Patents for C23F 1 - Etching metallic material by chemical means (16,062)
09/2009
09/22/2009US7591955 Method for forming an etched soft edge metal foil and the product thereof
09/22/2009US7591908 Vapor deposition apparatus and vapor deposition method
09/22/2009US7591907 Apparatus for hybrid chemical processing
09/22/2009US7591232 Internal coil with segmented shield and inductively-coupled plasma source and processing system therewith
09/17/2009US20090233450 Plasma etchimg method and plasma etching apparatus
09/17/2009US20090233445 Method of making diamond nanopillars
09/17/2009US20090232449 Erbium-Doped Silicon Nanocrystalline Embedded Silicon Oxide Waveguide
09/17/2009US20090231827 Interposer and method for manufacturing interposer
09/17/2009US20090230089 Electrical control of plasma uniformity using external circuit
09/17/2009US20090229856 Master Electrode and Method of Forming the Master Electrode
09/17/2009US20090229855 electrode and method of forming the master electrode
09/17/2009US20090229757 Plasma processing apparatus
09/17/2009US20090229756 Plasma processing apparatus
09/17/2009US20090229755 Plasma processing apparatus
09/17/2009US20090229754 Shower head and substrate processing apparatus
09/17/2009DE102005012356B4 PAA-basiertes Ätzmittel und Verfahren, bei denen dieses Ätzmittel verwendet wird PAA-based etchant and procedures that are experiencing this etchant is used
09/16/2009CN201309966Y Basket for installing silicon chip on 12 inch silicon chip corroding machine
09/16/2009CN101535530A Independent radiant gas preheating for precursor disassociation control and gas reaction kinetics in low temperature CVD systems
09/16/2009CN101533787A Adhesion promotion
09/16/2009CN101532180A Method for frequency corrosion of wafers and equipment thereof
09/16/2009CN101532142A Novel surface processing technology of ordinary aluminum plate
09/16/2009CN101532136A Electrolytic regeneration method of acidic etching waste solution
09/16/2009CN101532135A Method for eliminating metal body surface reflection
09/16/2009CN101532128A Composition for surface modification of a heat sink and method for surface treatment of the heat sink for printed circuit boards using the same
09/16/2009CN101531366A Method for cleaning polycrystalline silicon material
09/16/2009CN101530679A Solid phase micro-extraction stainless steel fiber and preparation method thereof
09/16/2009CN100540745C Basic etching solution and producing method
09/15/2009US7588693 Method of modifying an etched trench
09/15/2009US7587989 Plasma processing method and apparatus
09/15/2009US7587809 Method for forming a MR reader with reduced shield topography and low parasitic resistance
09/11/2009WO2009111487A1 Process of making a microtube and microfluidic devices formed therewith
09/10/2009US20090226665 Nickel structures and methods for manufacturing the same by removal of an underlying material
09/10/2009US20090224216 Surface-Activation of Semiconductor Nanostructures for Biological Applications
09/10/2009US20090223931 Dry etching method and apparatus
09/10/2009US20090223930 Apparatus for etching substrate and method of etching substrate using the same
09/10/2009US20090223929 Apparatus and method of removing coating of line-shaped body using plasma
09/10/2009US20090223928 Inductively coupled plasma processing apparatus
09/10/2009US20090223633 Apparatus And Method For Plasma Etching
09/10/2009DE19734879B4 Verfahren zum Ätzen eines Siliciumwafers, Ätzvorrichtung und Ätzmittel A method of etching a silicon wafer, etching and the etchant
09/09/2009CN101524829A A method and device for measuring film thickness by coupling eddy current sensors
09/09/2009CN100537848C Metal scavenger composition and method for producing the same
09/09/2009CN100537847C Etching solution composition for titanium and aluminium cascade metal films
09/08/2009US7585540 Method for manufacturing wiring substrate
09/08/2009US7585417 Method of fabricating a diaphragm of a capacitive microphone device
09/08/2009US7585385 Plasma processing apparatus, control method thereof and program for performing same
09/08/2009US7585383 Vacuum processing apparatus
09/08/2009US7584714 Method and system for improving coupling between a surface wave plasma source and a plasma space
09/03/2009US20090221151 Electrode for plasma processing apparatus, plasma processing apparatus, plasma processing method and storage medium
09/03/2009US20090221150 Etch rate and critical dimension uniformity by selection of focus ring material
09/03/2009US20090220865 Method and apparatus for source field shaping in a plasma etch reactor
09/03/2009US20090218317 Method to control uniformity using tri-zone showerhead
09/03/2009US20090218316 Manufacturing method in plasma processing apparatus
09/03/2009US20090218315 Method and system for controlling center-to-edge distribution of species within a plasma
09/03/2009US20090218314 Advanced process sensing and control using near infrared spectral reflectometry
09/03/2009US20090218122 Wiring substrate and method of manufacturing the same
09/03/2009US20090218045 Plasma processing apparatus
09/03/2009DE19882648B4 Verfahren und Einrichtung zum Beizen eines Metallbandes Method and device for pickling a metal strip
09/02/2009CN101519016A Method for making patterns on metal surfaces
09/01/2009US7582186 Method and apparatus for an improved focus ring in a plasma processing system
09/01/2009US7582185 Plasma-processing apparatus
09/01/2009US7582182 Method and apparatus for measuring electron density of plasma and plasma processing apparatus
09/01/2009US7582167 Apparatus for reducing entrapment of foreign matter along a moveable shaft of a substrate support
09/01/2009US7581511 Apparatus and methods for manufacturing microfeatures on workpieces using plasma vapor processes
08/2009
08/27/2009US20090215213 Microelectromechanical device having a common ground plane and method for making aspects thereof
08/27/2009US20090215156 Method for Fabricating Nanogap and Nanogap Sensor
08/27/2009US20090213188 method of manufacturing an actuator apparatus, a method of manufacturing a liquid jet head and a liquid jet apparatus
08/27/2009US20090212664 Micro movable device and method of making the same using wet etching
08/27/2009US20090212019 Single-sided high throughput wet etching and wet processing apparatus and method
08/27/2009US20090212017 Plasma processing method and plasma processing apparatus
08/27/2009US20090212015 Plasma-Assisted Processing in a Manufacturing Line
08/27/2009US20090212014 Method and system for performing multiple treatments in a dual-chamber batch processing system
08/27/2009US20090212010 Plasma etching carbonaceous layers with sulfur-based etchants
08/27/2009US20090212009 Methods for Electrochemically Fabricating Structures Using Adhered Masks, Incorporating Dielectric Sheets, and/or Seed Layers That Are Partially Removed Via Planarization
08/27/2009US20090212007 Surface treatment method
08/27/2009US20090211706 Etching endpoint determination method
08/26/2009EP1843903A4 Processes for forming electronic devices and electronic devices formed by such processes
08/26/2009CN101514456A Etching liquid and cuprum wiring forming method by using the same
08/26/2009CN100532648C Corrosion method of anode aluminum foil for middle-high voltage electrolytic capacitor
08/26/2009CN100532644C Method for preparing nano titanium oxide film by medical nickel-titanium memory alloy surface in situ denickeling
08/26/2009CN100532055C Capillary imprinting technique
08/25/2009US7579308 Etching with organic ammonium compound and/or oxoammonium compound, water, and solvent
08/25/2009US7578236 Apparatus and method for demetallizing a metallized film
08/20/2009WO2009101948A1 Etching method
08/20/2009US20090208880 Process sequence for formation of patterned hard mask film (rfp) without need for photoresist or dry etch
08/20/2009US20090206494 Wiring over substrate, semiconductor device, and methods for manufacturing thereof
08/20/2009US20090206348 Composite Substrate, and Method for the Production of a Composite Substrate
08/20/2009US20090206057 Method To Improve Mask Critical Dimension Uniformity (CDU)
08/20/2009US20090206056 Method and Apparatus for Plasma Process Performance Matching in Multiple Wafer Chambers
08/20/2009US20090206053 Plasma etching method, plasma etching apparatus, control program and computer-readable storage medium
08/19/2009EP2090675A1 Defect etching of germanium
08/19/2009EP1508161A4 Methods of positions and/or orienting nanostructures
08/19/2009CN101512040A Confinement ring drive
08/19/2009CN101511713A Load port module
08/19/2009CN101511607A Integrated chemical mechanical polishing composition and process for single platen processing
08/19/2009CN100531526C Metal photo-etching product and production method therefor
08/19/2009CN100530557C Etching method of single wafer
08/19/2009CN100529186C Method for isotropic etching of copper
08/19/2009CN100528571C Substrate for fluid jet device and method for forming substrate
08/18/2009US7575777 Potassium niobate deposited body and method for manufacturing the same, piezoelectric thin film resonator, frequency filter, oscillator, electronic circuit, and electronic apparatus
08/18/2009US7575694 Method of selectively stripping a metallic coating
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