Patents
Sitemap › G03 - Photography; Cinematography; Analogous techniques using waves other than optical waves; Electrography; Holography › G03C - Photosensitive materials for photographic purposes; Photographic processes, e.g. cine, x-ray, colour or stereo-photographic processes; Auxiliary processes in photography › G03C 5 - Photographic processes or agents therefor; Regeneration of such processing agents
Patents for G03C 5 - Photographic processes or agents therefor; Regeneration of such processing agents (11,726)
11/2005
11/17/2005WO2005109109A1 Charge control agent comprising a mixture of a triphenylmenthane compound and a tetraphenylmethane
11/17/2005US20050255390 Photomask for the manufacturing of reflective bumps
11/17/2005US20050255389 Phase shift mask and method of producing the same
11/17/2005US20050255387 Single exposure of mask levels having a lines and spaces array using alternating phase-shift mask
11/17/2005US20050255386 Mask for semiconductor (integrated circuits) manufacture composed of a layer with a chemical reaction interface that provides enhanced etch selectivity, especially a tunable, etch-resistant anti-reflective coating material.
11/16/2005EP1421162A4 Compositions for removing metal ions from aqueous process solutions and methods of use thereof
11/16/2005CN1698181A Method for forming pattern and method for manufacturing semiconductor device
11/16/2005CN1698011A Lithographic printing with polarized light
11/16/2005CN1696825A Camera for encoding audio signals
11/16/2005CN1227566C Silver halide emulsion, color photo sensitive material and imaging method thereof
11/15/2005US6964842 Black-and-white aqueous photothermographic materials
11/10/2005WO2005106583A1 Bleach concentrate composition for silver halide color- photographic materials, one-part type concentrate composition for replenishment color developers, and method of processing
11/10/2005WO2005106508A2 Diagnostic system for profiling micro-beams
11/10/2005US20050251781 Design pattern correcting method, design pattern forming method, process proximity effect correcting method, semiconductor device and design pattern correcting program
11/10/2005US20050250330 integrated circuit; diffusion barrier layer is covalently attached to the silicon substrate
11/10/2005US20050250057 Image forming method using photothermographic material
11/10/2005US20050250049 Bi-wavelength optical intensity modulators using materials with saturable absorptions
11/10/2005US20050250026 Overlay box structure for measuring process induced line shortening effect
11/10/2005US20050250025 Method and lithographic structure for measuring lengths of lines and spaces
11/10/2005US20050250022 Mask pattern correcting method, mask pattern inspecting method, photo mask manufacturing method, and semiconductor device manufacturing method
11/10/2005US20050250021 Orthogonal corners produced in a semiconductor device pattern to include one edge defined by a first mask and an orthogonal edge defined by a second mask; alleviate proximity effects
11/10/2005US20050250020 Mask, layout thereon and method therefor
11/10/2005US20050250019 Mask device for photolithography and application thereof
11/10/2005US20050247909 Process for reducing the passive layer from the surface of a metal
11/09/2005EP1594004A2 Barrier film material and pattern formation method using the same
11/09/2005CN1695083A Silver halide photosensitive material and image forming method therefor
11/09/2005CN1226197C Catalyzer for catalyzing wet oxidation in treating wastewater of sensitization glue, and its application
11/08/2005US6962763 Color films contains a color developing agent precursor that releases a color developing agent when heated with a tetraalkylpiperidinyloxy oxidizer, color forming by reacting with color coupler
11/03/2005US20050245088 Method for barc over-etch time adjust with real-time process feedback
11/03/2005US20050244763 Black and white photothermographic material and image forming method
11/03/2005US20050244760 Fog-density development in exposed areas of the image is imagewise inhibited by the presence of a density-inhibiting agent, especially a mercapto-functional compound
11/03/2005US20050244759 Bake apparatus for use in spin-coating equipment
11/03/2005US20050244755 Method of photolithographic production of polymer arrays
11/03/2005US20050244744 Method for forming temporary image
11/03/2005US20050244729 Method of measuring the overlay accuracy of a multi-exposure process
11/03/2005US20050244728 Quick mask design
11/03/2005US20050244726 Manufacturing method for exposure mask, generating method for mask substrate information, mask substrate, exposure mask, manufacturing method for semiconductor device and server
11/03/2005US20050244725 Apparatus and method for structure exposure of a photoreactive layer
11/03/2005US20050244724 Evaluation of pattern formation process, photo masks for the evaluation, and fabrication method of a semiconductor device with the evaluation process
11/03/2005US20050242301 Targeted radiation treatment using a spectrally selective radiation emitter
11/03/2005US20050242299 Diagnostic system for profiling micro-beams
11/02/2005EP1591829A1 Method for forming temporary image
11/02/2005CN1692311A Mask correcting method
11/02/2005CN1690864A Automatic developing apparatus and process for forming image using the same
11/02/2005CN1690863A Device manufacturing method
11/02/2005CN1690851A Chemical amplification positive photoresist compositions, (methyl) acrylate derivatives and method for preparing same
11/01/2005US6960413 Multi-step process for etching photomasks
11/01/2005CA2199299C Method of electrophotographically manufacturing a screen assembly
10/2005
10/27/2005WO2005101118A1 Photothermographic materials with improved natural age keeping
10/27/2005WO2005101112A2 Optical films and methods of making the same
10/27/2005US20050238999 Process for the manufacture of flexographic printing plates
10/27/2005US20050238970 Device manufacturing method
10/27/2005US20050238966 Photomasks having transparent and opaque, phase-shifting sections formed by trenches; photosenstivity; photoresists; etching; semiconductors
10/27/2005US20050238964 Photomask
10/27/2005US20050238351 Automatic developing apparatus and process for forming image using the same
10/26/2005EP1588221A2 A method of patterning photoresist on a wafer using a transmission mask with a carbon layer
10/25/2005US6958762 Filling an area of an image marked on a material with a laser
10/20/2005US20050233270 Photothermographic materials with improved natural age keeping
10/20/2005US20050233269 material comprising a support having a photosensitive silver halide, a non-photosensitive source of reducible silver ions, a reducing agent and an X-radiation-sensitive phosphor that is a rare earth phosphate, a yttrium phosphate, a strontium phosphate or a strontium fluoroborate
10/20/2005US20050233267 Multilayer; silver halide emulsion and protective colloid on radiation transparent support
10/20/2005US20050233265 Photosensitive thermal development recording material, its case, and developing method and production process of photosensitive thermal recording material
10/20/2005US20050233262 surface plasmon resonance as a result of coupling surface plasmon with light; a pattern having a dimension smaller than a half or less of a wavelength of light can be transferred to a resist without requiring closely contact of the resist with the mask
10/20/2005US20050233257 Forming amorphous carbon layer on semiconductor stack; etching; elimination of intermediate layer
10/20/2005US20050233253 Diphenylsulfonium compounds in which the S atom is additionally attached to a xanthene-9-onyl-2-yl- or coumarin-7-yl- ring; acid generator for a chemically amplified resist; photopolymerization initiator for polymerizing an epoxide or a vinyl ether
10/20/2005US20050233227 Methods for improving angled line feature accuracy and throughput using electron beam lithography and electron beam lithography system
10/20/2005US20050233225 Ultraviolet exposure irradiates from excimer laser or an fluorine gas laser; contains evaluation section with growable substance
10/20/2005US20050233223 Method for using asymmetric OPC structures on line ends of semiconductor pattern layers
10/20/2005US20050232000 Method of making information storage devices by molecular photolithography
10/19/2005EP1586008A2 Binary half tone photomasks and microscopic three-dimensional devices and method of fabricating the same
10/19/2005CN1684228A Optic micro distance correcting method
10/19/2005CN1223897C Photosensitive silver halide material for photographing
10/18/2005US6956694 Broad spectrum ultraviolet inspection systems employing catadioptric imaging
10/18/2005US6955993 Mask and method for making the same, and method for making semiconductor device
10/13/2005WO2005040924A3 Photoresist coating process for microlithography
10/13/2005US20050227188 Silver halide photosensitive material and method of forming image
10/13/2005US20050227183 Compositions and methods for image development of conventional chemically amplified photoresists
10/13/2005US20050227153 Mask for proximity field optical exposure, exposure apparatus and method therefor
10/13/2005US20050226390 Connection between x-ray sensor and holder
10/13/2005DE102004014482A1 Verfahren zum Erweitern von Limitierungen für Strukturweiten beim Herstellungsprozess von Fotomasken Method for upgrading of limitations for feature sizes in the manufacturing process of photomasks
10/12/2005EP1584978A1 Photothermographic material and image forming method
10/12/2005EP1583997A2 Photoresist removal
10/12/2005CN1681086A Resist pattern formation method, patterned substrate manufacturing method, and display device making method
10/06/2005WO2005092025A2 Methods and systems for measuring a characteristic of a substrate or preparing a substrate for analysis
10/06/2005US20050221560 Method of forming a vertical memory device with a rectangular trench
10/06/2005US20050221241 Photothermographic material and image forming method
10/06/2005US20050221229 Methods and systems for measuring a characteristic of a substrate or preparing a substrate for analysis
10/06/2005US20050221216 Silver halide color photographic sensitive material and it image forming method
10/06/2005US20050221208 Resist pattern formation method, patterned substrate manufacturing method, and resist pattern formation apparatus
10/06/2005US20050221207 Method and apparatus for monitoring exposure process
10/06/2005US20050221204 control the writing dimension of a pattern; correction of foggy effect; manufacturing a semiconductor device and a liquid crystal display with fine and complicated patterns
10/06/2005US20050221019 Method of improving the uniformity of a patterned resist on a photomask
10/06/2005US20050220272 Wireless digital dental x-ray sensor with positioning apparatus
10/05/2005EP1582918A1 Photothermographic material and image forming method
10/05/2005CN1677248A Photoresist stripping agent composition
10/05/2005CN1221851C 卤化银照相材料 The silver halide photographic material
10/04/2005US6952294 exposing a color photosensitive material having at least three layers containing blue-, green- and red-photosensitive silver halide emulsions, transparent support; a developing agent, fixing agent
10/04/2005US6951696 Transfer sheet
10/04/2005US6951173 method of transferring includes dispensing a selected volume of imprinting fluid onto the template transfer substrate, placing template upon the selected volume and converting the imprinting fluid to solid imprint material
09/2005
09/29/2005WO2005090931A1 Embedded attenuated phase shift mask with tunable transmission
09/29/2005WO2005048287A3 Phosphor screen and imaging assembly
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