| Patents for G03C 5 - Photographic processes or agents therefor; Regeneration of such processing agents (11,726) |
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| 01/04/2005 | US6838230 Method for processing a digitally exposed translucent or transparent photographic material |
| 12/30/2004 | US20040265757 Photosensitive emulsion and photothermographic material by use thereof |
| 12/30/2004 | US20040265746 Forming multilayer photoresist; overlapping zones atre exposured to actinic radiation; adjust solubility; development |
| 12/30/2004 | US20040265745 Forming photoresist on semiconductor substrate ; masking |
| 12/30/2004 | US20040265712 Detecting erosion in collector optics with plasma sources in extreme ultraviolet (euv) lithography systems |
| 12/30/2004 | US20040265711 comprises an adhesive layer for adhering the film to a substrate, a scratch resistant layer containing dispersed carbon black particles, and a metallized layer of aluminum deposited on a polyethylene terephthalate substrate |
| 12/30/2004 | US20040265709 Method for manufacturing mask for focus monitoring, and method for manufacturing semiconductor device |
| 12/30/2004 | US20040265346 Water-in-oil emulsions for use in cosmetics |
| 12/30/2004 | DE10361663A1 Verfahren und System zur dreidimensionalen Röntgenbildgebung unter mehrfachen Blickwinkeln Method and system for three-dimensional X-ray imaging at multiple angles |
| 12/29/2004 | WO2004114382A1 Method for forming pattern and method for manufacturing semiconductor device |
| 12/29/2004 | EP1491947A1 Photosensitive emulsion and photothermographic material |
| 12/29/2004 | EP0934552B1 Method and apparatus for electronic film development |
| 12/28/2004 | US6835936 Scintillator panel, method of manufacturing scintillator panel, radiation detection device, and radiation detection system |
| 12/28/2004 | US6835693 Composite positioning imaging element |
| 12/23/2004 | US20040259044 Photothermographic materials with improved image tone |
| 12/23/2004 | US20040259041 High-speed positive-working photothermographic system |
| 12/23/2004 | US20040258209 Apparatus for detecting position and format of a film cassette |
| 12/23/2004 | US20040257419 Liquid composition for ink jet, ink set for ink jet, and recording method and recording apparatus using the same |
| 12/23/2004 | US20040256574 Exposure apparatus and device fabrication method |
| 12/22/2004 | CN1556849A Compositions for removing metal ions from aqueous process solutions and methods of use thereof |
| 12/21/2004 | US6833235 High speed developing, fixing, rinsing and drying using automatic processing machine with densitometer |
| 12/16/2004 | WO2004109397A1 Photographic processing |
| 12/16/2004 | WO2004109396A1 Radiographic imaging assembly for mammography |
| 12/16/2004 | WO2004042344A3 Fabrication of a high resolution biological molecule detection device with gold electrical conductors |
| 12/16/2004 | US20040253812 Method for BARC over-etch time adjust with real-time process feedback |
| 12/16/2004 | US20040253556 Silver halide light-sensitive color photographic material, and method for forming images |
| 12/16/2004 | US20040253555 Support containing filler and/or undercoat layer containing smectite group clay treated with organic onium compound between; improved dimensional stability; photomechanics; integrated circuits; printed circuits |
| 12/16/2004 | US20040253552 High-speed positive-working photothermographic system comprising an accelerating agent |
| 12/16/2004 | US20040253525 Photomask correcting method and manufacturing method of semiconductor device |
| 12/16/2004 | US20040253524 Substrate with light shielding film; measurement flatness of substrate; calibration; forming pattern ; optical images |
| 12/16/2004 | US20040253523 Embedded bi-layer structure for attenuated phase shifting mask |
| 12/16/2004 | US20040253522 Strip-like profile on surface of masking substrate with protective coatings |
| 12/16/2004 | US20040250720 Highly reflective substrates for the digital processing of photopolymer printing plates |
| 12/15/2004 | EP1486823A1 Silver halide light-sensitive color photographic material, and method for forming images |
| 12/15/2004 | EP1377877A4 Stabilized cd-4 one-part film developer concentrates |
| 12/14/2004 | US6830878 Having hydroxylammonium groups; generates hydrogen peroxide; stable; odorless |
| 12/14/2004 | US6830853 Providing critical dimension control; working relatively large areas of opaque material |
| 12/09/2004 | WO2004107407A2 Method of making information storage devices by molecular photolithography |
| 12/09/2004 | WO2004107379A1 Unbaked laminate for producing front plate of plasma display device, and method for producing front plate of plasma display device |
| 12/09/2004 | WO2004107043A1 Method for reproducing a holographic matrix on a support and support |
| 12/09/2004 | WO2004107042A1 Method for evaluating the effects of multiple exposure processes in lithography |
| 12/09/2004 | US20040248050 Solutions for a photographic reversal bath and processing method for a photographic color reversal film |
| 12/09/2004 | US20040248044 Method for manufacturing a semiconductor device, stencil mask and method for manufacturing a the same |
| 12/09/2004 | US20040248020 Exposure mask and pattern exposure method |
| 12/09/2004 | US20040248018 to produce patterns of substantially the same size but having different pitches, including fine pitches; can be selectively isotropically etched to form an undercut under the portion of the opaque layer that extends between the second and third transparent regions |
| 12/09/2004 | US20040248016 Manually or automatically inserting into the layout file after locations of the attenuating feature are determined; forming resist features of uniform width |
| 12/08/2004 | EP1484643A1 Method for preparing bleach-fixing processing solution for silver halide color photographic light sensitive material, starter for concentrated bleach-fixing composition and method for processing of photographic light-sensitive material |
| 12/08/2004 | EP1483628A1 Full phase shifting mask in damascene process |
| 12/08/2004 | CN1179242C Method for printing on portable data medium and medium using said method |
| 12/08/2004 | CN1179241C Photographic silver halide photosensitive material |
| 12/07/2004 | US6828088 Contrast and sensitivity |
| 12/07/2004 | US6828084 Odorless photographic bleaching composition and color photographic processing |
| 12/07/2004 | US6828082 Method to pattern small features by using a re-flowable hard mask |
| 12/07/2004 | US6828081 Method and system for lithography using phase-change material |
| 12/07/2004 | US6828077 Mammography imaging method using high peak voltage |
| 12/07/2004 | US6828068 Binary half tone photomasks and microscopic three-dimensional devices and method of fabricating the same |
| 12/02/2004 | US20040241997 Method for manufacturing quartz oscillator |
| 12/02/2004 | US20040241597 Method for preparing bleach-fixing processing solution for silver halide color photographic light sensitive material, starter for concentrated bleach-fixing composition and method for processing of photographic light sensitive material |
| 12/02/2004 | US20040241595 Detecting at least one parameter for the characterization of the mask,automatically selecting a stored correction data record from a correction database; measuring optical properties of a structure of the mask using a measuring system; combining measurement results; storing a measurement data record |
| 12/02/2004 | US20040241592 Irradiating light onto a member having a modulation profile smaller than the wavelength of irradiated light and forming a distribution of optical near-field corresponding to surface of said member; introducing material gas to be used for a photochemical reaction; causing photochemical reaction |
| 12/02/2004 | US20040241584 having different storage characteristics at a plurality of discrete memory locations by providing a substrate with a surface portion having a linking group or charge storage group coupled thereto, each with a photocleavable protecting group |
| 12/02/2004 | US20040241555 Photoresist layer is exposed with a mask; setting transmittance of side-lobe region lower than transmittance of intermediate region. |
| 12/02/2004 | US20040240622 Radiographic imaging assembly for mammography |
| 12/01/2004 | EP1482374A2 Method of generating mask distortion data, exposure method and method of producing semiconductor device |
| 12/01/2004 | EP1482359A1 Blue-sensitive film for radiography and imaging assembly and method |
| 12/01/2004 | EP1481973A1 Heterocycle-bearing onium salts |
| 12/01/2004 | EP1481283A1 Lithography pattern shrink process and articles |
| 12/01/2004 | CN1551298A Pattern forming method and method for manufacturing seniconductor applying said method |
| 11/30/2004 | US6825122 Method for fabricating a patterned thin film and a micro device |
| 11/30/2004 | US6824966 Dye is formed in the photographic element during processing in order to provide an increased signal range |
| 11/30/2004 | US6824965 Bleach bath |
| 11/30/2004 | US6824964 Image forming method |
| 11/30/2004 | US6824963 Chemical marker remains in the processed material, therefore should any re-prints be required at a later date the operator of a mini-lab would be able to determine that scanning and digital optimization is required for satisfactory results |
| 11/25/2004 | WO2004077154A3 Lithographic printing with polarized light |
| 11/25/2004 | US20040234909 Photothermographic material and image forming method |
| 11/25/2004 | US20040234905 wafer is placed on the surface of a hot plate, the hot plate is then positioned under an angle with a horizontal direction and may be turned such that the active surface of the wafer, over which a photoresist mask has been formed, faces downwards; changing Critical Dimension in a layer of photoresist |
| 11/25/2004 | US20040234886 Photosensitive element for use as flexographic printing plate |
| 11/25/2004 | US20040234868 Novel modification of mask blank to avoid charging effect |
| 11/25/2004 | US20040233445 Determination of center of focus by parameter variability analysis |
| 11/24/2004 | CN1177259C Single part color photographic processing slurry |
| 11/23/2004 | US6822799 Exposing apparatus and exposing method for microlens array |
| 11/18/2004 | US20040229472 Exposure mask pattern formation method, exposure mask, and semiconductor device production method employing the exposure mask |
| 11/18/2004 | US20040229172 Method of reusing photographic processing wastesolution, and photographic processing agent |
| 11/18/2004 | US20040229154 Stimulable phosphor, radiation image conversion panel and preparation process thereof |
| 11/18/2004 | US20040229136 Photo mask blank and photo mask |
| 11/18/2004 | US20040229131 Photomask pattern |
| 11/18/2004 | US20040229129 Reducing charging effects in photolithography reticle manufacturing |
| 11/18/2004 | US20040229028 Method for producing light-transmitting electromagnetic wave-shielding film, light-transmitting electromagnetic wave-shielding film and plasma display panel using the shielding film |
| 11/17/2004 | CN1547046A Photographic fabrication method of radial gradual change dimmer sheet |
| 11/16/2004 | US6818515 Method for fabricating semiconductor device with loop line pattern structure |
| 11/16/2004 | US6818374 Silver halide photographic light-sensitive materials and method for development of the same |
| 11/16/2004 | US6818365 Feed forward leveling |
| 11/16/2004 | US6818135 For recovering metals from aqueous waste solutions |
| 11/11/2004 | WO2004066358A3 Binary half tone photomasks and microscopic three-dimensional devices and method of fabricating the same |
| 11/11/2004 | US20040224248 Multicolor image-forming material and multicolor image-forming method |
| 11/11/2004 | US20040224243 comprises silicon substrate with aperture, silicon oxide film formed on surface, single crystal silicon layer with aperture (for passing exposure beam) formed on film, and stress controlling layer for decreasing warping and high positioning precision; photomasks/photoresists |
| 11/11/2004 | US20040224241 Thin film transistor array panel, manufacturing method thereof, and mask therefor |
| 11/10/2004 | EP1475664A2 Mask, mask blank, and methods of producing these |
| 11/09/2004 | US6816678 Method for obtaining a sensitometric control patch with exposure gradient and photographic element comprising such a control patch |
| 11/09/2004 | US6815157 Silver halide emulsion and silver halide photographic material |