| Patents for G03C 5 - Photographic processes or agents therefor; Regeneration of such processing agents (11,726) |
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| 05/19/2005 | US20050106510 Water and a compositions of alkaline amphoteric and non-ionic inorganic salts, one surfactant having a non-ionic hydrophilic group of polyethylenoxide or polyether; less depositions in the developing apparatus and on the processed printing plates, especially during long run processing |
| 05/19/2005 | US20050106493 Water soluble negative tone photoresist |
| 05/19/2005 | US20050106490 storage phosphor panels having an excellent and constant sensitivity over the whole panel surface throughout the whole production, without undesired stimulated emission |
| 05/19/2005 | US20050106475 Mask substrate on which the patterned mask layer is arranged, has a protective layer to protect the mask layer from contact with impurity particles |
| 05/19/2005 | US20050106472 patterning the non-transparent film using the etch stop layer to expose areas of the transparent substrate, forming a mask on the non-transparent film to protect selected areas of the transparent substrate and forming a phase shift oxide |
| 05/19/2005 | US20050106383 Method for simultaneous patterning of features with nanometer scale gaps |
| 05/19/2005 | US20050105072 Optical system for providing a hexapole illumination and method of forming a photoresist pattern on a substrate using the same |
| 05/19/2005 | US20050104106 Ferroelectric polymer memory with a thick interface layer |
| 05/19/2005 | US20050104010 Radiation image conversion panel and preparation method thereof |
| 05/19/2005 | DE10297658T5 Verfahren und System zum Reparieren defekter Photomasken Method and system for repairing defective photomasks |
| 05/17/2005 | US6894844 Optical lens and method of producing the same, method of producing optical lens array, focus error signal production method, and optical pickup apparatus |
| 05/17/2005 | US6893807 Solidification waste solutions; reuse; color photography |
| 05/17/2005 | US6893799 Dual-solder flip-chip solder bump |
| 05/12/2005 | WO2005043241A2 Method for simultaneous patterning of features with nanometer scale gaps |
| 05/12/2005 | WO2004079780A3 A method of patterning photoresist on a wafer using a reflective mask with a multi-layer arc |
| 05/12/2005 | US20050101042 Ejection method, lens and its manufacturing method, semiconductor laser and its fabrication method, optical device and ejection device |
| 05/12/2005 | US20050100841 A symmetric radiographic silver halide film containing a crossover control agent, a pair of phosphor intensifying screenshaving a reflective polyester substrate; improved contrast and sharpness and reduced fog; medical diagnostics |
| 05/12/2005 | US20050100840 X-ray films comprising supports, multilayer of silver halide emulsions, hydrophilic colloid layers, merocyanine or oxonol dyes, and fluorescence intensifier screens having phosphors and polymer binders, used in medical diagnosis |
| 05/12/2005 | US20050100839 formed from silver halide emulsions and hydrophilic colloid layers; improved contrast/sharpness and reduced fog; for black-and-white imaging for medical diagnosis |
| 05/12/2005 | US20050100838 improved medical diagnostic images at lower dosage; especially for pediatric radiography; symmetric silver halide film (at least 400 film speed) and fluorescent intensifying screens on opposing sides |
| 05/12/2005 | US20050100837 Multilayer x-ray film containing sivler halide emulsion, hydrophilic colloids, merocyanine or oxonol dyes; fluorescence screen containing phosphor in binder; medical diagnosis |
| 05/12/2005 | US20050100836 Phosphor screen and imaging assembly |
| 05/12/2005 | US20050100830 Methods for fabricating patterned features utilizing imprint lithography |
| 05/12/2005 | US20050100825 Method for evaluating planographic printing plates and quality-control method thereof |
| 05/12/2005 | US20050100799 Mixture of photomasks; controlling incline of pattern; lithography; phase shifting; removal of mask by etching |
| 05/12/2005 | US20050100798 Device and method for providing wavelength reduction with a photomask |
| 05/12/2005 | US20050100797 Method of manufacturing a reflection type mask blank and method of manufacturing a reflection type mask |
| 05/12/2005 | US20050100335 Systems and methods for film processing quality control |
| 05/12/2005 | US20050098738 Absorption x-rays; emission of electromagnetic waves; on support having a reflective polyester surfaces containing barium sulfate particles; radiology images |
| 05/11/2005 | EP1530357A1 Method, computer program, and apparatus for detecting specific information included in image data of original image with accuracy, and computer readable storing medium storing the program |
| 05/11/2005 | CN2699337Y Light screen master film capable of preventing electron beam deviation caused by electric charge effect |
| 05/11/2005 | CN1201200C Method and apparatus for electronic film development |
| 05/10/2005 | US6890707 Silver halide crystals of the red-sensitive layer contain 20 to 500 nmol of iridium per mol of silver halide; N-acyl-N'-(thiophenylsulfonylmethylcarbonyl)-2-hydroxy-p-phenylene-diamine |
| 05/10/2005 | US6890706 Process for removing stain in a photographic material |
| 05/10/2005 | US6890690 Photographic article |
| 05/06/2005 | WO2005040924A2 Photoresist coating process for microlithography |
| 05/06/2005 | CA2537947A1 Photoresist coating process for microlithography |
| 05/05/2005 | US20050095515 Filtration measurement; measuring overlay displacement; calibration using model of optical errors |
| 05/05/2005 | US20050095513 Patterns with apertures; rectangle light shielding zones; exposure; uniform light applied to photosensitive body ; reduction of variations in line width; forming semiconductors |
| 05/05/2005 | US20050095512 Lithography mask for imaging of convex structures |
| 05/05/2005 | US20050095510 Flare measuring mask and flare measuring method of semiconductor aligner |
| 05/04/2005 | CN1612055A Photoetching with micro trace photoresist detecting pattern and its detecting method |
| 05/04/2005 | CN1200012C Organic antireflecting coating and its preparation |
| 05/03/2005 | US6887641 Mammography imaging method using high peak voltage and rhodium or tungsten anodes |
| 05/03/2005 | US6887629 Radiation-patterning tool |
| 04/28/2005 | WO2005038524A2 Novel photosensitive resin compositions |
| 04/28/2005 | US20050090120 removing post-etch residue; passivating silicon oxide low-k materials; solution comprises a silylating agent such as hexamethyldisilazane (HMDS), chlorotrimethylsilane (TMCS), trichloromethylsilane (TCMS) |
| 04/28/2005 | US20050089805 Material and method for treating photographic effluents |
| 04/28/2005 | US20050089790 Photoresist composition for a spinless coater and method of forming a photoresist pattern using the same |
| 04/28/2005 | US20050089777 Multilayer; dielectric substrate, spacers and masking layer; etching patterns |
| 04/28/2005 | US20050089776 Resist reflow measurement key and method of forming a fine pattern of a semiconductor device using the same |
| 04/28/2005 | US20050089773 System and method for measuring overlay errors |
| 04/28/2005 | US20050089769 External pattern area surrounding the layout pattern area provides registration for accurate allignment |
| 04/28/2005 | US20050089767 Alternate aperture phase shifting mask; integrated circuit fabrication, photolithography |
| 04/28/2005 | US20050089766 Method for improving uniformity and alignment accuracy of contact hole array pattern |
| 04/28/2005 | US20050089765 Method of a floating pattern loading system in mask dry-etching critical dimension control |
| 04/28/2005 | US20050089764 Multi-step phase shift mask and methods for fabrication thereof |
| 04/28/2005 | US20050089504 Hyperbranched polymeric micelles for encapsulation and delivery of hydrophobic molecules |
| 04/27/2005 | EP1526551A1 Stimulable phosphor screens or panels and manufacturing control thereof |
| 04/27/2005 | EP1459110B1 Composite mask for producing a diffuser |
| 04/27/2005 | EP1044395B1 Photographic processing composition and diffusion transfer photographic film unit |
| 04/27/2005 | CN1610060A Grating alignment procedure |
| 04/27/2005 | CN1609730A Simple non-poisonous silver halide bleaching method for hologram |
| 04/27/2005 | CN1609716A A composition containing a photoacid generator monomer and carrier coated with the same and application thereof |
| 04/27/2005 | CN1609710A Method for forming patterned ITO structure by using photosensitive ITO solution |
| 04/26/2005 | US6884572 Used for silver halide photographic material, storage stability, performance |
| 04/26/2005 | US6884554 Semiconductor wafer tilt compensation by wafer rotation and wafer tilt averaging |
| 04/21/2005 | WO2005036261A1 Negative resist composition with fluorosulfonamide-containing polymer |
| 04/21/2005 | US20050084806 Wiring pattern (mask layout) in the form of a line including angled portions with a local difference in line width is divided into rectangular patterns each having a large area and node portions interconnecting the rectangular patterns; high correction accuracy |
| 04/21/2005 | US20050084805 Method for forming patterned ITO structure by using photosensitive ITO solution |
| 04/21/2005 | US20050084804 Diamond-like composition acts as a release layer and is radiation transparent; use in imprint lithography |
| 04/21/2005 | US20050084790 Color developer composition and imaging element containing same |
| 04/21/2005 | US20050084782 Exposure method and exposure management system |
| 04/21/2005 | US20050084778 Reticle alignment procedure |
| 04/21/2005 | US20050084771 Phase shift mask |
| 04/21/2005 | US20050084769 Manufacturable chromeless alternating phase shift mask structure with phase grating |
| 04/21/2005 | US20050084768 Attenuated phase shift mask for extreme ultraviolet lithography and method therefore |
| 04/21/2005 | US20050084767 directing pulsed laser beams through substrates and focusing it on a target located in the substrate adjacent to coating layers, to write a diffractive optical element, thus changing the scattering properties of the substrate at the target location; masks for use in photolithography |
| 04/21/2005 | US20050082535 Thin film transistor array panel and manufacturing method thereof |
| 04/21/2005 | DE10324502B3 Photomaske, sowie Verfahren zur Herstellung von Halbleiter-Bauelementen Photomask, and to processes for the production of semiconductor devices |
| 04/14/2005 | WO2004086143A3 Multi-step process for etching photomasks |
| 04/14/2005 | US20050079454 Contrast enhancement materials containing non-PFOS surfactants |
| 04/14/2005 | US20050079449 Apparatus and method of fabricating thin film transistor array substrate |
| 04/14/2005 | US20050079437 applying a mixture of novolacs, photosensitizers and acid generators to substrate surfaces, then silylating and exposing to infrared radiation |
| 04/14/2005 | US20050079427 Semiconductor device with loop line pattern structure, method and alternating phase shift mask for fabricating the same |
| 04/13/2005 | EP1521843A2 Method for chemiluminescent detection |
| 04/13/2005 | CN1605936A Photomask and method for forming pattern |
| 04/12/2005 | US6878512 Average thickness lower than 0.15 mu m; average diameter at least 1.20 mu m; average aspect ratio of at least 8:1; coefficient of diameter variation COVd of 31%-44%; and coefficient of thickness variation COVt lower than 25%. |
| 04/12/2005 | US6878463 Method of machining glass |
| 04/07/2005 | WO2005031458A2 Forming partial-depth features in polymer film |
| 04/07/2005 | US20050074815 Bioassays incorporate film with chemiluminescent precursor immobilized therewith; polynucleotide/DNA analysis; kits |
| 04/07/2005 | US20050074709 Cleaning solution for photoresist and method for forming pattern using the same |
| 04/07/2005 | US20050074707 Image forming method using photothermographic material |
| 04/07/2005 | US20050074699 An extremely thin photoresist layer is coated on top of a photosensitive and anti-reflective protective layer of organometallic polymer; stack of the films is selectively exposed to actinic radiation and the latent images on the layers are developed with a common alkaline developer |
| 04/07/2005 | US20050074682 Forming slit features intersecting one another with good reproducibility; photomask has first light-shielding portions each in insular shape that shield exposure light and are spaced equidistantly; second light-shielding portion is formed to contain a point located equidistantly from first portions |
| 04/07/2005 | US20050074678 photomasks for production of semiconductors; photoresists |
| 04/07/2005 | US20050074552 Spray coating at angle while rotating at varying speed to uniformly cover deep etched features |
| 04/07/2005 | US20050074538 Quality potato chips; simple, low cost; combination of decomposing asparagine precursor with asparaginase and supressing conversion by addition of such as calcium chloride and phosphoric acid prior to drying step |
| 04/06/2005 | EP1521116A2 Silver halide photographic light-sensitive material and package thereof |
| 04/06/2005 | EP1086402B1 New color photographic developer kit |