Patents for C25D 21 - Processes for servicing or operating cells for electrolytic coating (5,798)
04/2001
04/17/2001US6217727 Electroplating apparatus and method
04/17/2001CA2211184C Method and apparatus for delivering electromagnetic energy into a solution
04/11/2001CN1291243A Electroplating system having auxiliary electrode exterior to main reactor chamber for contact cleaning operations
04/11/2001CN1290771A Electroplating device and process for electroplating parts using said device
04/10/2001US6214193 Semiconductor wafers
04/10/2001CA2120177C Method for recovering and reproducing tinning liquid
04/05/2001DE10045830A1 Removal of metal ions from aqueous solution, e.g. waste liquor, process bath or lixiviation solution, involves adjusting to suitable pH, adding solid organic chelant, stirring and removing metal complex formed
04/04/2001EP1088121A2 Method for metal coating of substrates
04/04/2001CN1290310A Plating apparatus and method
03/2001
03/29/2001WO2000036737A9 Power supply and method for producing non-periodic complex waveforms
03/29/2001DE19932524C1 Verfahren und Vorrichtung zur elektrochemischen Behandlung Method and apparatus for electrochemical treatment
03/29/2001DE10030717A1 Stationary measurement of entrainment of treatment solutions during transport of products on frames, in drums or other devices comprises maintaining and/or stabilizing operating parameters
03/28/2001CN1288979A Technology process and equiment for depositing permalloy film electrically
03/27/2001US6207034 Method of manufacture of polymer transistors with controllable gap
03/27/2001US6207033 Process and apparatus for regeneration of chromium plating bath
03/21/2001EP1085111A1 A replenishment process for metal electrodeposition baths
03/20/2001US6203685 Apparatus and method for selective electrolytic metallization/deposition utilizing a fluid head
03/13/2001US6200450 Method and apparatus for depositing Ni-Fe-W-P alloys
03/13/2001US6200436 Recycling consistent plating system for electroplating
03/08/2001WO2001016405A1 Method for measuring leveler concentration of plating solution, and method and apparatus for controlling plating solution
03/07/2001EP1081253A2 Double pressure vessel chemical dispenser unit
03/07/2001EP1080253A2 Chemical mixing, replenishment, and waste management system
03/07/2001EP1080252A1 Method for electro copperplating substrates
03/07/2001CN1286323A Technology and equipment for cleaning electroplated parts without discharge of sewage
02/2001
02/27/2001US6193863 Product conveyance mechanism for electroplating apparatus
02/27/2001US6193860 Method and apparatus for improved copper plating uniformity on a semiconductor wafer using optimized electrical currents
02/13/2001US6187166 Integrated solution electroplating system and process
02/13/2001US6187153 Comparator for monitoring the deposition of an electrically conductive material on a leadframe to warn of improper operation of a leadframe electroplating process
02/13/2001US6186316 Method and device for the precise electrolytic deposition and etching of metal layers on circuit boards and conductors foils in continuous systems
02/08/2001WO2001009409A1 Process for the solution of metals into an electrolytic deposition solution and solution plant operating such process
02/08/2001WO2001009399A1 Silver recovery from acidic brine solution by cementation
02/01/2001DE19935337A1 Partially coating metallic workpieces comprises completely or partially removing the lacquer in the regions to be coated, and subjecting the workpiece to a cathodic electro-dip lacquering on the regions to be coated
01/2001
01/30/2001US6179984 Circuit arrangement for supplying pulse current to electrolytic cells connected in parallel; method is used for electroplating of printed circuit boards in vertical dipping systems and in vertical and horizontal feed through systems
01/25/2001WO2000061498A3 System for electrochemically processing a workpiece
01/24/2001EP1070772A2 Electroplating device, and process for electroplating work using the device
01/24/2001CN1281517A Copper metallization of silicon wafers using insoluble anodes
01/23/2001US6176993 Process for recycling reaction system of electroplating passivation of wafers
01/23/2001US6176992 Method and apparatus for electro-chemical mechanical deposition
01/16/2001US6174417 Electroplating machine
01/10/2001CN1279303A Electrolytically processing method
01/04/2001DE19925471A1 Treatment of waste water from an electrolytic bath using reverse osmosis and selective ion-exchange to allow metal recovery
01/02/2001US6168693 Apparatus for controlling the uniformity of an electroplated workpiece
12/2000
12/28/2000WO2000079029A2 Method and apparatus for electro-deposition of metal
12/28/2000DE19726510C2 Vorrichtung und Verfahren zur elektrolytischen Metallabscheidung mittels Pulsstrom Apparatus and method for electrolytic metal deposition by means of pulse current
12/28/2000CA2377264A1 Method and apparatus for electro-deposition of metal
12/27/2000EP1063324A2 A method of in-situ displacement/stress control in electroplating
12/27/2000EP1063103A2 Electrolytic treatment method
12/26/2000US6165330 Continuous plating apparatus
12/21/2000DE19926019A1 Process for monitoring growing layers used in vacuum coating processes comprises directing a measuring beam before starting the layer growth into a galvanic bath and onto a layer substrate
12/19/2000US6162361 Plating waste water treatment and metals recovery system
12/13/2000EP1059367A2 Manufacturing method of electrodeposited copper foil, electrodeposited copper foil, copper-clad laminate and printed wiring board
12/13/2000CN1276442A Electrodeposit copper foil and its mfg method, copper coated laminate and PC board
12/13/2000CN1059475C Method and device for on-line control of organic additive in electrodeposition of metal
12/07/2000WO2000036737A3 Power supply and method for producing non-periodic complex waveforms
12/07/2000DE19911447A1 Brightening and leveling additive concentrations, especially in copper electroplating baths, are separately analyzed by titration and derivation from a previously determined calibration matrix
12/06/2000EP1057902A2 Improved process for synthesizing a palladium replenisher for electroplating baths
11/2000
11/29/2000EP1055020A2 Plating apparatus and method
11/28/2000US6153065 Internal stress testing device for high speed electroplating
11/28/2000US6153064 Apparatus for in line plating
11/21/2000US6150186 Method of making a product with improved material properties by moderate heat-treatment of a metal incorporating a dilute additive
11/16/2000WO2000068468A1 Copper replenishment technique for precision copper plating system
11/16/2000WO2000003073A3 Paced chemical replenishment system
11/15/2000EP1052311A1 Plating machine
11/15/2000EP1051541A2 Method for electrically regenerating contaminated rhodium solutions
11/14/2000US6146515 Power supply and method for producing non-periodic complex waveforms
11/08/2000EP1050607A2 A method and an equipment for the electrolytic deposition of gold or gold alloys
11/08/2000CN1272956A Apparatus and methods for controlling workpiece surface exposure to processing liquids during fabrication of microelectronic components
11/07/2000US6143146 Filter system
11/02/2000EP1048757A1 Plating method and apparatus
11/02/2000EP1048755A1 Plating device and method of confirming current feed
10/2000
10/31/2000US6139711 For measuring the throwing power of electroplating solutions.
10/31/2000US6139703 Cathode current control system for a wafer electroplating apparatus
10/31/2000CA2031028C Process for purification of nickel plating baths
10/25/2000CN2402691Y Electro-deposition coating device
10/19/2000WO2000061837A1 Workpiece processor having processing chamber with improved processing fluid flow
10/19/2000WO2000061498A2 System for electrochemically processing a workpiece
10/18/2000CN1270642A Cathode current control system for a wafer electroplating apparatus
10/17/2000US6132584 Process and circuitry for generating current pulses for electrolytic metal deposition
10/12/2000WO2000059605A1 Device for cleaning a fluid in the form of a vapor from a circuit
10/12/2000WO2000026443A3 Method and apparatus for electrochemical mechanical deposition
10/11/2000CN1269432A Anodic oxygenation method and operation apparatus thereof
10/04/2000EP1041178A2 Anodizing method and apparatus for performing the same
10/04/2000CN2399403Y Alloyed launder
10/03/2000US6126808 A reaction chamber holding an electrolyte for surface treating the head of aluminum pistons used in combustion engines
09/2000
09/28/2000WO2000056453A1 Method for producing a catalyst by means of electrodeposition
09/28/2000DE19913273A1 Production of pearl chromium layers on metal workpieces uses a chromic acid bath in which the cathodic current density is adjusted proportionally to the temperature of the bath
09/28/2000DE19912897A1 Katalysator und Verfahren zur Herstellung eines Katalysators Catalyst and process for the preparation of a catalyst
09/28/2000CA2367893A1 Method for producing a catalyst by means of electrodeposition
09/27/2000CN1267749A Lead-tin anode scavenger for chromium plating process
09/26/2000US6123815 Plating apparatus
09/26/2000CA2040809C Apparatus and process to regenerate a trivalent chromium bath
09/20/2000EP1036222A1 Copper metallization of silicon wafers using insoluble anodes
09/20/2000CN1267342A Method and device for regulating concentration of substaces in electrolytes
09/19/2000US6120673 Method and device for regenerating tin-plating solutions
09/14/2000WO2000020662A9 Submicron metallization using electrochemical deposition
09/08/2000WO2000052229A1 Copper recovery process
09/05/2000US6113769 Apparatus to monitor and add plating solution of plating baths and controlling quality of deposited metal
08/2000
08/31/2000WO2000026445A3 Enhanced membrane electrode devices useful for electrodeposition coating
08/30/2000CN1264757A Equipment and method for dissolving copper in step of producing raw liquid with electrolytic copper foil
08/29/2000US6110823 Method of modifying the thickness of a plating on a member by creating a temperature gradient on the member, applications for employing such a method, and structures resulting from such a method
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