| Patents for G03C 5 - Photographic processes or agents therefor; Regeneration of such processing agents (11,726) |
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| 04/06/2005 | CN1604275A Pattern formation method |
| 04/06/2005 | CN1603950A Method for making patterns of phase shift transformation light shield used in semiconductor chips manufacturing and structure thereof |
| 04/06/2005 | CN1603949A Photomask, photomask manufacturing method and semiconductor device manufacturing method using photomask |
| 04/06/2005 | CN1603947A Image forming method using photothermographic material |
| 04/05/2005 | US6876440 Methods and systems to compensate for a stitching disturbance of a printed pattern in a maskless lithography system utilizing overlap of exposure zones with attenuation of the aerial image in the overlap region |
| 04/05/2005 | US6875565 Silver halide photographic emulsion and photographic element comprising it |
| 04/05/2005 | US6875560 Testing multiple levels in integrated circuit technology development |
| 04/05/2005 | US6875546 Method of patterning photoresist on a wafer using an attenuated phase shift mask |
| 03/31/2005 | US20050070032 Ferroelectric polymer memory with a thick interface layer |
| 03/31/2005 | US20050069828 High-speed thermally developable imaging materials |
| 03/31/2005 | US20050069820 photographic waste solution solidified easily and recovered in solid form; prevents thermal decomposition of ingredients in the waste solution from deteriorating; free of noises caused by contact between lumps formed by coagulation of the solidified matter |
| 03/31/2005 | US20050069814 Pattern formation method |
| 03/31/2005 | US20050069813 Photoresists film with aperture patterns and swelling with liquid in apertures for reverse tapering of apertures for semiconductors |
| 03/31/2005 | US20050069791 Patterns with pivots measured in energy and semiconductor construction |
| 03/31/2005 | US20050069788 Photomask, photomask manufacturing method and semiconductor device manufacturing method using photomask |
| 03/31/2005 | US20050069786 Stencil mask, production method thereof, exposure apparatus, exposure method and electronic device production method |
| 03/31/2005 | US20050069783 masking; selectively coding the spaced regions to define a masked read only memory (ROM) structure that causes optical interference; illumination; development; improved circuit density and reliability; miniaturization; integrated circuits |
| 03/31/2005 | US20050069782 Each full-depth producing pattern includes an area of UV light-blocking material on a transparent plate that has a smaller dimension equal to or greater than minimum resolvable size; partial-depth producing pattern has an area of UV light-blocking material with smaller dimension less than minimum size |
| 03/31/2005 | US20050069781 conventional exposure, development and baking processes; photomask includes an array of first and second phase shift regions and a non phase shift region; elimination of side-lobe effects; integrated circuits; photolithography |
| 03/31/2005 | US20050068514 Methods and systems to compensate for a stitching disturbance of a printed pattern in a maskless lithography system utilizing overlap of exposure zones with attenuation of the aerial image in the overlap region |
| 03/30/2005 | EP1519226A2 Stencil mask, production method thereof, exposure apparatus, exposure method and electronic device production method |
| 03/30/2005 | EP1519225A2 Thin film evaporating concentrator, method of evaporating and solidifying photographic waste solution, and reuse method of photographic waste solution |
| 03/30/2005 | EP1519224A2 Image forming method using photothermographic material |
| 03/29/2005 | US6872511 Method for forming micropatterns |
| 03/29/2005 | US6872507 Patterning microelectronics using electron beam; etching masking layer; adjustment of backscattering |
| 03/24/2005 | WO2005026839A2 Phthalocyanine precursors in infrared sensitive compositions |
| 03/24/2005 | US20050064648 Method for forming wiring pattern, method for manufacturing semiconductor device, electro-optic device and electronic equipment |
| 03/24/2005 | US20050064350 Photothermographic material and image forming method |
| 03/24/2005 | US20050064342 as the main substrate can be separated from the sub substrate along the thin portion, the separation line will not be located at an unintended position or will not be in an unintended shape. As a result, reliability of the pattern formed on the main substrate is improved |
| 03/24/2005 | US20050064341 Composition containing a photoacid generator monomer, substrate coated with the composition, method for synthesizing a compound on a substrate using the composition, and microarray produced according to the method |
| 03/24/2005 | US20050064303 A pattern of a fine opening provided in the light blocking layer; optical head; for generating light; semiconductor processing for improve in fineness of microlithography |
| 03/24/2005 | US20050064301 Forming a first fine pattern which has a fine opening, having a size of not more than a wavelength of exposure light; forming a second mask; for use with microprocessing in a short time; microlithography |
| 03/24/2005 | US20050064300 The light-shielding layer is patterned to form a main pattern and a phantom pattern; eliminate optical proximity effects; substrate with the phantom pattern can be narrower; etched to form trenches in the substrate; photolithographic process to make semiconductor wafer |
| 03/24/2005 | US20050064084 During high-temperature cooking of a starch-based dough for a fabricated food, e.g., potato chips, corn chips, adding two reducing agents chosen from the group of calcium chloride, citric acid, phosphoric acid and cysteine in a ratio of 0.5 moles calcium chloride to 1.0 moles of free asparigine; quality |
| 03/24/2005 | US20050062281 Printed media with machine readable markings |
| 03/24/2005 | US20050061748 Compositions for removing metal ions from aqueous process solutions and methods of use thereof |
| 03/24/2005 | DE10340611A1 Lithographic mask for making integrated semiconductor circuit by photolithographic process, comprising angular structure element formed by two opaque segments, with adjacent transparent structure at convex section of angular structure |
| 03/23/2005 | EP1517178A1 A process for preparing peptide nucleic acid probe using monomeric photoacid generator |
| 03/23/2005 | EP1516227A1 Developer concentrate for black and white development of photographic materials |
| 03/23/2005 | CN1598696A Method of forming optical element |
| 03/23/2005 | CN1597322A Jet method, lens and manufacturing method thereof, semiconductor laser and its manufacturing method, optical device and jet device |
| 03/23/2005 | CN1596827A Human body measurement calculating and analysis method |
| 03/23/2005 | CN1194264C Silver halide color photographic sensitive material and color picture forming method |
| 03/23/2005 | CN1194262C Vision adaptive ray photographic film and imaging component |
| 03/22/2005 | US6869675 Radiographic imaging assemblies containing screens having a radiation curable, hydrophobic, wear and abrasion resistant protective coating |
| 03/17/2005 | WO2005024325A2 Method and system for drying a substrate |
| 03/17/2005 | US20050058954 Thermal development method and apparatus |
| 03/17/2005 | US20050058930 Negative resist composition with fluorosulfonamide-containing polymer |
| 03/17/2005 | US20050058915 Photomask |
| 03/17/2005 | US20050058448 Photographic developer effluent transfer station and drain wash |
| 03/17/2005 | US20050057998 Semiconductor device with loop line pattern structure, method and alternating phase shift mask for fabricating the same |
| 03/17/2005 | US20050057796 Ultra-broadband UV microscope imaging system with wide range zoom capability |
| 03/17/2005 | DE102004026206A1 Belichtungsmaskensubstrat-Herstellungsverfahren, Belichtungsmasken-Herstellungsverfahren und Halbleitereinrichtungs-Herstellungsverfahren Exposure mask substrate manufacturing method, exposure mask manufacturing method and semiconductor device production method |
| 03/16/2005 | EP1515168A1 Optical component formation method |
| 03/15/2005 | US6867416 Image forming method and image forming material |
| 03/15/2005 | US6867122 Redistribution process |
| 03/15/2005 | US6866987 Resolution and process window improvement using lift-off |
| 03/10/2005 | WO2005022600A2 Method and systems for processing overlay data |
| 03/10/2005 | US20050054210 Multiple exposure method for forming patterned photoresist layer |
| 03/10/2005 | US20050053873 Solid bleach-fixing composition for silver halide color photographic light-sensitive material, and method for processing silver halide color photographic light-sensitive material |
| 03/10/2005 | US20050053872 Adding colloidal silica into backing of photosensitive material; containing fluorine containing surfactants |
| 03/10/2005 | US20050053864 Phthalocyanine precursors in infrared sensitive compositions |
| 03/10/2005 | US20050053850 Further method to pattern a substrate |
| 03/10/2005 | US20050053847 Photolithography; forming semiconductors, integrated circuits; detecting defects |
| 03/10/2005 | US20050053846 Phase shift assignments for alternate PSM |
| 03/10/2005 | US20050053273 aligning spatial light modulators to write a second layer of patterns over a first layer of patterns on a workpiece, comprising illuminating alignment markings with radiation, detecting the markings using cameras and analyzing posistioning; phase shifting masks (PSM) |
| 03/09/2005 | EP1513009A1 Container for photochemicals |
| 03/09/2005 | CN1592539A Substrate, method of manufacturing multi-layer substrate, and satellite broadcasting reception apparatus |
| 03/09/2005 | CN1591179A Solid bleach-fixing composition for silver halide color photographic light-sensitive material, and method for processing silver halide color photographic light-sensitive material |
| 03/09/2005 | CN1591144A Film transistor array panel and its mfg method |
| 03/09/2005 | CN1590957A Original negative, exposure method and original negative making method |
| 03/08/2005 | US6864167 Wafer scale solder bump fabrication method and structure |
| 03/08/2005 | US6864045 Mammography film and imaging assembly for use with rhodium or tungsten anodes |
| 03/08/2005 | US6864024 Real-time control of chemically-amplified resist processing on wafer |
| 03/03/2005 | US20050050511 System and method of correcting mask rule violations after optical proximity correction |
| 03/03/2005 | US20050048420 Photographic chemicals bundle |
| 03/03/2005 | US20050048418 Thermal development apparatus and thermal development process |
| 03/03/2005 | US20050048409 Method of making an optical device in silicon |
| 03/03/2005 | US20050048395 Homopolymer or copolymer of polyhydroxystyrene changes its solubility in an alkali developer by action of an acid; generating an acid by exposure to radiation; bis((4-(1,3-dioxolan-2-yl)cyclohexyl)methylsulfonyl)diazomethane |
| 03/03/2005 | US20050048377 Mask for improving lithography performance by using multi-transmittance photomask |
| 03/03/2005 | US20050048375 Method of making an attenuated phase-shifting mask from a mask blank |
| 03/03/2005 | US20050046934 Method and system for drying a substrate |
| 03/03/2005 | US20050044802 Hermetically sealable housing and enclosed getter material; protecting laser from ultraviolet radiation pitting damage |
| 03/03/2005 | DE102004008378A1 Optisches Nähenkorrekturverfahren Optical proximity correction method |
| 03/02/2005 | EP1510859A1 Solid bleach-fixing composition for a silver halide color photographic light-sensitive material and method for processing a silver halide color photographic light-sensitive material |
| 03/02/2005 | EP1509404A1 Multilayer body with a layer having at least one laser-sensitive material |
| 03/01/2005 | US6861183 Scatter dots |
| 03/01/2005 | US6861180 Contact printing as second exposure of double exposure attenuated phase shift mask process |
| 03/01/2005 | US6861176 Hole forming by cross-shape image exposure |
| 02/24/2005 | US20050044513 Contrast based resolution enhancement for photolithographic processing |
| 02/24/2005 | US20050042551 Forming light-permeable anode conducting layer on transparent substrate, etching pattern via photolithography, forming insulating layer, cathode partitioning layer, and hole transporting layer, depositing small-molecule electron transporting layer via evaporation, then forming packaging layer |
| 02/24/2005 | US20050042525 Reticle, semiconductor exposure apparatus and method, and semiconductor device manufacturing method |
| 02/24/2005 | DE102004021151A1 Verfahren zum Reduzieren von Ungleichförmigkeit und Bildverkürzung in einem auf ein Substrat belichteten Bild unter Verwendung einer photolithographischen Maske, und photolithographische Maske A method for reducing non-uniformity and image shortening in an exposed image on a substrate using a photolithographic mask, and photolithographic mask |
| 02/17/2005 | US20050037295 Systems and methods for film processing quality control |
| 02/17/2005 | US20050037294 Stabilized p-phenylenediamine-type photographic color developers in free base form |
| 02/17/2005 | US20050037288 Adjustment of printed circuit incline when imaging photolithographic patterns having asymmetrical configuration, |
| 02/17/2005 | US20050037271 For resist pattern; observation data such as electron microscopy is applied to model data created beforehand in accordance with the exposure conditions to estimate fluctuations in the exposure dose and the focal position |
| 02/17/2005 | US20050037267 Illumination multilayer, vertical pattern through mask |
| 02/16/2005 | EP1506328A2 Fabrication of a high resolution biological molecule detection device with gold electrical conductors |
| 02/16/2005 | CN1582092A Method for forming wire-layout pattern and method for making semiconductor device and photoelectronic device |