| Patents for G03C 5 - Photographic processes or agents therefor; Regeneration of such processing agents (11,726) |
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| 11/09/2004 | US6815155 Radiographic imaging system and silver halide photographic material |
| 11/09/2004 | US6815138 Comprises modified polyglycerol layer and diazo coupler; microcapsulation; improved color dispersion, radiation transparency, and glossiness |
| 11/09/2004 | US6815127 Scanning through gap in sample capacitor with pulsed, focused beam of radation; measuring photoelectron response; recording signals from radio frequency photoconductor |
| 11/04/2004 | WO2004095133A1 Method of forming image with silver halide color photographic lightsensitive material and silver halide color photographic lightsensitive material |
| 11/04/2004 | WO2004094967A2 Composition and method for 3-dimensional mapping or radiation dose |
| 11/04/2004 | US20040219461 Parallelism adjustment device |
| 11/04/2004 | US20040219439 Reticle set, method for designing a reticle set, exposure monitoring method, inspection method for reticle set and manufacturing method for a semiconductor device |
| 11/04/2004 | US20040219437 EUV (extreme ultraviolet lithography) is transmitted onto reflection mask at grazing incident angle to develop a pattern image to a photoresist layer on surface of wafer; shape is dependent on plurality of reflective regions; controlling surface roughness and defects |
| 11/04/2004 | US20040219435 Projecting light through a photomask using an optical projection system, sub-resolution features in clear areas adjacent to lines and spaces reduce transparency of the clear areas reduce light scattering and flare, greater degree of defocus in the pattern, less resist stripping |
| 11/04/2004 | US20040218033 Photothermographic material and image forming method |
| 11/04/2004 | US20040217435 Mask and method for making the same, and method for making semiconductor device |
| 11/03/2004 | EP1070279B1 Single part color photographic processing slurry |
| 11/03/2004 | CN1174282C Apparatus for production of long period optical fiber gratings |
| 11/02/2004 | US6812951 Image recording method and apparatus with density control |
| 11/02/2004 | US6812129 Reticle for creating resist-filled vias in a dual damascene process |
| 11/02/2004 | US6811946 Multicolor image-forming material and multicolor image-forming method |
| 11/02/2004 | US6811930 Formed via pre-hardening silver halide emulsion, developing, bleaching, hardening, drying, fixing, treating with warm water, then drying again; optical recording material; light amplifiers |
| 10/28/2004 | WO2004093148A2 Effective proximity effect correction methodology |
| 10/28/2004 | WO2004092832A2 Determination of center of focus by parameter variability analysis |
| 10/28/2004 | US20040214114 Photothermographic material and image forming method |
| 10/28/2004 | US20040214109 Method to form reduced dimension pattern with good edge roughness |
| 10/28/2004 | US20040214099 for obtaining a preferable image without "stripe-shaped unevenness"; photosensitive material is exposed with a plurality of exposure heads |
| 10/28/2004 | US20040212816 Sheet for color calibration, color calibrating method, and image recording apparatus |
| 10/27/2004 | EP1470447A1 Photolithographic critical dimension control using reticle measurements |
| 10/27/2004 | CN1173228C Silver halide emulsion, productio process of silver halide emulsion, silver halide color photographic light-sensitive material and image formation method |
| 10/26/2004 | US6810209 Method to establish sensitometry curve for a photographic medium |
| 10/26/2004 | US6809745 Compositing two-dimensional and 3-dimensional images |
| 10/21/2004 | WO2004090635A1 Method of producing photomask and photomask blank |
| 10/21/2004 | WO2004049063A3 Photomask and method for creating a protective layer on the same |
| 10/21/2004 | WO2004021081A3 Method for the production of a phase mask |
| 10/21/2004 | US20040210423 Complementary division condition determining method and program and complementary division method |
| 10/21/2004 | US20040209192 Method for fabricating an interference display unit |
| 10/21/2004 | US20040209171 inspected by disposing dummy inspection patterns having the same pattern as at least a part of the mask pattern portion, inside and/or outside an area of the mask pattern portion and comparing the portion of the mask pattern portion with the dummy inspection pattern portion |
| 10/21/2004 | US20040208279 Apparatus and methods for multiple view angle stereoscopic radiography |
| 10/21/2004 | DE10316821A1 Process for the correction of image errors in an optical system for the manufacture of masks for semiconductors |
| 10/20/2004 | EP1469345A2 Complementary division condition determining method and program and complementary division method |
| 10/19/2004 | US6806042 Color photographic print material |
| 10/19/2004 | US6806035 Wafer serialization manufacturing process for read/write heads using photolithography and selective reactive ion etching |
| 10/14/2004 | US20040205688 Effective proximity effect correction methodology |
| 10/13/2004 | CN1536435A Silver halide flake grqnule emulsion |
| 10/12/2004 | US6803179 Photographic color developing composition containing calcium ion sequestering agent combination and method of use |
| 10/12/2004 | US6803158 Photomask and method for forming an opaque border on the same |
| 10/12/2004 | US6802991 Method for preparing a CsX photostimulable phosphor and phosphor screens therefrom |
| 10/07/2004 | WO2004086143A2 Multi-step process for etching photomasks |
| 10/07/2004 | WO2004086139A1 Photographic processing solutions |
| 10/07/2004 | WO2004086138A1 Processing method and apparatus |
| 10/07/2004 | WO2004047121A3 Method for the production of and protective layer for a layer of luminescent material |
| 10/07/2004 | US20040197717 Silver halide color photographic photosensitive material and image forming method utilizing the same |
| 10/07/2004 | US20040197716 Photographic films having photosensitive silver halide emulsion layers containing sulfur compounds such as glutaramidophenyldisulfide, disodium salts as antisludging agents |
| 10/07/2004 | US20040197715 Providing photosensitive material;providing a Lenticular sheet in contact with photosensitive material; exposing photosensitive material through Lenticular sheet, wherein exposing comprises using an optical imaging system to expose photosensitive material through additional lens-array |
| 10/07/2004 | US20040197714 Method of silvery recovery from color photographic processing |
| 10/07/2004 | US20040197684 Composition and method for 3-dimensional mapping or radiation dose |
| 10/07/2004 | US20040197676 Method for forming an opening in a light-absorbing layer on a mask |
| 10/07/2004 | US20040197675 Stencil mask with charge-up prevention and method of manufacturing the same |
| 10/07/2004 | US20040197673 Photo reticles using channel assist features |
| 10/07/2004 | DE10338048A1 Phasenverschiebungsmaske, Verfahren zumBilden eines Musters mit einer Phasenverschiebungsmaske, Verfahren zum Herstellen einer elektronischen Vorrichtung Phase shift mask method zumBilden a pattern having a phase shift mask method for manufacturing an electronic device |
| 10/06/2004 | EP1465009A2 Photo reticles using channel assist features |
| 10/06/2004 | EP1465008A1 Silver halide photographic light-sensitive material |
| 10/05/2004 | US6801357 Ultra-broadband UV microscope imaging system with wide range zoom capability |
| 10/05/2004 | US6801303 Process for the three dimensional production of images |
| 09/30/2004 | WO2004083960A2 Alternating aperture phase shift photomask having light absorption layer |
| 09/30/2004 | US20040191701 Electron exposure to reduce line edge roughness |
| 09/30/2004 | US20040191645 Method and apparatus for forming crystalline portions of semiconductor film |
| 09/30/2004 | US20040191642 Multiple stepped aperture repair of transparent photomask substrates |
| 09/30/2004 | US20040191479 Anti-reflection film material and a substrate having an anti-reflection film and a method for forming a pattern |
| 09/30/2004 | US20040190008 Method for process optimization and control by comparison between 2 or more measured scatterometry signals |
| 09/30/2004 | US20040188614 Image forming method and image forming material |
| 09/29/2004 | EP1462857A1 Radiographic imaging assembly with blue-sensitive film |
| 09/29/2004 | EP1462856A1 Blue-sensitive film for radiography with desired image tone |
| 09/29/2004 | EP1462855A1 Blue-sensitive film for radiography and imaging assembly and method |
| 09/29/2004 | EP1462853A1 Blue spectrally sensitized film for radiography, imaging assembly and method |
| 09/29/2004 | EP1057076B1 High contrast photographic silver halide material |
| 09/29/2004 | CN1532630A Blue sensitive film with desived image tone for radiation photograph |
| 09/28/2004 | US6797457 Method for improving the resolution of optic lithography |
| 09/28/2004 | US6797439 Anti-reflective coating, the substrate, the patterned anti-reflective layer, and the patterned absorber layer arranged in that order |
| 09/28/2004 | US6797183 Method of treating waste effluent |
| 09/23/2004 | WO2004072734A3 Transmission mask with differential attenuation to improve iso-dense proximity |
| 09/23/2004 | US20040185392 Silver halide photographic light-sensitive material |
| 09/23/2004 | US20040185390 Ferrous photographic bleach-fixing precursor compositions and methods for their use |
| 09/23/2004 | US20040185383 Resist pattern forming method and resist pattern forming system |
| 09/23/2004 | US20040185354 capable of getting a smooth sloped portion of the blaze and a sharp rising portion of the blaze edge using a small-diameter beam, and reducing the overall blaze patterning time at the same time |
| 09/23/2004 | US20040185353 Aligner, exposing method, method for manufacturing thin-film transistor, display device, and electronic device using shading means |
| 09/23/2004 | US20040185350 A thin layer material combined with a radiation-opaque layer material with different etch selectivity facilitate a multi-stage patterning treatment of an underlying mask layer and a resultant critical dimension in the patterned mask; accuracy |
| 09/23/2004 | US20040185348 optical lithography; radiation transparent; semiconductors/integrated circuits |
| 09/22/2004 | EP1459110A1 Composite mask for producing a diffuser |
| 09/22/2004 | CN1530773A Exposure device and method, Manufacturnig method and dispaying device for thin-membrane transistor |
| 09/22/2004 | CN1530745A Slushing compound pattern shaping method and system |
| 09/21/2004 | US6794107 Thermal generation of a mask for flexography |
| 09/21/2004 | US6794106 Radiographic imaging assembly for mammography |
| 09/21/2004 | US6794105 Cubic grains are spectrally sensitized with anionic benzimidazole-benzoxazole carbocyanine and anionic oxycarbocyanine dyes |
| 09/21/2004 | US6793417 System and method for digital film development using visible light |
| 09/16/2004 | WO2004079780A2 A method of patterning photoresist on a wafer using a reflective mask with a multi-layer arc |
| 09/16/2004 | WO2004079779A2 A method of patterning photoresist on a wafer using an attenuated phase shift mask |
| 09/16/2004 | US20040180303 Kits for high-speed bleach-fixing (< 60 seconds) by adding certain aliphatic or aromatic sulfur-containing compounds including an double-bonded nitrogen even when silver iodide, phenyl mercaptotetrazole or block polymers are present |
| 09/16/2004 | US20040180294 Lithographic printing with polarized light |
| 09/16/2004 | US20040180273 Methods of forming aligned structures with radiation-sensitive material |
| 09/16/2004 | US20040180272 Methods of printing structures |
| 09/16/2004 | US20040180268 Method of manufacturing photomask |
| 09/16/2004 | US20040180267 binary photomask may include glass and chrome features which form a pattern |
| 09/16/2004 | US20040179178 Processing apparatus for processing object in vessel |