Patents for C30B 31 - Diffusion or doping processes for single crystals or homogeneous polycrystalline material with defined structure; Apparatus therefor (2,201)
05/2004
05/20/2004US20040097088 Conductor treating single-wafer type treating device and method for semi-conductor treating
05/19/2004EP1419520A2 System and method for fast ambient gas switching in rapid thermal processing
05/18/2004US6737613 Heat treatment apparatus and method for processing substrates
05/13/2004WO2004040650A1 Soi wafer and method for manufacturing soi wafer
05/13/2004DE10239775B3 Production of a silicon wafer used in the production of a semiconductor component comprises treating the cleaned wafer with an aqueous ozone solution, coating with polycrystalline silicon, finely grinding, and epitaxially growing the wafer
05/12/2004EP1021586A4 A rapid thermal processing barrel reactor for processing substrates
05/06/2004US20040083621 Forced convection assisted rapid thermal furnace
04/2004
04/21/2004CN1491300A Method for reducing oxygen component and carbon component in fluoride
04/13/2004US6720531 Temperature uniformity during chemical vapor deposition
04/07/2004EP1405333A1 Apparatus and method of making a slip free wafer boat
04/07/2004EP1405018A2 Wafer boat with arcuate wafer support arms
04/06/2004US6718127 Heating device of the light irradiation type
04/06/2004US6716027 When any of the boat parts experiences thermal deformation after long periods of use, the boat part may be readily replaced without damaging any part of the boat and without the costs associated with replacing the boat entirely
04/01/2004US20040062696 Method for reducing oxygen component and carbon component in fluoride
03/2004
03/23/2004US6709267 Semiconductors
03/18/2004DE19962452B4 Verfahren für die Herstellung von opakem Quarzglas A process for the production of opaque quartz glass
03/09/2004US6703294 Method for producing a region doped with boron in a SiC-layer
03/09/2004US6703293 Implantation at elevated temperatures for amorphization re-crystallization of Si1-xGex films on silicon substrates
03/03/2004EP1393361A2 Low temperature load and bake
03/03/2004EP1393354A1 Method and device for the thermal treatment of substrates
03/03/2004EP1393351A1 Method and device for doping, diffusion and oxidation of silicon wafers under reduced pressure
03/03/2004EP1015831B1 Semiconductor processing furnace heating subassembly
02/2004
02/25/2004EP1235953B1 Mini batch furnace
02/18/2004CN1475609A Preparation method of smectic chemical metering ratio lithjum niobate chip
02/17/2004US6692576 Wafer support system
01/2004
01/29/2004US20040018008 Heating configuration for use in thermal processing chambers
01/21/2004CN1469433A Method for producing Si Ge film on silicon substrate
01/21/2004CN1135905C Furnace sidewall temperature control system
01/15/2004WO2003067637A3 Methods of treating a silicon carbide substrate for improved epitaxial deposition
01/15/2004US20040009626 Implantation at elevated temperatures for amorphization re-crystallization of Si1-xGex films on silicon substrates
01/14/2004EP1380675A1 Method for reducing oxygen component and carbon component in fluoride
01/08/2004WO2004002891A1 Method and apparatus for increasing bulk conductivity of a ferroelectric material
01/08/2004US20040003780 Self aligning non contact shadow ring process kit
01/07/2004CN1466670A System and method for controlling movement of a workpiece in a thermal processing system
12/2003
12/18/2003WO2003019622A3 System and method of fast ambient switching for rapid thermal processing
12/04/2003US20030221623 Fabricating a semiconductor device
11/2003
11/25/2003US6651582 Method and device for irradiating an ion beam, and related method and device thereof
11/12/2003CN1455029A Combined gas-phase pre-doping and neutron irradiation doping area fused silicon monocrystal production method
11/06/2003US20030206732 Heat-treating methods and systems
11/04/2003US6641743 Methods for forming waveguides in optical materials
11/04/2003US6641662 Method for fabricating ultra thin single-crystal metal oxide wave retarder plates and waveguide polarization mode converter using the same
10/2003
10/22/2003CN1450981A Adhesive composite coating for diamond and diamond-containing materials and method for producing coating
10/16/2003WO2003085343A1 Pulsed processing semiconductor heating methods using combinations of heating sources
10/14/2003US6632277 Optimized silicon wafer gettering for advanced semiconductor devices
10/08/2003CN1447980A Thermally processing substrate
10/02/2003US20030186493 Method and device for making substrates
10/02/2003US20030183614 Heat treatment apparatus and method for processing substrates
10/02/2003US20030183612 Pulsed processing semiconductor heating methods using combinations of heating sources
10/02/2003US20030183611 Electromagnetically levitated substrate support
10/02/2003US20030183172 Vaporiser for generating feed gas for an arc chamber
09/2003
09/18/2003WO2003077598A1 System and method for lamp split zone control
09/17/2003EP0996767B1 Reflective surface for cvd reactor walls
09/10/2003CN1441465A Method and device for regulating ion beam parallel in ion injection device
09/04/2003WO2002097864A3 Low temperature load and bake
09/03/2003EP1027474A4 Process tube with in situ gas preheating
09/03/2003CN1439750A Lithium niobate crystal waveguide preparation by ion implantation and anneal
08/2003
08/26/2003US6610968 System and method for controlling movement of a workpiece in a thermal processing system
08/21/2003US20030157453 Boat for heat treatment and vertical heat treatment apparatus
08/21/2003US20030155072 RTA chamber with in situ reflective index monitor
08/19/2003US6607381 Auxiliary heat-insulating jig
08/14/2003WO2003067637A2 Methods of treating a silicon carbide substrate for improved epitaxial deposition
08/14/2003CA2474883A1 Methods of treating a silicon carbide substrate for improved epitaxial deposition
08/07/2003US20030146200 Thermal processing apparatus and thermal processing method
07/2003
07/30/2003EP0832407B1 Passive gas substrate thermal conditioning apparatus and method
07/23/2003CN1432191A Mfg. method of monocrystal silicon (SOI) on insulator
07/15/2003US6594446 Heat-treating methods and systems
07/15/2003US6592661 Method for processing wafers in a semiconductor fabrication system
07/09/2003EP1093664A4 Temperature control system for a thermal reactor
07/08/2003US6589352 Self aligning non contact shadow ring process kit
07/03/2003WO2003007336A3 Wafer boat with arcuate wafer support arms
07/02/2003EP1323182A2 Apparatus and method for reducing contamination on thermally processed semiconductor substrates
07/02/2003EP1322901A2 System and method for controlling movement of a workpiece in a thermal processing system
06/2003
06/24/2003US6582221 Wafer boat and method for treatment of substrates
06/10/2003US6575739 Configurable wafer furnace
06/10/2003US6575622 Correction of wafer temperature drift in a plasma reactor based upon continuous wafer temperature measurements using an in-situ wafer temperature optical probe
06/04/2003CN1110838C Silicon substrate and producing method thereof
05/2003
05/28/2003CN1109779C Dual vertical thermal treatment furnace
05/27/2003US6570137 System and method for lamp split zone control
05/15/2003WO2003040636A1 System and process for heating semiconductor wafers by optimizing absorption of electromagnetic energy
05/13/2003US6561796 Heating in a gas with a thermal conductivity and mean free path greater than that of oxygen, or by heating under a pressure less than 0.1 Torr.
05/01/2003US20030081945 Heat treating apparatus and method
05/01/2003US20030080104 Heat treating apparatus and method
04/2003
04/24/2003US20030075274 Wafer support system
04/23/2003EP1304733A2 Process of and apparatus for heat-treating II-IV compound semiconductors and semiconductor heat-treated by the process
04/23/2003CN1412827A Semiconductor heat treatment process and equipment, and semiconductor by said process heat treatment
04/17/2003US20030073259 Process of and apparatus for heat-treating II-VI compound semiconductors and semiconductor heat-treated by the process
04/17/2003US20030072340 Mid-ir microchip laser: ZnS:Cr2+ laser with saturable absorber material
04/15/2003US6548378 Method of boron doping wafers using a vertical oven system
04/10/2003WO2003030251A1 Silicon monocrystal wafer processing device, and method of manufacturing silicon monocrystal wafer and silicon epitaxial wafer
04/10/2003US20030066587 Susceptor for semiconductor manufacturing equipment and process for producing the same
04/09/2003EP1300380A1 Adhesive composite coating for diamond and diamond-containing materials and method for producing said coating.
04/08/2003US6544035 Semiconductor manufacturing apparatus
04/08/2003CA2264317C Susceptor for semiconductor manufacturing equipment and process for producing the same
04/02/2003EP1297560A2 Thermally processing a substrate
04/01/2003US6540827 Slicing of single-crystal films using ion implantation
03/2003
03/27/2003WO2003026086A1 MID-IR MICROCHIP LASER: ZnS:Cr2+ LASER WITH SATURABLE ABSORBER MATERIAL
03/27/2003CA2783176A1 Mid-ir microchip laser: zns:cr2+ laser with saturable absorber material
03/27/2003CA2461096A1 Mid-ir microchip laser: zns:cr2+ laser with saturable absorber material
03/25/2003US6538237 Apparatus for fixing position of furnace tube in semiconductor processing furnace comprising two clamp halves, each in half-circular shape, for engaging flange on tube to base, and means for mounting two clamp halves to base
03/12/2003EP1102876A4 Method for contact diffusion of impurities into diamond and other crystalline structures and products
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