| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 03/13/1996 | EP0700534A1 Partially polymerized resins |
| 03/13/1996 | EP0641250B1 Inorganic membrane for microfiltration, and a process for production of such an inorganic membrane |
| 03/13/1996 | CN1118629A Colored photosensitive resin composition |
| 03/13/1996 | CN1118457A Photo mask, method for producing the same, pattern forming method, method of manufacturing semiconductor device and mask pattern design system |
| 03/12/1996 | US5499282 Efficient narrow spectral width soft-X-ray discharge sources |
| 03/12/1996 | US5499137 Exposure method and apparatus therefor |
| 03/12/1996 | US5499100 Photo-lithography apparatus and method of correcting off-telecentricity of the apparatus caused by shift of effective illumination source |
| 03/12/1996 | US5499099 Alignment method and alignment system |
| 03/12/1996 | US5499076 For projecting a pattern |
| 03/12/1996 | US5498878 Method and apparatus for detecting positional deviation by using diffraction gratings with a compensation delay determining unit |
| 03/12/1996 | US5498877 Method of manufacturing semiconductor device using measurement mark pattern |
| 03/12/1996 | US5498772 Reversible heat-sensitive recording material |
| 03/12/1996 | US5498769 Method for thermally treating resist film and forming undercut pattern |
| 03/12/1996 | US5498765 Positive photoresist composition containing photoacid generator and use thereof |
| 03/12/1996 | US5498641 Photopolymerization |
| 03/12/1996 | US5498579 Method of producing semiconductor device layer layout |
| 03/12/1996 | US5498514 Lithographic double-coated patterning plate with undercoat levelling layer |
| 03/12/1996 | US5498506 Positive-acting radiation-sensitive mixture and recording material produced therewith |
| 03/12/1996 | US5498504 Process for the preparation of an image using only dry steps |
| 03/12/1996 | US5498501 Manufacturing semiconductors |
| 03/12/1996 | US5498500 Overlay measurement mark and method of measuring an overlay error between multi patterns in a semiconductor device using the measurement mark |
| 03/12/1996 | US5498498 Photosensitive resin composition used in a method for forming a light-shielding film |
| 03/12/1996 | US5498449 Photoresist film coating method |
| 03/12/1996 | US5498308 Plasma asher with microwave trap |
| 03/12/1996 | US5498118 Apparatus for and method of carrying a substrate |
| 03/07/1996 | WO1996007075A1 Corrector plate correction of extant imaging systems for approaching diffraction limit |
| 03/07/1996 | WO1996006694A1 Surface modification processing of flat panel device substrates |
| 03/07/1996 | WO1996006693A1 Photo reactive cleaning of critical surfaces in cd manufacturing |
| 03/07/1996 | WO1996006692A1 Cleaning of printed circuit boards |
| 03/07/1996 | DE19532358A1 Alkoxyphenyl-substituierte Bisacylphosphinoxide Alkoxyphenyl-substituted bisacylphosphine |
| 03/06/1996 | EP0699961A1 Photosensitive composition, photosensitive rubber plate and process for producing the plate, and flexographic plate and process for producing the plate |
| 03/06/1996 | EP0699960A1 Photosensitive composition |
| 03/06/1996 | EP0699959A1 A bislactone compound and a process for producing the same |
| 03/06/1996 | EP0648349B1 Solid state imager |
| 03/06/1996 | CN2221792Y Synchronous optical overprinting synthetic equipment for picture, characters image |
| 03/06/1996 | CN1118200A Support element for an automatic loading tray of an exposure unit for silicon wafers |
| 03/06/1996 | CN1118193A Novel matrix resin for high-temperature stable photoimageable compositions |
| 03/06/1996 | CN1117921A Lithographic printing plates |
| 03/06/1996 | CN1031227C Welding mask coating capable of exposure-imaging |
| 03/05/1996 | US5497008 Use of a Kumakhov lens in analytic instruments |
| 03/05/1996 | US5496903 Photpolymerizable coating |
| 03/05/1996 | US5496685 Manufacturing a printing plate |
| 03/05/1996 | US5496684 Photosensitive compositions and elements for flexographic printing |
| 03/05/1996 | US5496683 Method of and apparatus for optically shaping photo-setting resin |
| 03/05/1996 | US5496682 Three dimensional sintered inorganic structures using photopolymerization |
| 03/05/1996 | US5496679 Imaging element and method for making lithographic printing plates according to the silver salt diffusion transfer process |
| 03/05/1996 | US5496678 Photosensitive compositions containing a polymer with carboxyl and hydroxyphenyl groups, a compound with multiple ethylenic unsaturation and a photo-acid generator |
| 03/05/1996 | US5496677 Presensitized plate for use in making lithographic printing plate comprising a mat layer and coating layer on the back face of the substrate |
| 03/05/1996 | US5496669 System for detecting a latent image using an alignment apparatus |
| 03/05/1996 | US5496668 Formation of microstructures using a preformed photoresist sheet |
| 03/05/1996 | US5496667 Forming film of x-ray absorber by sputtering in inert gas containing nitrogen using a target of tungsten with or without added titanium; lithography; low internal stress, high dimensional accuracy |
| 03/05/1996 | US5496666 Contact hole mask for semiconductor fabrication |
| 03/05/1996 | US5496504 Halomethyl-1,3,5-triazines containing a monomeric moiety |
| 03/05/1996 | US5496491 For photoresists, amine salt reaction product |
| 03/05/1996 | US5496438 Method of removing photo resist |
| 03/05/1996 | US5496432 Method and device for peeling a film |
| 03/05/1996 | CA2050070C Optical memory device |
| 03/03/1996 | CA2157342A1 Alkoxyphenyl-substituted bisacylphosphine oxides |
| 02/29/1996 | WO1996006382A1 Process and apparatus for rejuvenating developer in printing plate development |
| 02/29/1996 | WO1996006369A2 Improving resolution in scanned optical systems |
| 02/29/1996 | WO1996006121A1 Metal ion reduction in novolak resin solution using an anion exchange resin |
| 02/29/1996 | WO1996005915A1 Emulsion coating apparatus |
| 02/29/1996 | DE19530856A1 Vorrichtung zum Laden und Entladen einer Zwischenmaske Apparatus for loading and unloading a reticle |
| 02/29/1996 | DE19530545A1 Aromatic hydroxy-carboxylic acid resins, partial ester(s) and metal chelates |
| 02/29/1996 | CA2197224A1 Process and apparatus for rejuvenating developer in printing plate development |
| 02/28/1996 | EP0698916A2 Method of optical lithography using phase shift masking |
| 02/28/1996 | EP0698826A1 Off axis alignment system for scanning photolithography |
| 02/28/1996 | EP0698825A1 An energy sensitive resist material and a process for device fabrication using the resist material |
| 02/28/1996 | EP0698824A2 Pattern formation method and method and apparatus for production of a semiconductor device using said method |
| 02/28/1996 | EP0698823A1 Antireflective coating for microlithography |
| 02/28/1996 | EP0698822A2 Lithographic printing plate precursor with a flexible support and method for making a lithographic printing plate therewith |
| 02/28/1996 | EP0698821A1 High resolution phase edge lithography without the need for a trim mask |
| 02/28/1996 | EP0698498A2 Device for making stamps |
| 02/28/1996 | EP0698233A1 Process and device for coating printed circuit boards |
| 02/28/1996 | EP0698232A1 Process and device for coating printed circuit boards |
| 02/28/1996 | EP0698230A1 Chemically amplified photoresist |
| 02/28/1996 | EP0697967A1 Thermosensitive recording material |
| 02/28/1996 | CN1117652A Vernier |
| 02/28/1996 | CN1117599A Developer for photoresist layers |
| 02/28/1996 | CN1031116C Solid imaging system using differential tension elastomeric film |
| 02/28/1996 | CN1031115C Improved solid imaging method and apparatus |
| 02/28/1996 | CN1031114C Method and apparatus for fabricating three dimensional objects from photoformed precursor sheets |
| 02/27/1996 | US5495328 Apparatus and method for calibrating and normalizing a stereolithographic apparatus |
| 02/27/1996 | US5495280 Illumination device using a pulsed laser source a Schlieren optical system, and a matrix addressable surface light modulator for producing images with undiffracted light |
| 02/27/1996 | US5495279 Method and apparatus for exposure of substrates |
| 02/27/1996 | US5495029 Photopolymerizable; coatings, adhesives, photoresists, solder masks |
| 02/27/1996 | US5494944 Hardenable composition and its use |
| 02/27/1996 | US5494943 A two-component initiator system for curing an epoxy monomer comprising a metallocene catalyst and a stabilizer; storage stability; coatings; adhesives; abrasive binders; magnetic recording media |
| 02/27/1996 | US5494785 High ortho-ortho bonded novolak binder resins and their use in a process for forming positive resist patterns |
| 02/27/1996 | US5494784 Method of pattern formation utilizing radiation-sensitive resin composition containing monooxymonocarboxylic acid ester solvent |
| 02/27/1996 | US5494780 Accurately forming circuit patterns of electroconductive materials on three-dimensiuonal molded substrates |
| 02/27/1996 | US5494777 Radiation sensitive resin composition |
| 02/27/1996 | US5494774 Microporous crosslinked silicated surface comprising a colloidal silica crosslinked by a coupling agent; photopolymer layer |
| 02/27/1996 | US5494773 Positive photoresist composition comprising a novolak resin having a cycloalkylidene-bisphenol group |
| 02/27/1996 | US5494618 Increasing the useful range of cationic photoinitiators in stereolithography |
| 02/27/1996 | CA1338095C Photopolymerizable composition |
| 02/24/1996 | CA2156781A1 Print making device |
| 02/22/1996 | WO1996005539A1 Water-less lithographic plates |
| 02/22/1996 | WO1996005249A2 Acrylic syrup curable to a crosslinked viscoelastomeric material |
| 02/22/1996 | DE19527314A1 Fabrication of silicon membrane with predefined parameters |