| Patents for C30B 31 - Diffusion or doping processes for single crystals or homogeneous polycrystalline material with defined structure; Apparatus therefor (2,201) |
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| 06/12/2001 | US6246031 Mini batch furnace |
| 06/07/2001 | WO2001041195A1 Single wafer annealing oven |
| 06/07/2001 | WO2001040552A1 Mini batch furnace |
| 06/07/2001 | US20010002948 Gas driven rotating susceptor for rapid thermal processing (rtp) system |
| 05/30/2001 | EP1102876A1 Method for contact diffusion of impurities into diamond and other crystalline structures and products |
| 05/22/2001 | US6236068 Transistor component |
| 05/22/2001 | US6236023 Cleaning process for rapid thermal processing system |
| 05/03/2001 | WO2001031700A1 Wafer holder and epitaxial growth device |
| 05/01/2001 | US6225190 Process for the separation of at least two elements of a structure in contact with one another by ion implantation |
| 04/25/2001 | EP1094502A2 Platform for supporting a semiconductor substrate and method of supporting a substrate during rapid high temperature processing |
| 04/25/2001 | EP1093664A1 Temperature control system for a thermal reactor |
| 04/24/2001 | US6222990 Heating element for heating the edges of wafers in thermal processing chambers |
| 04/24/2001 | US6222194 Fast neutron irradiation of sapphire |
| 04/24/2001 | US6222164 Temperature control system for a thermal reactor |
| 04/24/2001 | US6221165 High temperature plasma-assisted diffusion |
| 04/19/2001 | WO2001027363A1 A device and a method for heat treatment of an object in a susceptor |
| 04/04/2001 | EP1089325A2 Support frame for substrates |
| 04/03/2001 | US6211495 Temperature control system for a thermal reactor |
| 03/27/2001 | US6207937 Temperature control system for a thermal reactor |
| 03/20/2001 | US6204484 System for measuring the temperature of a semiconductor wafer during thermal processing |
| 03/15/2001 | WO2001018856A1 Wafer holder |
| 03/06/2001 | US6198075 Rapid heating and cooling vacuum oven |
| 02/20/2001 | US6191388 Thermal processor and components thereof |
| 02/13/2001 | US6188838 Apparatus for heat treating a semiconductor wafer to reduce stress |
| 02/13/2001 | US6186779 Wafer clamp for a heater assembly |
| 01/25/2001 | WO2001006031A1 Susceptorless semiconductor wafer support and reactor system for epitaxial layer growth |
| 01/23/2001 | CA2213387C Thermal shock resistant sapphire for ir windows and domes, and method of making same |
| 01/18/2001 | WO2001004940A1 Method for doping gallium nitride (gan) substrates and the resulting doped gan substrate |
| 01/18/2001 | WO2001004934A1 Semiconductor wafer carrier |
| 01/17/2001 | EP1068480A1 Substrate support for a thermal processing chamber |
| 01/11/2001 | WO2001002628A1 Doped diamond |
| 01/10/2001 | EP1067587A2 Thermally processing a substrate |
| 01/09/2001 | US6173116 Furnace for rapid thermal processing |
| 01/09/2001 | US6172337 System and method for thermal processing of a semiconductor substrate |
| 01/02/2001 | US6169271 Model based method for wafer temperature control in a thermal processing system for semiconductor manufacturing |
| 12/26/2000 | US6167195 Multizone illuminator for rapid thermal processing with improved spatial resolution |
| 12/26/2000 | US6166354 System and apparatus for in situ monitoring and control of annealing in semiconductor fabrication |
| 12/26/2000 | US6164963 Semiconductor furnace processing vessel base |
| 12/12/2000 | US6159873 Method for producing semiconductor device and production apparatus of semiconductor device |
| 12/07/2000 | WO2000073543A1 Doping of crystalline substrates |
| 12/07/2000 | WO2000073533A1 Cooled window |
| 12/05/2000 | US6157003 Furnace for processing semiconductor wafers |
| 11/28/2000 | US6153260 Method for heating exhaust gas in a substrate reactor |
| 11/21/2000 | US6151447 Rapid thermal processing apparatus for processing semiconductor wafers |
| 11/21/2000 | US6149984 Laser irradiation processing on a film that is sensitive to impurities, such as a semiconductor film that has been subjected to laser light irradiation. another object of the invention is to facilitate cleaning irradiation apparatus. |
| 11/21/2000 | US6149365 Support frame for substrates |
| 11/14/2000 | US6147020 Light-impermeable, high purity silicon carbide material, a light shielding member for a semiconductor-treating apparatus, and a semiconductor-treating apparatus |
| 11/07/2000 | US6142773 Enveloping device and vertical heat-treating apparatus for semiconductor process system |
| 11/02/2000 | EP1049356A2 Heating apparatus for semiconductor wafers or substrates |
| 10/19/2000 | WO2000061841A1 Slicing of single-crystal films using ion implantation |
| 10/19/2000 | CA2365992A1 Slicing of single-crystal films using ion implantation |
| 10/17/2000 | US6134385 Water free furnace tube with self-heating quartz plug |
| 10/17/2000 | US6133550 Method and apparatus for thermal processing of semiconductor substrates |
| 10/17/2000 | US6132506 Method for the heat treatment of ZnSe crystal |
| 09/21/2000 | DE19954021A1 Verfahren zur Bor-Dotierung von Wafern unter Einsatz eines Vertikalofensystems A method for boron doping wafers using a vertical furnace system |
| 09/20/2000 | EP1037268A1 METHOD FOR SYNTHESIZING SINGLE CRYSTAL AlN THIN FILMS OF LOW RESISTANT n-TYPE AND LOW RESISTANT p-TYPE |
| 09/19/2000 | US6122439 Rapid thermal heating apparatus and method |
| 09/19/2000 | US6121580 Lamp annealer and method for annealing semiconductor wafer |
| 09/19/2000 | US6120285 Dimpled thermal processing furnace and method for processing semiconductor wafers |
| 09/13/2000 | EP1034561A1 Rapid thermal processing (rtp) system with gas driven rotating substrate |
| 09/05/2000 | US6113702 Wafer support system |
| 08/29/2000 | US6110289 Rapid thermal processing barrel reactor for processing substrates |
| 08/29/2000 | US6110285 Vertical wafer boat |
| 08/29/2000 | US6110284 Apparatus and a method for shielding light emanating from a light source heating a semicondutor processing chamber |
| 08/29/2000 | US6109915 Drafting apparatus |
| 08/22/2000 | US6108490 Multizone illuminator for rapid thermal processing with improved spatial resolution |
| 08/16/2000 | EP1027482A1 Apparatus and method for the in-situ generation of dopants |
| 08/16/2000 | EP1027474A1 Process tube with in situ gas preheating |
| 08/15/2000 | US6101844 Double wall reaction chamber glassware |
| 08/08/2000 | US6099645 Vertical semiconductor wafer carrier with slats |
| 08/08/2000 | US6099302 Semiconductor wafer boat with reduced wafer contact area |
| 08/01/2000 | US6096627 Method for introduction of an impurity dopant in SiC, a semiconductor device formed by the method and a use of a highly doped amorphous layer as a source for dopant diffusion into SiC |
| 08/01/2000 | US6095806 Semiconductor wafer boat and vertical heat treating system |
| 07/26/2000 | EP1021586A1 A rapid thermal processing barrel reactor for processing substrates |
| 07/18/2000 | US6090210 Multi-zone gas flow control in a process chamber |
| 07/06/2000 | WO2000039840A1 Method for boron doping wafers using a vertical oven system |
| 07/06/2000 | DE19849462A1 IR lamp heating for temp. over 1000 degrees C for rear side heating of substrate holders in installations for gas phase epitaxy |
| 07/05/2000 | EP1017085A2 Semiconductor device manufacturing apparatus employing vacuum system |
| 07/05/2000 | EP1015831A1 Semiconductor processing furnace heating subassembly |
| 06/28/2000 | EP1012358A1 Inflatable elastomeric element for rapid thermal processing (rtp) system |
| 06/27/2000 | US6079874 Temperature probes for measuring substrate temperature |
| 06/22/2000 | WO2000036635A1 Gas driven rotating susceptor for rapid thermal processing (rtp) system |
| 06/06/2000 | US6072164 Heat-treating method and radiant heating device |
| 06/06/2000 | US6072160 Method and apparatus for enhancing the efficiency of radiant energy sources used in rapid thermal processing of substrates by energy reflection |
| 06/06/2000 | US6071350 Semiconductor device manufacturing apparatus employing vacuum system |
| 05/25/2000 | WO2000029799A1 Apparatus and method for thermal processing of semiconductor substrates |
| 05/24/2000 | EP0832407A4 Passive gas substrate thermal conditioning apparatus and method |
| 05/03/2000 | EP0996767A1 Reflective surface for cvd reactor walls |
| 04/25/2000 | US6054684 Ultra fast temperature ramp up and down in a furnace using interleaving shutters |
| 04/18/2000 | US6051512 Apparatus and method for rapid thermal processing (RTP) of a plurality of semiconductor wafers |
| 04/12/2000 | EP0992608A1 Light-impermeable, high purity silicon carbide material, a light shielding member for a semiconductor-treating apparatus, and a semiconductor-treating apparatus |
| 04/06/2000 | WO2000019502A1 Vertical furnace and wafer boat for vertical furnace |
| 04/04/2000 | US6046439 System and method for thermal processing of a semiconductor substrate |
| 03/28/2000 | US6043460 System and method for thermal processing of a semiconductor substrate |
| 03/28/2000 | US6042372 Heat treatment apparatus |
| 03/09/2000 | WO2000012945A1 Method and apparatus for thermal processing of semiconductor substrates |
| 03/07/2000 | US6034356 RTP lamp design for oxidation and annealing |
| 03/07/2000 | US6033215 Heat treatment apparatus and heat treatment boat |
| 02/29/2000 | US6031205 Thermal treatment apparatus with thermal protection members intercepting thermal radiation at or above a predetermined angle |
| 02/17/2000 | WO2000008401A1 Furnace for processing semiconductor wafers |