Patents for G03C 5 - Photographic processes or agents therefor; Regeneration of such processing agents (11,726)
07/2005
07/05/2005US6913866 Multicolor image-forming material and multicolor image-forming method
07/05/2005US6913857 Reduced deformation due to heat generation
06/2005
06/30/2005WO2005024325A3 Method and system for drying a substrate
06/30/2005US20050142492 For application to surfaces of buildings
06/30/2005US20050142462 Mask, method of production of same, and method of production of semiconductor device
06/30/2005US20050142461 Photo mask and method for fabricating the same
06/30/2005US20050142459 Line photo masks and methods of forming semiconductor devices using the same
06/30/2005US20050142458 Exposure mask and exposure method using the same
06/30/2005US20050142457 Improving line resolution by using an overlapping exposing process; pattern bridges can be completely removed by the overlapping exposing process
06/30/2005US20050142454 Grid with a space smaller than a minimum pitch allowed by a design rule, and provides hole patterns at lattice points, which are the intersections of the grid; semiconductor integrated circuit manufacturing; flexibility of hole pattern arrangement and quality of hole pattern arrangement easily evaluated
06/29/2005EP1548496A1 Container for photographic processing chemistry
06/29/2005EP1547938A1 Two compartment container for photographic developers
06/29/2005EP1240549B1 Reference card
06/28/2005US6911654 Scintillator panel, method of manufacturing scintillator panel, radiation detection device, and radiation detection system
06/28/2005US6911305 Bioassays incorporate film with chemiluminescent precursor immobilized therewith; polynucleotide/DNA analysis; kits
06/28/2005US6911301 Methods of forming aligned structures with radiation-sensitive material
06/28/2005US6911285 Sidelobe correction for attenuated phase shift masks
06/28/2005US6910816 Digital film processing method
06/23/2005US20050136363 Stabilizers for use in thermographic recording materials
06/23/2005US20050136341 Designing and forming the auxiliary pattern according to the density function so as to prevent local or global variations between the desired critical dimension (CD) and actual CD from occurring
06/23/2005US20050136339 A before-correction pattern edge defining step, a deviated position setting step, an edge selecting step, a correcting step, after-correction pattern edge defining step
06/23/2005US20050136338 Using a photomask that can prevent critical dimension biases of pattern images of different pattern densities while forming a circuit pattern
06/23/2005US20050136335 Sequential linewidth measurement and trimming of a patterned mask layer to form multiply trimmed patterned mask layer; precise linewidth control
06/23/2005US20050135564 Drawer for X-ray detectors
06/23/2005US20050133533 Package for photographic processing chemicals
06/23/2005US20050133530 Package for photographic processing chemicals
06/23/2005DE19735755B4 Verfahren zur Herstellung einer lithographischen Druckplatte A process for producing a lithographic printing plate
06/23/2005DE102004049735A1 Mask for microlithographic projection exposure apparatus, has pattern of opaque structures applied on support, where intermediate spaces between bar-like structures of opaque structures are filled with dielectric material
06/22/2005CN1630035A Pattern formation method
06/22/2005CN1207630C Water-compensating method of treatment liquid and photographic developing machine
06/22/2005CN1207627C Process for removing stain in photographic material
06/21/2005US6910014 System for playing pre-recorded audio encoded in infra-red ink on a card
06/21/2005US6908728 Laser marking on photosensitive material and photosensitive material including the marking
06/21/2005US6908713 EUV mask blank defect mitigation
06/16/2005WO2005026839A3 Phthalocyanine precursors in infrared sensitive compositions
06/16/2005US20050132322 Mask evaluating method, mask evaluating system, method of manufacturing mask and computer program product
06/16/2005US20050130081 Method of forming color image
06/16/2005US20050130072 Sawtooth grating groove the vertex of which has an assured sharpness to attain a high diffraction efficiency and provide the two surfaces forming the vertex with an enhanced linearity and the reflective surface of which has a reduced roughness to eliminate scattered light; Two step etching
06/16/2005US20050130071 Method for fabricating image sensor with inorganic microlens
06/16/2005US20050130067 Pattern formation method
06/16/2005US20050130055 Method and removing resist pattern
06/16/2005US20050129179 Intraoral radiographic dental x-ray packets having non-lead radiation shielding
06/15/2005EP1051664A4 Method for forming a critical dimension test structure and its use
06/15/2005CN1627193A Method of removing resist pattern
06/14/2005US6906215 Powdery s,s-ethylenediamine-n,n′-disuccinic acid iron complex and process for producing the same
06/14/2005US6905811 Overcoating photoresist substrate; electron beam exposure; computer control; heat treatment, development
06/14/2005US6905802 Writing exposure to blanket photoresist; overlapping patterns; attenuation phase shifting
06/14/2005US6905801 Lithography; masking absorber anisotropic etching; reflective multilayer; forming ruthenium layer then absorber
06/14/2005US6905761 Transparent film-forming compositions for magnetic recording
06/09/2005US20050123866 negative/postive films; digital imaging
06/09/2005US20050123865 Single-part bleach-fixing composition and method of processing
06/09/2005US20050123864 Filling an area of an image marked on a product with a laser
06/09/2005US20050123862 Photoimaging using a hybrid organic-inorganic polymer such as POSS (Polyhedral Oligomeric Silsesquioxane)-based polymers and multi-photon exposure; making waveguides for example; polysilsesquioxanes can be used in high temperature process without decomposing
06/09/2005US20050123860 Dielectric with fluorescent material
06/09/2005US20050123856 Solvent development replaced by heat; selectively exposing to actinic radiation a layer of photopolymer on a relatively thin metal backed printing plate element, heating to selectively soften or melt the photopolymer layer and then blotting to absorb the melt and form a relief image
06/09/2005US20050123845 Method of adjusting deviation of critical dimension of patterns
06/09/2005US20050123843 Analytical determination of position of an object with alignment marks; projector
06/09/2005US20050123840 Opaque pattern consists of electrically conductive material; has a higher diffraction efficiency for projection wavelength polarised parallel to the structures than for projection light of the same wavelength polarised perpendicular; intermediate spaces filled withliquid and solid dielectrics
06/09/2005US20050123837 Photomask features with interior nonprinting window using alternating phase shifting
06/09/2005DE102004053563A1 Photomaske und Verfahren zum Bilden eines Musters Photo mask and method for forming a pattern
06/08/2005EP1537445A2 Nanocomposites
06/08/2005CN1205513C Method for improving photolithography analyticity
06/07/2005US6903800 Capable of optimally processing a film such as an insulation film between layers on a surface of an object to be processed, e.g., a semiconductor wafer
06/07/2005US6902876 Concentrated color developer composition used for silver halide photographic material and processing method by use thereof
06/07/2005US6902851 Method for using phase-shifting mask
06/02/2005WO2005050315A1 High-speed radiographic film
06/02/2005WO2005050314A1 Ultrahigh speed imaging assembly for radiography
06/02/2005WO2005050313A1 High speed radiographic imaging assembly
06/02/2005WO2005050312A2 High speed imaging assembly for radiography
06/02/2005WO2005050311A1 Stabilized high-speed emulsions and photothermographic materials
06/02/2005WO2004094967A3 Composition and method for 3-dimensional mapping or radiation dose
06/02/2005US20050118542 50% or more of a total projected area of photosensitive silver halide grains is occupied by tabular grains having an aspect ratio of 2 or more
06/02/2005US20050118541 Maintenance of photoresist adhesion and activity on the surface of dielectric ARCS for 90 nm feature sizes
06/02/2005US20050118540 Adding colloidal silica into backings of photosensitive material; controlling surface electrical resistance; with fluorine containing surfactant
06/02/2005US20050118539 Developer contains a divalent-trivalent iron salt in a dissolved state; for color and black and white photography
06/02/2005US20050118537 Multi-layer, multi-color image of a substrate comprising paper material and a single- or multi-layer structure applied thereto using a transfer film, preferably a hot stamping film, or a laminating film; high level of safeguard with respect to forgery
06/02/2005US20050118515 Binary half tone photomasks and microscopic three-dimensional devices and method of fabricating the same
06/01/2005CN1622943A Heterocycle-bearing onium salts
06/01/2005CN1204617C Self-alignment process capable of making subcritical contact with wire
05/2005
05/31/2005US6901576 Phase-width balanced alternating phase shift mask design
05/31/2005US6901045 Optical lens and method of producing the same, method of producing optical lens array, focus error signal production method, and optical pickup apparatus
05/31/2005US6900004 Concentrated color developer composition used for silver halide photographic sensitized material and processing method by use thereof
05/26/2005WO2005048287A2 Phosphor screen and imaging assembly
05/26/2005WO2005008850A3 Spatial and temporal selective laser assisted fault localization
05/26/2005US20050112511 Design assures complete emptying of the container by permitting simultaneous refill of single part developer through two valves
05/26/2005US20050112476 Phase-shift mask and fabrication thereof
05/26/2005US20050112475 Monitoring pattern configured to obtain information required for adjusting optical system; asymmetrical diffraction grating generates positive first order diffracted light and negative first order diffracted light; probing phase shifters
05/26/2005US20050112473 Transparent regions between two adjacent shielding regions and one depression; shielding pattern made of slightly translucent molybdenum silicide
05/26/2005US20050109992 Using mixture of water and polyether nonionic surfactant
05/25/2005EP1533655A2 Radiation image conversion panel and preparation method thereof
05/25/2005EP1532484A2 Lithographic printing with polarized light
05/25/2005DE10346681A1 Film/foil system, for radiography, has a housing containing the X-ray film with a shrouding between it and an outer scintillator layer which gives a visible light intensity distribution according to the X-ray intensity distribution
05/25/2005CN1620632A Optical proximity correction for phase shifting photolithographic masks
05/25/2005CN1620631A Single part color photographic developer concentrate
05/25/2005CN1619416A Exposure mask, method for manufacturing the mask, and exposure method
05/25/2005CN1203525C Exposure mask, method for manufacturing the mask, and exposure method
05/24/2005US6897939 Exposure apparatus
05/19/2005WO2004066028A3 Method for process optimization and control by comparison between 2 or more measured scatterometry signals
05/19/2005US20050106515 Photothermographic material
05/19/2005US20050106514 comprising a binder, a photosensitive silver halide, a non-photosensitive source of reducible silver ions that includes a silver salt of a compound containing an imino group, an ascorbic acid or reductone reducing agent for the non-photosensitive reducible silver ions, and a polycarboxylic acid
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