Patents for C25D 5 - Electroplating characterised by the process; Pretreatment or after-treatment of workpieces (17,883)
06/2002
06/27/2002WO2002050336A2 Integrated mutli-step gap fill and all feature planarization for conductive materials
06/27/2002WO2002050326A1 Steel sheet for porcelain enameling and method for production thereof, and enameled product and method for production thereof
06/27/2002US20020080588 Probe card assembly and kit, and methods of making same
06/27/2002US20020079228 Rectifiers that pulse direct current several hundred times per second in order to repeatedly and intermittently establish an electric field between a supply of plating material and the gravure cylinder
06/27/2002US20020079215 Workpiece processor having processing chamber with improved processing fluid flow
06/27/2002US20020079133 Copper foil and metal foil with carrier foil for printed wiring board, and semi-additive process for producing printed wiring board using the same
06/27/2002US20020078669 Nonwoven metal fabric and method of making same
06/26/2002EP1216486A1 Methods and apparatus for treating seed layer in copper interconnections
06/25/2002USRE37765 Pretreating the material with a carbon black dispersion followed by a graphite dispersion before the electroplating step.
06/25/2002US6410178 Separator of fuel cell and method for producing same
06/25/2002US6409904 Method and apparatus for depositing and controlling the texture of a thin film
06/25/2002US6409903 Multi-step potentiostatic/galvanostatic plating control
06/25/2002US6409892 Reactor vessel having improved cup, anode, and conductor assembly
06/25/2002US6409850 Heating to tin melting point and quenching; brightness, free of woodgrain surface; di- or trihydroxybenzenesulfonic acids
06/20/2002WO2002049077A2 Barrier layer for electrical connectors and methods of applying the layer
06/20/2002WO2000075401A9 Simultaneous electrical and fluid connection for anode
06/20/2002US20020076515 Heat resistant resin film with metal thin film, manufacturing method of the resin film, endless belt, manufacturing method of the belt, and image forming apparatus
06/20/2002US20020074662 Substrate for manufacturing a semiconductor device with three element alloy
06/20/2002US20020074234 Immersing the wafer, under bias, in a plating solution at forward current density of 10-30 mA/cm2 and a duration of 2-60 seconds followed by reverse current and bulk fill plating
06/20/2002US20020074233 Altering the structure of each deposited copper layer by annealing
06/20/2002US20020074230 Plating method and apparatus that creates a differential between additive disposed on a top surface and a cavity surface of a workpiece using an external influence
06/19/2002EP1215304A1 Two-layer chrome-plating process
06/19/2002EP1214739A2 Copper deposit process
06/19/2002EP1214191A1 Treated copper foil and process for making treated copper foil
06/19/2002CN1354588A Honeycomb telephone shell
06/18/2002US6407047 For pretreatment of aluminum prior to electroplating, to remove smut that results from the etching step of the aluminum pretreatment
06/13/2002WO2002047139A2 Methode of forming a copper film on a substrate
06/13/2002WO2002046526A1 Doctor or coater blade and method in connection with its manufacturing
06/13/2002WO2002046500A2 Improvements relating to metal finishes
06/13/2002WO2002045476A2 Apparatus and method for electrochemically depositing metal on a semiconductor workpiece
06/13/2002WO2002014583A3 Electroplated aluminum parts and process of production
06/13/2002WO2000045625A3 Method for the direct electroplating of through-holes in printed circuit boards
06/13/2002US20020072335 Cellular phone housing
06/13/2002US20020071961 Material for electronic components, method of connecting material for electronic components, ball grid array type electronic components and method of connecting ball grid array type electronic components
06/13/2002US20020071207 Thin film magnetic head having gap layer made of nip and method of manufacturing the same
06/13/2002US20020070434 Palladium-spot leadframes for high adhesion semiconductor devices and method of fabrication
06/13/2002US20020070126 Polishing method, polishing apparatus, plating method, and plating apparatus
06/13/2002US20020070119 Masking techniques for metal plating
06/13/2002US20020070118 Plating cathode with layer of first metal, and a layer of second metal, using an electrolytic plating process; wherein a plating current is controlled to obtain desired current density at the cathode within a predefined range
06/13/2002US20020070117 Electrochemical processing power device
06/13/2002US20020069943 Method for producing a tin-nickel alloy film
06/12/2002EP1213372A2 Process and arrangement for the galvanic deposition of nickel, cobalt, nickel alloys or cobalt alloys with periodic current pulses and use of the process
06/12/2002CN1353779A System for electrochemically processing workpiece
06/12/2002CN1353778A Workpiece processor having processing chamber with improved processing fluid flow
06/11/2002US6403234 Plated material for connectors
06/11/2002US6402925 Prevent accumulation by polishing
06/11/2002US6402924 Programmed pulse electroplating process
06/11/2002US6402922 Pulse plating
06/11/2002US6402592 Electrochemical methods for polishing copper films on semiconductor substrates
06/06/2002US20020068438 Method for fabricating semiconductor devices
06/06/2002US20020067181 Probe card assembly and kit, and methods of making same
06/06/2002US20020066673 Method for plating copper conductors and devices formed
06/05/2002EP1211011A1 Solder coating material and production method therefor
06/04/2002US6399220 Conformable nickel coating and process for coating an article with a conformable nickel coating
06/04/2002US6399163 Optical displays with liquid crystals
06/04/2002US6399153 Method and apparatus for air masking portion of component during plating or coating
06/04/2002US6398939 An electrowinning cell and an electrolyte circulation system for forming copper, where fresh electrolytic solution entering the tank is directed uniformly between the cathode and anode plates
06/04/2002US6398937 Vibration of an electrolysis solution to increase uniformity of copper electrodeposition using transducers positioned between anodes
06/04/2002CA2193467C Article with protective coating thereon
05/2002
05/30/2002WO2001032951A9 Chemical fluid deposition for the formation of metal and metal alloy films on patterned and unpatterned substrates
05/30/2002US20020064677 Electric connector
05/30/2002US20020064591 Substrate plating method and apparatus
05/30/2002US20020063064 Connecting electronically resistive substrate to a negative terminal of electrical power source; disposing substrate and an anode in solution comprising metal compound and supporting electrolyte; electrodepositing metal onto substrate
05/30/2002US20020063062 Depositing a copper seed layer over dielectric layer and into etched features of dielectric layer having a barrier layer; treating copper seed layer to remove oxidized layer from over copper seed layer; electroplating copper fill layer
05/30/2002US20020062663 Articles with selectively deposited overlay
05/29/2002EP0956600B1 PREPARATION OF Cu x In y Ga z Se n (x=0-2, y=0-2, z=0-2, n=0-3) PRECURSOR FILMS BY ELECTRODEPOSITION FOR FABRICATING HIGH EFFICIENCY SOLAR CELLS
05/29/2002CN1351678A 合金电镀 Alloy plating
05/29/2002CN1351531A Method and apparatus for plating and polishing a semiconductor substrate
05/29/2002CN1351530A Method and apparatus for deposition on and polishing of a semiconductor surface
05/28/2002US6395642 Semiconductor substrate
05/28/2002US6395230 Pellistor
05/28/2002US6395163 Process for the electrolytic processing especially of flat items and arrangement for implementing the process
05/23/2002US20020060159 Chrome-plated sliding member and manufacturing method thereof
05/23/2002DE10052188A1 Production of a metallized electrode used as a gas diffusion electrode for a polymer-electrolyte-membrane fuel cells comprises applying a catalyst onto a conducting substrate coated with a polymer by electrochemical deposition
05/21/2002US6391476 Aluminum alloy cladding layer comprising silicon, magnesium, zinc, copper, manganese, indium, iron, strontium, bismuth, lead, lithium, and/or antimony
05/21/2002US6391473 Cu plated ceramic substrate and a method of manufacturing the same
05/21/2002US6391181 Coloring, metal alloys of zinc, copper and zinc
05/21/2002US6391179 Plating and antideposit agents
05/21/2002US6391168 Plating apparatus utilizing an auxiliary electrode
05/21/2002US6391166 Plating apparatus and method
05/21/2002US6390356 Method of forming cylindrical bumps on a substrate for integrated circuits
05/16/2002WO2002038834A1 Porous nickel foil for alkaline battery cathode, production method therefor and production device therefor
05/16/2002WO2002038830A1 Surface treated tin-plated steel sheet and chemical treatment solution
05/16/2002WO2002038827A1 Plasma electroplating
05/16/2002WO2002038326A2 Brazing product having a low melting point
05/16/2002US20020056649 Method of fabricating thin magnetic film and electrolytic plating apparatus for fabricating thin magnetic film
05/16/2002US20020056647 Plating method and plating apparatus
05/16/2002US20020056645 Immersing electrically conductive substrate having smooth surface having small recesses therein in electroplating bath containing ions of metal to be deposited, immersing counter electrode, passing modulated pulsing current between
05/16/2002US20020056644 Pulse plating by pulsed electrolysis by periodically applying electricity while controlling pulse frequency and current density
05/15/2002EP1205602A1 Nonwoven metal fabric and a method of making same
05/15/2002EP1204787A2 Method for continuous nickel-plating of an aluminium conductor and corresponding device
05/15/2002EP1204786A1 Arrangement enabling a liquid to flow evenly around a surface of a sample and use of said arrangement
05/15/2002CN1349659A Burless castellation via process and product for plastic chip carrier
05/14/2002US6387229 Alloy plating
05/09/2002US20020053734 Probe card assembly and kit, and methods of making same
05/09/2002US20020053519 Seed layer repair
05/09/2002US20020053517 Electolysis to create an alloy of copper, tungsten and/or molybdenum, nickel, cobalt, iron and/or zinc and chlorine
05/09/2002US20020053510 Methods and apparatus for processing the surface of a microelectronic workpiece
05/08/2002CN1348511A Method for selective plating of a metal substrate using laser developed masking layer and apparatus for carrying out the method
05/08/2002CN1348326A Production method of copper foil for fine line use