Patents for C23F 1 - Etching metallic material by chemical means (16,062)
04/2009
04/01/2009CN101399197A Chamber lining
04/01/2009CN101399172A Apparatus for and method of processing substrate
04/01/2009CN101398518A Method for making metal optical lens cone
04/01/2009CN101397668A Etching technology of silicon shallow slot
04/01/2009CN101397667A Wet etching apparatus and method
04/01/2009CN100474521C Temperature controlled hot edge ring assembly, and device comprising the same and the use thereof
03/2009
03/31/2009US7510667 Plasma processing method and apparatus
03/31/2009US7510666 Time continuous ion-ion plasma
03/31/2009US7510664 Apparatus and method for atmospheric pressure reactive atom plasma processing for shaping of damage free surfaces
03/31/2009US7510663 Method for manufacturing organic molecular device
03/26/2009WO2009038224A1 Corrosion inhibitors or strippers containing substituted ketones or derivatives thereof and process for production of the same
03/26/2009WO2009038063A1 Etching solution
03/26/2009US20090081819 Method and apparatus for managing manufacturing equipment, method for manufacturing device thereby
03/26/2009US20090081810 Substrate processing apparatus and substrate processing method
03/26/2009US20090081596 Metal photoetching product and production method thereof
03/26/2009US20090081522 Metal composite for fuel cell and fuel cell bipolar plate using same, and fabrication method for same
03/26/2009US20090081433 Thin-film multilayer structure, component comprising said structure and its method of deposition
03/26/2009US20090081414 Resin composition for laser engraving, resin printing plate precursor for laser engraving, relief printing plate and method for production of relief printing plate
03/26/2009US20090078679 Etching solution and method for regenerating waste liquid thereof, and method for recovering valuable metals from waste liquid
03/26/2009US20090078678 Plasma processing apparatus and plasma processing method
03/26/2009US20090078677 Integrated steerability array arrangement for minimizing non-uniformity
03/26/2009US20090078676 METHOD FOR DRY ETCHING Al2O3 FILM
03/26/2009US20090078674 Reactive Ion Etching Process for Etching Metals
03/26/2009US20090078375 Plasma Processing Apparatus And Method
03/26/2009US20090078374 Apparatus and methods for transporting and processing substrates
03/26/2009US20090078373 Apparatus for manufacturing flat-panel display
03/26/2009US20090078372 Vacuum processing apparauts
03/25/2009CN101395010A Methods for forming articles having apertures and articles having substantially reduced residual compressive stress
03/25/2009CN101392376A Etching composite
03/25/2009CN101392375A Etching agent combination for forming circuit in film transistor LCD
03/25/2009CN101392374A Double temperature control hydrofluoric acid vapor etching device
03/24/2009US7507350 For radiation transparent indium tin oxide films; aqueous solution of oxalic acid, acetylene-free ethylene oxide-propylene oxide copolymer, a sulfonate type anionic surfactant, and a lower alkanol; suppressed foaming and residue formation
03/24/2009US7507313 Film removal method and apparatus
03/24/2009US7507039 Dynamic pressure bearing manufacturing method, dynamic pressure bearing and dynamic pressure bearing manufacturing device
03/24/2009US7506610 Plasma processing apparatus and method
03/24/2009US7506609 System for generating a local electron-cyclotron microwave low-pressure plasma at a predetermined location within a processing chamber
03/19/2009WO2009034845A1 Process for producing separator for fuel cell
03/19/2009WO2009034764A1 Process for producing printed wiring board and printed wiring board produced by the production process
03/19/2009WO2007131057A4 Vacuum processing chamber suitable for etching high aspect ratio features and components of same
03/19/2009US20090075484 Method of Processing A Substrate, Spin Unit for Supplying Processing Materials to A Substrate, and Apparatus for Processing A Substrate Having the Same
03/19/2009US20090075421 Wet etching of zinc tin oxide thin films
03/19/2009US20090074650 Method for the production of silicon suitable for solar purposes
03/19/2009US20090074646 Etching processes used in mems production
03/19/2009US20090071940 Multi-speed substrate processing apparatus and substrate processing method
03/19/2009US20090071939 Modification of polymer surface with shielded plasma
03/19/2009US20090071938 Methods and apparatus for substrate processing
03/19/2009US20090071933 Etching processes used in mems production
03/19/2009US20090071932 Etching processes used in mems production
03/19/2009US20090071605 Method for depositing a film using a charged particle beam, method for performing selective etching using the same, and charged particle beam equipment therefor
03/19/2009US20090071537 Index tuned antireflective coating using a nanostructured metamaterial
03/19/2009US20090071503 Method and device for treating substrates and nozzle unit therefor
03/19/2009DE102007043563A1 Etching, galvanizing, cleaning and photoresist developing of a substrate with megasonic support, comprise carrying out megasonic excitation by standard megasonic-oscillation of cool bar- and atomizer application
03/18/2009EP2035596A1 Plasma immersion ion processing for coating of hollow substrates
03/18/2009CN101389788A Process tuning gas injection from the substrate edge
03/17/2009US7504644 Method and devices for producing corpuscular radiation systems
03/17/2009US7504643 Method for cleaning a lithographic apparatus module, a cleaning arrangement and a lithographic apparatus comprising the cleaning arrangement
03/17/2009US7504041 Rotating at least the outer radio frequency source power applicator about a radial tilt axis to a position at which the spatial distribution of a plasma process parameter, such as etch rate, has at least a nearly minimal non-symmetry relative to the common axis of symmetry; semiconductor fabrication
03/17/2009US7503996 Multiple frequency plasma chamber, switchable RF system, and processes using same
03/12/2009US20090068844 Etching Process
03/12/2009US20090065480 Plasma Processing Apparatus
03/12/2009US20090065479 Dry etching method of high-k film
03/12/2009US20090065477 Pulsed-continuous etching
03/12/2009US20090065148 Methods and apparatus for igniting a low pressure plasma
03/12/2009US20090065147 Plasma processing apparatus
03/12/2009US20090065146 Plasma processing apparatus
03/12/2009US20090065145 Plasma Processing Apparatus And Method Capable Of Adjusting Temperature Within Sample Table
03/12/2009DE102007054484B3 Method for producing structures on multicrystalline silicon surfaces in semiconductor production comprises applying phosphoric acid solution to surface and heating to specified minimum temperature or above
03/11/2009CN101381873A Etching solution and conductor pattern forming method
03/11/2009CN101381872A Dry film pasting promotor and its use method
03/11/2009CN101381870A Surface treating method for casing of electronic equipment
03/11/2009CN100468640C Etching method and contact window forming method
03/11/2009CN100468055C Preparation method of X-ray diffraction sample rack
03/11/2009CN100467673C Removing process of residual copper on cathode foil surface for improved aluminium electrolyzing capacitor
03/11/2009CN100467671C Method for recovering hydrochloric acid and copper sulfate from acidic etching liquid
03/11/2009CN100467670C Acid corrosion solution for preparing multicrystal silicon pile surface and its using method
03/10/2009US7501073 Methods for producing metallic implants having roughened surfaces
03/10/2009US7501068 Method for manufacturing resonator
03/05/2009WO2009028114A1 Etching system
03/05/2009US20090061640 Alternate gas delivery and evacuation system for plasma processing apparatuses
03/05/2009US20090061354 Lithographic Printing Plate Support, Method of Manufacturing the Same, and Presensitized Plate
03/05/2009US20090057271 Manufacturing method of metal interconnection
03/05/2009US20090057265 Method of manufacturing multilayer printed circuit board
03/05/2009US20090056877 Plasma processing apparatus
03/05/2009US20090056876 Work Processing System and Plasma Generating Apparatus
03/05/2009US20090056875 Enhanced stripping of low-K films using downstream gas mixing
03/05/2009US20090056874 Lower electrode assembly for processing substrates
03/05/2009DE102008045306A1 Solution for etching copper during printed circuit board manufacture, includes copper ion source, acid, water, azole, aromatic compound and hydrogen peroxide
03/04/2009EP1946358A4 Composition and method for recycling semiconductor wafers having low-k dielectric materials thereon
03/04/2009CN201201968Y Circuit board miroetching manufacture process liquid medicine regenerating device
03/04/2009CN101379220A Solution and process to treat surfaces of copper alloys in order to improve the adhesion between the metal surface and the bonded polymeric material
03/04/2009CN101379219A Composition and method for improved adhesion of polymeric materials to copper or copper alloy surfaces
03/04/2009CN101376979A Method for removing aluminum coating on back of aluminum oxide template using dilute acid
03/04/2009CN100466404C Wet etching method for gallium arsenide/aluminum arsenide distributed Bragg reflector
03/04/2009CN100466192C Liquid flow control system for wet processing tank, and wet processing system
03/04/2009CN100465343C A method for constructing super-drainage structures on metal copper surfaces
03/03/2009US7498236 Silicon wafer thinning end point method
03/03/2009US7498074 Metal photoetching product and production method thereof
03/03/2009US7497967 Compositions and methods for polishing copper
03/03/2009US7497912 Substrate processing apparatus
02/2009
02/26/2009WO2009023988A1 Process and system for etching copper
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