C23F 1 - Etching metallic material by chemical means

Patents for C23F 1 - Etching metallic material by chemical means (16,062)
10/2009
10/28/2009	CN101568669A Method of surface treatment for metal glass part, and metal glass part with its surface treated by the method
10/28/2009	CN101568420A Metal/resin composite and process for producing the same
10/28/2009	CN101567309A Device for blending etching solution and device for determinating concetration of etching solution
10/28/2009	CN101566699A Antireflective member, optical element, display device, method of making stamper and method of making antireflective member using the stamper
10/28/2009	CN100554514C Apparatus and method for pressure control of reaction chamber
10/27/2009	US7608194 Photonic structures, devices, and methods
10/27/2009	US7608162 Plasma processing apparatus and method
10/22/2009	US20090264316 Ultraviolet/Ozone Patterned Organosilane Surfaces
10/22/2009	US20090262353 Methods and apparatus for measuring substrate edge thickness during polishing
10/22/2009	US20090261066 Apparatus and method for dry etching
10/22/2009	US20090261065 Components for use in a plasma chamber having reduced particle generation and method of making
10/22/2009	US20090261062 Carrier substrate and method of manufacturing flexible display apparatus using the same
10/22/2009	US20090261060 Production Method of Suspension Board with Circuit
10/22/2009	US20090260871 Perforated Substrates for Forming Housings
10/22/2009	US20090260853 Wiring substrate and method for manufacturing the same
10/22/2009	US20090260763 Plasma processing with preionized and predissociated tuning gases and associated systems and methods
10/22/2009	US20090260762 Process gas introducing mechanism and plasma processing device
10/21/2009	CN201330281Y Multi-chemical separation and recycling device
10/21/2009	CN101560663A Method for electrochemically preparing nano-array structure materials on basis of nano-mask preparation technique
10/21/2009	CN100552986C Method for preparing polysilicon solar battery matte under magnetic field
10/20/2009	US7606132 Cantilever-type near-field probe for optical data storage and method of manufacturing the same
10/20/2009	US7605093 Method of fabricating iridium-based materials and structures on substrates, and iridium source reagents therefor
10/20/2009	US7604749 Techniques of anisotropic wet etch micromachining for comb drive transducers and resonance frequency reduction
10/20/2009	US7604708 Cleaning of native oxide with hydrogen-containing radicals
10/20/2009	US7603963 Controlled zone microwave plasma system
10/15/2009	WO2009124393A1 Electrochemical process for the recovery of metallic iron and sulfuric acid values from iron-rich sulfate wastes, mining residues and pickling liquors
10/15/2009	WO2008103456A8 Pulsed plasma system with pulsed sample bias for etching semiconductor structures
10/15/2009	US20090255902 Focus ring, plasma etching apparatus and plasma etching method
10/15/2009	US20090255901 Plasma processing apparatus, plasma processing method, and tray
10/15/2009	US20090255631 Plasma Processing Apparatus and the Upper Electrode Unit
10/15/2009	CA2717887A1 Electrochemical process for the recovery of metallic iron and sulfuric acid values from iron-rich sulfate wastes, mining residues and pickling liquors
10/14/2009	CN201327825Y Trimming film loader of silicon substrate epitaxial wafer
10/14/2009	CN101555598A Shallow surface lead-removing process for bathroom faucet
10/14/2009	CN101554826A Manufacturing method of casing and casing manufactured therefrom
10/14/2009	CN101554543A Distributed exhaust device for exhausting gas of microfluid device and preparation method thereof
10/14/2009	CN100550312C Multilayer substrate cleaning method, substrate bonding method, and bonded wafer manufacturing method
10/14/2009	CN100549226C Cleaning method of chemical vapor deposition equipment
10/13/2009	US7602111 Plasma accelerating apparatus and plasma processing system including secondary electron amplification coating layer formed at inner wall of channel
10/13/2009	US7601242 Plasma processing system and baffle assembly for use in plasma processing system
10/13/2009	US7601241 Plasma processing apparatus and plasma processing method
10/13/2009	US7601225 System for controlling the sublimation of reactants
10/13/2009	US7601223 Showerhead assembly and ALD methods
10/13/2009	US7600522 Substrate treatment method and substrate treatment apparatus
10/13/2009	US7600303 BAW resonator bi-layer top electrode with zero etch undercut
10/08/2009	US20090250431 Substrate processing apparatus and substrate processing method
10/08/2009	US20090250430 Methods for Fabrication of Three-Dimensional Structures
10/08/2009	US20090250379 Process for Manufacturing a Microreactor and Its Use as a Reformer
10/08/2009	US20090250260 High density circuit board and manufacturing method thereof
10/08/2009	US20090250253 Printed circuit board and manufacturing method thereof
10/08/2009	US20090250169 Lower liner with integrated flow equalizer and improved conductance
10/07/2009	CN101552210A Semiconductor device having oxide semiconductor layer and manufacturing method
10/07/2009	CN101549552A Method for preparing polymer superhydrophobic surface using controlled etched metal surface as template
10/07/2009	CN100547723C Micro movable device and method of making the same using wet etching
10/07/2009	CN100547116C Etching solution for polycrystal 'carbon head material' silicon carbon separation and preparation method thereof
10/06/2009	US7597531 Method of controlling mover device
10/01/2009	WO2009118129A1 Method for wet chemical etching
10/01/2009	US20090246629 Manufacturing method of electrode, electric storage device, and intermediate laminate member
10/01/2009	US20090242517 Substrate treating apparatus and substrate treating method
10/01/2009	US20090242516 Plasma etching method and computer readable storage medium
10/01/2009	US20090242515 Plasma processing apparatus and plasma etching method
10/01/2009	US20090242514 Etch Process and Etching Chamber
10/01/2009	US20090242513 Multi-Layer/Multi-Input/Multi-Output (MLMIMO) Models and Method for Using
10/01/2009	US20090242507 Manufacturing process of electrode
10/01/2009	US20090242134 Plasma processing apparatus
10/01/2009	US20090242133 Electrode structure and substrate processing apparatus
10/01/2009	US20090242131 Ecr plasma source
10/01/2009	US20090242126 Edge etching apparatus for etching the edge of a silicon wafer
10/01/2009	US20090242125 Carrier Head Membrane
09/2009
09/30/2009	EP2104591A1 Process for surface preparation of parts to be coated
09/30/2009	CN201317809Y Device for regeneration of acid etching waste solution and recovery of copper
09/30/2009	CN201317808Y Deplating cleaner
09/30/2009	CN101545060A Method for preparing copper porous material
09/30/2009	CN101544770A Herstellung superhydrophober polymer
09/30/2009	CN100545312C Printed circuit etching liquid
09/30/2009	CN100545311C Method for removing layers from a component
09/29/2009	US7595539 Method for release of surface micromachined structures in an epitaxial reactor
09/29/2009	US7595096 Method of manufacturing vacuum plasma treated workpieces
09/29/2009	US7594927 Flexible stent
09/24/2009	WO2009117734A1 Adhesion promotion of metal to laminate with a multi-functional compound haftforderung von metall zu laminaten mit einer multifunktionellen
09/24/2009	WO2009117624A2 Mono-energetic neutral beam activated chemical processing system and method of using
09/24/2009	WO2009064380A8 Fabrication of anchored carbon nanotube array devices for integrated light collection and energy conversion
09/24/2009	US20090236316 Substrate processing method and substrate processing apparatus
09/24/2009	US20090236314 Mono-energetic neutral beam activated chemical processing system and method of using
09/24/2009	US20090236313 Gas flow distribution receptacles, plasma generator systems, and methods for performing plasma stripping processes
09/24/2009	US20090236311 Method and Apparatus for Structuring Components Made of a Material Composed of Silicon Oxide
09/24/2009	US20090236209 Key sheet and production method thereof
09/24/2009	US20090236043 Plasma processing apparatus
09/24/2009	US20090236042 Silent discharge plasma apparatus
09/23/2009	EP2103406A1 Process for production of highly corrosion-resistant composite
09/23/2009	CN201313937Y 蚀刻机 Etcher
09/23/2009	CN101542019A Exhaust system
09/23/2009	CN101540351A Method for etching matte on surface of single crystal silicon solar energy battery
09/23/2009	CN101538717A Preparation method of multivariant complexing etching liquid used for magnesium alloy surface treatment
09/23/2009	CN101538716A Remover for a ruthenium containing metal and use thereof
09/23/2009	CN101538715A Flexible circuit board etching liquid concentration control device
09/23/2009	CN100543188C Etching liquid composition
09/23/2009	CN100543187C Solution for removing attached palladium on printing board surface and removing method
09/23/2009	CN100542775C Manufacture of light guiding mould cores
09/22/2009	US7592266 Removing the palladium metal layer using a cerium (IV) nitrate salt
09/22/2009	US7591959 plurality of selectivities exhibits a first etch selectivity at a first temperature and a second etch selectivity at a second temperature; etchant include phosphoric acid, fluoboric acid, or sulfuric acid to remove dielectric materials, such as Si3N4, SiO2 at different temperarture

1 ... 51 52 53 54 55 56 57 58 59 60 61 62 63 64 65 66 67 68 69 70 71 ... 161