Patents for C30B 31 - Diffusion or doping processes for single crystals or homogeneous polycrystalline material with defined structure; Apparatus therefor (2,201) |
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05/06/2005 | CA2542704A1 Methods of forming power semiconductor devices using boule-grown silicon carbide drift layers and power semiconductor devices formed thereby |
05/05/2005 | US20050092244 Diffusion system |
05/05/2005 | US20050092242 Staggered ribs on process chamber to reduce thermal effects |
05/04/2005 | CN1612296A 扩散系统 Diffusion System |
05/03/2005 | US6887576 Quartz reacted with solution of metal compound or metal element to form silicon oxide body doped with metal elements, which when reacted with plasma gas such a fluorine, form compounds with higher boiling points than silicon fluoride |
05/03/2005 | US6887144 Surface impurity-enriched diamond and method of making |
05/03/2005 | CA2216998C In-situ diffusion of dopant impurities during dendritic web growth of crystal ribbon |
04/26/2005 | US6884701 Process for fabricating semiconductor device |
04/21/2005 | US20050082542 Methods of forming power semiconductor devices using boule-grown silicon carbide drift layers and power semiconductor devices formed thereby |
04/19/2005 | US6881658 Process of and apparatus for heat-treating II-VI compound semiconductors and semiconductor heat-treated by the process |
04/14/2005 | DE10343522A1 Verfahren zur Steuerung der Behandlung eines Kristalls mit einer Flüssigkeit A method of controlling the treatment of a crystal with a liquid |
04/13/2005 | EP1135659A4 Apparatus and method for thermal processing of semiconductor substrates |
04/07/2005 | WO2005031344A1 Method for controlling the treatment of a crystal by means of a liquid |
03/30/2005 | CN1601701A Method for fabricating SIGE substrate materials on metastable insulator and substrate materials |
03/24/2005 | US20050064632 Soi wafer and method for manufacturing soi wafer |
03/24/2005 | US20050062388 Heat-treating methods and systems |
03/24/2005 | US20050061232 Doped organic semiconductor materials and process for their preparation |
03/24/2005 | DE10338406A1 Dotierte organische Halbleitermaterialien sowie Verfahren zu deren Herstellung Doped organic semiconductor materials as well as processes for their preparation |
03/23/2005 | CN2687841Y Vaporization furnace |
03/23/2005 | CN1194380C Mfg, method of monocrystal silicon (SOI) on insulator |
03/17/2005 | DE10222879A1 Messung niedriger Wafer-Temperaturen Measurement of low wafer temperatures |
03/09/2005 | CN1591926A Doped organic semiconductor materials and process for their preparation |
03/03/2005 | US20050048778 Use of thin SOI to inhibit relaxation of SiGe layers |
03/02/2005 | CN1589513A Mid-ir microchip laser: ZnS:Cr2+ laser with saturable absorber material |
02/23/2005 | EP1508903A2 Endowed organic semiconductor materials and method of prepration |
02/23/2005 | CN1190530C Process for preparing chemical-specific Mg-doped lithium niobate crystal with periodic polarizing microstructure |
02/18/2005 | CA2476168A1 Doped organic semiconductor materials and process for their preparation |
02/17/2005 | DE10392472T5 Halbleitererhitzungsverfahren mit gepulster Verarbeitung unter Verwendung von kombinierten Heizquellen Semiconductor heating method with pulsed processing using combined heat sources |
02/16/2005 | CN1189928C Semiconductor heat treatment process and equipment, and semiconductor by said process heat treatment |
02/15/2005 | US6855619 Method and device for making substrates |
02/08/2005 | US6852601 Heat treatment method that includes a low negative pressure |
02/01/2005 | US6849831 Pulsed processing semiconductor heating methods using combinations of heating sources |
01/27/2005 | US20050016470 Susceptor and deposition apparatus including the same |
01/25/2005 | US6847015 Heat treatment apparatus and controller for heat treatment apparatus and control method for heat treatment apparatus |
01/12/2005 | CN1563518A Crucible in use for equilibrium method of gas phase transmission under lithium atmosphere |
01/06/2005 | US20050000452 Electromagnetic rotation of platter |
12/29/2004 | CN1559079A Heating system and method of reactor for heating atmosphere |
12/29/2004 | CN1558002A Artificial hair crystal and preparation method thereof |
12/23/2004 | US20040255860 Rapid thermal processing apparatus and methods |
12/22/2004 | EP1488450A2 Methods of treating a silicon carbide substrate for improved epitaxial deposition and resulting structures and devices |
12/22/2004 | CN1556910A System and process for heating semiconductor wafers by optimizing absorption of electromagnetic energy |
12/16/2004 | US20040250774 Wafer heater with protected heater element |
12/08/2004 | CN2661712Y Cantilevered push-pull device in diffusion system |
12/08/2004 | CN2661711Y Double pole push-pull device in diffusion system |
12/02/2004 | WO2004104275A1 Electromagnetic rotation of platter |
12/02/2004 | US20040241992 Silicon monocrystal wafer processing device, and method of manufacturing silicon monocrystal wafer and silicon epitaxial wafer |
11/24/2004 | EP1479267A1 System and method for lamp split zone control |
11/17/2004 | CN1547757A System and method of fast ambient switching for rapid thermal processing |
10/28/2004 | WO2004092457A1 Semi-insulating silicon carbide produced by neutron transmutation doping |
10/27/2004 | CN1540818A Self modulated laser crystal and preparation method |
10/26/2004 | US6808563 Controlled partial pressure technique for adjusting lithium oxide concentration in wafers |
10/20/2004 | CN1172351C Method and equipment for radiating ion beam, related method and its equipment |
10/14/2004 | US20040201024 Semi-Insulating Silicon Carbide Produced by Neutron Transmutation Doping |
10/14/2004 | DE10297368T5 System und Verfahren zum Erwärmen von Halbleiterwafern durch Optimieren der Absorption elektromagnetischer Energie System and method for heating semiconductor wafers by optimizing the absorption of electromagnetic energy |
10/13/2004 | EP1142004B1 Method for boron doping wafers using a vertical oven system |
10/12/2004 | US6803548 Batch-type heat treatment apparatus and control method for the batch-type heat treatment apparatus |
10/12/2004 | US6803546 Thermally processing a substrate |
10/12/2004 | US6802712 Heating system, method for heating a deposition or oxidation reactor, and reactor including the heating system |
10/07/2004 | US20040198153 Wafer support system |
10/06/2004 | CN1170012C Reactor with replaceable inner wall and colling system |
10/05/2004 | US6800833 Electromagnetically levitated substrate support |
09/30/2004 | US20040188020 Wafer supporter |
09/30/2004 | US20040187769 Method of producing SOI wafer |
09/29/2004 | CN1533588A Method and device for thermally treating substrates |
09/29/2004 | CN1169191C Method for implanting negative hydrogen ion and implanting apparatus |
09/28/2004 | US6796439 Vertical type wafer supporting jig |
09/28/2004 | CA2212653C A method for the heat treatment of znse crystal |
09/23/2004 | WO2004066347A3 Device for producing electroconductive passages in a semiconductor wafer by means of thermomigration |
09/23/2004 | US20040185680 Method and device for thermal treatment of substrates |
09/15/2004 | CN1528958A Method for increasing surface-layer lattice integrity of lithiumaluminate and lithium gallium oxide crystal plate |
09/09/2004 | US20040175956 Method and device for doping, diffusion and oxidation of silicon wafers under reduced pressure |
09/09/2004 | US20040175899 Method for fabricating silicon-on-insulator material |
09/09/2004 | DE10082995B4 Wafer-Haltevorrichtung Wafer holding device |
09/08/2004 | CN1528007A Method and device for doping diffusion and oxidation of silicon wafers under reduced pressure |
09/08/2004 | CN1165637C Equipment for making semiconductor device using vacuum system |
09/02/2004 | DE19725091B4 Laterales Transistorbauelement und Verfahren zu seiner Herstellung Lateral transistor device and method for its preparation |
09/01/2004 | CN1526062A Wafer boat with arcuate wafer support arms |
08/26/2004 | WO2004059835A3 Ion beam doped lithium tantalate or similar compounds |
08/26/2004 | US20040163596 placing lithium tantalate in an environment including zinc vapor and heating to a temperature below a Curie temperature of lithium tantalate |
08/25/2004 | CN1163955C Susceptor for semiconductor manufacturing equipment and process for producing the same |
08/24/2004 | CA2197400C Fabrication of sub-micron silicide structures on silicon using resistless electron beam lithography |
08/19/2004 | DE10302653A1 Vorrichtung zur Thermomigration Apparatus for thermo-migration |
08/12/2004 | US20040157183 Heating system, method for heating a deposition or oxidation reactor, and reactor including the heating system |
08/12/2004 | US20040154537 Diffusion furnace used for manufacturing integrated circuits and method for cooling the diffusion furnace |
08/05/2004 | WO2004066347A2 Device for producing electroconductive passages in a semiconductor wafer by means of thermomigration |
08/05/2004 | US20040149715 Pulsed processing semiconductor heating methods using combinations of heating sources |
08/03/2004 | US6770379 Susceptor for semiconductor manufacturing equipment and process for producing the same |
07/15/2004 | WO2004059835A2 Ion beam doped lithium tantalate or similar compounds |
07/14/2004 | EP1436865A1 MID-IR MICROCHIP LASER: ZnS:Cr-2+ LASER WITH SATURABLE ABSORBER MATERIAL |
07/08/2004 | DE19712556B4 Verfahren und Vorrichtung zur Wärmebehandlung eines Halbleiterwafers Method and apparatus for heat treating a semiconductor wafer |
07/07/2004 | EP1435652A1 Silicon monocrystal wafer processing device, and method of manufacturing silicon monocrystal wafer and silicon epitaxial wafer |
06/24/2004 | WO2004053960A1 Method of producing an n-type diamond with high electrical conductivity |
06/24/2004 | WO2004053189A1 Support system for a treatment apparatus |
06/24/2004 | WO2004053188A1 Susceptor system |
06/24/2004 | WO2004053187A1 Susceptor system________________________ |
06/22/2004 | US6753506 System and method of fast ambient switching for rapid thermal processing |
06/08/2004 | US6746908 Temperature controlling method, thermal treating apparatus, and method of manufacturing semiconductor device |
06/02/2004 | CN1501445A Semiconductor device manufacturing apparatus employing vacuum system |
05/27/2004 | WO2004044962A1 Forced convection assisted rapid thermal furnace |
05/25/2004 | US6740196 RTA chamber with in situ reflective index monitor |