Patents for C30B 33 - After-treatment of single crystals or homogeneous polycrystalline material with defined structure (6,009)
10/2007
10/17/2007CN100343961C Production method for anneal wafer and anneal wafer
10/16/2007US7282457 Apparatus for stabilizing high pressure oxidation of a semiconductor device
10/11/2007WO2007112719A1 Treatment of crystals for the prevention of optical damage
10/11/2007DE102006016201A1 Behandlung von Kristallen zur Vermeidung optischen Schadens Treatment of crystals to avoid optical damage
10/11/2007DE102006015781A1 Semiconductor wafer useful for the production of electronic components, comprises inner area arranged in the middle of the wafer, outer area, and a first surface, which is formed of a semiconductor element in the inner area
10/10/2007EP1842942A2 GaN crystal substrate
10/10/2007CN101052754A Method of surface reconstruction for silicon carbide substrate
10/10/2007CN100342503C Annealed wafer and annealed wafer manufacturing method
10/10/2007CN100342065C Method of reducing crystal defect density
10/09/2007US7279435 Apparatus for stabilizing high pressure oxidation of a semiconductor device
10/04/2007US20070228049 Integrated crystal mounting and alignment system for high-throughput biological crystallography
10/04/2007DE102006015539A1 Coolant, useful for preparing and/or treating ingots and/or wafers used in semiconductor industry and micro mechanical- and electronic devices, comprises at least a surfactant e.g. organosilicon compounds
10/03/2007EP1840560A2 Method of revealing crystalline faults in a massive substrate
09/2007
09/27/2007WO2007107757A2 Growth method using nanostructure compliant layers and hvpe for producing high quality compound semiconductor materials
09/27/2007US20070224821 Method for Manufacturing Silicon Wafers
09/27/2007US20070224783 Process for forming low defect density, ideal oxygen precipitating silicon
09/27/2007US20070221120 Level Realignment Following an Epitaxy Step
09/26/2007EP1299900A4 METHOD FOR ACHIEVING IMPROVED EPITAXY QUALITY (SURFACE TEXTURE AND DEFECT DENSITY) ON FREE-STANDING (ALUMINUM, INDIUM, GALLIUM) NITRIDE ((Al,In,Ga)N) SUBSTRATES FOR OPTO-ELECTRONIC AND ELECTRONIC DEVICES
09/25/2007US7274769 Integrated crystal mounting and alignment system for high-throughput biological crystallography
09/25/2007US7273647 Silicon annealed wafer and silicon epitaxial wafer
09/25/2007US7273564 Method and apparatus for fabricating flat panel display
09/20/2007US20070218202 Directed assembly of highly-organized carbon nanotube architectures
09/19/2007EP1835054A2 Gallium nitride substrate and methods for testing and manufacturing it
09/19/2007CN101037807A Gan crystal substrate and method of manufacturing the same, and method of manufacturing semiconductor device
09/19/2007CN101037801A Hf:Er:LiNbO3 crystal and preparation method thereof
09/19/2007CN100338270C Monocrystalline silicon buffing sheet heat treatment process
09/18/2007US7270720 Obtainable by bending while heating a rod or band-like unfinished workpiece of a single crystal alloy to provide a predetermined curve, cooling followed by reheating; quenching; eyeglass frames; medical equipment; dielectric coatings; tension and compression springs, prevention spiral, arterial stoppers
09/13/2007DE102006010273A1 Production of strained layer on strain-compensated layer stacks with small defect density, comprises arranging relaxed silicon-germanium buffer layer on silicon substrate and arranging intermediate layer on relaxed buffer layer
09/12/2007EP1660702B1 A method of fabricating an epitaxially grown layer
09/12/2007CN100336945C Inner gettering process of heavily boron-doped Czochralski silicon wafer based on quick heat process
09/07/2007WO2006041660A8 100 mm silicon carbide wafer with low micropipe density
09/06/2007US20070204788 Lithium tantalate substrate and method of manufacturing same
09/05/2007EP1829992A1 Process for producing single crystal and process for producing annealed wafer
09/05/2007EP1828445A1 Process for producing silicon carbide crystals having increased minority carrier lifetimes
09/04/2007US7264750 Single crystal ingot doped with Cerium, Europium, Terbium or Ytterbium; crystal face is composed of a plurality of smooth partial region surfaces
08/2007
08/29/2007CN101024579A Method for surface fit metn of inorganic nano particles on carbon nano tube
08/23/2007WO2007094231A1 Method for manufacturing semiconductor substrate
08/23/2007WO2007094126A1 Method of recovering sodium metal from flux
08/23/2007US20070193499 Zno single crystal as super high speed scintillator...
08/23/2007DE60123592T2 Hochtemperatur/hochdruck-farbeveränderung von diamanten High-temperature / high-pressure change color of diamonds
08/23/2007DE60123591T2 Hochtemperatur/hochdruck-farbeveränderng von diamanten High-temperature / high-pressure farbeveränderng of diamonds
08/22/2007EP1821339A1 GaN crystal substrate and method of manufacturing the same, and method of manufacturing semiconductor device
08/22/2007EP1122342B1 Method for removing defects of single crystal material
08/21/2007US7258931 Configured to reduce the volume of thin film residues on a top surface adjacent an edge, and to inhibit redeposition of residue particulates on the top surfaces during processing
08/21/2007US7258743 Composite structure with a uniform crystal orientation and the method of controlling the crystal orientation of one such structure
08/21/2007US7258739 Process for producing epitaxial silicon wafer and silicon wafer produced by process thereof
08/15/2007EP1818429A2 Method of growing single crystal GaN, method of making single crystal GaN substrate and single crystal GaN substrate
08/15/2007EP1817445A1 Method for making a dismountable substrate
08/15/2007EP1537258B1 Method of fabricating substrates, in particular for optics, electronics or optoelectronics----------------------------------------
08/15/2007EP1402089B1 Synthesis of stable colloidal nanocrystals using organic dendrons
08/15/2007EP1347852B1 Method of forming nano-crystalline structures
08/15/2007CN1332078C Polarization method for lithium niobate
08/15/2007CN1332077C Lithium niobate substrate and manufacturing method thereof
08/15/2007CN101019212A Process for producing semiconductor substrate, semiconductor substrate for solar application and etching solution
08/15/2007CN101016651A Annealed wafer and manufacturing method of annealed wafer
08/14/2007US7256478 Notched compound semiconductor wafer
08/14/2007US7256477 Notched compound semiconductor wafer
08/14/2007US7256476 Notched compound semiconductor wafer
08/14/2007US7255740 Method of growing hexagonal single crystals and use of same as substrates for semiconductor elements
08/08/2007EP1816238A1 Preferential hardening of signle crystal blades
08/02/2007WO2007056745A3 Arsenic and phosphorus doped silicon wafer substrates having intrinsic gettering
08/02/2007DE102006002903A1 Treatment of oxygen-containing semiconductor wafer, comprises irradiating second side of wafer with high-energy particles to produce crystal defects in second semiconductor region of wafer, and heating wafer
08/01/2007EP1814149A1 METHOD FOR ABRASING GaN SUBSTRATE
08/01/2007CN101008105A Repair method of crystalline structures by epitaxy
07/2007
07/31/2007US7250081 Methods for repair of single crystal superalloys by laser welding and products thereof
07/26/2007WO2007083477A1 Method for manufacturing silicon single crystal wafer
07/26/2007WO2007083476A1 Process for producing silicon single crystal wafer
07/26/2007WO2007083155A1 A method of fabricating fibres composed of silicon or a silicon-based material and their use in lithium rechargeable batteries
07/26/2007US20070169688 Method for manufacturing silicon wafer
07/26/2007CA2636471A1 A method of fabricating fibres composed of silicon or a silicon-based material and their use in lithium rechargeable batteries
07/25/2007EP1811065A1 Single crystal silicon wafer for insulated gate bipolar transistors and process for producing the same
07/19/2007US20070167021 Method of Manufacturing Nitride Substrate for Semiconductors
07/18/2007EP1658519A4 Solution to thermal budget
07/18/2007CN1327048C Method for flattening surface of oxide crystal to ultra high degree
07/18/2007CN1327047C N-type heat treatment process for HgCdTe materials grown from melting method
07/17/2007US7244306 Method for measuring point defect distribution of silicon single crystal ingot
07/12/2007US20070160872 Method of altering crystal structure of group 13 element nitride, group 13 element nitride and structure material containing cubic nitride
07/12/2007US20070160501 Device and method for treating a crystal by applying microdrops thereto
07/12/2007DE10047346B4 Verfahren zur Herstellung eines Siliciumwafers zur Abscheidung einer Epitaxieschicht und Epitaxiewafer A process for producing a silicon wafer for the deposition of an epitaxial layer and epitaxial wafer
07/11/2007EP1806775A1 Process for producing semiconductor substrate, semiconductor substrate for solar application and etching solution
07/11/2007EP1806438A1 Method of surface reconstruction for silicon carbide substrate
07/11/2007EP1806199A2 System and Method for Blind Laser Brazing
07/05/2007WO2007074242A1 Method for making a plate-like detachable structure, in particular made of silicon, and use of said method
07/05/2007WO2007074027A1 Simplified method of producing an epitaxially grown structure
07/05/2007US20070155004 Treatment of crystals in order to avoid light-induced modifications of the refractive index
07/04/2007CN1992168A Fabrication method and fabrication apparatus of group III nitride crystal substance
07/04/2007CN1324660C Rectangular nitride semiconductor substrate capable of identifying outside and inside
07/04/2007CN1324167C Lithium tantanate substrate and its prepn. process
07/03/2007US7238425 Outer cylindrical shell and a telescoped segment partially housed within its interior cavity and partially extending from the outermost shell; use as a linear or rotational bearing in microelectromechanical systems or a constant force nanospring
06/2007
06/28/2007WO2007071772A1 Method for the manufacture of substrates, in particular for the optical, electronic or optoelectronic areas, and the substrate obtained in accordance with the said method
06/28/2007WO2007071771A1 Method for making a composite substrate and composite substrate according to said method
06/28/2007US20070148374 Method of incorporating a mark in cvd diamond
06/28/2007US20070145003 Method of etching semiconductor device
06/27/2007EP1543181B1 Single crystal diamond
06/27/2007CN1986912A Process of preparing monocrystalline InP with nano square pore array
06/20/2007CN1985368A Support for hybrid epitaxy and method of fabrication
06/20/2007CN1985362A Silicon carbide single crystal and method of etching the same
06/20/2007CN1322562C Monitoring low-temp quick thermal annealing process by ion implanted chip
06/14/2007DE102005059531A1 Preparation of highly pure, preferably radiation-stable large volume single crystals, useful in e.g. lenses, comprises producing a melt obtained from crystal raw material and controlled cooling under solidification
06/14/2007DE102004017142B4 Lithiumtantalat-Substrat und Verfahren zu seiner Herstellung Lithium tantalate substrate and process for its preparation
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