Patents for C30B 31 - Diffusion or doping processes for single crystals or homogeneous polycrystalline material with defined structure; Apparatus therefor (2,201)
10/1998
10/06/1998US5817179 GaAs anneal boat design and method for use
09/1998
09/30/1998EP0867538A1 Heating apparatus
09/29/1998US5813851 Heat treatment method
09/24/1998WO1998041806A1 Method for cooling a furnace, and furnace provided with a cooling device
09/22/1998US5811916 Field emission devices employing enhanced diamond field emitters
09/11/1998WO1998039610A1 Semiconductor processing furnace heating subassembly
09/11/1998WO1998039609A1 Semiconductor processing furnace
09/08/1998US5804042 Reduces or eliminates secondary plasma around backplane
09/02/1998CN1192265A Passive gas substrate thermal conditioning apparatus and method
08/1998
08/27/1998WO1998037258A1 A rapid thermal processing barrel reactor for processing substrates
08/18/1998US5796079 Rapid thermal processing method for ferroelectric, high dielectric, electrostrictive, semiconductive, or conductive ceramic thin film using microwaves
08/11/1998US5792701 Used for mixing gases in the deposition/oxidations processes in furnaces to achieve uniform film growth and thickness
08/11/1998US5792256 Method for producing N-type semiconducting diamond
08/11/1998US5791895 Apparatus for thermal treatment of thin film wafer
08/05/1998EP0856880A2 A method for the heat treatment of group II-VI semiconductors
08/04/1998US5790751 Rapid thermal heating apparatus including a plurality of light pipes and a pyrometer for measuring substrate temperature
08/04/1998US5790750 Profiled substrate heating utilizing a support temperature and a substrate temperature
08/04/1998US5789308 Manufacturing method for wafer slice starting material to optimize extrinsic gettering during semiconductor fabrication
07/1998
07/30/1998WO1998032893A2 Wafer support system
07/28/1998US5786605 Semiconductor device produced by a single furnace cycle diffusion and oxidation process
07/23/1998CA2227686A1 A method for the heat treatment of ii-vi semiconductors
07/16/1998WO1998030854A1 Thermal processing apparatus and process
07/14/1998US5781693 Gas introduction showerhead for an RTP chamber with upper and lower transparent plates and gas flow therebetween
07/14/1998US5778968 For stabilizing the temperature of semiconductor wafers
07/07/1998US5776391 Silicon carbide carrier for wafer processing and method for making same
07/07/1998US5775889 Heat treatment process for preventing slips in semiconductor wafers
07/07/1998US5775416 Temperature controlled chuck for vacuum processing
07/01/1998EP0851465A1 Method of separation of at least two elements joined by ion implantation
07/01/1998CN1186128A Dual vertical thermal processing furance
06/1998
06/18/1998DE19652471A1 Damage-free compound semiconductor passivation
06/17/1998EP0848575A1 Heating device, assembly and method
06/17/1998EP0848223A1 Vertical heat treatment device
06/16/1998US5767486 Rapid thermal heating apparatus including a plurality of radiant energy sources and a source of processing gas
06/09/1998US5762713 RTP lamp design for oxidation and annealing
06/02/1998US5759909 Method for manufacturing a silicon wafer by using a dopant foil
05/1998
05/26/1998US5756964 Thermal processing apparatus
05/19/1998US5753046 Vertical diffusion furnace and cap therefor
05/19/1998US5752819 Exhaust system for high temperature furnace
05/13/1998EP0840811A2 System and method for thermal processing of a semiconductor substrate
05/12/1998US5749723 Heat treatment apparatus
05/07/1998WO1998019334A1 Heat treatment apparatus
04/1998
04/28/1998US5744195 Growing diamond islands emitting electrons at a specified current density on a substrate
04/28/1998US5743643 Rapid thermal heating apparatus and method
04/09/1998WO1998014645A1 A METHOD FOR PRODUCING A REGION DOPED WITH BORON IN A SiC-LAYER
04/01/1998EP0832407A1 Passive gas substrate thermal conditioning apparatus and method
03/1998
03/12/1998WO1998010463A1 Germanes and doping with germanes
03/04/1998EP0826800A1 A method for the heat-treatment of ZnSe crystal
03/04/1998EP0826799A2 Thermal shock resistant sapphire for ir windows and domes, and method of making same
02/1998
02/17/1998US5718574 Heat treatment apparatus
02/04/1998EP0822274A2 Method for manufacturing epitaxial wafer
02/03/1998US5714395 Doping surface of wafer, creating cleavage layer, heat treating to cause separation of surface layer
01/1998
01/28/1998EP0821085A1 Apparatus for introducing gas into a rapid thermal processing chamber
01/28/1998EP0821084A1 Multi-zone gas flow control in a process chamber
01/28/1998EP0820637A1 A METHOD FOR INTRODUCTION OF AN IMPURITY DOPANT IN SiC, A SEMICONDUCTOR DEVICE FORMED BY THE METHOD AND A USE OF A HIGHLY DOPED AMORPHOUS LAYER AS A SOURCE FOR DOPANT DIFFUSION INTO SiC
01/20/1998US5710407 Rapid thermal processing apparatus for processing semiconductor wafers
01/20/1998US5709543 Vertical heat treatment apparatus
01/14/1998EP0818807A2 Dual vertical thermal processing furnace
01/13/1998US5708755 Rapid thermal heating apparatus and method
12/1997
12/30/1997US5702654 Method of making thermal shock resistant sapphire for IR windows and domes
12/23/1997US5700992 Zigzag heating device with downward directed connecting portions
12/11/1997WO1997046842A1 Vertical heat treatment device
12/10/1997EP0811709A2 Method and apparatus for enhancing the efficiency of radiant energy sources used in rapid thermal processing of substrates by energy reflection
12/10/1997EP0645072A4 High performance horizontal diffusion furnace system.
12/09/1997US5695567 Susceptor for a device for epitaxially growing objects and such a device
11/1997
11/18/1997US5689614 Rapid thermal heating apparatus and control therefor
11/18/1997US5688116 Heat treatment process
11/06/1997DE19712556A1 Semiconductor wafer heat treatment appliance
11/04/1997US5683518 Rapid thermal processing apparatus for processing semiconductor wafers
11/04/1997US5683173 Cooling chamber for a rapid thermal heating apparatus
10/1997
10/23/1997WO1997039477A1 P-type silicon carbide formation by ion implantation and p-type silicon carbide
10/21/1997US5680502 Thin film heat treatment apparatus with conductively heated table and surrounding radiation shield
10/21/1997US5679405 Method for preventing substrate backside deposition during a chemical vapor deposition operation
10/21/1997US5678989 Heat treatment method using a vertical processing tube
10/14/1997US5676869 Vertical heat treatment apparatus
10/08/1997CN1036101C Open tube aluminum-gallium diffusion process
10/01/1997CN1160929A Compound semicondudctor N-doping method, and electronic and optical devices produced using the same method
09/1997
09/23/1997US5671323 Zigzag heating device with downward directed connecting portions
09/23/1997US5669768 Apparatus for adjusting a gas injector of furnace
09/18/1997WO1997034318A1 Heat-treating method and radiant heating device
09/18/1997WO1997034022A1 Process for preparing endohedral fullerenes or fullerene derivatives
09/17/1997CN1159490A Compound semi-conductors and controlled doping thereof
09/03/1997EP0792956A2 Radiant heating apparatus and method
09/02/1997US5662469 Method of thermal processing
08/1997
08/28/1997WO1997031133A1 A susceptor for a device for epitaxially growing objects and such a device
08/20/1997EP0597053B1 Device for heat-treating a magazine for lead frames with electronic components
08/12/1997US5656541 Low temperature P2 O5 oxide diffusion source
08/05/1997US5654230 Heating substrates in process tube, introducing doping and film forming gases, decomposing gases
08/05/1997US5653802 Method for forming crystal
08/05/1997US5653800 Method for producing N-type semiconducting diamond
07/1997
07/29/1997US5651827 Single-wafer heat-treatment apparatus and method of manufacturing reactor vessel used for same
07/29/1997US5651670 Heat treatment method and apparatus thereof
07/23/1997EP0603391B1 Vertical heat treatment apparatus and heat insulating material
07/22/1997US5650082 Profiled substrate heating
07/15/1997US5648114 Chemical vapor deposition process for fabricating layered superlattice materials
07/09/1997CN1153834A Boat for loading wafers in vertical diffusion furnace
07/08/1997US5645417 Dimpled thermal processing furnace tube
06/1997
06/25/1997CN1152626A Equipment for making semiconductor device using vacuum system
06/10/1997US5637950 Field emission devices employing enhanced diamond field emitters
06/03/1997US5636320 Sealed chamber with heating lamps provided within transparent tubes
06/03/1997US5635422 Diffusing dopants into a semiconductor wafer
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