| Patents for G03C 5 - Photographic processes or agents therefor; Regeneration of such processing agents (11,726) |
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| 08/11/2005 | US20050175907 Photo mask including scattering bars and method of manufacturing the same |
| 08/11/2005 | US20050175905 Method for manufacturing transfer mask substrate, transfer mask substrate, and transfer mask |
| 08/11/2005 | US20050175337 Method for processing a color reversal photographic film |
| 08/11/2005 | US20050174423 Laser marking method |
| 08/11/2005 | US20050173671 storage stable mixtures of fixatives comprising ammonium, sodium or potassium thiosulfate, iron-ligand complexing agents and nitrogen compounds as adjuvants, used for developing photographic films |
| 08/11/2005 | DE10392658T5 Verfahren zur Herstellung eines Transfermasken-Substrats, Transfermasken-Substrat und Transfermaske A method for producing a transfer mask substrate transfer mask substrate and transfer mask |
| 08/11/2005 | DE102005000734A1 Verfahren zum Einstellen einer Abweichung einer kritischen Abmessung von Mustern Method for adjusting a deviation of a critical dimension of patterns |
| 08/10/2005 | EP1562071A1 Silver halide emulsion and silver halide photographic material containing the same |
| 08/09/2005 | US6927021 Photographic films having photosensitive silver halide emulsion layers containing sulfur compounds such as glutaramidophenyldisulfide, disodium salts as antisludging agents |
| 08/09/2005 | US6927019 Bleaching agent comprises an iron(III) complex salt of an aminopolycarboxylic acid |
| 08/09/2005 | US6927016 Molding optics; exposure to laser radiation |
| 08/09/2005 | US6927005 Alternating phase shift mask design with optimized phase shapes |
| 08/04/2005 | WO2005069805A2 Targeted radiation treatment using a spectrally selective radiation emitter |
| 08/04/2005 | US20050170299 Image forming method using a silver halide color photographic light-sensitive material, and silver halide color photographic light-sensitive material |
| 08/04/2005 | US20050170298 Heat-developable photosensitive material and an image forming method |
| 08/04/2005 | US20050170295 Method for forming micropatterns |
| 08/04/2005 | US20050170293 Exposure apparatus |
| 08/04/2005 | US20050170288 Optical lithography; radiation transparent phase shifting masks used in manufacture of semiconductors/integrated circuits |
| 08/04/2005 | US20050170269 Solidifying flowable film onto which concave and convex portions have been transferred, annealing film with press, then patterning of solidified film burnt by annealing |
| 08/04/2005 | US20050170268 Circuit patterning substrate, providing mask, collimating incident direction of particles, irradiating |
| 08/04/2005 | US20050170267 Methods and systems to compensate for a stitching disturbance of a printed pattern in a maskless lithography system utilizing overlap of exposure zones with attenuation of the aerial image in the overlap region |
| 08/04/2005 | US20050170264 Projects images of grating pattern and test pattern; photoresists |
| 08/04/2005 | US20050170262 Exposure processing system, exposure processing method and method for manufacturing a semiconductor device |
| 08/04/2005 | US20050170261 Providing a phase shift mask substrate having a layer of phase shifting material and a layer of an opaque material, and depositing a first resist layer on the substrate; resist layer is exposed by a direct write electron beam or laser energy source and developed, and the substrate is etched |
| 08/04/2005 | US20050169433 Radiation sensitive recording plate with orientation identifying marker, method of making, and of using same |
| 08/04/2005 | DE102004063140A1 Fotomaske und Verfahren für die Herstellung derselben Photo mask and method for manufacturing the same |
| 08/03/2005 | EP1558654A2 Novel copolymer, photoresist compositions thereof and deep uv bilayer system thereof |
| 08/03/2005 | EP1558446A1 Thermal generation of a mask for flexography |
| 08/03/2005 | CN1650229A Silver halide color photographic-sensitive material and its image forming method |
| 08/03/2005 | CN1649748A Multilayer body with a layer having at least one laser sensitive material |
| 08/03/2005 | CN1649747A Multilayer image particularly multiple color image |
| 08/03/2005 | CN1648775A System and method for processing masks with oblique features |
| 08/03/2005 | CN1648767A Diffusion transfer film unit for seal print |
| 08/03/2005 | CN1213492C Method for making plate-type magnetic-resistance sensing piece element |
| 08/02/2005 | US6924086 Developing photoresist with supercritical fluid and developer |
| 08/02/2005 | US6924084 Electron exposure to reduce line edge roughness |
| 08/02/2005 | US6924070 Composite patterning integration |
| 08/02/2005 | US6924069 Depositing a negative photoresist over the light blocking layer to include filling a portion of the opening exposing the negative photoresist layer through the quartz substrate; developing and dry etching; accuracy |
| 07/28/2005 | WO2005060565A3 Filling an area of an image marked on a product with a laser |
| 07/28/2005 | WO2005001898A3 Method of designing a reticle and forming a semiconductor device therewith |
| 07/28/2005 | WO2005001432A3 Optical fluids, and systems and methods of making and using the same |
| 07/28/2005 | US20050164522 Optical fluids, and systems and methods of making and using the same |
| 07/28/2005 | US20050164135 Synergistic combination of alkyl or arylsulfonate with organic antioxidant; high quality photoprocessing of silver halide materials; kits |
| 07/28/2005 | US20050164134 Method and apparatus for a two-step resist soft bake to prevent ILD outgassing during semiconductor processing |
| 07/28/2005 | US20050164117 Curling prevention, image fastness; color identification cards, notes, albums; simplified operation, easy handling |
| 07/28/2005 | US20050164098 Pattern dimension accuracy; aligning mask or reticle with reference system and determining offset angle; rotating and processing in horizontal or vertical direction |
| 07/28/2005 | US20050164097 Simplifying design of alternating phase shift photomask; forming opaque layer on transparent substrate then patterning and etching and repeating on adjacent region |
| 07/28/2005 | US20050164095 Decreasing error of line width on coarse/dense pattern; adjusting numerical aperture and/or coherence factor |
| 07/28/2005 | DE102004063455A1 Fotomaske Photomask |
| 07/27/2005 | EP1557716A1 Diffusion transfer film unit for seal print |
| 07/27/2005 | CN2713515Y Dim light phase shift light cover having double embedded layers |
| 07/21/2005 | WO2005066712A1 Color motion picture print film |
| 07/21/2005 | WO2005065109A2 Computer program and method for converting an image to machine control data |
| 07/21/2005 | US20050159016 Electron exposure to reduce line edge roughness |
| 07/21/2005 | US20050158676 Silver salt photothermographic dry imaging material |
| 07/21/2005 | US20050158673 Liquid-filled balloons for immersion lithography |
| 07/21/2005 | US20050158666 forming dielectric multilayers over substrates, then forming a photoresist masking layer, etching pattern into and through the dielectric layers, adding gases and stripping the photoresists by ashing in oxygen and wet chemical solvents, to form semiconductors; microelectronics |
| 07/21/2005 | US20050158637 comprising radiation transparent plates through which light passes, having blocking patterns for selectively blocking the light, and concave and convex portions for imprinting pateerns on photoresist films; lithography |
| 07/21/2005 | US20050157611 Optical lens and method of producing the same, method of producing optical lens array, focus error signal production method, and optical pickup apparatus |
| 07/21/2005 | DE10360366A1 Gebinde für fotografische Verarbeitungschemikalien Container for photographic processing chemicals |
| 07/21/2005 | DE10360365A1 Gebinde für fotografische Verarbeitungschemikalien Container for photographic processing chemicals |
| 07/21/2005 | DE102004059439A1 Methode zur Entfernung eines Resistmusters Method of removing a resist pattern |
| 07/20/2005 | CN1641485A Exposure system, test mask for flare testing, method for evaluating lithography process |
| 07/20/2005 | CN1211705C Silver halide photosensitive material |
| 07/19/2005 | US6919164 Applying photosensitive layer to substrate; electron beam exposure; contacting developers |
| 07/14/2005 | WO2005031458A3 Forming partial-depth features in polymer film |
| 07/14/2005 | WO2004107407A3 Method of making information storage devices by molecular photolithography |
| 07/14/2005 | US20050153228 Radiation image storage panel |
| 07/14/2005 | US20050153218 Photomasks |
| 07/14/2005 | US20050153215 Real-time configurable masking |
| 07/14/2005 | US20050153214 Single trench repair method with etched quartz for attenuated phase shifting mask |
| 07/14/2005 | US20050153212 Generating simplified layout patterns from the predetermined main shapes of the mask, such layout patterns are generated by eliminating detail of the main shapes which leads to unmanufacturable associated shapes while preserving geometrically relevant shape information, associated shapes are generated |
| 07/14/2005 | US20050151990 Method, computer program, and apparatus for detecting specific information included in image data of original image with accuracy, and computer readable storing medium storing the program |
| 07/14/2005 | US20050150451 Position adjusting method and substrate processing system |
| 07/13/2005 | EP1553617A1 Method for forming pattern and method for manufacturing semiconductor device |
| 07/13/2005 | EP1553444A1 Silver halide color photographic sensitive material and it image forming method |
| 07/13/2005 | EP1553443A1 Silver halide photosensitive material and method of forming image |
| 07/13/2005 | CN1639631A Silver halide photosensitive material and method of forming image |
| 07/13/2005 | CN1639590A Composite mask for producing a diffuser |
| 07/13/2005 | CN1638053A Method of adjusting deviation of critical dimension of patterns |
| 07/13/2005 | CN1637620A Exposure processing system, exposure processing method and method for manufacturing a semiconductor device |
| 07/13/2005 | CN1637607A Method for reducing nonuniformity of image printed on substrate using light micro-image cover and light micro- image cover |
| 07/13/2005 | CN1637594A Exposure mask and exposure method using the same |
| 07/13/2005 | CN1210615C Silver halide photographic material |
| 07/13/2005 | CN1210614C Reader decoding and reproducing sound encoded in infrared ink on photographs |
| 07/12/2005 | US6916601 Image-forming method using a silver halide color photographic light-sensitive material, and silver halide color photographic light-sensitive material |
| 07/12/2005 | US6916600 Benzotriazole compound contained in silver halide emulsion layer |
| 07/12/2005 | US6916543 Chemical amplification; organosilicon moieties; binder resins; etching resistant; photolithography |
| 07/07/2005 | WO2005062126A1 A process for the manufacture of flexographic printing plates |
| 07/07/2005 | WO2005062125A1 Single-part bleach-fixing composition and method of processing |
| 07/07/2005 | WO2005060565A2 Filling an area of an image marked on a product with a laser |
| 07/07/2005 | US20050148203 Method, apparatus, system and computer-readable medium for in situ photoresist thickness characterization |
| 07/07/2005 | US20050147933 Reduced silver level three color image recording with quality silverless soundtrack signal; simplified film processing |
| 07/07/2005 | US20050147931 Process for manufacturing a photothermographic material |
| 07/07/2005 | US20050147930 Dimensional precision photolithography; high density and microfabrication of semiconductor devices; removal of antireflective film undercoating without affecting resist film |
| 07/07/2005 | US20050147902 Least squares analysis of position of an object with alignment marks; projector |
| 07/07/2005 | US20050147901 Lithography pattern shrink process and articles |
| 07/06/2005 | CN1209678C Silver halide photographic emulsion contg. methylidyne compound, and photographic material using said emulsion |
| 07/05/2005 | US6913873 Photoresist amplification; phenolic resin, acrylic polymer and acid generator |
| 07/05/2005 | US6913868 Conductive bi-layer e-beam resist with amorphous carbon |