor element formed by film that is irradiated to form patterns |
| 05/07/1996 | US5514518 Method of improving delamination in an image forming material utilizing 2-diazo-1,2-quinone compounds having fluorine containing substituent groups |
| 05/07/1996 | US5514515 Photoactive compounds having a heterocyclic group used in photoresist compositions |
| 05/07/1996 | US5514501 Process for UV-photopatterning of thiolate monolayers self-assembled on gold, silver and other substrates |
| 05/07/1996 | US5514215 Treating liquid supplying apparatus for a substrate spin treating apparatus |
| 05/03/1996 | CA2160080A1 Photoimageable elements |
| 05/03/1996 | CA2159947A1 Photoimageable elements |
| 05/02/1996 | WO1996012988A1 Positive photosensitive composition |
| 05/02/1996 | DE4438283A1 Narrow band emission laser, esp. excimer laser for microlithography |
| 05/01/1996 | EP0709741A1 Photolithographic process for circular dense patterns |
| 05/01/1996 | EP0709740A1 Integrated circuit and method of making the same |
| 05/01/1996 | EP0709739A2 Method for obtaining a printing plate according to the silver salt diffusion transfer process |
| 05/01/1996 | EP0709738A1 Photosensitive resin composition for form plates and printing block material of photosensitive resin |
| 05/01/1996 | EP0709736A1 Positive chemically amplified resist composition and method for producing compounds used therein |
| 05/01/1996 | EP0709438A1 Active energy ray-curable composition recording medium and image-forming method employing the same |
| 05/01/1996 | EP0709410A2 Polymers |
| 05/01/1996 | EP0709228A1 Thermal transfer donor and receptor for lithographic printing applications |
| 05/01/1996 | EP0708934A1 Radiation-sensitive paint composition |
| 04/30/1996 | US5512759 Condenser for illuminating a ringfield camera with synchrotron emission light |
| 04/30/1996 | US5512607 An epoxidized novolak modified by an unsaturated acid, a tertiary amine and a phosphate; water-developable photoresist; hardness; adhesion; waterproofing |
| 04/30/1996 | US5512606 Photo-crosslinkable polyamide materials |
| 04/30/1996 | US5512500 Method of fabricating semiconductor device |
| 04/30/1996 | US5512422 Method of forming resist pattern and organic silane compound for forming anti-reflection film for use in such method |
| 04/30/1996 | US5512420 Computer controlled laser exposure of durable, camera speed lithographic printing plate |
| 04/30/1996 | US5512419 Contains a polyglycol ether |
| 04/30/1996 | US5512418 Infra-red sensitive aqueous wash-off photoimaging element |
| 04/30/1996 | US5512417 Positive resist composition comprising a bis (t-butoxycarbonylmethly(thymolphthalein as a dissolution inhibitor |
| 04/30/1996 | US5512413 Imaging element for making a lithographic printing plate according to the silver salt diffusion transfer process |
| 04/30/1996 | US5512412 Diffusion transfer |
| 04/30/1996 | US5512397 Stepper scanner discretionary lithography and common mask discretionary lithography for integrated circuits |
| 04/30/1996 | US5512395 Image masks for semiconductor lithography |
| 04/30/1996 | US5512394 Method of coil fabrication for thin-film magnetic recording heads using phase-shifting masks |
| 04/30/1996 | US5512334 Method for the production of a bottom resist |
| 04/30/1996 | US5512328 Method for forming a pattern and forming a thin film used in pattern formation |
| 04/30/1996 | US5512131 Formation of microstamped patterns on surfaces and derivative articles |
| 04/30/1996 | US5511930 Precision positioning apparatus |
| 04/25/1996 | WO1996012217A1 Process and device for calibrating a laser beam scanning control |
| 04/25/1996 | WO1996012216A1 Resist composition |
| 04/25/1996 | WO1996012215A1 Photosensitive elastomer composition and photosensitive rubber printing plate |
| 04/25/1996 | WO1996012214A1 Low metal ion photoactive compounds and photoresists compositions produced therefrom |