Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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09/03/1996 | US5553274 Vertex minimization in a smart optical proximity correction system |
09/03/1996 | US5553273 Vertex minimization in a smart optical proximity correction system |
09/03/1996 | US5553110 X-ray mask structure, process for production thereof, apparatus and method for X-ray exposure with the X-ray mask structure, and semiconductor device produced by the X-ray exposure method |
09/03/1996 | US5552892 Illumination optical system, alignment apparatus, and projection exposure apparatus using the same |
09/03/1996 | US5552891 Automated mask alignment for UV projection expose system |
09/03/1996 | US5552888 Apparatus for measuring position of an X-Y stage |
09/03/1996 | US5552856 Projection exposure apparatus |
09/03/1996 | US5552503 For use in the microelectronics industry, polyacetylenes |
09/03/1996 | US5552263 Process for preparing flexographic printing plates |
09/03/1996 | US5552262 Process for production of photopolymerizable flexographic printing plates |
09/03/1996 | US5552261 Recycling the recording layer of flexographic printing plates |
09/03/1996 | US5552260 Photosensitive compositions |
09/03/1996 | US5552259 Thermal imaging system with improved resistance to stress induced delamination |
09/03/1996 | US5552258 Diffusion transfer printing plate with acid gelatin under layer |
09/03/1996 | US5552256 Positive resist composition containing naphthoquinonediazide compound having non-metallic atom directly bonded to the naphthalene ring |
09/03/1996 | US5552255 Article utilizing quinone diazide resist layer on tantalum substrate surface |
09/03/1996 | US5552251 Circuits, photoresists, masking and measurement |
09/03/1996 | US5552250 Used in a photolithography step of manufacturing a semiconductor integrated circuit device, electron resist |
09/03/1996 | US5552249 Method for making a mask useful in the conformal photolithographic manufacture of patterned curved surfaces |
09/03/1996 | US5552247 Method for patterning an X-ray master mask |
09/03/1996 | CA2074302C Initiator for photopolymerization |
08/29/1996 | WO1996026468A1 Methods and apparatuses for lithography of sparse arrays of sub-micrometer features |
08/29/1996 | WO1996026467A1 Deep pattern micro-lithography |
08/29/1996 | WO1996026466A1 Manufacture of intaglio printing plates by photoablation |
08/29/1996 | DE19606636A1 Resist compsn. for electroless plating of printed circuit board |
08/28/1996 | EP0729293A1 Selective metallization process |
08/28/1996 | EP0729073A1 Positioning system and method and apparatus for device manufacture |
08/28/1996 | EP0729072A1 A process for fabricating a device in which the process is controlled by near-field imaging latent features introduced into energy sensitive resist materials |
08/28/1996 | EP0729071A1 Process for the fabrication of a printing master |
08/28/1996 | EP0729070A2 Waterless lithographic printing plate |
08/28/1996 | EP0729069A1 Benzanthrone polymerization gate in photopolymerizable composition |
08/28/1996 | EP0729068A2 Photosensitive resin composition and method of forming conductive pattern |
08/28/1996 | EP0728788A1 Process for producing photosensitive resin and liquid photosensitive resin composition |
08/28/1996 | EP0728578A1 Process for the fabrication of screen printing master |
08/28/1996 | EP0728520A1 Printing molecular library arrays |
08/28/1996 | EP0728327A1 Process for making an array of tapered photopolymerized waveguides |
08/28/1996 | EP0728034A1 Membrane filter and a method of manufacturing the same as well as a membrane |
08/28/1996 | CN2234098Y Printing-plate making machine |
08/28/1996 | CN1129852A Light exposure mask for semiconductor devices |
08/27/1996 | US5550635 Rotational deviation detecting method and system using a periodic pattern |
08/27/1996 | US5550634 Semiconductor manufacturing system with self-diagnosing function and self-diagnosing method thereof |
08/27/1996 | US5550633 Optical measuring apparatus having a partitioning wall for dividing gas flow in an environmental chamber |
08/27/1996 | US5550627 Exposure and pressure applicator device for printing an image |
08/27/1996 | US5550574 Method and apparatus for exposing light sensitive material by means of a copying machine having a vertically movable laser unit |
08/27/1996 | US5550265 Photoinitiators |
08/27/1996 | US5550215 Polymer reversal on solid surfaces |
08/27/1996 | US5550171 Polymeric sulfonium salt photoinitiators |
08/27/1996 | US5550008 Fine processing |
08/27/1996 | US5550007 Depositing photoresist imaging layer on substrate, exposing, treating with organodisilane, developing |
08/27/1996 | US5550006 Contacting metal surface with aqueous solution containing phosphoric acid and vanadium, niobium, tungsten and/or tantalum compound for time to produce phosphate conversion coating |
08/27/1996 | US5550004 Chemically amplified radiation-sensitive composition |
08/27/1996 | US5550002 Exposing to light photohardenable photosensitive layer on light-sensitive plate, applying heat or pressure, removing exposed layer, exposing unexposed layer to harden |
08/27/1996 | US5550001 Images of improved ink receptivity which can be developed in aqueous developers after exposure |
08/27/1996 | US5549994 Non-reflective portion formed by destroying regularity of periodic structure of multilayer film |
08/25/1996 | CA2169898A1 Benzanthrone polymerization gate in photopolymerizable compositions |
08/23/1996 | CA2169989A1 Waterless lithographic printing plate |
08/22/1996 | WO1996025690A1 3-d laser patterning process |
08/22/1996 | WO1996025681A1 Arbitrarily wide lens array with an image field to span the width of a substrate |
08/22/1996 | WO1996025677A1 Convex ultra-fine particle surface structure |
08/22/1996 | WO1996025293A1 Method and arrangement for the production of a stencil |
08/22/1996 | DE19606170A1 Light source filter for projecting masking images on to semiconductor wafers for lithographic micro-miniaturisation process |
08/22/1996 | DE19506880A1 Optical grating structure inscription by electron beam lithography |
08/22/1996 | CA2213103A1 Method and arrangement for the production of a stencil |
08/22/1996 | CA2187784A1 Lithographic form plate |
08/21/1996 | EP0727716A1 Method for measuring degree of curvature of moving mirror |
08/21/1996 | EP0727715A1 Method and arrangement for characterizing micro-size patterns |
08/21/1996 | EP0727714A1 A diazo based imaging element having improved resistance against physical damage |
08/21/1996 | EP0727713A1 Photoresist having increased sensitivity and use thereof |
08/21/1996 | EP0727712A1 Integral silver halide diffusion transfer lithographic printing plates |
08/21/1996 | EP0727711A2 Photoresist compositions containing supercritical fluid fractionated polymeric binder resins |
08/21/1996 | EP0726921A1 Energy-curable cyanate/ethylenically unsaturated compositions |
08/21/1996 | CN1032614C Method for making single or multiple layer circuit parttern |
08/20/1996 | US5548625 Method for parallel multiple field processing in X-ray lithography |
08/20/1996 | US5547999 Reactive microgel particles formed of acrylic monomer and having unsaturated epoxy compound attached to surfaces, ethylene-unsaturated ester copolymer, unsaturated monomer, photopolymerization initiator |
08/20/1996 | US5547839 Contacting polynucleotides with surface of solid substrate, hybridizing using nucleic acid polymerase and labeled nucleotide |
08/20/1996 | US5547814 O-quinonediazide sulfonic acid esters of phenolic compounds and their use in forming positive images |
08/20/1996 | US5547813 Forming resist, forming middle layer having index of refraction adjusted to prevent mixing of resist and contrast enhancement layer, forming contrast enhancement layer, selectively developing |
08/20/1996 | US5547812 Composition for eliminating microbridging in chemically amplified photoresists comprising a polymer blend of a poly(hydroxystyrene) and a copolymer made of hydroxystyrene and an acrylic monomer |
08/20/1996 | US5547811 Photopolymerizable material on transparent flexible support;photoinitiator; pigment |
08/20/1996 | US5547808 Resist composition having a siloxane-bond structure |
08/20/1996 | US5547789 Pattern transfer mask |
08/20/1996 | US5547788 For projecting pattern through lenses onto semiconductor wafer surface |
08/20/1996 | US5547642 Light ozone asher, light ashing method, and manufacturing method of semiconductor device |
08/20/1996 | US5547328 Method and apparatus for transferring articles between two controlled environments |
08/15/1996 | WO1996024888A1 Resist pattern forming method |
08/15/1996 | WO1996024887A1 Photolithographic structure generation process |
08/15/1996 | WO1996024886A1 Photoactive compounds |
08/15/1996 | WO1996024885A1 Fabrication and use of a sub-micron dimensional standard |
08/15/1996 | WO1996024621A1 Polymers for radiation-sensitive varnishes |
08/14/1996 | EP0726500A1 Chemically amplified, radiation-sensitive resin composition |
08/14/1996 | EP0726499A1 Polymers and use in photoimageable compositions |
08/14/1996 | EP0726498A1 Photopolymerizable composition |
08/14/1996 | EP0726497A2 Photopolymerizable composition |
08/14/1996 | EP0726279A2 A photo-setting colored filter compositions, a color filter, a process for the preparation thereof, and a curable resin composition |
08/14/1996 | EP0726142A2 Continuous film laminating and delaminating system |
08/14/1996 | DE19504684A1 Semiconductor device with silicone ladder resin film |
08/14/1996 | DE19504433A1 Photosensitive varnish layer prodn. |
08/14/1996 | CN1129036A Flexographic printing photosensitive resin and printing plates thereof |
08/13/1996 | US5546225 High resolution printing technique by using improved mask pattern and improved illumination system |
08/13/1996 | US5546223 Method for external excitation of subwavelength light sources that is integrated into feedback methodologies |