Patents for C25D 21 - Processes for servicing or operating cells for electrolytic coating (5,798)
08/2004
08/11/2004CN1520384A ELectrodeionization appts. and method
08/11/2004CN1520334A Vibratingly stirring appts., and device and method for processing using stirring appts.
08/10/2004US6773569 Potential pulse-scan methods of analyzing organic additives in plating baths with multi-component additives
08/10/2004US6773559 Processing apparatus including a reactor for electrochemically etching a microelectronic workpiece
08/05/2004WO2004053455A3 Plating bath composition control
08/05/2004WO2002029137A3 Method and associated apparatus for tilting a substrate upon entry for metal deposition
08/05/2004US20040152348 Socket for mating with electronic component, particularly semiconductor device with spring packaging, for fixturing, testing, burning-in or operating such a component
08/04/2004CN1517453A Electroplating device, electroplating cup and cathode ring
08/03/2004US6770184 Integrated de-ionized water pressure monitoring system for solder plating machines
07/2004
07/28/2004EP1441232A2 Method for connecting electronic components
07/28/2004EP1441048A2 Plating apparatus, plating cup and cathode ring
07/27/2004US6767437 Electroplating apparatus and electroplating method
07/22/2004WO2004061164A1 Work transfer device for immerse transfer electroplating apparatus
07/22/2004US20040142566 Continuous bleed-and-feed process and equipment
07/22/2004US20040140199 Plating apparatus, plating cup and cathode ring
07/21/2004EP1439397A2 Method of performing a burn-in
07/21/2004EP1438447A2 Method and conveyorized system for electrolytically processing work pieces
07/21/2004EP1438446A2 System and method for electrolytic plating
07/15/2004WO2004059042A1 Lead-free bump and method for forming the same
07/15/2004US20040134774 Processing apparatus including a reactor for electrochemically etching microelectronic workpiece
07/14/2004CN1157504C Mixing device
07/13/2004US6761812 Supplying electrical current to workpiece through contact portions contacting workpiece at different locations, measuring magnetic field of each portion to determine magnitude of current, individually adjusting current
07/08/2004WO2004007811A3 Device and method for monitoring an electrolytic process
07/08/2004US20040129575 rotating substrate holding member to remove plating liquid; and sucking liquid remaining on the substrate-contacting portion or in its vicinity, while the holding member is rotated
07/08/2004US20040129384 Chemical treatment apparatus and chemical treatment method
07/08/2004US20040129209 Phosphate film processing method and phospate film processing device
07/07/2004CN1510980A Film carrying belt for mounting electronic components, production and electrolyzing apparatus
07/06/2004US6758955 Methods for determination of additive concentration in metal plating baths
07/01/2004WO2003002784A3 Electrolysis cell for restoring the concentration of metal ions in electroplating processes
07/01/2004US20040124089 Plating method and apparatus for controlling deposition on predetermined portions of a workpiece
07/01/2004US20040124084 Separation and counting of single molecules through nanofluidics, programmable electrophoresis, and nanoelectrode-gated tunneling and dielectric detection
06/2004
06/30/2004EP1278899B1 Method and device for the electrolytic coating of a metal strip
06/30/2004CN1509350A Anodization device and anodization method
06/30/2004CN1508296A Electroplating device and method thereof
06/29/2004US6755960 Zinc-nickel electroplating
06/29/2004US6755956 Catalyst-induced growth of carbon nanotubes on tips of cantilevers and nanowires
06/29/2004US6755955 Immersing a planar substrate in an electrolyte that contains the catalytically active metallic; applying an electrical voltage; depositing a layer of catalytically active metallic material by electrochemical deposition on the planar substrate
06/29/2004US6755946 Clamshell apparatus with dynamic uniformity control
06/24/2004WO2004053455A2 Plating bath composition control
06/24/2004WO2004016828A3 Antimisting agents
06/24/2004US20040118676 Plating apparatus and plating method
06/23/2004EP1431424A2 Plating apparatus and plating method
06/23/2004EP1430167A2 Plating apparatus and method
06/23/2004CN1506502A Method and equipment for controlling local electric current to obtain uniform electroplating thickness
06/22/2004US6754090 AC/DC/HFAC/DC/AC power supply
06/22/2004US6752916 Electrochemical planarization end point detection
06/22/2004US6752855 For providing substrate such as a semiconductor wafer solution treatment
06/17/2004US20040115932 Method and apparatus for controlling local current to achieve uniform plating thickness
06/17/2004DE10255702A1 Method for producing a nonferrous foil with required properties involves mixing of a nonferrous metal sulfate bath with an additional mixture of polypropylene glycol and phenol sulfone acid
06/16/2004CN1153855C Method and device for regulating concentration of substaces in electrolytes
06/16/2004CN1153852C Device and method for controlling electric power line distribution
06/15/2004US6749692 Branching a portion of a water flow, which circulates through a rinsing water circuit associated with each of the washer units, off in form of a bypass stream, feeding the stream to a washer unit located upstream of a respective washer unit
06/10/2004WO2004009875A3 Tilted electrochemical plating cell with constant wafer immersion angle
06/10/2004US20040108224 Methods and apparatuses for analyzing solder plating solutions
06/10/2004US20040108214 Methods for determination of additive concentration in metal plating baths
06/10/2004US20040108213 Plating bath composition control
06/10/2004US20040108199 Device for electrodepositing metallic, prosthetic, molded, dental components
06/09/2004EP1426469A1 Method for electrolytic copper plating
06/08/2004US6746589 Plating method and plating apparatus
06/08/2004US6746579 Comprises continuously detecting deterioration state of gold sulfite complex plating solution
06/08/2004US6746578 Selective shield/material flow mechanism
06/03/2004US20040104123 Anode is separated from the alkaline electrode to avoid undesirable secondary reactions in an alkali zinc nickel electroplating bath
06/03/2004US20040103921 Method for electrochemically treating articles and apparatus and method for cleaning articles
06/03/2004DE69817077T2 Behandlungsverfahren und Vorrichtung, die eine chemische Reaktion verwenden Treatment method and device which use a chemical reaction
06/02/2004EP1424406A1 Electroforming apparatus and electroforming method
05/2004
05/27/2004WO2004044924A1 A commutator, a gaz electrode, a method of electroplating and a method of initiating cold fusion
05/27/2004WO2004044272A1 Measurement of the concentration of a reducing agent in an electroless plating bath
05/27/2004US20040099533 Microelectronics; positioning contactors; concentric anodes; nozzles; electroplating
05/27/2004US20040099532 Using insulating shield; electrochemical plating bath; uniform current distribution
05/27/2004DE10130333B4 Galvanische Vorrichtung zur Abscheidung von Edelmetall Electroplating apparatus for separating noble metal
05/26/2004CN1499992A Process for degassing queous plating solution
05/26/2004CN1151009C Fabricating interconnects and tips using sacrificial substrates
05/25/2004US6741085 Contact carriers (tiles) for populating larger substrates with spring contacts
05/25/2004US6740242 For forming an interconnection by embedding copper in fine interconnection groove defined in surface of semiconductor substrate through copper sulfate plating
05/25/2004US6740164 Plating apparatus and method of manufacturing semiconductor device
05/20/2004US20040094403 Integrated plating and planarization apparatus having a variable-diameter counterelectrode
05/19/2004EP1420087A2 Method for supplying zinc ions to alkaline zinc plating solution
05/19/2004EP1419378A2 Improved method for analysis of three organic additives in an acid copper plating bath
05/19/2004EP1419290A2 Segmented counterelectrode for an electrolytic treatment system
05/19/2004CN1498290A Phosphate film processing method and film processing device
05/19/2004CN1497830A Control power supply device for electroplating
05/18/2004US6736945 Wafer plating apparatus
05/13/2004WO2003006715A9 Methods and apparatus for controlling an amount of a chemical constituent of an electrochemical bath
05/13/2004US20040089555 Continuous metal plating and supplemental processing in one housing; substrate stage between cassette stage and pre-treatment unit; cleaning with pure water; drying
05/13/2004US20040089553 Method for supplying zinc ions to alkaline zinc plating solution
05/13/2004US20040089552 Electrochemical treating substrate by irradiating with light; lamp, stage, cathode, frame and seal
05/13/2004US20040089551 Ion-depletion compartment; ion exchange resin; water purification
05/13/2004US20040089538 Electrode, electrochemical cell, and method for analysis of electroplating baths
05/12/2004EP0792463B1 Mounting spring elements on semiconductor devices
05/12/2004CN1495870A Composite intermediate connection element of microelectronic component and its making method
05/12/2004CN1495296A Electroplating method and device for wire stock, and electroplate wire stock
05/11/2004US6733656 Automatic calibration of the reference electrode enabled by the present invention, saves labor, time and expense, and minimizes errors in the plating bath analysis.
05/11/2004US6733650 Apparatus and process for producing zinc oxide film
05/06/2004WO2002004711A3 Method and associated apparatus for tilting a substrate upon entry for metal deposition
05/06/2004US20040084319 Method for electrochemical fabrication
05/06/2004US20040084316 Voltage applied between cathode electrode in contact with edge of substrate and vertically moveable anode; copper films of uniform thickness
05/06/2004US20040084315 Plating apparatus and plating method
05/06/2004US20040083855 Antimisting agents
05/06/2004DE10043560B4 Verfahren und Vorrichtung zur Herstellung einer Metallschicht Method and apparatus for producing a metal layer
05/05/2004CN1494462A Internal heat spreader plating methods and devices
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