| Patents for C30B 31 - Diffusion or doping processes for single crystals or homogeneous polycrystalline material with defined structure; Apparatus therefor (2,201) |
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| 05/29/1997 | WO1997019303A1 Temperature controlled chuck for vacuum processing |
| 05/28/1997 | EP0776026A1 Semiconductor device manufacturing apparatus employing vacuum system |
| 05/21/1997 | EP0633997A4 A rapid thermal processing apparatus for processing semiconductor wafers. |
| 05/14/1997 | EP0773310A1 Process for producing a silicon wafer |
| 04/23/1997 | EP0769810A2 Bipolar transistor and method of fabricating it |
| 04/23/1997 | EP0769809A1 Process for suppressing crystalline defects in silicon wafers |
| 04/22/1997 | US5622639 Heat treating apparatus |
| 04/09/1997 | EP0513191B1 Doped crystalline compositions and a method for preparation thereof |
| 04/08/1997 | US5618345 Method of producing self-supporting thin film of silicon single crystal |
| 04/02/1997 | EP0733130A4 Apparatus for heating or cooling wafers |
| 04/01/1997 | US5616264 Method and apparatus for controlling temperature in rapid heat treatment system |
| 04/01/1997 | US5616025 Vertical diffusion furnace having improved gas flow |
| 04/01/1997 | US5616024 Apparatuses for heating semiconductor wafers, ceramic heaters and a process for manufacturing the same, a process for manufacturing ceramic articles |
| 03/19/1997 | EP0763849A1 Process for preparing thin semiconductor films |
| 03/11/1997 | US5609926 Diamond doping |
| 03/06/1997 | WO1997003236A3 System and method for thermal processing of a semiconductor substrate |
| 03/04/1997 | CA2076334C Ambient-free processing system |
| 02/25/1997 | US5605574 Semiconductor wafer support apparatus and method |
| 02/25/1997 | US5605454 Four port tube to extend the life of quartz tubes used for the well drive process |
| 02/18/1997 | US5603772 Furnace equipped with independently controllable heater elements for uniformly heating semiconductor wafers |
| 02/11/1997 | US5601428 Vertical heat-treating apparatus and heat insulator |
| 01/30/1997 | WO1997003236A2 System and method for thermal processing of a semiconductor substrate |
| 01/29/1997 | EP0756118A2 Fluid control system and valve to be used therein |
| 01/21/1997 | US5595604 Wafer supporting boat |
| 01/07/1997 | US5592581 Heat treatment apparatus |
| 01/07/1997 | US5591484 Chemical vapor deposition using amino-borane compounds |
| 12/31/1996 | US5588831 Furnace system equipped with protected combustion nozzle used in fabrication of semiconductor device |
| 12/31/1996 | US5588827 Passive gas substrate thermal conditioning apparatus and method |
| 12/27/1996 | EP0750058A2 Doping of crystalline substrates |
| 12/24/1996 | US5587210 Growing and releasing diamonds |
| 12/24/1996 | US5586880 Heat treatment apparatus and heat treatment boat |
| 12/19/1996 | WO1996041109A1 Passive gas substrate thermal conditioning apparatus and method |
| 12/19/1996 | DE19521716A1 Process tube for making semiconductor wafers |
| 12/17/1996 | US5584936 Susceptor for semiconductor wafer processing |
| 12/08/1996 | CA2154048A1 Wafer support structure for a wafer backplane with a curved surface |
| 12/04/1996 | EP0746009A1 Multi-layer susceptor for rapid thermal process reactors |
| 12/04/1996 | CN1137296A Apparatus for heating or cooling wafers |
| 12/03/1996 | US5580388 Multi-layer susceptor for rapid thermal process reactors |
| 11/28/1996 | DE19537759C1 Implantation of dopant into semiconductor material |
| 11/13/1996 | EP0742582A2 Doping procedure for semiconductor growth processes |
| 11/05/1996 | US5571010 Heat treatment method and apparatus |
| 10/29/1996 | US5569402 Curing oven for magazine holding computer chip lead frames, providing flow direction control for hot gas stream |
| 10/22/1996 | US5567152 Heat processing apparatus |
| 10/22/1996 | US5567149 Exhaust system for high temperature furnace |
| 10/17/1996 | WO1996032738A1 A METHOD FOR INTRODUCTION OF AN IMPURITY DOPANT IN SiC, A SEMICONDUCTOR DEVICE FORMED BY THE METHOD AND A USE OF A HIGHLY DOPED AMORPHOUS LAYER AS A SOURCE FOR DOPANT DIFFUSION INTO SiC |
| 10/17/1996 | DE19514083A1 Rapid thermal processing reactor operation |
| 10/09/1996 | EP0736614A2 Method and apparatus for producing semiconductor device |
| 09/25/1996 | EP0733130A1 Apparatus for heating or cooling wafers |
| 09/19/1996 | WO1996028843A1 Heat-treating apparatus |
| 08/27/1996 | US5550082 Method and apparatus for doping silicon wafers using a solid dopant source and rapid thermal processing |
| 07/31/1996 | EP0702775A4 Apparatus for thermal treatment of thin film wafer |
| 07/30/1996 | US5540782 Heat treating apparatus having heat transmission-preventing plates |
| 07/23/1996 | US5538763 Method of preparing carbon cluster film having electrical conductivity |
| 07/23/1996 | US5538230 Silicon carbide carrier for wafer processing |
| 07/09/1996 | US5534074 Vertical boat for holding semiconductor wafers |
| 06/25/1996 | US5530222 Apparatus for positioning a furnace module in a horizontal diffusion furnace |
| 06/05/1996 | EP0714997A1 Process for manufacturing layers of diamond doped with boron |
| 05/28/1996 | US5520742 Thermal processing apparatus with heat shielding member |
| 05/14/1996 | US5517001 High performance horizontal diffusion furnace system |
| 05/01/1996 | EP0709869A1 Field emission devices employing enhanced diamond field emitters |
| 05/01/1996 | EP0708983A1 Chemical vapor deposition process for fabricating layered superlattice materials |
| 04/09/1996 | US5506389 Thermal processing furnace and fabrication method thereof |
| 04/03/1996 | EP0704554A1 Wafer supporting boat |
| 04/03/1996 | EP0511294B1 Heating apparatus for semiconductor wafers or substrates |
| 04/02/1996 | US5504346 Insitu detection of tube sagging in semiconductor diffusion furnace using a laser beam that is blocked when tube sags |
| 03/27/1996 | EP0702775A1 Apparatus for thermal treatment of thin film wafer |
| 02/27/1996 | US5494852 Prestabilization of temperature and gas mixture |
| 02/22/1996 | WO1996005019A1 Wafer carrier and method for making same |
| 02/20/1996 | US5492229 Vertical boat and a method for making the same |
| 02/07/1996 | EP0695922A1 Heating apparatus for semiconductor wafers or substrates |
| 02/06/1996 | US5489550 Gas-phase doping method using germanium-containing additive |
| 01/23/1996 | US5487127 Rapid thermal heating apparatus and method utilizing plurality of light pipes |
| 01/09/1996 | US5483041 For measuring thermal energy in a high temperature furnace |
| 01/09/1996 | US5482559 Heat treatment boat |
| 01/09/1996 | US5482558 Heat treatment boat support |
| 01/03/1996 | EP0689722A1 Method and apparatus for doping a solid material |
| 01/02/1996 | US5481088 Cooling system for a horizontal diffusion furnace |
| 01/02/1996 | US5480300 Vertical heat-treating apparatus and heat insulator |
| 12/28/1995 | WO1995023427A3 Apparatus for thermal treatment of thin film wafer |
| 11/21/1995 | US5468297 Wafer boat for supporting silicon wafers |
| 11/14/1995 | US5467220 Method and apparatus for improving semiconductor wafer surface temperature uniformity |
| 10/24/1995 | US5461214 High performance horizontal diffusion furnace system |
| 10/17/1995 | US5458688 Heat treatment boat |
| 10/03/1995 | CA1337169C Zone melt recrystallization apparatus |
| 09/28/1995 | DE19510209A1 Doping diamond to obtain optical or electrical property |
| 09/07/1995 | DE19505818A1 Doping semiconductor crystals, esp. silicon@ crystals |
| 08/31/1995 | WO1995023427A2 Apparatus for thermal treatment of thin film wafer |
| 08/29/1995 | US5445676 Method and apparatus for manufacturing semiconductor devices |
| 08/22/1995 | US5444217 Rapid thermal processing apparatus for processing semiconductor wafers |
| 07/18/1995 | US5434090 Processing chamber for processing semiconductor substrates |
| 07/11/1995 | US5431561 Method and apparatus for heat treating |
| 07/04/1995 | US5429498 Thermal processing system |
| 06/28/1995 | EP0506690B1 Transport system, in particular for transporting silicon monocrystals through the tank of a research reactor |
| 06/22/1995 | WO1995016800A1 Apparatus for heating or cooling wafers |
| 06/07/1995 | EP0656076A1 Furnace and control method therefor |
| 05/23/1995 | US5418885 Three-zone rapid thermal processing system utilizing wafer edge heating means |
| 05/09/1995 | US5414244 Semiconductor wafer heat treatment apparatus |
| 04/18/1995 | US5407349 Exhaust system for high temperature furnace |
| 04/11/1995 | US5405446 Apparatus for heat processing a substrate |
| 04/11/1995 | US5405444 Process chamber purge module for semiconductor processing equipment |