Patents for C30B 33 - After-treatment of single crystals or homogeneous polycrystalline material with defined structure (6,009)
03/2009
03/25/2009EP1516361B1 Method for producing semi-insulating resistivity in high purity silicon carbide crystals
03/25/2009CN101392409A Pulsed processing semiconductor heating methods using combinations of heating sources
03/19/2009DE102007044007A1 Verfahren zur Herstellung eines Festkörper-Lasers mit passiver Güteschaltung A process for producing a solid-state laser with a passive Q-switch
03/18/2009EP2035179A1 Friction welding of a single crystal component to a second component with minimisation of in plane friction and forge forces
03/11/2009CN101381893A CdGeAs2 crystal etching agent and etching method
03/11/2009CN100468102C Solution to thermal budget
03/11/2009CN100467678C Hf:Er:LiNbO3 crystal and preparation method thereof
03/05/2009WO2009028658A1 Silicon single crystal wafer for igbt, method for manufacturing silicon single crystal wafer for igbt and method for assuring resistivity of silicon single crystal wafer for igbt
03/05/2009WO2005080645A3 Diamond structure separation
03/05/2009US20090056374 Gemstone Facet Configuration
03/05/2009DE102007040390A1 Method of producing silicon wafers by cutting silicon ingots for manufacturing solar cells and solar modules, comprises removing materials from a side of the silicon ingot by an etching process
03/04/2009EP2031101A2 Method for making silicon wafers
03/04/2009EP2030733A2 Method for making silicon wafers
03/04/2009EP2030225A2 Wet etch suitable for creating square cuts in si and resulting structures
03/04/2009CN100465356C A GaN wafer with high surface quality and a production method thereof
02/2009
02/24/2009US7494595 Etching apparatus
02/18/2009EP2024992A1 Method for smoothing iii-n substrates
02/18/2009CN101371381A A method of fabricating fibres composed of silicon or a silicon-based material and their use in lithium rechargeable batteries
02/18/2009CN101370971A Method of recovering sodium metal from flux
02/18/2009CN101369029A Method for producing photon crystal film for improving mechanical strength and solvent resistance
02/18/2009CN101368294A Surface finished zinc oxide nanometer stick array and preparation method thereof
02/11/2009CN100461349C Process for producing high resistance silicon wafer, and process for producing epitaxial wafer and SOI wafer
02/11/2009CN100461340C Method for manufacturing group III nitride compound semiconductor
02/10/2009US7488430 Method of fabricating in-plane switching mode LCD
02/04/2009CN101361171A Method for manufacturing silicon single crystal wafer
02/04/2009CN101360852A Process for producing silicon single crystal wafer
02/04/2009CN101359595A Method for flattening wafer surface
02/04/2009CN100459047C Method for preparing film structure comprising ferroelectric single crystal layer
02/03/2009US7485238 Etching method, etched product formed by the same, and piezoelectric vibration device, method for producing the same
01/2009
01/29/2009WO2009012583A1 Use of acid washing to provide purified silicon crystals
01/29/2009US20090029550 Method of Manufacturing Nitride Substrate for Semiconductors
01/29/2009CA2694806A1 Use of acid washing to provide purified silicon crystals
01/28/2009EP2019420A1 Device for texturising surfaces of silicon discs and uses of this device
01/28/2009CN101353813A Free-standing (Al, Ga, In)N and parting method for forming same
01/28/2009CN100456445C Etching method and apparatus
01/28/2009CN100456177C Gas path controlling method for chip etching equipment
01/27/2009US7481879 Diamond single crystal substrate manufacturing method and diamond single crystal substrate
01/22/2009WO2009011100A1 Iii nitride semiconductor substrate and method for cleaning the same
01/22/2009US20090022930 Single crystal silicon having improved gate oxide integrity
01/22/2009US20090020067 Method of manufacturing solar-grade polysilicon ingot with relevant induction apparatus
01/21/2009EP2015928A2 Porous processing carrier for flexible substrates
01/21/2009CN101351879A Method for making a plate-like detachable structure, in particular made of silicon, and use of said method
01/21/2009CN101351580A Arsenic and phosphorus doped silicon wafer substrates having intrinsic gettering
01/20/2009US7479188 Process for producing GaN substrate
01/15/2009US20090017569 Method for fabricating liquid crystal display device
01/07/2009CN101341580A Method for the manufacture of substrates, in particular for the optical, electronic or optoelectronic areas, and the substrate obtained in accordance with the said method
01/07/2009CN101339926A Method of manufacturing nitride substrate for semiconductors, and nitride semiconductor substrate
01/07/2009CN100449340C Three-dimensional photonic crystal waveguide structure
01/01/2009US20090004426 Suppression of Oxygen Precipitation in Heavily Doped Single Crystal Silicon Substrates
01/01/2009US20090000537 Silicon wafer and method for producing same
12/2008
12/31/2008EP2007933A1 Methods for controllable doping of aluminum nitride bulk crystals
12/31/2008EP1281196A4 Method of doping silicon with phosphorus and growing oxide on silicon in the presence of steam
12/31/2008CN201172701Y Heat treatment equipment for gallium arsenide single crystal open pipe
12/30/2008US7470970 Prepared by making use of orientation (plane) dependence of the oxygen doping to GaN; non-C-plane growth enables the growing GaN crystal to accept oxygen effectively; for producing light emitting diodes, laser diodes or other electronic devices of groups 3 and 5 nitride semiconductors
12/25/2008US20080317663 Lithium Tantalate Substrate and Process for its Manufacture
12/24/2008WO2008156058A1 Method for joining silicon base materials, liquid droplet delivery head, liquid droplet delivery apparatus, and electronic device
12/24/2008WO2008156056A1 Method for joining silicon base materials, liquid droplet delivery head, liquid droplet delivery apparatus, and electronic device
12/24/2008EP2004884A1 Treatment of crystals for the prevention of optical damage
12/24/2008DE20321702U1 Vorrichtung zum Texturieren von Oberflächen von Silizium-Scheiben Apparatus for texturing surfaces of silicon wafers
12/24/2008DE102007028439A1 Separating flat-parallel silicon wafers from cuboid crystalline or polycrystalline silicon ingot using wire saw for photo-voltaic applications, comprises moving wire around rolls, and attaching the ingot to reception of the wire saw
12/18/2008US20080311024 Diamond single crystal substrate manufacturing method and diamond single crystal substrate
12/18/2008DE102007027112A1 Verfahren zur Reinigung, Trocknung und Hydrophilierung einer Halbleiterscheibe A method for cleaning, drying and hydrophilization of a semiconductor wafer
12/18/2008DE102006044366B4 Verfahren zum Abtrennen einer Vielzahl von Scheiben von einem zylindrischen Werkstück A method for separating a plurality of slices of a cylindrical workpiece
12/17/2008EP1645664A4 The technique of production of fancy red diamonds
12/17/2008CN101323983A Novel preparation for synthetic gem chromic coloring
12/16/2008US7466907 Annealing process and device of semiconductor wafer
12/11/2008DE102007026292A1 Verfahren zur einseitigen Politur nicht strukturierter Halbleiterscheiben A method for unilateral polish not structured semiconductor wafers
12/10/2008EP2000565A1 Growth method of a GaN crystal, and GaN crystal substrate
12/10/2008CN101319361A 单晶金刚石 Single crystal diamond
12/10/2008CN101319360A 单晶金刚石 Single crystal diamond
12/10/2008CN101319359A 单晶金刚石 Single crystal diamond
12/10/2008CN101319358A 单晶金刚石 Single crystal diamond
12/10/2008CN101319354A Purification process for single-wall nano-carbon tube film
12/10/2008CN101319347A Method for crystal surface self-organizing growth of fine-nano-structure with femtosecond laser
12/09/2008US7462291 Method of fabricating array substrate for liquid crystal display device
12/03/2008EP1997125A2 Growth method using nanostructure compliant layers and hvpe for producing high quality compound semiconductor materials
12/02/2008US7459025 Methods for transferring a layer onto a substrate
11/2008
11/27/2008DE102008022747A1 Silicium-Einkristall-Wafer und Verfahren zur Herstellung Silicon single crystal wafer and methods for preparing
11/27/2008DE10066107B4 Verfahren zur Wärmebehandlung eines Siliciumwafers A method for heat treating a silicon wafer
11/27/2008DE10066106B4 Verfahren zur Wärmebehandlung eines Siliciumwafers A method for heat treating a silicon wafer
11/26/2008CN101312165A Alxgayin1-x-yn substrate and cleaning method for the same, and ain substrate and cleaning method for the same
11/26/2008CN101312164A Alxgayin1-x-yn substrate and cleaning method for the same, and ain substrate and cleaning method for the same
11/26/2008CN101311344A Polysilicon film preparation with crystal particle dimension controllable and detection device
11/25/2008US7455880 Optical element fabrication method, optical element, exposure apparatus, device fabrication method
11/20/2008US20080282978 Process For Manufacturing A Gallium Rich Gallium Nitride Film
11/20/2008DE10066099B4 Silicon wafer used in the production of semiconductor circuits has a low number of particles of crystalline origin in the wafer surface
11/19/2008CN101310047A Process for producing diamond having structure of acicular projection array disposed on surface thereof, diamond maerial, electrode and electronic device
11/19/2008CN101307498A Iii-v nitride substrate wafer and its manufacture method and uses
11/13/2008DE10047345B4 Wärmebehandlungsverfahren eines Siliciumwafers und behandelter Siliciumwafer Heat treatment process of a silicon wafer and treated silicon wafer
11/12/2008CN100433257C Process for producing monocrystal thin film and monocrystal thin film device
11/06/2008DE112006003461T5 Verfahren zur Herstellung einer zerlegbaren scheibenförmigen Struktur, insbesondere auf Silizium basierend, und Anwendung des Verfahrens A method of manufacturing a separable disk-shaped structure, in particular based on silicon, and use of the method
11/06/2008DE102007053108A1 Thermally treating disk-shaped semiconductor silicon wafer body at a temperature, comprises introducing wafer in treatment chamber having suspension gas stream, and carrying out thermal treatment of wafer under changing wafer temperature
11/05/2008CN101299452A Method for preparing CeO2 isolated layer film on monocrystal substrate
11/05/2008CN101298698A Method for surface in situ synthesis of conductive polyaniline PANi by using four acicular type zinc oxide crystal whisker T-ZnOw
11/05/2008CN100431189C Thin plate display device and its manufacturing method
11/04/2008US7446045 Method of manufacturing nitride substrate for semiconductors
10/2008
10/30/2008US20080266502 Method of producing uv stable liquid crystal alignment
10/29/2008EP1986217A1 Method for manufacturing semiconductor substrate
10/29/2008EP1984545A2 Method for growth of semipolar (al,in,ga,b)n optoelectronic devices
10/29/2008EP1537258B9 Method of fabricating substrates, in particular for optics, electronics or optoelectronics----------------------------------------
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