| Patents for C30B 31 - Diffusion or doping processes for single crystals or homogeneous polycrystalline material with defined structure; Apparatus therefor (2,201) |
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| 03/11/2003 | US6530994 Platform for supporting a semiconductor substrate and method of supporting a substrate during rapid high temperature processing |
| 03/06/2003 | WO2003019622A2 System and method of fast ambient switching for rapid thermal processing |
| 03/05/2003 | EP0931187B1 A METHOD FOR PRODUCING A REGION DOPED WITH BORON IN A SiC-LAYER |
| 03/05/2003 | CN1400337A Cooling system of reactor with replaceable inner wall |
| 03/04/2003 | US6527854 Method for contact diffusion of impurities into diamond and other crystalline structures and products |
| 02/27/2003 | US20030038128 Heating device of the light irradiation type |
| 02/27/2003 | US20030038127 Annealing, diffusion, oxidation, doping,and vapor deposition; semiconductors |
| 02/20/2003 | US20030036268 Low temperature load and bake |
| 02/18/2003 | US6521504 Semiconductor device and method of fabricating the same |
| 02/05/2003 | EP1281196A1 Method of doping silicon with phosphorus and growing oxide on silicon in the presence of steam |
| 01/30/2003 | WO2002095804A8 Method and device for the thermal treatment of substrates |
| 01/23/2003 | WO2003007336A2 Wafer boat with arcuate wafer support arms |
| 01/16/2003 | US20030010275 Method for fabricating ultra thin single-crystal metal oxide wave retarder plates and waveguide polarization mode converter using the same |
| 01/15/2003 | EP0645072B1 High performance horizontal diffusion furnace system |
| 01/14/2003 | US6506994 Low profile thick film heaters in multi-slot bake chamber |
| 01/14/2003 | US6506291 Substrate support with multilevel heat transfer mechanism |
| 01/07/2003 | US6503321 To form a damage layer at an implantation depth below a top surface of said crystal structure, and chemically etching the damage layer to detach a single crystal film from the crystal structure; optoelectronic devices |
| 01/02/2003 | US20030000936 Heating chamber and method of heating a wafer |
| 01/02/2003 | US20030000458 Quartz member for semiconductor manufacturing equipment and method for metal analysis in quartz member |
| 01/02/2003 | EP1268884A1 Method and device for making substrates |
| 12/27/2002 | WO2002103781A1 Wafer supporter |
| 12/27/2002 | WO2002103761A1 Substrate support with multilevel heat transfer mechanism |
| 12/26/2002 | US20020195437 Heat treating apparatus and method |
| 12/24/2002 | US6497767 Thermal processing unit for single substrate |
| 12/19/2002 | US20020190051 Low profile thick film heaters in multi-slot bake chamber |
| 12/19/2002 | US20020189940 Substrate support with multilevel heat transfer mechanism |
| 12/18/2002 | EP1027482A4 Apparatus and method for the in-situ generation of dopants |
| 12/12/2002 | US20020187023 Vertical type wafer supporting jig |
| 12/10/2002 | US6491757 Wafer support system |
| 12/10/2002 | US6491518 Apparatus for high-temperature and high-pressure treatment |
| 12/05/2002 | WO2002097864A2 Low temperature load and bake |
| 12/04/2002 | EP1261761A1 Quartz member for semiconductor manufacturing equipment and method for metal analysis in quartz member |
| 12/04/2002 | EP0848223B1 Vertical heat treatment device |
| 12/03/2002 | US6488497 Wafer boat with arcuate wafer support arms |
| 11/28/2002 | WO2002095804A1 Method and device for the thermal treatment of substrates |
| 11/28/2002 | WO2002095803A1 Method and device for thermally treating substrates |
| 11/21/2002 | WO2002093621A1 Method and device for doping, diffusion and oxidation of silicon wafers under reduced pressure |
| 11/21/2002 | US20020172908 Auxiliary heat-insulating jig, method of manufacturing the same, wafer boat provided with plate insulator, vertical heat treatment apparatus, method of modifying vertical heat treatment apparatus and method of fabricating semiconductor device |
| 11/19/2002 | US6481368 Device and a method for heat treatment of an object in a susceptor |
| 11/13/2002 | EP1256975A2 Vertical type wafer supporting jig |
| 11/13/2002 | EP1256973A1 Heating system and method for heating an atmospheric reactor |
| 11/13/2002 | CN1379127A Process for preparing chemical-specific Mg-doped lithium niobate crystal with periodic polarizing microstructure |
| 11/05/2002 | US6474987 Wafer holder |
| 10/29/2002 | US6472639 Heat treatment method and heat treatment apparatus |
| 10/24/2002 | WO2002084711A1 Heating system and method for heating an atmospheric reactor |
| 10/22/2002 | US6468884 Method of forming silicon-contained crystal thin film |
| 10/08/2002 | US6461428 Method and apparatus for controlling rise and fall of temperature in semiconductor substrates |
| 09/26/2002 | US20020137311 Within atomic layer or chemical vapor deposition reactors , delivering a purge gas in a sleeve surrounding a conductor associated with an electric heating assembly for a wafer so that the purge gas envelopes the electrical conductor in the sleeve and escapes from an unsealed end into an exhaust system |
| 09/25/2002 | EP0840811B1 System and method for thermal processing of a semiconductor substrate |
| 09/25/2002 | CN1371434A Slicing of single-crystal films using ion implantation |
| 09/24/2002 | US6454866 Wafer support system |
| 09/24/2002 | US6454852 High efficiency silicon wafer optimized for advanced semiconductor devices |
| 09/24/2002 | US6454563 Wafer treatment chamber having thermal reflector |
| 09/19/2002 | WO2002050875A3 Heating configuration for use in thermal processing chambers |
| 09/12/2002 | US20020125240 Heating device, method for producing same and film forming apparatus |
| 09/12/2002 | US20020124800 Apparatus for producing thin films |
| 09/10/2002 | US6449428 Gas driven rotating susceptor for rapid thermal processing (RTP) system |
| 09/04/2002 | EP1235953A1 Mini batch furnace |
| 08/27/2002 | US6441350 Temperature control system for a thermal reactor |
| 08/20/2002 | US6437290 Heat treatment apparatus having a thin light-transmitting window |
| 08/20/2002 | US6435865 Apparatus and method for positioning gas injectors in a vertical furnace |
| 08/15/2002 | WO2002063076A1 Method for reducing oxygen component and carbon component in fluoride |
| 08/15/2002 | US20020110769 Heat treatment method and heat treatment apparatus |
| 08/13/2002 | US6434327 Rapid thermal heating apparatus and method including an infrared camera to measure substrate temperature |
| 08/01/2002 | WO2002059953A1 Conductor treating single-wafer type treating device and method for semi-conductor treating |
| 08/01/2002 | US20020102510 Semiconductor manufacturing apparatus |
| 08/01/2002 | US20020102098 Heat-treating methods and systems |
| 07/31/2002 | EP1015831A4 Semiconductor processing furnace heating subassembly |
| 07/25/2002 | US20020096507 Heat treatment method and heat treatment apparatus |
| 07/23/2002 | US6423400 Electrostatic chucks formed by lamination of aluminum nitride with high melting metals and an adhesive layer, for coating silicon wafers; corrosion resistance |
| 07/18/2002 | US20020092815 Semiconductor wafer boat having stackable independently replaceable boat parts and vertical heat-treating apparatus comprising the same |
| 07/17/2002 | EP0963459B1 Wafer support apparatus |
| 07/11/2002 | US20020090802 Safe arsenic gas phase doping |
| 07/03/2002 | EP1220569A2 Heating device assembly and method |
| 07/02/2002 | US6414280 Heat treatment method and heat treatment apparatus |
| 07/02/2002 | US6413884 Substrate to rotates around a center axis in accompany with a first gas spouting toward the substrate and colliding with a second gas |
| 07/02/2002 | US6413844 Heating; exposure to arsenic doping gases; termination; cooling |
| 07/02/2002 | US6413081 Method for purging a furnace and furnace assembly |
| 07/02/2002 | US6412821 Device for the vacuum-tight connecting of two bodies of different materials |
| 06/27/2002 | WO2002050875A2 Heating configuration for use in thermal processing chambers |
| 06/25/2002 | US6409503 Heat treatment method and heat treatment apparatus |
| 06/20/2002 | WO2002006568A3 Slicing of single-crystal films using ion implantation |
| 06/20/2002 | WO2002005323A3 Thermally processing a substrate |
| 06/20/2002 | US20020076559 Quartz reacted with solution of metal compound or metal element to form silicon oxide body doped with metal elements, which when reacted with plasma gas such a fluorine, form compounds with higher boiling points than silicon fluoride |
| 06/20/2002 | US20020074324 Heat treatment apparatus and controller for heat treatment apparatus and control method for heat treatment apparatus |
| 06/18/2002 | US6407368 System for maintaining a flat zone temperature profile in LP vertical furnace |
| 06/18/2002 | US6407367 Heat treatment apparatus, heat treatment process employing the same, and process for producing semiconductor article |
| 06/13/2002 | WO2002047143A1 Heat-treating methods and systems |
| 06/13/2002 | WO2002047123A1 Heat-treating methods and systems |
| 06/12/2002 | CN1353445A Method and equipment for radiating ion beam, related method and its equipment |
| 06/11/2002 | US6403926 Thermal processing apparatus having a coolant passage |
| 06/11/2002 | US6403925 System and method for thermal processing of a semiconductor substrate |
| 06/06/2002 | WO2002027059A3 System and method for controlling movement of a workpiece in a thermal processing system |
| 06/06/2002 | WO2002023594A3 Apparatus and method for reducing contamination on thermally processed semiconductor substrates |
| 06/06/2002 | US20020067918 Heat-treating methods and systems |
| 06/04/2002 | US6399921 System and method for thermal processing of a semiconductor substrate |
| 05/30/2002 | US20020062792 Wafer support device and reactor system for epitaxial layer growth |
| 05/29/2002 | EP1209251A2 Temperature control system for wafer |
| 05/28/2002 | US6395085 Purity silicon wafer for use in advanced semiconductor devices |
| 05/21/2002 | US6391116 Semiconductor device manufacturing apparatus and semiconductor device manufacturing method |