| Patents for C30B 31 - Diffusion or doping processes for single crystals or homogeneous polycrystalline material with defined structure; Apparatus therefor (2,201) |
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| 04/23/1985 | US4512391 Apparatus for thermal treatment of semiconductor wafers by gas conduction incorporating peripheral gas inlet |
| 03/26/1985 | US4506815 Bubbler cylinder and dip tube device |
| 03/20/1985 | EP0134716A1 Process for high temperature drive-in diffusion of dopants into semiconductor wafers |
| 03/05/1985 | US4503087 High speed |
| 01/30/1985 | EP0132321A1 Optical materials from intercalation of polyvalent cations in beta double prime alumina |
| 01/29/1985 | US4496843 Method for producing metal ions |
| 01/15/1985 | US4493977 Method for heating semiconductor wafers by a light-radiant heating furnace |
| 01/15/1985 | US4493287 Diffusion equipment |
| 01/09/1985 | EP0130311A2 Stable suspensions of boron, phosphorus, antimony and arsenic dopants |
| 12/25/1984 | US4490192 Stable suspensions of boron, phosphorus, antimony and arsenic dopants |
| 12/12/1984 | EP0028266B1 Boat for conveying semiconductor substrates |
| 12/11/1984 | US4487787 Method of growing silicate glass layers employing chemical vapor deposition process |
| 12/04/1984 | US4486465 Method for deposition on a semiconductor wafer |
| 11/27/1984 | US4484538 Apparatus for providing depletion-free uniform thickness CVD thin-film on semiconductor wafers |
| 11/06/1984 | US4481406 Heater assembly for thermal processing of a semiconductor wafer in a vacuum chamber |
| 10/16/1984 | US4477112 Semiconductor substrate handling tray |
| 10/11/1984 | WO1984003905A1 Tetramethyltin dopant source for mocvd grown epitaxial semiconductor layers |
| 09/19/1984 | EP0119130A1 Transparent heating apparatus having at least two zones at different temperatures |
| 09/18/1984 | US4472622 Apparatus for thermal treatment of semiconductors |
| 09/18/1984 | US4472206 Volatility, coatings, uniformity |
| 08/21/1984 | US4466381 Coating of semiconductor wafers and apparatus therefor |
| 08/14/1984 | US4465529 Irradiation with electron beam |
| 07/18/1984 | EP0113518A2 Bubbler cylinder and dip tube device |
| 06/20/1984 | EP0111085A2 Ion implantation process for compound semiconductor |
| 06/05/1984 | US4453080 Temperature control of a workpiece under ion implantation |
| 05/15/1984 | US4449037 Method and apparatus for heating semiconductor wafers |
| 05/02/1984 | EP0036859B1 Boat for wafer processing |
| 04/04/1984 | EP0104412A1 Polymeric boron-nitrogen dopant |
| 04/03/1984 | US4440538 Apparatus for loading and unloading a furnace |
| 03/27/1984 | US4439265 Fabrication method for LiNbO3 and LiTaO3 integrated optics devices |
| 03/13/1984 | US4436674 Vapor mass flow control system |
| 02/28/1984 | US4434036 Method and apparatus for doping semiconductor material |
| 02/15/1984 | EP0100539A2 Assembled device for supporting semiconductor wafers or the like |
| 01/17/1984 | US4426237 Volatile metal oxide suppression in molecular beam epitaxy systems |
| 12/20/1983 | CA1159161A1 Method and apparatus for conducting heat to or from an article being treated under vacuum |
| 12/06/1983 | CA1158109A1 Coating of semiconductor wafers and apparatus therefor |
| 11/15/1983 | US4415385 Diffusion of impurities into semiconductor using semi-closed inner diffusion vessel |
| 11/09/1983 | EP0093504A1 Apparatus for introducing silicon wafers in magazines into a furnace |
| 10/18/1983 | US4410974 Capacitance detection type record stylus and method for making the stylus |
| 10/18/1983 | US4410801 Ion implantation equipment |
| 09/13/1983 | US4404233 Ion implanting method |
| 07/26/1983 | CA1150668A1 Implantation of vaporized material on melted substrates |
| 07/19/1983 | US4394123 Tiltable support bracket for slidably supporting quartz support tubes for semiconductor wafer processing boards, and processing apparatus embodying such brackets |
| 07/12/1983 | US4393013 Vapor mass flow control system |
| 07/12/1983 | US4392928 Method of doping a semiconductor |
| 06/28/1983 | US4389967 Boat for carrying semiconductor substrates |
| 06/21/1983 | US4389256 Method of manufacturing pn junction in group II-VI compound semiconductor |
| 05/10/1983 | US4382776 Quartz tube for thermal processing of semiconductor substrates |
| 05/03/1983 | US4382099 Dopant predeposition from high pressure plasma source |
| 04/27/1983 | EP0077408A1 A method and apparatus for the heat treatment of semiconductor articles |
| 04/26/1983 | US4381213 Partial vacuum boron diffusion process |
| 04/05/1983 | US4379006 B2 O3 Diffusion processes |
| 03/15/1983 | CA1143074A1 Boat for wafer processing |
| 02/15/1983 | US4373975 Vapor phase diffusion of antimony |
| 01/25/1983 | US4370176 Process for fast droping of semiconductors |
| 01/25/1983 | US4370158 Heat-treating method for semiconductor components |
| 01/11/1983 | US4367768 Refractory protective tube for the heat treatment of semiconductor components |
| 12/22/1982 | EP0067521A2 Process for maximizing laser crystal efficiency by effecting single site for dopant |
| 12/22/1982 | EP0067165A1 Improved partial vacuum boron diffusion process. |
| 12/08/1982 | EP0066288A1 Method for ion-implanting metal elements |
| 11/25/1982 | EP0051639A4 Implantation of vaporized material on melted substrates. |
| 11/23/1982 | US4360393 Vapor deposition of H3 PO4 and formation of thin phosphorus layer on silicon substrates |
| 10/26/1982 | US4355974 Wafer boat |
| 10/13/1982 | EP0062174A1 Apparatus treating specimens at raised temperatures |
| 09/28/1982 | US4351805 Single gas flow elevated pressure reactor |
| 08/31/1982 | US4347431 Diffusion furnace |
| 08/17/1982 | US4345142 Directly heatable semiconductor tubular bodies |
| 07/21/1982 | EP0056326A2 Coating of semiconductor wafers and apparatus therefor |
| 07/07/1982 | EP0055619A1 Method for regulating concentration and distribution of oxygen in Czochralski grown silicon |
| 06/24/1982 | WO1982002065A1 Improved partial vacuum boron diffusion process |
| 06/15/1982 | US4335160 Chemical process |
| 06/08/1982 | CA1125440A1 Method of the boron doping of silicon bodies |
| 05/19/1982 | EP0051639A1 Implantation of vaporized material on melted substrates. |
| 05/11/1982 | US4329016 Diffusion of titanium into lithium niobate from a titanium oxide-0ilica composite layer |
| 03/09/1982 | US4318889 Impermeable cooled closing plug for processing tubes, in particular in semiconductor manufacture |
| 03/02/1982 | US4317680 Diffusion source and method of preparing |
| 02/24/1982 | EP0046355A1 Quartz tube for thermal processing of semiconductor substrates |
| 02/02/1982 | US4313773 Method for removing borosilicate and boron rich oxides from a silicon body prior to doping silicon bodies with a SiB6 solid source |
| 01/26/1982 | US4312294 Apparatus for thermal treatment of semiconductors |
| 12/02/1981 | EP0040646A1 Cooled closure for reaction tubes, especially in the manufacture of semiconductors |
| 11/26/1981 | WO1981003344A1 Implantation of vaporized material on melted substrates |
| 11/12/1981 | WO1981003239A1 Ion implantation apparatus for semiconductor manufacture |
| 09/22/1981 | US4290830 Method of selectively diffusing aluminium into a silicon semiconductor substrate |
| 08/18/1981 | US4284663 Increasing refractive index |
| 08/12/1981 | EP0033685A1 Process for doping semiconductors rapidly |
| 07/28/1981 | US4281030 Particle flux |
| 07/22/1981 | EP0032174A1 Method of doping silicium substrates by diffusion of boron and use of this method for the manufacture of the base zones of bipolar transistors |
| 07/14/1981 | US4278422 Diffusion tube support collar |
| 07/08/1981 | EP0031671A2 A method of growing silicate glass layers employing a chemical vapour deposition process |
| 07/08/1981 | EP0031546A2 Ion implantation apparatus |
| 07/07/1981 | US4277307 Method of restoring Si crystal lattice order after neutron irradiation |
| 07/07/1981 | US4277293 Growth of synthetic diamonds having altered electrical conductivity |
| 05/13/1981 | EP0028266A1 Boat for conveying semiconductor substrates |
| 05/05/1981 | CA1100390A1 N-conductivity silicon monocrystals produced by neutron irradiation |
| 04/14/1981 | US4261762 Method for conducting heat to or from an article being treated under vacuum |
| 03/25/1981 | EP0025670A1 Method and apparatus for conducting heat to or from an article being treated under vacuum |
| 03/24/1981 | CA1098219A1 Semiconductors |
| 03/19/1981 | WO1981000681A1 Boat for wafer processing |
| 03/17/1981 | US4256229 Boat for wafer processing |
| 02/10/1981 | US4249970 Exposure to an oxygen-boron tribromide gas mixture to form a boron glass layer over a silicon hexabromide layer; removal of glass; heat treatment |