Patents for G03C 5 - Photographic processes or agents therefor; Regeneration of such processing agents (11,726) |
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02/16/2005 | CN1581437A Optical mask, method for making figure and method for making semiconductor device |
02/15/2005 | US6857109 Short edge smoothing for enhanced scatter bar placement |
02/15/2005 | US6856225 Photolithographically-patterned out-of-plane coil structures and method of making |
02/15/2005 | US6855481 Apparatus and a method for forming a pattern using a crystal structure of material |
02/15/2005 | US6855259 Process for reducing the passive layer from the surface of a metal |
02/10/2005 | WO2005013007A1 Further method to pattern a substrate |
02/10/2005 | WO2005013006A1 Psm alignment method and device |
02/10/2005 | WO2005011992A1 Process for providing marking on security papers |
02/10/2005 | WO2004079779A3 A method of patterning photoresist on a wafer using an attenuated phase shift mask |
02/10/2005 | US20050032006 photographic films for providing images with superior graininess and enhanced sharpness, comprising support blue-sensitive, green-sensitive and red-sensitive silver emulsion layers, containing yellow dye, magenta dye and cyan dye forming couplers respectively; interimage effects |
02/10/2005 | US20050032003 Multiple exposure method for forming a patterned photoresist layer |
02/10/2005 | US20050032002 tuning doses applied in passes of a multipass writing strategy to measurable characteristics of resists or radiation sensitive layers applied to the substrates |
02/10/2005 | US20050031976 Adjusting shape utilizing design and vicinity patterns |
02/10/2005 | US20050031974 Ensuring uniform illumination of exposure tool; coating with resist film, generating patterns and comparing to reference image to detect abnormalities |
02/10/2005 | US20050031968 Utilizing photolithographic master and slave mask set; simple, low cost technique for correcting errors; adjusts to varying wafer positions |
02/10/2005 | US20050031967 Photomask, method for fabricating a pattern and method for manufacturing a semiconductor device |
02/10/2005 | US20050031966 Method to improve photomask critical dimension uniformity and photomask fabrication process |
02/09/2005 | EP1504917A1 Process for providing marking on security papers |
02/09/2005 | EP1504793A2 X-ray imaging cassette for radiotherapy |
02/09/2005 | CN1577722A Image correcting method , system and program. mask, semiconductor producing method and design pattern |
02/08/2005 | US6852477 Photographic peracid bleaching composition, processing kit, and method of use |
02/03/2005 | WO2004083960A3 Alternating aperture phase shift photomask having light absorption layer |
02/03/2005 | US20050026093 Photothermographic material and image forming method |
02/03/2005 | US20050026092 Carbonate, bicarbonate and alkali silicate; permits the formation of images excellent in printing durability, without using any heat-treatment after the exposure of the image-forming material |
02/03/2005 | US20050026088 wherein base comprises a biaxially stretched, semicrystalline film base of a PET-based polyester material comprising one or more polyester resins in which total level of repeat units derived from 1,4-cyclohexane dimethanol is 65 to 100 mol % |
02/03/2005 | US20050026050 Exposure mask and mask pattern production method |
02/03/2005 | US20050026049 Method for forming an opening on an alternating phase shift mask |
02/03/2005 | US20050026048 Proximity correcting lithography mask blanks |
02/03/2005 | US20050026047 comprises line-shaped features and ladder-shaped assists; improved image contrast, resolution, and uniformity |
02/03/2005 | US20050026004 Prevent electrochemical corrosion of reflective panels; multiayer with electroconductive support, reflective layer, phosphor protective coating |
02/03/2005 | US20050024618 Method and apparatus for amplitude filtering in the frequency plane of a lithographic projection system |
02/03/2005 | US20050024469 Image formation on heat-developable light-sensitive material and image forming apparatus |
02/03/2005 | US20050023494 Scintillator panel, method of manufacturing scintillator panel, radiation detection device, and radiation detection system |
02/03/2005 | US20050023493 Scintillator panel, method of manufacturing scintillator panel, radiation detection device, and radiation detection system |
02/03/2005 | US20050023485 X-ray imaging cassette for radiotherapy |
02/02/2005 | EP1503247A2 Image-forming method and developer |
02/02/2005 | EP1501688A1 Multilayer image, particularly a multicolor image |
02/02/2005 | CN1574364A Memory array with loop line pattern structure and fabricating method thereof |
02/02/2005 | CN1573558A Light mask manufacturing method capable of avoiding electron beam offset due to charge effect |
02/02/2005 | CN1573538A Attenuated phase shifting mask having embedded bi-layer structure for and method for making same |
02/02/2005 | CN1573537A Method for preparing bleach-fixing processing solution for silver halide color photographic light sensitive material, starter for concentrated bleach-fixing composition and method for processing of ph |
02/01/2005 | US6849858 Apparatus and method for forming alignment layers |
02/01/2005 | US6849393 Phase shifting lithographic process |
02/01/2005 | US6849392 Thermally developable emulsions and materials containing triazine-thione compounds |
02/01/2005 | US6849366 Systems and methods for film processing quality control |
01/27/2005 | WO2005008850A2 Spatial and temporal selective laser assisted fault localization |
01/27/2005 | US20050022150 Optical proximity correction method |
01/27/2005 | US20050019706 Method for developing multilayer imageable elements |
01/27/2005 | US20050019675 Lithographic apparatus, device manufacturing method, and mask |
01/27/2005 | US20050019674 Suppress the loading effect and achieve a high CD (critical dimension) accuracy when forming a highly accurate pattern by dry etching; photomask blank having, on the light-transmissive substrate, a chromium film, an etching mask film having a resistance against etching of the chromium film, and a resist |
01/27/2005 | US20050018317 Optical lens and method of producing the same, method of producing optical lens array, focus error signal production method, and optical pickup apparatus |
01/27/2005 | DE10327613A1 Formation of preferably square hole on an alternating phase mask useful in electronics for the lithographic structuring of contact planes in preparation of integrated circuits, and in semiconductor technology |
01/26/2005 | EP1208150A4 Image making medium |
01/26/2005 | EP0898732B1 Black-and-white photothermographic and thermographic elements comprising 3-heteroaromatic-substituted acrylonitrile compounds as co-developers |
01/20/2005 | WO2004065287A3 A method of patterning photoresist on a wafer using a transmission mask with a carbon layer |
01/20/2005 | US20050014076 Method of generating mask distortion data, exposure method and method of producing semiconductor device |
01/20/2005 | US20050014075 Phase edge darkening binary masks |
01/20/2005 | US20050014074 Generating mask patterns for alternating phase-shift mask lithography |
01/20/2005 | DE10359626A1 Simultaneous replenishment system for use in automated color photographic processing has developer-replenishing vessel containing more than 60 g developer per liter vessel volume and at least two bleach-fixing bath replenishers |
01/19/2005 | CN1568443A Process for preparing p-phenylenediamine color developers in a concentrated free-base form |
01/18/2005 | US6844145 High-speed thermally developable imaging materials and methods of using same |
01/18/2005 | US6844141 Method for developing multilayer imageable elements |
01/18/2005 | US6843923 Compositions for removing metal ions from aqueous process solutions and methods of use thereof |
01/13/2005 | WO2004092832A3 Determination of center of focus by parameter variability analysis |
01/13/2005 | US20050008981 Digital film processing method |
01/13/2005 | US20050008980 An abrasive sheet includs a substrate having two second major surfaces, an abrasive on the first surface, and hooking stems on the second; the stems are adapted to hook engaging structures on an opposed surface to releasably affix abrasive sheet to the surface |
01/13/2005 | US20050008976 Method of manufacturing an electronic device |
01/13/2005 | US20050008953 Design feature can be introduced into layout prior to correstion then removed prior to tapping of pattern onto reticle; printing design inot radiation sensitive material |
01/13/2005 | US20050008952 Methods of forming patterned reticles |
01/13/2005 | US20050008951 Methods of forming patterned reticles |
01/13/2005 | US20050008950 Methods of forming patterned reticles |
01/13/2005 | US20050008949 Methods of forming patterned reticles |
01/13/2005 | US20050008946 Mask for charged particle beam exposure, and method of forming the same |
01/13/2005 | US20050008945 plasma/dry etching; photolithographic reticle; oxygen-free gas etches anti-reflective coating and patterned photoresistive material; integrated circuits |
01/13/2005 | US20050008943 Partial edge bead removal to allow improved grounding during e-beam mask writing |
01/13/2005 | US20050008846 Composite mask for producing a diffuser |
01/13/2005 | US20050006602 Synchronization of laser; positioning defects; semiconductors; process control |
01/13/2005 | DE10309266B3 Verfahren zum Bilden einer Öffnung einer Licht absorbierenden Schicht auf einer Maske A method of forming an opening of a light-absorbing layer on a mask |
01/12/2005 | EP1496394A2 Reticle, semiconductor exposure apparatus and method, and semiconductor device manufacturing method |
01/11/2005 | US6842889 Methods of forming patterned reticles |
01/11/2005 | US6842296 Optical lens and method of producing the same, method of producing optical lens array, focus error signal production method, and optical pickup apparatus |
01/11/2005 | US6841322 Detecting erosion in collector optics with plasma sources in extreme ultraviolet (EUV) lithography systems |
01/06/2005 | WO2005001901A2 Wet developable hard mask in conjunction with thin photoresist for micro photolithography |
01/06/2005 | WO2005001898A2 Method of designing a reticle and forming a semiconductor device therewith |
01/06/2005 | WO2005001567A1 Highly reflectivesubstrates for the digital processing of photopolymer printing plates |
01/06/2005 | WO2005001565A1 Photothermographic materials with improved image tone |
01/06/2005 | WO2005001432A2 Optical fluids, and systems and methods of making and using the same |
01/06/2005 | US20050003314 Image forming method using a silver halide color photographic light-sensitive material, and silver halide color photographic light-sensitive material |
01/06/2005 | US20050003313 Radiographic silver halide photographic material having excellent preservation characteristics |
01/06/2005 | US20050003305 Photo mask, exposure method using the same, and method of generating data |
01/06/2005 | US20050003295 Flexible substrate containing grooves, recesses |
01/06/2005 | US20050003280 Exposure to adjustment design pattern; shaping inclined edge zones; measurement calibration; drawing pattern using electron beams |
01/06/2005 | US20050003279 Positioning mask on semiconductor wafer; exposure; fading zones |
01/06/2005 | US20050003278 Photomask for forming photoresist patterns repeating in two dimensions and method of fabricating the same |
01/06/2005 | US20050001853 Compositing two-dimensional and three-dimensional image layers |
01/06/2005 | US20050001419 Color laser engraving and digital watermarking |
01/06/2005 | US20050001177 Apparatus and method for forming alignment layers |
01/05/2005 | DE10327268A1 Vorrichtung zur Erkennung der Position und des Formats einer Filmkassette Apparatus for detecting the position and the format of a film cassette |
01/05/2005 | CN1183421C Developing processing of low silver black-and-white photograph component |
01/04/2005 | US6838233 Method of color photographic processing for color photographic papers |