Patents for C30B 31 - Diffusion or doping processes for single crystals or homogeneous polycrystalline material with defined structure; Apparatus therefor (2,201)
05/2011
05/18/2011CN201835008U Soft landing diffusion furnace
05/18/2011CN1628370B Methods of treating a silicon carbide substrate for improved epitaxial deposition and resulting structures and devices
05/12/2011WO2011055672A1 Hybrid silicon wafer
05/11/2011CN201826036U Air feeding pipe for diffusion furnace
04/2011
04/27/2011CN102037166A Method for transferring a thin layer by proton exchange
04/20/2011EP2311076A2 Rapid thermal processing chamber with shower head
04/20/2011CN101532179B Method for manufacturing silicon wafer on insulator
04/06/2011CN201788993U Solar cell diffusion exhaust
04/06/2011CN201788959U Diffusing quartz boat used for manufacturing silicon wafers
04/06/2011CN201785548U Chain type diffusion equipment
03/2011
03/31/2011DE102009055667A1 Method for the production of a disc comprising gallium nitride, comprises providing a substrate from monocrystalline silicon with a superficial layer of monocrystalline 3C-silicon carbide
03/23/2011CN101290877B Preparing method of polycrystalline silicon thin film
03/16/2011EP1300380B1 Adhesive composite coating for diamond and diamond-containing materials and method for producing said coating.
03/10/2011DE102010028924A1 Vefahren zur Herstellung eines Siliciumeinkristalls und Verfahren zur Herstellung eines Siliciumwafers Vefahren for producing a silicon single crystal and method for producing a silicon wafer
02/2011
02/24/2011WO2011020175A1 Rare earth-doped sapphire films and related methods
02/16/2011EP2283172A1 Method for transferring a thin layer by proton exchange
02/16/2011CN201746609U Tailpipe joint of diffusion furnace for producing crystalline silicon solar cell
02/10/2011WO2011016837A1 Large area deposition and doping of graphene, and products including the same
02/10/2011US20110030991 Large area deposition and doping of graphene, and products including the same
01/2011
01/27/2011US20110019982 Rapid thermal processing apparatus and method of manufacture of semiconductor device
01/19/2011CN201713608U Silicon chip diffusion furnace for solar battery
01/12/2011CN201704430U Diffusing flow equalization board for horizontal diffusion furnace
01/05/2011CN101051609B High voltage protective interlock for ion injector
12/2010
12/29/2010WO2010149779A1 Method for making fancy pale blue or fancy pale blue /green single crystal cvd diamond and product obtained
12/29/2010WO2010149777A1 Method for making fancy orange coloured single crystal cvd diamond and product obtained
12/29/2010WO2010149776A1 Method for treating diamond material and product obtained
12/29/2010WO2010149775A1 Method for treating single crystal cvd diamond and product obtained
12/29/2010CA2765901A1 Diamond material
12/29/2010CA2765898A1 Method for treating single crystal cvd diamond and product obtained
12/29/2010CA2765808A1 Method for making fancy pale blue or fancy pale blue/green single crystal cvd diamond and product obtained
12/29/2010CA2765804A1 Method for making fancy orange coloured single crystal cvd diamond and product obtained
12/23/2010WO2010099862A3 Device and method for simultaneously microstructuring and doping semiconductor substrates
12/22/2010CN101922046A Plasma immersion implantation device
12/15/2010CN101916799A Method for preparing crystalline silicon solar cell selective emitter junction
12/15/2010CN101916798A Preparation method for selective emitting electrode structure of crystalline silicon solar battery
12/09/2010WO2010140665A1 Process and apparatus for production of crystals of compound of metal belonging to group-13 on periodic table
12/08/2010CN101368288B P type ZnO thin film production method
12/07/2010US7847218 System and process for heating semiconductor wafers by optimizing absorption of electromagnetic energy
12/02/2010DE102004060624B4 Halbleiterscheibe mit epitaktisch abgeschiedener Schicht und Verfahren zur Herstellung der Halbleiterscheibe Semiconductor wafer having epitaxially deposited layer and method for manufacturing the semiconductor wafer
12/01/2010CN101392409B Pulsed processing semiconductor heating methods using combinations of heating sources
11/2010
11/25/2010DE4345602B4 Verfahren zum Zünden und Betreiben einer Niederspannungs-Bogenentladung, Vakuumbehandlungsanlage und Kathodenkammer hierfür sowie Verwendung des Verfahrens Method for starting and operating a low-voltage arc discharge, vacuum treatment plant and cathode chamber for this and using the method
11/23/2010US7837795 Low temperature load and bake
11/17/2010EP1405333B1 Wafer boat and method of making a slip free wafer boat
10/2010
10/14/2010WO2010115862A1 Method for boron doping silicon wafers
10/13/2010CN201605353U 软着陆扩散设备的炉门控制机构 Soft landing door control mechanism diffusion equipment
10/13/2010CN101857972A Silicon chip phosphorous diffusion impurity removal process for manufacturing solar cell
09/2010
09/22/2010CN201588007U Sealing device used for sealing quartz tube in diffusion furnace
09/10/2010WO2010099862A2 Device and method for simultaneously microstructuring and doping semiconductor substrates
09/08/2010CN201574212U Diffusion furnace for solar battery plate
09/08/2010CN101824654A Method for manufacturing black silicon material
09/08/2010CN101824653A Method for manufacturing black silicon material by scanning and irradiation of light source of broad-pulse laser
09/08/2010CN101026078B Ion injection device
08/2010
08/12/2010WO2010089928A1 GaN SUBSTRATE, METHOD FOR MANUFACTURING GaN SUBSTRATE, METHOD FOR MANUFACTURING GaN LAYER BONDED SUBSTRATE AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE
08/04/2010EP2212913A1 Systems and methods for preparation of epitaxially textured thick films
08/04/2010EP1570107B1 Susceptor system
08/04/2010CN101792933A Method for preparing material of solar grade silicon monocrystals by mixing and doping
07/2010
07/28/2010CN101787566A Gallium doping method of Czochralski silicon monocrystalline and doping device thereof
07/21/2010CN101781797A Method and system for low temperature ion implantation
07/14/2010CN101775661A Preparation method of sapphire doping agent
07/08/2010US20100171232 Method for semiconductor solidification with the addition of doped semiconductor charges during crystallisation
07/07/2010CN101772597A Nanocrystalline alloys of the Fe3Al(Ru) type and use thereof optionally in nanocrystalline form for making electrodes for sodium chlorate synthesis
06/2010
06/30/2010EP1817445B1 Method for making a dismountable substrate
06/02/2010CN101333686B Method for preparing metallic nano-zinc of polyspinal deformity on zinc oxide substrate
06/02/2010CN101275284B Transition and diffusion method for aluminum impurity source
05/2010
05/19/2010CN201478255U Ion source of ion implanter
05/19/2010CN201476552U Diffusion furnace with purging treatment device
05/12/2010CN101705520A High-temperature cobalt ion diffusion color forming method of rock crystal
04/2010
04/21/2010CN201440038U Diffusion furnace door sealing structure
04/20/2010USRE41249 Quartz glass body having improved resistance against plasma corrosion, and method for production thereof
04/14/2010CN201438080U Lifting device for automatic boat of diffusion furnace
04/14/2010CN101694011A Device and method for decreasing temperature rise of wafer in ion implantation process
04/07/2010CN101220518B Tail gas collecting device for high temperature diffusion system
03/2010
03/31/2010EP2168917A1 Microspheres of silicon and photonic sponges, method for production and uses thereof in the manufacture of photonic devices
03/17/2010CN101671846A Method for reducing stress of cubic boron nitride thin film
03/17/2010CN101671841A Method for preparing nitrogenous dopant for preparing czochralski silicon single crystal
03/16/2010CA2410023C Coated nanoparticles
03/09/2010US7674336 Processing apparatus
03/04/2010DE102008045533A1 Changing structure of semiconductor layer e.g. amorphous silicon layer, by irradiating area of semiconductor layer with laser light generated from laser beam, and splitting laser beam into beam parts with different radiation intensities
02/2010
02/17/2010EP2154712A1 Method for preparing a partially or fully semi-insulating or P-doped ZnO substrate, substrates obtained, and electronic, electro-optical or optoelectronic devices comprising same.
02/10/2010EP2150640A1 Nanocrystalline alloys of the fe3al(ru) type and use thereof optionally in nanocrystalline form for making electrodes for sodium chlorate synthesis
02/02/2010US7655093 Wafer support system
01/2010
01/28/2010US20100022049 Mid-IR Microchip Laser: ZnS:Cr2+ Laser with Saturable Absorber Material
01/13/2010CN201381378Y Quartz furnace tube for preparing solar battery
01/13/2010CN100580156C Controllable doping method for Si3N4 single-crystal low-dimension nano material
12/2009
12/30/2009CN100576415C Ion implantation device and method for obtaining uneven ion implant energy
12/23/2009CN101609794A Apparatus and method of temperature conrol during cleaving processes of thick film materials
12/16/2009CN101603208A Silica tube for growing semi-insulated gallium arsenide and method for doping carbon in gallium arsenide
12/16/2009CN101603205A Carbon-doped yttrium aluminium garnet crystal and two-step preparation method thereof
11/2009
11/17/2009US7618830 Rapid thermal processing apparatus and methods
11/12/2009WO2009136100A1 Method for transferring a thin layer by proton exchange
11/10/2009US7615121 Susceptor system
10/2009
10/21/2009CN101562214A Method for doping titanium dioxide nanotube array
10/15/2009DE102007058053B4 Diffusionsofen und Verfahren zur Erzeugung einer Gasströmung Diffusion furnace and method for generating a gas flow
10/07/2009CN100547126C Device for adding doping agent for germanium monocrystal
09/2009
09/16/2009EP2100989A1 Method for preparing substrate having monocrystalline film
09/16/2009CN101532179A Method for manufacturing silicon wafer on insulator
09/16/2009CN100540756C Method for preparing p-type zinc oxide thin film by using n-type zinc oxide
09/09/2009CN100537424C New material and method of fabrication therefor
08/2009
08/19/2009EP2089562A1 Reverse oxidation post-growth process for tailored gain profile in solid-state devices
08/19/2009CN100530548C Systems and methods for implant dosage control, and wafer implantation method by using ion beam
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