| Patents for C30B 31 - Diffusion or doping processes for single crystals or homogeneous polycrystalline material with defined structure; Apparatus therefor (2,201) |
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| 05/16/2002 | US20020056814 Method and device for irradiating an ion beam, and related method and device thereof |
| 05/09/2002 | US20020055080 Temperature controlling method, thermal treating apparatus, and method of manufacturing semiconductor device |
| 05/09/2002 | US20020053318 Slicing of single-crystal films using ion implantation |
| 05/08/2002 | EP1203108A1 Cooled window |
| 05/08/2002 | EP1034561B1 Rapid thermal processing (rtp) system with gas driven rotating substrate |
| 05/07/2002 | US6383287 System and method for performing diffusion on a three-dimensional substrate |
| 05/07/2002 | US6381987 Process for making opaque quartz glass and opaque component made according to the process |
| 05/02/2002 | WO2001004940A9 Method for doping gallium nitride (gan) substrates and the resulting doped gan substrate |
| 04/25/2002 | US20020048860 Method of producing thin films using current of process gas and inert gas colliding with each other and apparatus for producing thin films for practicing the same method |
| 04/25/2002 | US20020048311 Correction of wafer temperature drift in a plasma reactor based upon continuous wafer temperature measurements using an in-situ wafer temperature optical probe |
| 04/25/2002 | US20020047004 System and method for thermal processing of a semiconductor substrate |
| 04/23/2002 | US6375749 Susceptorless semiconductor wafer support and reactor system for epitaxial layer growth |
| 04/18/2002 | US20020045146 Batch-type heat treatment apparatus and control method for the batch-type heat treatment apparatus |
| 04/16/2002 | US6371712 Support frame for substrates |
| 04/10/2002 | EP1194619A1 Doped diamond |
| 04/09/2002 | US6369361 Thermal processing apparatus |
| 04/04/2002 | WO2002027059A2 System and method for controlling movement of a workpiece in a thermal processing system |
| 04/03/2002 | EP1192299A1 Doping of crystalline substrates |
| 03/21/2002 | WO2002023594A2 Apparatus and method for reducing contamination on thermally processed semiconductor substrates |
| 03/20/2002 | EP1189261A2 Batch-type heat treatment apparatus and method for controlling it |
| 03/20/2002 | EP1188722A1 Article comprising a body made of quartz glass having improved resistance against plasma corrosion, and method for production thereof |
| 03/14/2002 | US20020030047 Heat treatment apparatus having a thin light-transmitting window |
| 03/12/2002 | US6355909 Method and apparatus for thermal processing of semiconductor substrates |
| 03/12/2002 | US6355577 System to reduce particulate contamination |
| 03/05/2002 | US6353210 Correction of wafer temperature drift in a plasma reactor based upon continuous wafer temperature measurements using and in-situ wafer temperature optical probe |
| 03/05/2002 | US6352884 Method for growing crystals having impurities and crystals prepared thereby |
| 02/26/2002 | US6350703 Semiconductor substrate and production method thereof |
| 02/21/2002 | US20020022348 Semiconductor substrate and production method thereof |
| 02/21/2002 | US20020022210 Wafer treatment chamber having thermal reflector |
| 02/19/2002 | US6348417 Semiconductor device manufacturing apparatus and semiconductor device manufacturing method |
| 02/06/2002 | EP1012358B1 Inflatable elastomeric element for rapid thermal processing (rtp) system |
| 02/05/2002 | US6345150 Single wafer annealing oven |
| 01/29/2002 | US6343183 Wafer support system |
| 01/29/2002 | US6342691 Apparatus and method for thermal processing of semiconductor substrates |
| 01/24/2002 | WO2002006568A2 Slicing of single-crystal films using ion implantation |
| 01/22/2002 | US6340535 Method for the heat treatment of a ZnSe crystal substrate, heat treated substrate and light emission device |
| 01/17/2002 | WO2002005323A2 Thermally processing a substrate |
| 01/17/2002 | US20020006877 Annealing using oxygen |
| 01/16/2002 | EP1171653A1 Slicing of single-crystal films using ion implantation |
| 01/10/2002 | US20020002951 Heating installation for a reactor |
| 01/03/2002 | WO2002000971A1 Silicon epitaxial wafer manufacturing method and silicon epitaxial wafer |
| 01/01/2002 | US6334404 Method and apparatus for reducing particle contamination on wafers |
| 12/27/2001 | US20010054390 Wafer support system |
| 12/27/2001 | US20010054384 Vaporiser for generating feed gas for an arc chamber |
| 12/13/2001 | US20010050052 Semiconductor device manufacturing apparatus and semiconductor device manufacturing method |
| 12/12/2001 | CN1326018A Heat treatment of ZnSe crystal substrates, heat treated substrates and optical emitter |
| 12/11/2001 | US6329643 Method of temperature-calibrating heat treating apparatus |
| 12/11/2001 | US6328561 Method for cooling a furnace, and furnace provided with a cooling device |
| 12/04/2001 | US6325848 Method of making a silicon substrate with controlled impurity concentration |
| 11/29/2001 | US20010046754 Process for fabricating semiconductor device |
| 11/29/2001 | US20010046609 Diffusing aluminum (Al) through the zinc-selenide (ZnSe) substrate by forming an Al film on the substrate, heat treating in selenium atmosphere and then heat treating in a zinc atmosphere; monochromatic light emitting diodes (LED's) |
| 11/29/2001 | DE19962452A1 Verfahren für die Herstellung von opakem Quarzglas und nach dem Verfahren hergestelltes opakes Bauteil A process for the production of opaque quartz glass and an opaque component produced by the process |
| 11/29/2001 | DE10024857A1 Production of a partially single crystalline silicon carbide layer in a silicon wafer comprises preparing a silicon wafer, implanting carbon ions into the wafer by ion implantation, and subjecting the wafer to a thermal radiation source |
| 11/28/2001 | EP0633997B1 A rapid thermal processing apparatus for processing semiconductor wafers |
| 11/22/2001 | US20010043903 A three-dimensional faceted diamond crystal having a dopant of a greater concentration near the outer surface than in the center where the concentration is at a minimum of 5 micro-meter below the surface; high compressive fracture |
| 11/22/2001 | US20010042742 Thermal processing apparatus having a coolant passage |
| 11/21/2001 | EP1156140A1 A method for the heat treatment of a ZnSe crystal substrate, heat treated substrate and light emission device |
| 11/21/2001 | EP1155439A1 Single wafer annealing oven |
| 11/20/2001 | US6319556 Reflective surface for CVD reactor walls |
| 11/19/2001 | CA2348124A1 A method for the heat treatment of a znse crystal substrate, heat treated substrate and light emission device |
| 11/15/2001 | WO2001086019A1 Susceptorless semiconductor wafer support and reactor system for epitaxial layer growth |
| 11/14/2001 | EP1154039A1 A rapid thermal processing apparatus for processing semiconductor wafers |
| 11/08/2001 | US20010039098 Method for fabricating silicon-on-insulator material |
| 11/07/2001 | CN1321333A Wafer holder |
| 11/01/2001 | WO2001082346A1 Method for fabricating silicon-on-insulator |
| 10/30/2001 | US6310327 Rapid thermal processing apparatus for processing semiconductor wafers |
| 10/30/2001 | US6308738 Drafting apparatus |
| 10/18/2001 | DE10115937A1 Verdampfer zum Erzeugen von Speisegas für eine Lichtbogenkammer Evaporator for generating feed gas for an arc chamber |
| 10/16/2001 | US6302962 Diffusion system having air curtain formation function for manufacturing semiconductor devices and method of controlling the same |
| 10/11/2001 | WO2001075196A1 Method and device for making substrates |
| 10/11/2001 | US20010029108 Substrate processeing apparatus, substrate processing method and electronic device manufacturing method |
| 10/10/2001 | EP1142004A1 Method for boron doping wafers using a vertical oven system |
| 10/04/2001 | WO2001072104A1 Method for the production of silicon carbide (sic) layers by means of ionic implantation of carbon and anneals |
| 10/04/2001 | EP1138060A1 Gas driven rotating susceptor for rapid thermal processing (rtp) system |
| 09/26/2001 | EP1135659A1 Apparatus and method for thermal processing of semiconductor substrates |
| 09/26/2001 | EP0708983B1 Chemical vapor deposition process for fabricating layered superlattice materials |
| 09/25/2001 | US6294223 Method for ion implantation induced embedded particle formation via reduction |
| 09/20/2001 | WO2001068559A1 Adhesive composite coating for diamond and diamond-containing materials and method for producing said coating. |
| 09/13/2001 | WO2001004940A8 Method for doping gallium nitride (gan) substrates and the resulting doped gan substrate |
| 09/13/2001 | US20010020439 Method and apparatus for controlling rise and fall of temperature in semiconductor substrates |
| 09/12/2001 | EP1132506A1 Thermal processing apparatus |
| 09/11/2001 | US6287112 Wafer boat |
| 09/06/2001 | US20010019877 Method of forming silicon-contained crystal thin film |
| 09/04/2001 | US6284051 Cooled window |
| 09/04/2001 | US6283175 Enveloping device and vertical heat-treating apparatus for semiconductor process system |
| 08/28/2001 | US6281099 Method for synthesizing single crystal AIN thin films of low resistivity n-type and low resistivity p-type |
| 08/28/2001 | US6280183 Substrate support for a thermal processing chamber |
| 08/23/2001 | US20010016306 Method for purging a furnace and furnace assembly |
| 08/23/2001 | US20010015168 Optimized silicon wafer gettering for advanced semiconductor devices |
| 08/16/2001 | WO2001059189A1 Quartz member for semiconductor manufacturing equipment and method for metal analysis in quartz member |
| 08/08/2001 | EP0970337B1 Method for cooling a furnace, and furnace provided with a cooling device |
| 08/02/2001 | US20010010307 Thermal processing apparatus |
| 07/25/2001 | EP1117968A1 Method and apparatus for thermal processing of semiconductor substrates |
| 07/24/2001 | US6264467 Micro grooved support surface for reducing substrate wear and slip formation |
| 07/12/2001 | US20010007241 Improved purity silicon wafer for use in advanced semiconductor devices |
| 07/12/2001 | US20010007240 High efficiency silicon wafer optimized for advanced semiconductor devices |
| 07/03/2001 | US6254686 Vented lower liner for heating exhaust gas from a single substrate reactor |
| 06/27/2001 | EP1110917A2 Method of producing opaque silica glass and opaque elements produced by the process |
| 06/26/2001 | US6251835 Surface planarization of high temperature superconductors |
| 06/13/2001 | EP1106715A1 Self aligning non contact shadow ring process kit |