Patents for C30B 31 - Diffusion or doping processes for single crystals or homogeneous polycrystalline material with defined structure; Apparatus therefor (2,201)
02/2008
02/14/2008US20080038524 Selective Doping of a Material
02/13/2008EP1138060B1 Gas driven rotating susceptor for rapid thermal processing (rtp) system
02/12/2008US7329947 Heat treatment jig for semiconductor substrate
02/06/2008CN101118940A Built crystal substrate and liquid built crystal growing method
02/05/2008US7327947 Heat treating apparatus and method
01/2008
01/10/2008US20080008460 System and process for heating semiconductor wafers by optimizing absorption of electromagnetic energy
01/08/2008US7317870 Pulsed processing semiconductor heating methods using combinations of heating sources
01/08/2008US7316969 Method and apparatus for thermally treating substrates
12/2007
12/27/2007US20070297775 Heating Configuration for Use in Thermal Processing Chambers
12/20/2007DE19649508B4 Halter für Halbleiterplatten Holders for semiconductor wafers
12/12/2007CN101086945A Ion beam tuning in an ion implanter
12/12/2007CN100354205C Method and apparatus for increasing bulk conductivity of a ferroelectric material
12/05/2007EP1581667B1 Support system for a treatment apparatus
11/2007
11/29/2007US20070275333 Method for Controlling the Treatment of a Crystal with a Liquid
11/28/2007CN101079375A Ion injection simulation method
11/28/2007CN100351435C Process for preparing gas phase doped float-zone silicon monocrystal for solar cell
11/22/2007WO2007131547A1 Semiconductor control device for a cvd or rtp process
11/21/2007CN100350561C Method for fabricating SIGE substrate materials on metastable insulator and substrate materials
11/15/2007DE19652471B4 Verfahren zur Wasserstoffpassivierung von Verbindungshalbleitern Process for hydrogen passivation of compound semiconductors
10/2007
10/31/2007CN101064234A Apparatus and method for ion implanatation leading to partial ion implant energy
10/25/2007WO2007053016A3 Surface and method for the manufacture of photovolataic cells using a diffusion process
10/24/2007CN200964448Y Crystalline silicon chip diffusion furnace
10/17/2007EP1493214B1 Solid-state laser devices with radial dopant valence profile
10/17/2007CN101054730A Controllable doping method for Si3N4 single-crystal low-dimension nano material
10/17/2007CN101054721A Silicon single crystal wafer for IGBT and method for manufacturing silicon single crystal wafer for IGBT
10/10/2007CN101051609A High voltage protective interlock for ion injector
09/2007
09/26/2007CN200953336Y Indirect heating cathode fixing device in long-life ion source
09/19/2007CN101038869A Water-cooling plasma shower
09/11/2007US7269343 Heating configuration for use in thermal processing chambers
08/2007
08/29/2007CN101026078A Ion injection device
08/23/2007WO2007094231A1 Method for manufacturing semiconductor substrate
08/16/2007US20070190761 Material and method of fabrication therefor
08/16/2007US20070186858 Susceptor
08/15/2007EP1817445A1 Method for making a dismountable substrate
08/01/2007CN101009191A Ion implantation system having variable screen apertures and method of implanting ions using the same
07/2007
07/25/2007EP1811065A1 Single crystal silicon wafer for insulated gate bipolar transistors and process for producing the same
07/11/2007CN1326219C Method for reducing 4H-silicon carbide resistivity of oriented phosphorus ion filling (0001)
07/03/2007US7237606 Wafer supporter
06/2007
06/26/2007US7235139 Wafer carrier for growing GaN wafers
06/26/2007US7235137 Conductor treating single-wafer type treating device and method for semi-conductor treating
06/20/2007CN2914323Y Air-feeding system of cold plasma shower
06/20/2007CN1983517A 半导体处理 Semiconductor processing
06/14/2007US20070131173 Wafer support system
06/06/2007EP1793021A2 Method for semiconductor processing using silicon carbide article
05/2007
05/30/2007EP1790757A1 Susceptor
05/30/2007CN1972879A Selective doping of a material
05/16/2007EP1784369A1 Selective doping of a material
05/08/2007US7214271 Silicon single crystal wafer process apparatus, silicon single crystal wafer, and manufacturing method of silicon epitaxial wafer
05/01/2007US7211769 Heating chamber and method of heating a wafer
04/2007
04/25/2007CN1312329C Method for reducing oxygen component and carbon component in fluoride
04/19/2007US20070084848 Heat treating apparatus and method
04/18/2007CN2891270Y Heat-insulating and gas-supply apparatus in long-life ion source
04/05/2007WO2007035983A1 Ion detector
04/05/2007US20070075086 Processing apparatus
04/04/2007CN1308503C Crucible in use for equilibrium method of gas phase transmission under lithium atmosphere
03/2007
03/28/2007EP1590510B1 Device for producing electroconductive passages in a semiconductor wafer by means of thermomigration
03/28/2007CN1938822A Susceptor
03/06/2007US7186298 Wafer support system
03/01/2007WO2007023362A1 Doping of particulate semiconductor materials
03/01/2007DE102005041643A1 Semiconductor method for producing an isolated semiconductor substrate uses a masking layer with holes and an output layer
02/2007
02/28/2007EP1559133B1 Forced convection assisted rapid thermal furnace
02/07/2007CN1908254A Device for doping metal catalyst for use in low-temperature crystallization of polysilicon and doping method therefor
02/01/2007WO2007014032A1 s SEPARATION OF GROWN DIAMOND FROM DIAMOND SEEDS MOSAIC
01/2007
01/30/2007US7169233 Reactor chamber
01/24/2007CN1902130A New material and method of fabrication therefor
01/18/2007US20070012241 Methods of assessing the temperature of semiconductor wafer substrates within deposition apparatuses
01/17/2007EP1203108B1 Cooled window
01/17/2007CN1896344A Method for doping oxygen to gallium nitride crystal and oxygen-doped n-type gallium nitride single crystal substrate
01/17/2007CN1295745C Method and device for thermally treating substrates
01/10/2007CN1892987A Systems and methods for implant dosage control, and wafer implantation method by using ion beam
01/04/2007WO2007000704A1 Apparatus and method for maintaining a near-atmospheric pressure inside a process chamber
01/04/2007CA2840566A1 Lithium manganese compounds and methods of making the same
12/2006
12/28/2006WO2006085798A3 Method for manufacturing of article comprising silicon substrate with silicon carbide film on its surface
12/28/2006US20060291834 Method and apparatus for thermally treating substrates
12/26/2006US7155102 Method and structure of electric field poling of Ti indiffused LiNbO3 substrates without the use of grinding process
12/19/2006US7151007 Doped organic semiconductor materials and process for their preparation
12/14/2006WO2006131251A1 Mixture for doping semiconductors
12/13/2006EP1732111A1 Susceptor
12/06/2006CN1873919A Air supply system of shower in water cold plasma
12/06/2006CN1288713C Heating system and method of reactor for heating atmosphere
11/2006
11/30/2006DE102005024073A1 Halbleiter-Schichtstruktur und Verfahren zur Herstellung einer Halbleiter-Schichtstruktur Semiconductor layer structure and process for producing a semiconductor layer structure
11/22/2006CN1868066A Methods of forming power semiconductor devices using boule-grown silicon carbide drift layers and power semiconductor devices formed thereby
11/22/2006CN1866461A Ion beam transmission control optimizing method
11/15/2006EP1116261B1 Method and apparatus for cooling substrates
11/02/2006US20060243385 Device for producing electroconductive passages in a semiconductor wafer by means of thermomigration
11/01/2006CN1282769C Artificial hair crystal and preparation method thereof
10/2006
10/31/2006US7129123 SOI wafer and a method for producing an SOI wafer
10/26/2006DE102005018162A1 Semiconductor treatment device for chemical vapor deposition, comprises reactor chamber with circular holder for a circular disk-shaped substrate formed on substrate holding zone adjacent to ring opening
10/19/2006US20060231016 Deposition apparatuses
10/11/2006CN1845292A Magnetic field assistant self glow plasma ion implantation device
10/11/2006CN1279577C Method for carrying out thermally processing for substrate
10/04/2006EP1479267B1 System and method for lamp split zone control
09/2006
09/27/2006EP1704118A1 New material and method of fabrication therefor
09/19/2006US7108753 Staggered ribs on process chamber to reduce thermal effects
09/19/2006US7108748 Low temperature load and bake
09/14/2006WO2006081104A3 Semiconductor wafer boat for a vertical furnace
09/14/2006US20060201414 Low temperature load and bake
09/13/2006CN1832100A One-dimensional mechanical scaning device of ion implantation apparatus
09/13/2006CN1275290C Method and device for doping diffusion and oxidation of silicon wafers under reduced pressure
08/2006
08/31/2006WO2006090034A1 Method for making a dismountable substrate
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