Patents
Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
09/1996
09/03/1996US5553274 Vertex minimization in a smart optical proximity correction system
09/03/1996US5553273 Vertex minimization in a smart optical proximity correction system
09/03/1996US5553110 X-ray mask structure, process for production thereof, apparatus and method for X-ray exposure with the X-ray mask structure, and semiconductor device produced by the X-ray exposure method
09/03/1996US5552892 Illumination optical system, alignment apparatus, and projection exposure apparatus using the same
09/03/1996US5552891 Automated mask alignment for UV projection expose system
09/03/1996US5552888 Apparatus for measuring position of an X-Y stage
09/03/1996US5552856 Projection exposure apparatus
09/03/1996US5552503 For use in the microelectronics industry, polyacetylenes
09/03/1996US5552263 Process for preparing flexographic printing plates
09/03/1996US5552262 Process for production of photopolymerizable flexographic printing plates
09/03/1996US5552261 Recycling the recording layer of flexographic printing plates
09/03/1996US5552260 Photosensitive compositions
09/03/1996US5552259 Thermal imaging system with improved resistance to stress induced delamination
09/03/1996US5552258 Diffusion transfer printing plate with acid gelatin under layer
09/03/1996US5552256 Positive resist composition containing naphthoquinonediazide compound having non-metallic atom directly bonded to the naphthalene ring
09/03/1996US5552255 Article utilizing quinone diazide resist layer on tantalum substrate surface
09/03/1996US5552251 Circuits, photoresists, masking and measurement
09/03/1996US5552250 Used in a photolithography step of manufacturing a semiconductor integrated circuit device, electron resist
09/03/1996US5552249 Method for making a mask useful in the conformal photolithographic manufacture of patterned curved surfaces
09/03/1996US5552247 Method for patterning an X-ray master mask
09/03/1996CA2074302C Initiator for photopolymerization
08/1996
08/29/1996WO1996026468A1 Methods and apparatuses for lithography of sparse arrays of sub-micrometer features
08/29/1996WO1996026467A1 Deep pattern micro-lithography
08/29/1996WO1996026466A1 Manufacture of intaglio printing plates by photoablation
08/29/1996DE19606636A1 Resist compsn. for electroless plating of printed circuit board
08/28/1996EP0729293A1 Selective metallization process
08/28/1996EP0729073A1 Positioning system and method and apparatus for device manufacture
08/28/1996EP0729072A1 A process for fabricating a device in which the process is controlled by near-field imaging latent features introduced into energy sensitive resist materials
08/28/1996EP0729071A1 Process for the fabrication of a printing master
08/28/1996EP0729070A2 Waterless lithographic printing plate
08/28/1996EP0729069A1 Benzanthrone polymerization gate in photopolymerizable composition
08/28/1996EP0729068A2 Photosensitive resin composition and method of forming conductive pattern
08/28/1996EP0728788A1 Process for producing photosensitive resin and liquid photosensitive resin composition
08/28/1996EP0728578A1 Process for the fabrication of screen printing master
08/28/1996EP0728520A1 Printing molecular library arrays
08/28/1996EP0728327A1 Process for making an array of tapered photopolymerized waveguides
08/28/1996EP0728034A1 Membrane filter and a method of manufacturing the same as well as a membrane
08/28/1996CN2234098Y Printing-plate making machine
08/28/1996CN1129852A Light exposure mask for semiconductor devices
08/27/1996US5550635 Rotational deviation detecting method and system using a periodic pattern
08/27/1996US5550634 Semiconductor manufacturing system with self-diagnosing function and self-diagnosing method thereof
08/27/1996US5550633 Optical measuring apparatus having a partitioning wall for dividing gas flow in an environmental chamber
08/27/1996US5550627 Exposure and pressure applicator device for printing an image
08/27/1996US5550574 Method and apparatus for exposing light sensitive material by means of a copying machine having a vertically movable laser unit
08/27/1996US5550265 Photoinitiators
08/27/1996US5550215 Polymer reversal on solid surfaces
08/27/1996US5550171 Polymeric sulfonium salt photoinitiators
08/27/1996US5550008 Fine processing
08/27/1996US5550007 Depositing photoresist imaging layer on substrate, exposing, treating with organodisilane, developing
08/27/1996US5550006 Contacting metal surface with aqueous solution containing phosphoric acid and vanadium, niobium, tungsten and/or tantalum compound for time to produce phosphate conversion coating
08/27/1996US5550004 Chemically amplified radiation-sensitive composition
08/27/1996US5550002 Exposing to light photohardenable photosensitive layer on light-sensitive plate, applying heat or pressure, removing exposed layer, exposing unexposed layer to harden
08/27/1996US5550001 Images of improved ink receptivity which can be developed in aqueous developers after exposure
08/27/1996US5549994 Non-reflective portion formed by destroying regularity of periodic structure of multilayer film
08/25/1996CA2169898A1 Benzanthrone polymerization gate in photopolymerizable compositions
08/23/1996CA2169989A1 Waterless lithographic printing plate
08/22/1996WO1996025690A1 3-d laser patterning process
08/22/1996WO1996025681A1 Arbitrarily wide lens array with an image field to span the width of a substrate
08/22/1996WO1996025677A1 Convex ultra-fine particle surface structure
08/22/1996WO1996025293A1 Method and arrangement for the production of a stencil
08/22/1996DE19606170A1 Light source filter for projecting masking images on to semiconductor wafers for lithographic micro-miniaturisation process
08/22/1996DE19506880A1 Optical grating structure inscription by electron beam lithography
08/22/1996CA2213103A1 Method and arrangement for the production of a stencil
08/22/1996CA2187784A1 Lithographic form plate
08/21/1996EP0727716A1 Method for measuring degree of curvature of moving mirror
08/21/1996EP0727715A1 Method and arrangement for characterizing micro-size patterns
08/21/1996EP0727714A1 A diazo based imaging element having improved resistance against physical damage
08/21/1996EP0727713A1 Photoresist having increased sensitivity and use thereof
08/21/1996EP0727712A1 Integral silver halide diffusion transfer lithographic printing plates
08/21/1996EP0727711A2 Photoresist compositions containing supercritical fluid fractionated polymeric binder resins
08/21/1996EP0726921A1 Energy-curable cyanate/ethylenically unsaturated compositions
08/21/1996CN1032614C Method for making single or multiple layer circuit parttern
08/20/1996US5548625 Method for parallel multiple field processing in X-ray lithography
08/20/1996US5547999 Reactive microgel particles formed of acrylic monomer and having unsaturated epoxy compound attached to surfaces, ethylene-unsaturated ester copolymer, unsaturated monomer, photopolymerization initiator
08/20/1996US5547839 Contacting polynucleotides with surface of solid substrate, hybridizing using nucleic acid polymerase and labeled nucleotide
08/20/1996US5547814 O-quinonediazide sulfonic acid esters of phenolic compounds and their use in forming positive images
08/20/1996US5547813 Forming resist, forming middle layer having index of refraction adjusted to prevent mixing of resist and contrast enhancement layer, forming contrast enhancement layer, selectively developing
08/20/1996US5547812 Composition for eliminating microbridging in chemically amplified photoresists comprising a polymer blend of a poly(hydroxystyrene) and a copolymer made of hydroxystyrene and an acrylic monomer
08/20/1996US5547811 Photopolymerizable material on transparent flexible support;photoinitiator; pigment
08/20/1996US5547808 Resist composition having a siloxane-bond structure
08/20/1996US5547789 Pattern transfer mask
08/20/1996US5547788 For projecting pattern through lenses onto semiconductor wafer surface
08/20/1996US5547642 Light ozone asher, light ashing method, and manufacturing method of semiconductor device
08/20/1996US5547328 Method and apparatus for transferring articles between two controlled environments
08/15/1996WO1996024888A1 Resist pattern forming method
08/15/1996WO1996024887A1 Photolithographic structure generation process
08/15/1996WO1996024886A1 Photoactive compounds
08/15/1996WO1996024885A1 Fabrication and use of a sub-micron dimensional standard
08/15/1996WO1996024621A1 Polymers for radiation-sensitive varnishes
08/14/1996EP0726500A1 Chemically amplified, radiation-sensitive resin composition
08/14/1996EP0726499A1 Polymers and use in photoimageable compositions
08/14/1996EP0726498A1 Photopolymerizable composition
08/14/1996EP0726497A2 Photopolymerizable composition
08/14/1996EP0726279A2 A photo-setting colored filter compositions, a color filter, a process for the preparation thereof, and a curable resin composition
08/14/1996EP0726142A2 Continuous film laminating and delaminating system
08/14/1996DE19504684A1 Semiconductor device with silicone ladder resin film
08/14/1996DE19504433A1 Photosensitive varnish layer prodn.
08/14/1996CN1129036A Flexographic printing photosensitive resin and printing plates thereof
08/13/1996US5546225 High resolution printing technique by using improved mask pattern and improved illumination system
08/13/1996US5546223 Method for external excitation of subwavelength light sources that is integrated into feedback methodologies