Patents for C30B 31 - Diffusion or doping processes for single crystals or homogeneous polycrystalline material with defined structure; Apparatus therefor (2,201) |
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05/20/2004 | US20040097088 Conductor treating single-wafer type treating device and method for semi-conductor treating |
05/19/2004 | EP1419520A2 System and method for fast ambient gas switching in rapid thermal processing |
05/18/2004 | US6737613 Heat treatment apparatus and method for processing substrates |
05/13/2004 | WO2004040650A1 Soi wafer and method for manufacturing soi wafer |
05/13/2004 | DE10239775B3 Production of a silicon wafer used in the production of a semiconductor component comprises treating the cleaned wafer with an aqueous ozone solution, coating with polycrystalline silicon, finely grinding, and epitaxially growing the wafer |
05/12/2004 | EP1021586A4 A rapid thermal processing barrel reactor for processing substrates |
05/06/2004 | US20040083621 Forced convection assisted rapid thermal furnace |
04/21/2004 | CN1491300A Method for reducing oxygen component and carbon component in fluoride |
04/13/2004 | US6720531 Temperature uniformity during chemical vapor deposition |
04/07/2004 | EP1405333A1 Apparatus and method of making a slip free wafer boat |
04/07/2004 | EP1405018A2 Wafer boat with arcuate wafer support arms |
04/06/2004 | US6718127 Heating device of the light irradiation type |
04/06/2004 | US6716027 When any of the boat parts experiences thermal deformation after long periods of use, the boat part may be readily replaced without damaging any part of the boat and without the costs associated with replacing the boat entirely |
04/01/2004 | US20040062696 Method for reducing oxygen component and carbon component in fluoride |
03/23/2004 | US6709267 Semiconductors |
03/18/2004 | DE19962452B4 Verfahren für die Herstellung von opakem Quarzglas A process for the production of opaque quartz glass |
03/09/2004 | US6703294 Method for producing a region doped with boron in a SiC-layer |
03/09/2004 | US6703293 Implantation at elevated temperatures for amorphization re-crystallization of Si1-xGex films on silicon substrates |
03/03/2004 | EP1393361A2 Low temperature load and bake |
03/03/2004 | EP1393354A1 Method and device for the thermal treatment of substrates |
03/03/2004 | EP1393351A1 Method and device for doping, diffusion and oxidation of silicon wafers under reduced pressure |
03/03/2004 | EP1015831B1 Semiconductor processing furnace heating subassembly |
02/25/2004 | EP1235953B1 Mini batch furnace |
02/18/2004 | CN1475609A Preparation method of smectic chemical metering ratio lithjum niobate chip |
02/17/2004 | US6692576 Wafer support system |
01/29/2004 | US20040018008 Heating configuration for use in thermal processing chambers |
01/21/2004 | CN1469433A Method for producing Si Ge film on silicon substrate |
01/21/2004 | CN1135905C Furnace sidewall temperature control system |
01/15/2004 | WO2003067637A3 Methods of treating a silicon carbide substrate for improved epitaxial deposition |
01/15/2004 | US20040009626 Implantation at elevated temperatures for amorphization re-crystallization of Si1-xGex films on silicon substrates |
01/14/2004 | EP1380675A1 Method for reducing oxygen component and carbon component in fluoride |
01/08/2004 | WO2004002891A1 Method and apparatus for increasing bulk conductivity of a ferroelectric material |
01/08/2004 | US20040003780 Self aligning non contact shadow ring process kit |
01/07/2004 | CN1466670A System and method for controlling movement of a workpiece in a thermal processing system |
12/18/2003 | WO2003019622A3 System and method of fast ambient switching for rapid thermal processing |
12/04/2003 | US20030221623 Fabricating a semiconductor device |
11/25/2003 | US6651582 Method and device for irradiating an ion beam, and related method and device thereof |
11/12/2003 | CN1455029A Combined gas-phase pre-doping and neutron irradiation doping area fused silicon monocrystal production method |
11/06/2003 | US20030206732 Heat-treating methods and systems |
11/04/2003 | US6641743 Methods for forming waveguides in optical materials |
11/04/2003 | US6641662 Method for fabricating ultra thin single-crystal metal oxide wave retarder plates and waveguide polarization mode converter using the same |
10/22/2003 | CN1450981A Adhesive composite coating for diamond and diamond-containing materials and method for producing coating |
10/16/2003 | WO2003085343A1 Pulsed processing semiconductor heating methods using combinations of heating sources |
10/14/2003 | US6632277 Optimized silicon wafer gettering for advanced semiconductor devices |
10/08/2003 | CN1447980A Thermally processing substrate |
10/02/2003 | US20030186493 Method and device for making substrates |
10/02/2003 | US20030183614 Heat treatment apparatus and method for processing substrates |
10/02/2003 | US20030183612 Pulsed processing semiconductor heating methods using combinations of heating sources |
10/02/2003 | US20030183611 Electromagnetically levitated substrate support |
10/02/2003 | US20030183172 Vaporiser for generating feed gas for an arc chamber |
09/18/2003 | WO2003077598A1 System and method for lamp split zone control |
09/17/2003 | EP0996767B1 Reflective surface for cvd reactor walls |
09/10/2003 | CN1441465A Method and device for regulating ion beam parallel in ion injection device |
09/04/2003 | WO2002097864A3 Low temperature load and bake |
09/03/2003 | EP1027474A4 Process tube with in situ gas preheating |
09/03/2003 | CN1439750A Lithium niobate crystal waveguide preparation by ion implantation and anneal |
08/26/2003 | US6610968 System and method for controlling movement of a workpiece in a thermal processing system |
08/21/2003 | US20030157453 Boat for heat treatment and vertical heat treatment apparatus |
08/21/2003 | US20030155072 RTA chamber with in situ reflective index monitor |
08/19/2003 | US6607381 Auxiliary heat-insulating jig |
08/14/2003 | WO2003067637A2 Methods of treating a silicon carbide substrate for improved epitaxial deposition |
08/14/2003 | CA2474883A1 Methods of treating a silicon carbide substrate for improved epitaxial deposition |
08/07/2003 | US20030146200 Thermal processing apparatus and thermal processing method |
07/30/2003 | EP0832407B1 Passive gas substrate thermal conditioning apparatus and method |
07/23/2003 | CN1432191A Mfg. method of monocrystal silicon (SOI) on insulator |
07/15/2003 | US6594446 Heat-treating methods and systems |
07/15/2003 | US6592661 Method for processing wafers in a semiconductor fabrication system |
07/09/2003 | EP1093664A4 Temperature control system for a thermal reactor |
07/08/2003 | US6589352 Self aligning non contact shadow ring process kit |
07/03/2003 | WO2003007336A3 Wafer boat with arcuate wafer support arms |
07/02/2003 | EP1323182A2 Apparatus and method for reducing contamination on thermally processed semiconductor substrates |
07/02/2003 | EP1322901A2 System and method for controlling movement of a workpiece in a thermal processing system |
06/24/2003 | US6582221 Wafer boat and method for treatment of substrates |
06/10/2003 | US6575739 Configurable wafer furnace |
06/10/2003 | US6575622 Correction of wafer temperature drift in a plasma reactor based upon continuous wafer temperature measurements using an in-situ wafer temperature optical probe |
06/04/2003 | CN1110838C Silicon substrate and producing method thereof |
05/28/2003 | CN1109779C Dual vertical thermal treatment furnace |
05/27/2003 | US6570137 System and method for lamp split zone control |
05/15/2003 | WO2003040636A1 System and process for heating semiconductor wafers by optimizing absorption of electromagnetic energy |
05/13/2003 | US6561796 Heating in a gas with a thermal conductivity and mean free path greater than that of oxygen, or by heating under a pressure less than 0.1 Torr. |
05/01/2003 | US20030081945 Heat treating apparatus and method |
05/01/2003 | US20030080104 Heat treating apparatus and method |
04/24/2003 | US20030075274 Wafer support system |
04/23/2003 | EP1304733A2 Process of and apparatus for heat-treating II-IV compound semiconductors and semiconductor heat-treated by the process |
04/23/2003 | CN1412827A Semiconductor heat treatment process and equipment, and semiconductor by said process heat treatment |
04/17/2003 | US20030073259 Process of and apparatus for heat-treating II-VI compound semiconductors and semiconductor heat-treated by the process |
04/17/2003 | US20030072340 Mid-ir microchip laser: ZnS:Cr2+ laser with saturable absorber material |
04/15/2003 | US6548378 Method of boron doping wafers using a vertical oven system |
04/10/2003 | WO2003030251A1 Silicon monocrystal wafer processing device, and method of manufacturing silicon monocrystal wafer and silicon epitaxial wafer |
04/10/2003 | US20030066587 Susceptor for semiconductor manufacturing equipment and process for producing the same |
04/09/2003 | EP1300380A1 Adhesive composite coating for diamond and diamond-containing materials and method for producing said coating. |
04/08/2003 | US6544035 Semiconductor manufacturing apparatus |
04/08/2003 | CA2264317C Susceptor for semiconductor manufacturing equipment and process for producing the same |
04/02/2003 | EP1297560A2 Thermally processing a substrate |
04/01/2003 | US6540827 Slicing of single-crystal films using ion implantation |
03/27/2003 | WO2003026086A1 MID-IR MICROCHIP LASER: ZnS:Cr2+ LASER WITH SATURABLE ABSORBER MATERIAL |
03/27/2003 | CA2783176A1 Mid-ir microchip laser: zns:cr2+ laser with saturable absorber material |
03/27/2003 | CA2461096A1 Mid-ir microchip laser: zns:cr2+ laser with saturable absorber material |
03/25/2003 | US6538237 Apparatus for fixing position of furnace tube in semiconductor processing furnace comprising two clamp halves, each in half-circular shape, for engaging flange on tube to base, and means for mounting two clamp halves to base |
03/12/2003 | EP1102876A4 Method for contact diffusion of impurities into diamond and other crystalline structures and products |