Patents for G03C 5 - Photographic processes or agents therefor; Regeneration of such processing agents (11,726)
09/2005
09/29/2005US20050214702 Black and white photothermographic material and image forming method
09/29/2005US20050214699 Image forming layer containing photosensitive silver halide emulsions, nonphotosensitive organic silver compound, reducing agent and binder; medical imaging for diagnosis; high speed resolution
09/29/2005US20050214691 Method of manufacturing multilayer optical information recording medium, and multilayer optical information recording medium
09/29/2005US20050214685 Process of preparing planographic printing plate
09/29/2005US20050214683 Method and apparatus for reforming film and controlling slimming amount thereof
09/29/2005US20050214658 Method for alleviating tolerance restrictions for feature sizes during fabrication of photomasks
09/29/2005US20050214656 Process for producing a mask
09/29/2005US20050214654 ESD-resistant photomask and method of preventing mask ESD damage
09/29/2005US20050214653 Repair of photolithography masks by sub-wavelength artificial grating technology
09/29/2005US20050214652 Continuous sloped phase edge architecture fabrication technique using electron or optical beam blur for single phase shift mask ret
09/29/2005US20050214451 Bismuth, germanium, silicon, titanium oxide particles are filled in aerosolization chamber, shaken/agitated together with carrier gas in high-pressure gas cylinder which stores carrier gas; electrostatic latent imaging
09/29/2005US20050214398 Assembly and method for transferring imprint lithography templates
09/29/2005US20050213222 Optical lens and method of producing the same, method of producing optical lens array, focus error signal production method, and optical pickup apparatus
09/28/2005CN1673858A Photosensitive thermal development recording material, its case, and developing method and production process of photosensitive thermal recording material
09/27/2005US6949331 solidification/granulation of thin films; for silver halide emulsions
09/27/2005US6949325 reactive ion etching; improved etch resistance; for production of semiconductor chips
09/22/2005WO2005088394A1 Photosensitive material for silver halide color photograph
09/22/2005WO2004093148A3 Effective proximity effect correction methodology
09/22/2005US20050210436 Alternating phase-shift mask rule compliant ic design
09/22/2005US20050209857 System for recording and playing audio signals provided on a photograph
09/22/2005US20050208441 Photosensitive silver halide, non-photosensitive organic silver salt, reducing agent, polyhalogen compound, and binder; conjugated copolymer or copolyene optionally substituted with halogen or nitrile groups; storage stability, discoloration inhibition; high speed development
09/22/2005US20050208437 Black and white photothermographic material and image forming method
09/22/2005US20050208428 Surface graft material, conductive pattern material, and production method thereof
09/22/2005US20050208396 Identifying a target edge fragment that form a length and a classification in a photolithographic design, length of the target edge fragment is less than a minimum scatter bar length, target edge fragment is smoothed with the collinear edge fragment to increase the length of the target edge fragment
09/22/2005US20050208393 Photomask and method for creating a protective layer on the same
09/22/2005US20050208390 Exposed regions of a substrate are etched to a predetermined depth; Additional regions are exposed and trimmed to a predetermined thickness to provide desired attenuation amount; final etched depth compensating for the change of relative phase shift caused by trimming
09/22/2005US20050207746 Substrate having photograph and encoded audio signal simultaneously printed thereon
09/22/2005US20050207637 Polarization analyzing system, exposure method, and method for manufacturing semiconductor device
09/22/2005US20050205797 Scintillator panel, method of manufacturing scintillator panel, radiation detection device, and radiation detection system
09/22/2005US20050205780 Scanning electron microscope and a method for evaluating accuracy of repeated measurement using the same
09/22/2005US20050205115 After a resist stripping solution of sulfuric acid and a hydrogen peroxide is supplied to the surface of the substrate which is being rotated at a first rotational speed, the rotational speed of the substrate is reduced to form a liquid film on the surface; paddling to maintain the liquid film
09/21/2005CN1670589A Device for generating light and liquid crystal display apparatus having the same
09/20/2005US6947291 Photolithographically-patterned out-of-plane coil structures and method of making
09/15/2005US20050202328 Large feature-shift coma sensitivity is simulated for a range of illumination conditions, resulting source sensitivity data is modeled and a practical array of source shapes, each of which is optimized to eliminate the effects of transverse distortion due to third-order coma, is identified
09/15/2005US20050202327 Method and arrangement for controlling focus parameters of an exposure tool
09/15/2005US20050202326 creating a photomask layout of spaced integrated circuit shapes for projecting an image of an integrated circuit design; determining bisectors between adjacent ones by creating Voronoi cells; assist features along the bisectors are parallel to the spaced integrated circuit shapes
09/15/2005US20050202325 Device for generating light and liquid crystal display apparatus having the same
09/15/2005US20050202324 Method for producing masks for photolithograpy and the use of such masks
09/15/2005US20050202322 Methods of forming alternating phase shift masks having improved phase-shift tolerance
09/15/2005US20050202321 Pliant sraf for improved performance and manufacturability
09/15/2005US20050201748 Package for solid photographic-processing agent
09/15/2005US20050200990 Master substrate, apparatus and method for magnetic transfer
09/15/2005US20050199730 Camera for encoding audio signals
09/15/2005DE102004007678B3 Mask manufacturing method for semiconductor component, involves enlarging slivers after breaking up of semiconductor layout data, and transmitting enlarged slivers to generator in form of control data after photographic exposure of mask
09/14/2005EP1574900A1 Package for solid photographic-processing agent
09/14/2005CN1219237C Silver halide photographic photosensitive material and treating method thereof
09/13/2005US6944263 Apparatus and methods for multiple view angle stereoscopic radiography
09/13/2005US6942831 Process for rapid annealing of a polyester film base to control film curl
09/09/2005WO2005050312A3 High speed imaging assembly for radiography
09/08/2005US20050196712 Irradiating electron beams onto a film on a surface of an object to be processed to modify a quality of the film; measuring an intensity of the emission spectrum; detecting an end point of the process based on the intensity of the emission spectrum
09/08/2005US20050196684 Mask pattern data producing method, patterning method, reticle correcting method, reticle manufacturing method, and semiconductor apparatus manufacturing method
09/08/2005US20050196683 Forming a first semitransparent layer configured to add a first phase rotation to a light beam passing through; forming a second semitransparent layer configured to add a second phase rotation to a light beam passing through; semiconductors
09/08/2005DE102004040764A1 Verfahren zum Korrigieren von Verletzungen von Maskenregeln nach optischer Nachbarschaftskorrektur, maschinenlesbares Speichermedium und System A method for correcting violations of rules after optical proximity correction mask, machine-readable storage medium and system
09/07/2005EP1571490A1 Photosensitive thermal development recording material, its case, and developing method and production process of photosensitive thermal recording material
09/06/2005US6940583 Method and apparatus for amplitude filtering in the frequency plane of a lithographic projection system
09/06/2005US6939667 Photosensitive emulsion and photothermographic material by use thereof
09/06/2005US6939650 making integrated circuits using absorbent transmission masks that can be repaired
09/01/2005WO2005081059A1 Method for the production of masks used in photolithography, and use of such masks
09/01/2005WO2005081058A1 Watermarking method for motion picture image sequence
09/01/2005WO2005079233A2 Films for optical use and methods of making such films
09/01/2005US20050192180 Imaging leading edge to mid range density; reducing distraction effects; readability, aesthetic qualities
09/01/2005US20050191589 Radiographic silver halide photographic material having a good developing speed, an excellent image tone and low residual color after processing
09/01/2005US20050191588 Thermally developable imaging material
09/01/2005US20050191587 Silver halide emulsion and silver halide photographic material
09/01/2005US20050191582 System, method, and apparatus for mechanically releasable slider processing including lapping, air bearing patterning, and debonding
09/01/2005US20050191566 Quick and accurate modeling of transmitted field
08/2005
08/31/2005EP1568737A2 Reactive anthraquinone colorant compounds and polymeric materials reacted therewith
08/31/2005CN1661776A Barrier film material and pattern formation method using the same
08/30/2005US6936411 Industrial radiographic silver halide material suitable for rapid processing applications
08/30/2005US6936386 for application to semiconductor wafers; comprises charge coupled camera; lithography
08/25/2005WO2005076940A2 Single-part photographic bleach-fixing composition
08/25/2005US20050187441 Laser-scanning examination apparatus
08/25/2005US20050186754 Solid-state imaging apparatus having multiple anti-reflective layers and method for fabricating the multiple anti-reflective layers
08/25/2005US20050186521 Imaging layer of thermal recording media contains a binder and a non-photosensitive source of reducible silver ions, such as silver behenate, a color developing agent that is released above 80 degrees C, a cyan dye-forming color coupler, and a magenta dye-forming color coupler; neutral image tone density
08/25/2005US20050186520 Color films contains a color developing agent precursor that releases a color developing agent when heated with a tetraalkylpiperidinyloxy oxidizer, color forming by reacting with color coupler
08/25/2005US20050186517 Overlay correction by reducing wafer slipping after alignment
08/25/2005US20050186516 Barrier film material and pattern formation method using the same
08/25/2005US20050186487 Blank has a phase shift film sputtered onto a radiation transparent substrate comprising two or more silicides, nitrides or oxynitrides of molybdenum, zirconium, tantalum and tungsten; lithographic processing and etching the mask; improved high energy radiation resistance, especially to ArF or F2 lasers
08/25/2005US20050186485 Forming layer of metal and silicon-containing compound film on transparent substrate by co-sputtering; photoresists; semiconductors; integrated circuits
08/25/2005US20050186484 Method for forming mask pattern of semiconductor device
08/24/2005CN1658068A Photolithographic process, photomask and manufacturing thereof
08/24/2005CN1216396C Method for manufacturing screen component on internal suface of panel of color CRT
08/23/2005US6933193 Method of forming a capacitor
08/23/2005US6933084 Alternating aperture phase shift photomask having light absorption layer
08/18/2005WO2004027822A3 Oriented nanostructures and methods of preparing
08/18/2005US20050183056 Simulator of lithography tool, simulation method, and computer program product for simulator
08/18/2005US20050181498 Multilayer body with a layer having at least one laser -sensitive material
08/18/2005US20050181315 Provides simplified data manipulation techniques for defining cross-sectional data representing layers of structure (microscale or mesoscale) that are to be formed where data takes the form of a plurality of adjacent and similarly oriented, elongated rectangular structures
08/18/2005US20050181297 Novel photosensitive resin compositions
08/18/2005US20050181293 Imprinting device and substrate holding device thereof
08/18/2005US20050181128 Films for optical use and methods of making such films
08/18/2005US20050180014 Films for optical use and methods of making such films
08/18/2005US20050179995 Films for optical use and methods of making such films
08/18/2005US20050179765 Watermarking method for motion picture image sequence
08/17/2005EP1563513A2 Method for the production of and protective layer for a layer of luminescent material
08/17/2005CN1215373C X ray intensifying screen and its preparation method
08/16/2005US6930698 Image formation on heat-developable light-sensitive material and image forming apparatus
08/16/2005US6929892 Method of monitoring an exposure process
08/11/2005WO2005073804A1 Silver halide color photographic light-sensitive material and color image-forming method
08/11/2005US20050175942 Exposing to infrared radiation, a presensitized plate comprising substrate and image recording layer formed thereon which comprises novolak resin containing xylenol monomer; alkaline developer comprises polyoxyalkylene adduct of alkylene diamine and anionic surfactant
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