Patents for C23F 1 - Etching metallic material by chemical means (16,062)
07/2009
07/08/2009CN101476125A Method for etching gravure printing roller by spraying copper chloride
07/08/2009CN100510188C Method of recovering copper metal from waste printed circuit board and copper containing waste liquid and device thereof
07/08/2009CN100510187C Composition for etching metal layer and method for forming metal pattern by using same
07/08/2009CN100510186C Decoating liquid
07/07/2009US7556908 Chemically amplified positive resist composition, (meth)acrylate derivative and a process for producing the same
07/07/2009US7556712 Laser cleaning of backside of wafer for photolithographic processing
07/07/2009US7556711 Semiconductor device manufacturing apparatus and operating method thereof
07/02/2009WO2009081884A1 Etching agent, etching method and liquid for preparing etching agent
07/02/2009US20090170227 Mask and container and manufacturing
07/02/2009US20090166622 Plasma processing apparatus and semiconductor element manufactured by such apparatus
07/02/2009US20090166326 Edge electrodes with dielectric covers
07/02/2009US20090166324 Full-wafer backside marking process
07/02/2009US20090166220 Microchip and analysis method using the same
07/02/2009US20090165955 Plasma processing apparatus and method with controlled biasing functions
07/02/2009US20090165954 Electrically enhancing the confinement of plasma
07/02/2009US20090165951 Plasma processing apparatus capable of suppressing variation of processing characteristics
07/02/2009US20090165828 Substrate treatment method and substrate treatment apparatus
07/01/2009EP2075052A1 Thin film support substrate for use in hydrogen production filter and production method of hydrogen production filter
07/01/2009EP2073973A2 Patterned printing plates and processes for printing electrical elements
07/01/2009CN100507437C Method and apparatus for measuring film thickness by means of coupled eddy sensors
07/01/2009CN100507083C Magnesium alloy etching agent and using method thereof
06/2009
06/30/2009US7553457 Chemical processing apparatus for manufacturing circuit substrates
06/30/2009US7553427 in semiconductor using an aluminum source in the presence of a chlorine-containing gases, that are capable of anisotropic etching of high aspect ratio features in accordance with masking patterns
06/30/2009US7552521 Method and apparatus for improved baffle plate
06/25/2009WO2009078466A1 Composites of metal with resin and processes for producing the same
06/25/2009WO2006023753A3 System for thinning a semiconductor workpiece
06/25/2009US20090163035 Etch with high etch rate resist mask
06/25/2009US20090163034 Composite showerhead electrode assembly for a plasma processing apparatus
06/25/2009US20090162974 Semiconductor package board using a metal base
06/25/2009US20090159214 Microwave plasma source and plasma processing apparatus
06/25/2009US20090159213 Plasma reactor gas distribution plate having a path splitting manifold immersed within a showerhead
06/25/2009US20090159212 Jet plasma gun and plasma device using the same
06/25/2009US20090159211 Plasma processing apparatus
06/25/2009US20090159210 Roll-to-roll substrate transfer apparatus, wet etching apparatus comprising the same and apparatus for manufacturing printed circuit board
06/25/2009US20090159209 Plasma etching method and plasma etching apparatus
06/25/2009DE102007061687A1 Method for soft etching of silicon substrate using mineral acid mixture, which comprises mineral acid comprising sulfuric acid, nitric acid and hydrofluoric acid, water-binding agent and an added fluoride ion containing buffer
06/24/2009EP2072639A1 Method for adhesion promotion between the nickel and nickel alloy layer and another metal or a dielectric, such as in the manufacture of lead frames for semiconductor devices
06/24/2009EP1698215A4 Method of manufacturing an electrical component
06/24/2009CN100503273C Method for forming multilayered patterns on aluminum composite board surface
06/23/2009US7550183 Method for manufacturing conductive element substrate, conductive element substrate, method for manufacturing liquid crystal display, liquid crystal display and electronic information equipment
06/23/2009US7550091 Implant surface preparation
06/18/2009US20090157214 Maintenance system, substrate processing apparatus, remote operation unit and communication method
06/18/2009US20090156013 Method and apparatus for removing polymer from the wafer backside and edge
06/18/2009US20090152511 includes samarium oxide and ytterbium oxide; direct current sputtering; etched with weak acid, preventing occurrence of corrosion of gate or data lines and creation of debris
06/18/2009US20090152243 Plasma processing apparatus and method thereof
06/18/2009US20090152242 Plasma treatment apparatus and plasma treatment method
06/18/2009US20090152238 Substrate processing method and substrate processing system
06/18/2009US20090152237 Ceramic-Copper Foil Bonding Method
06/18/2009US20090151871 Systems for detecting unconfined-plasma events
06/18/2009US20090151870 Silicon carbide focus ring for plasma etching system
06/17/2009CN201258361Y Microetch liquor regeneration and heavy metal recovery equipment
06/17/2009CN101457360A Organic acid type roughening liquid
06/17/2009CN101456154A Multiple zone carrier head with flexible membrane
06/17/2009CN100500941C Substrate processing device and substrate processing system
06/16/2009US7547860 Microwave plasma processing apparatus for semiconductor element production
06/16/2009US7547669 Contains choline hydroxide; for removal of residues, photoresists, organic anti-reflective coatings and gap-fill and sacrificial polymers from surfaces; corrosion resistance
06/16/2009US7547399 Implant surface preparation
06/11/2009WO2009071788A2 Method and device for selective etching
06/11/2009WO2009070946A1 Rollers for transporting thin substrate and chemical treatment method using the same
06/11/2009US20090148963 Metal Wiring and Method of Manufacturing the Same, and Metal Wiring Substrate and Method of Manufacturing the Same
06/11/2009US20090146280 Circuit member, manufacturing method of the circuit member, and semiconductor device including the circuit member
06/11/2009US20090145881 System and method for dual-sided sputter etch of substrates
06/11/2009US20090145879 System and method for commercial fabrication of patterned media
06/11/2009US20090145553 Suppressor of hollow cathode discharge in a shower head fluid distribution system
06/11/2009CA2707243A1 Roller group for transporting thin substrate and method for performing chemical treatment by using the same
06/10/2009EP1586007A4 Electron beam processing for mask repair
06/10/2009DE102007058876A1 Method for processing wafer surfaces in the production of solar cells comprises inserting wafers into a treatment chamber, contacting with an alkaline treatment solution containing a texturing agent and further processing
06/10/2009DE102007058829A1 Textur- und Reinigungsmedium zur Oberflächenbehandlung von Wafern und dessen Verwendung Texture and cleaning medium for the surface treatment of wafers and to the use thereof
06/10/2009CN101454482A Process chamber for dielectric gapfill
06/10/2009CN101451241A Etchant combination for circuit of iquid crystal device of pattern thin film transistor
06/10/2009CN100499964C Etching reactive tank
06/10/2009CN100497748C Electropolishing assembly and methods for electropolishing conductive layers
06/10/2009CN100497743C Chemical removing method of ion-plating TiAlN coating on stainless steel substrate
06/09/2009US7545234 Microelectromechanical device having a common ground plane layer and a set of contact teeth and method for making aspects thereof
06/09/2009US7544269 Method and apparatus for electron density measurement
06/09/2009US7543547 Electrode assembly for plasma processing apparatus
06/04/2009US20090142936 Method of forming gated, self-aligned micro-structures and nano-structures
06/04/2009US20090142931 Cleaning method following opening etch
06/04/2009US20090139963 Multiple frequency pulsing of multiple coil source to control plasma ion density radial distribution
06/04/2009US20090139962 Methods and systems for controlling accumulation of electrical charge during semiconductor etching processes
06/04/2009US20090139658 Plasma processing apparatus
06/04/2009US20090139421 Metal pattern and process for producing the same
06/04/2009US20090139328 Packaged micro movable device and method for making the same
06/03/2009EP1625244B1 Method for removing layers from a component
06/03/2009CN101448977A Apparatus and process for plasma-enhanced atomic layer deposition
06/03/2009CN101445934A Method for removing gold coating on gallium aluminum arsenide material surface
06/03/2009CN101445933A Etchant
06/03/2009CN101445932A Etching solution
06/03/2009CN101445931A Microtextured implants and methods of making same
06/03/2009CN100494500C Method for simultaneous electrolysis and regeneration of acid etching solution and micro-etching solution
06/03/2009CN100494499C Etching solution for multi-layer copper and molybdenum, and etching method therewith
06/03/2009CN100494498C Method for surface treatment of metal material
06/02/2009US7542263 Overlay correction by reducing wafer slipping after alignment
06/02/2009US7541094 Etching; photolithography
06/02/2009US7541007 Microreactor and method of use to produce hydrogen by methanol reforming
06/02/2009US7540971 Plasma etch process using polymerizing etch gases across a wafer surface and additional polymer managing or controlling gases in independently fed gas zones with time and spatial modulation of gas content
06/02/2009US7540968 Micro movable device and method of making the same using wet etching
06/02/2009US7540923 Shower head structure for processing semiconductor
05/2009
05/28/2009WO2009066750A1 Etching solution composition
05/28/2009US20090136777 Wire-grid metal sheet, wire grid, and method for making the wire-grid metal sheet
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