Patents for G03C 5 - Photographic processes or agents therefor; Regeneration of such processing agents (11,726)
02/2005
02/16/2005CN1581437A Optical mask, method for making figure and method for making semiconductor device
02/15/2005US6857109 Short edge smoothing for enhanced scatter bar placement
02/15/2005US6856225 Photolithographically-patterned out-of-plane coil structures and method of making
02/15/2005US6855481 Apparatus and a method for forming a pattern using a crystal structure of material
02/15/2005US6855259 Process for reducing the passive layer from the surface of a metal
02/10/2005WO2005013007A1 Further method to pattern a substrate
02/10/2005WO2005013006A1 Psm alignment method and device
02/10/2005WO2005011992A1 Process for providing marking on security papers
02/10/2005WO2004079779A3 A method of patterning photoresist on a wafer using an attenuated phase shift mask
02/10/2005US20050032006 photographic films for providing images with superior graininess and enhanced sharpness, comprising support blue-sensitive, green-sensitive and red-sensitive silver emulsion layers, containing yellow dye, magenta dye and cyan dye forming couplers respectively; interimage effects
02/10/2005US20050032003 Multiple exposure method for forming a patterned photoresist layer
02/10/2005US20050032002 tuning doses applied in passes of a multipass writing strategy to measurable characteristics of resists or radiation sensitive layers applied to the substrates
02/10/2005US20050031976 Adjusting shape utilizing design and vicinity patterns
02/10/2005US20050031974 Ensuring uniform illumination of exposure tool; coating with resist film, generating patterns and comparing to reference image to detect abnormalities
02/10/2005US20050031968 Utilizing photolithographic master and slave mask set; simple, low cost technique for correcting errors; adjusts to varying wafer positions
02/10/2005US20050031967 Photomask, method for fabricating a pattern and method for manufacturing a semiconductor device
02/10/2005US20050031966 Method to improve photomask critical dimension uniformity and photomask fabrication process
02/09/2005EP1504917A1 Process for providing marking on security papers
02/09/2005EP1504793A2 X-ray imaging cassette for radiotherapy
02/09/2005CN1577722A Image correcting method , system and program. mask, semiconductor producing method and design pattern
02/08/2005US6852477 Photographic peracid bleaching composition, processing kit, and method of use
02/03/2005WO2004083960A3 Alternating aperture phase shift photomask having light absorption layer
02/03/2005US20050026093 Photothermographic material and image forming method
02/03/2005US20050026092 Carbonate, bicarbonate and alkali silicate; permits the formation of images excellent in printing durability, without using any heat-treatment after the exposure of the image-forming material
02/03/2005US20050026088 wherein base comprises a biaxially stretched, semicrystalline film base of a PET-based polyester material comprising one or more polyester resins in which total level of repeat units derived from 1,4-cyclohexane dimethanol is 65 to 100 mol %
02/03/2005US20050026050 Exposure mask and mask pattern production method
02/03/2005US20050026049 Method for forming an opening on an alternating phase shift mask
02/03/2005US20050026048 Proximity correcting lithography mask blanks
02/03/2005US20050026047 comprises line-shaped features and ladder-shaped assists; improved image contrast, resolution, and uniformity
02/03/2005US20050026004 Prevent electrochemical corrosion of reflective panels; multiayer with electroconductive support, reflective layer, phosphor protective coating
02/03/2005US20050024618 Method and apparatus for amplitude filtering in the frequency plane of a lithographic projection system
02/03/2005US20050024469 Image formation on heat-developable light-sensitive material and image forming apparatus
02/03/2005US20050023494 Scintillator panel, method of manufacturing scintillator panel, radiation detection device, and radiation detection system
02/03/2005US20050023493 Scintillator panel, method of manufacturing scintillator panel, radiation detection device, and radiation detection system
02/03/2005US20050023485 X-ray imaging cassette for radiotherapy
02/02/2005EP1503247A2 Image-forming method and developer
02/02/2005EP1501688A1 Multilayer image, particularly a multicolor image
02/02/2005CN1574364A Memory array with loop line pattern structure and fabricating method thereof
02/02/2005CN1573558A Light mask manufacturing method capable of avoiding electron beam offset due to charge effect
02/02/2005CN1573538A Attenuated phase shifting mask having embedded bi-layer structure for and method for making same
02/02/2005CN1573537A Method for preparing bleach-fixing processing solution for silver halide color photographic light sensitive material, starter for concentrated bleach-fixing composition and method for processing of ph
02/01/2005US6849858 Apparatus and method for forming alignment layers
02/01/2005US6849393 Phase shifting lithographic process
02/01/2005US6849392 Thermally developable emulsions and materials containing triazine-thione compounds
02/01/2005US6849366 Systems and methods for film processing quality control
01/2005
01/27/2005WO2005008850A2 Spatial and temporal selective laser assisted fault localization
01/27/2005US20050022150 Optical proximity correction method
01/27/2005US20050019706 Method for developing multilayer imageable elements
01/27/2005US20050019675 Lithographic apparatus, device manufacturing method, and mask
01/27/2005US20050019674 Suppress the loading effect and achieve a high CD (critical dimension) accuracy when forming a highly accurate pattern by dry etching; photomask blank having, on the light-transmissive substrate, a chromium film, an etching mask film having a resistance against etching of the chromium film, and a resist
01/27/2005US20050018317 Optical lens and method of producing the same, method of producing optical lens array, focus error signal production method, and optical pickup apparatus
01/27/2005DE10327613A1 Formation of preferably square hole on an alternating phase mask useful in electronics for the lithographic structuring of contact planes in preparation of integrated circuits, and in semiconductor technology
01/26/2005EP1208150A4 Image making medium
01/26/2005EP0898732B1 Black-and-white photothermographic and thermographic elements comprising 3-heteroaromatic-substituted acrylonitrile compounds as co-developers
01/20/2005WO2004065287A3 A method of patterning photoresist on a wafer using a transmission mask with a carbon layer
01/20/2005US20050014076 Method of generating mask distortion data, exposure method and method of producing semiconductor device
01/20/2005US20050014075 Phase edge darkening binary masks
01/20/2005US20050014074 Generating mask patterns for alternating phase-shift mask lithography
01/20/2005DE10359626A1 Simultaneous replenishment system for use in automated color photographic processing has developer-replenishing vessel containing more than 60 g developer per liter vessel volume and at least two bleach-fixing bath replenishers
01/19/2005CN1568443A Process for preparing p-phenylenediamine color developers in a concentrated free-base form
01/18/2005US6844145 High-speed thermally developable imaging materials and methods of using same
01/18/2005US6844141 Method for developing multilayer imageable elements
01/18/2005US6843923 Compositions for removing metal ions from aqueous process solutions and methods of use thereof
01/13/2005WO2004092832A3 Determination of center of focus by parameter variability analysis
01/13/2005US20050008981 Digital film processing method
01/13/2005US20050008980 An abrasive sheet includs a substrate having two second major surfaces, an abrasive on the first surface, and hooking stems on the second; the stems are adapted to hook engaging structures on an opposed surface to releasably affix abrasive sheet to the surface
01/13/2005US20050008976 Method of manufacturing an electronic device
01/13/2005US20050008953 Design feature can be introduced into layout prior to correstion then removed prior to tapping of pattern onto reticle; printing design inot radiation sensitive material
01/13/2005US20050008952 Methods of forming patterned reticles
01/13/2005US20050008951 Methods of forming patterned reticles
01/13/2005US20050008950 Methods of forming patterned reticles
01/13/2005US20050008949 Methods of forming patterned reticles
01/13/2005US20050008946 Mask for charged particle beam exposure, and method of forming the same
01/13/2005US20050008945 plasma/dry etching; photolithographic reticle; oxygen-free gas etches anti-reflective coating and patterned photoresistive material; integrated circuits
01/13/2005US20050008943 Partial edge bead removal to allow improved grounding during e-beam mask writing
01/13/2005US20050008846 Composite mask for producing a diffuser
01/13/2005US20050006602 Synchronization of laser; positioning defects; semiconductors; process control
01/13/2005DE10309266B3 Verfahren zum Bilden einer Öffnung einer Licht absorbierenden Schicht auf einer Maske A method of forming an opening of a light-absorbing layer on a mask
01/12/2005EP1496394A2 Reticle, semiconductor exposure apparatus and method, and semiconductor device manufacturing method
01/11/2005US6842889 Methods of forming patterned reticles
01/11/2005US6842296 Optical lens and method of producing the same, method of producing optical lens array, focus error signal production method, and optical pickup apparatus
01/11/2005US6841322 Detecting erosion in collector optics with plasma sources in extreme ultraviolet (EUV) lithography systems
01/06/2005WO2005001901A2 Wet developable hard mask in conjunction with thin photoresist for micro photolithography
01/06/2005WO2005001898A2 Method of designing a reticle and forming a semiconductor device therewith
01/06/2005WO2005001567A1 Highly reflectivesubstrates for the digital processing of photopolymer printing plates
01/06/2005WO2005001565A1 Photothermographic materials with improved image tone
01/06/2005WO2005001432A2 Optical fluids, and systems and methods of making and using the same
01/06/2005US20050003314 Image forming method using a silver halide color photographic light-sensitive material, and silver halide color photographic light-sensitive material
01/06/2005US20050003313 Radiographic silver halide photographic material having excellent preservation characteristics
01/06/2005US20050003305 Photo mask, exposure method using the same, and method of generating data
01/06/2005US20050003295 Flexible substrate containing grooves, recesses
01/06/2005US20050003280 Exposure to adjustment design pattern; shaping inclined edge zones; measurement calibration; drawing pattern using electron beams
01/06/2005US20050003279 Positioning mask on semiconductor wafer; exposure; fading zones
01/06/2005US20050003278 Photomask for forming photoresist patterns repeating in two dimensions and method of fabricating the same
01/06/2005US20050001853 Compositing two-dimensional and three-dimensional image layers
01/06/2005US20050001419 Color laser engraving and digital watermarking
01/06/2005US20050001177 Apparatus and method for forming alignment layers
01/05/2005DE10327268A1 Vorrichtung zur Erkennung der Position und des Formats einer Filmkassette Apparatus for detecting the position and the format of a film cassette
01/05/2005CN1183421C Developing processing of low silver black-and-white photograph component
01/04/2005US6838233 Method of color photographic processing for color photographic papers
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