Patents for C23F 1 - Etching metallic material by chemical means (16,062)
05/2009
05/28/2009US20090136771 Composition for preparing a surface for coating and methods of making and using same
05/28/2009US20090135521 Protective film forming method
05/28/2009US20090134120 Plasma Processing Method and Plasma Processing Apparatus
05/28/2009US20090134119 Film-forming material and method of forming pattern
05/28/2009US20090133840 Inductively coupled plasma apparatus
05/28/2009US20090133837 Apparatus for manufacturing flat-panel display
05/28/2009US20090133836 Adjustable height pif probe
05/28/2009US20090133835 Processing apparatus
05/28/2009DE102007057125A1 Etching process and assembly for the manufacture of printed circuit boards has de-complexor ioniser
05/27/2009CN101443480A Recyclable etching solution
05/27/2009CN101440492A Grill metal member etching production process capable of reducing corrosion allowance
05/27/2009CN101440491A Method for forming convex point structure formed by etching composition for convex point lower metal layer
05/27/2009CN100491594C Removing agent for ruthenium containing metal, and its application method
05/27/2009CN100491586C Plasma processing apparatus
05/26/2009US7538927 MEMS mirror with short vertical comb teeth and long in-plane comb teeth
05/26/2009US7537709 Method for isotropic etching of copper
05/26/2009US7537671 Self-calibrating optical emission spectroscopy for plasma monitoring
05/26/2009US7537662 Method and apparatus for depositing thin films on a surface
05/26/2009CA2645532A1 Metallic bipolar plate for fuel cells and method for manufacturing the same
05/22/2009WO2009064380A2 Fabrication of anchored carbon nanotube array devices for integrated light collection and energy conversion
05/22/2009WO2009064371A1 Plasma immersion ion implantation reactor with extended cathode process ring
05/22/2009WO2009063532A1 Aluminum etched plate for electrolytic capacitor
05/22/2009WO2009062753A1 Method for connecting a precious metal surface to a polymer
05/21/2009US20090131887 Method of manufacturing microneedle
05/21/2009US20090130476 Method of Forming Polarization Reversal Area, Apparatus thereof and Device Using it
05/21/2009US20090130380 Method for manufacturing pourous structure and method for forming pattern
05/21/2009US20090130370 Fabrication of anchored carbon nanotube array devices for integrated light collection and energy conversion
05/21/2009US20090128950 High aspect ratio motion limiter of a microactuator and method for fabrication
05/21/2009US20090127234 Plasma processing chamber with guard ring for upper electrode assembly
05/21/2009US20090127228 Structured method
05/21/2009US20090127227 Plasma processing apparatus and plasma processing method
05/21/2009US20090127225 Measurement of etching
05/21/2009US20090127224 Method of producing a nano-structure and method of producing a magnetic recording medium
05/21/2009US20090126871 Plasma processing apparatus
05/20/2009CN201243008Y Sprinkling anti-pollution device
05/20/2009CN101437981A In-situ chamber clean process to remove by-product deposits from chemical vapor etch chamber
05/20/2009CN101437980A Applications and fabrication techniques for large scale wire grid polarizers
05/20/2009CN100489158C Use of selective silicon nitrogen oxide etching liquid by wetting method
05/19/2009US7534723 Methods of forming fine patterns, and methods of forming trench isolation layers using the same
05/19/2009US7534364 Methods for a multilayer retaining ring
05/19/2009US7534363 Method for providing uniform removal of organic material
05/19/2009US7534362 Uniform etching system and process for large rectangular substrates
05/19/2009US7534360 Method of making diamond product and diamond product
05/19/2009US7534301 RF grounding of cathode in process chamber
05/14/2009US20090124091 Etching solution composition for metal films
05/14/2009US20090124087 Vertical plasma processing apparatus and method for using same
05/14/2009US20090122588 Phase change memory cell including a thermal protect bottom electrode and manufacturing methods
05/14/2009US20090121324 Etch with striation control
05/14/2009US20090120904 Method and device for manufacturing structure having pattern, and method for manufacturing mold
05/14/2009US20090120584 Counter-balanced substrate support
05/14/2009US20090120583 Methods of making gas distribution members for plasma processing apparatuses
05/14/2009US20090120581 Systems and methods for plasma processing of microfeature workpieces
05/14/2009US20090120580 Disturbance-Free, Recipe-Controlled Plasma Processing System And Method
05/13/2009EP2058417A1 Method for forming corrosion resistant plating layer and rotating machine
05/13/2009EP1429185B1 Etching method and use of a composition for forming etching protective layer
05/13/2009CN101432860A Method for forming self-aligned metal silicide contacts
05/13/2009CN101432463A Etching solutions, method for regeneration of waste etching solutions and method for the recovery of valuable metals from waste etching solutions
05/13/2009CN101432148A Processes for forming electronic devices and electronic devices formed by such processes
05/13/2009CN101431124A Texture etching method for single crystalline silicon solar cell
05/13/2009CN101431123A Texture etching method for single crystalline silicon solar cell
05/13/2009CN100487871C Etching method
05/13/2009CN100487857C In-situ dry clean chamber for front end of line fabrication
05/12/2009US7531104 Micro-optic elements and method for making the same
05/12/2009US7531103 Mask forming method, mask forming functional layer, dry etching method, and method of manufacturing an information recording medium
05/12/2009US7531061 Gas temperature control for a plasma process
05/12/2009US7531060 Integrated tool assemblies with intermediate processing modules for processing of microfeature workpieces
05/12/2009US7531025 Method of creating a turbulent flow of fluid between a mold and a substrate
05/12/2009US7530661 Substrate and method of forming substrate for fluid ejection device
05/07/2009WO2007027907A3 A system and method for obtaining anisotropic etching of patterned substrates
05/07/2009WO2006107573A3 High strip rate downstream chamber
05/07/2009US20090117443 Bipolar Plate Hydrophilic Treatment for Stable Fuel Cell Stack Operation at Low Power
05/07/2009US20090116149 Magnetic head slider manufacturing method
05/07/2009US20090115047 Robust multi-layer wiring elements and assemblies with embedded microelectronic elements
05/07/2009US20090114621 Method and device for the plasma treatment of materials
05/07/2009US20090114619 Wet etching method and wet etching apparatus
05/06/2009CN101426957A Substrate support system and method
05/06/2009CN101425397A Low voltage anode foil corrosion device for electrolytic capacitor
05/06/2009CN101425393A Cathode foil manufacturing method for aluminum electrolysis capacitor
05/06/2009CN101425385A Producing process for electrolysis capacitor high temperature resistant alloy aluminum cathode foil
05/06/2009CN101423946A Technique for preparing etched foil of medium-high voltage anode foil for energy-saving lamp
05/06/2009CN101423942A Alkali etch solution and method for preparing monocrystalline silicon pile fabrics
05/06/2009CN100485877C Method for improving unevenness of polishing and method for preparing embedded copper metal layer
05/06/2009CN100485861C Film etching method
05/06/2009CN100485859C Unit cleaning method and substrate treater for depressurizing chamber
05/06/2009CN100485091C Separation method of nickel ion in iron trichloride solution by crystallization and extraction method
05/06/2009CN100485024C Polymer film based miniature cell clamp and preparing process thereof
05/05/2009US7527741 Microreactor including magnetic barrier
05/05/2009US7527706 Plasma processing apparatus, process vessel for plasma processing apparatus and dielectric plate for plasma processing apparatus
05/05/2009US7527694 Substrate gripping apparatus
05/05/2009US7527016 Plasma processing apparatus
04/2009
04/30/2009WO2009055507A1 Methods and apparatus for sealing a slit valve door
04/30/2009WO2009053154A1 Method for removing a metal layer by means of fic in an intermediate step
04/30/2009WO2007030527A3 Photomask for the fabrication of a dual damascene structure and method for forming the same
04/30/2009US20090111280 Method for removing oxides
04/30/2009US20090107956 Thermal Gradient Control of High Aspect Ratio Etching and Deposition Processes
04/30/2009US20090107955 Offset liner for chamber evacuation
04/30/2009US20090107953 Methods for forming surface features using self-assembling masks
04/29/2009EP2053145A1 Method for removing a metal layer using FIC in an intermediate stage
04/29/2009CN201228284Y Gas drive circuit board etching machine
04/29/2009CN101419930A Wafer spin chuck and an etcher using the same
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