Patents for C23F 1 - Etching metallic material by chemical means (16,062)
02/2004
02/05/2004US20040023430 Method for forming a micro-mechanical component in a semiconductor wafer, and a semiconductor wafer comprising a micro-mechanical component formed therein
02/04/2004EP1386351A1 Method of wet etching a silicon and nitrogen containing material
02/04/2004EP1386350A1 Method of wet etching an inorganic antireflection layer
02/04/2004CN1473209A Method for removing lead from plated cylindrical article made of lead-containing copper alloy and metal fitting for hydrant, and method for preventing leaching of lead from article made of lead-contai
02/04/2004CN1472362A Method for removing copper stannous and lead ions from used tin soldering liquid
02/04/2004CN1472361A Etching agent and application for improving etching selectvie ratio
02/04/2004CN1137287C Method for protecting sacrificial layer of movable structure in deep-reaction ion etching process
01/2004
01/29/2004WO2004010486A1 High temperature anisotropic etching of multi-layer structures
01/29/2004WO2004009872A2 In-line demetallization process for flexible metallized substrates
01/29/2004US20040018730 Effective solution and process to wet-etch metal-alloy films in semiconductor processing
01/29/2004US20040018372 Etching substrate material, etching process and article obtained by etching
01/29/2004US20040016876 Method of etching semiconductor device using neutral beam and apparatus for etching the same
01/28/2004EP1384797A1 In-line demetallization process for flexible metallized substrates
01/28/2004EP1383943A1 Method of plating and pretreating aluminium workpieces
01/28/2004CN1470674A Nickel-containing iron trichloride etching effluent extraction and separation method
01/28/2004CN1136336C Chemical removing technology for composite coating of aircraft engine steel blade before low temperature aluminizing
01/27/2004US6683009 Method for local etching
01/27/2004US6683007 Etching and cleaning methods and etching and cleaning apparatus used therefor
01/27/2004US6683006 Film forming method and film forming apparatus
01/22/2004DE10230252A1 Verfahren zur Herstellung integrierter Mikrosysteme A method for manufacturing integrated microsystems
01/21/2004CN1469939A A method for wet etching
01/21/2004CN1469918A Stabilized alkaline compositions for cleaning microelectronic substrates
01/21/2004CN1468977A Residual polymer eliminating method
01/20/2004US6680668 Fast heat rise resistor using resistive foil
01/15/2004WO2004006298A2 Method and apparatus for non-invasive measurement and analysis of semiconductor process parameters
01/15/2004WO2004006285A1 Method and apparatus for non-invasive measurement and analysis of plasma parameters
01/15/2004US20040007063 Micro machined polymer beam structure method and resulting device for spring applications
01/14/2004CN1468050A Method of manufacturing printed wiring board and printed wiring board obtained by the manufacturing method
01/14/2004CN1134553C Fe-Ni alloy cathode cover semi-product with good etching perforation property and its preparing method
01/13/2004US6677167 Wafer processing apparatus and a wafer stage and a wafer processing method
01/13/2004US6676843 Magnetically patterning conductors
01/13/2004US6676802 Remote exposure of workpieces using a plasma
01/08/2004WO2004003969A2 Method and system for predicting process performance using material processing tool and sensor data
01/08/2004WO2004003410A1 Sealable surface method and device
01/08/2004WO2004003256A1 Anisotropic dry etching of cu-containing layers
01/08/2004US20040005723 Methods of making, positioning and orienting nanostructures, nanostructure arrays and nanostructure devices
01/08/2004US20040004724 Spin etcher with thickness measuring system
01/07/2004CN1465746A Etching liquid for silver alloy
01/06/2004US6673156 Semiconductor processing device
01/06/2004US6671945 Method for making a resistor using resistive foil
01/01/2004US20040002430 Using a time critical wafer cleaning solution by combining a chelating agent with an oxidizer at point-of-use
01/01/2004US20040002213 Method for descreasing number of particles during etching process
01/01/2004US20040000378 Isolation chamber arrangement for serial processing of semiconductor wafers for the electronic industry
12/2003
12/31/2003WO2004000972A1 An etchant for a wiring, a method for manufacturing the wiring using the etchant, a thin film transistor array panel including the wiring, and a method for manufacturing the same
12/31/2003CN1465216A Copper plated circuit layer carrying copper clad laminated sheet and method of producing printed wiring board using the copper plated circuit layer carrying copper clad laminated sheet
12/25/2003US20030235997 Method of controlling metallic layer etching process and regenerating etchant for metallic layer etching layer etching process based on near infrared spectrometer
12/25/2003US20030234079 Plasma ashing/etching using solid sapphire disk
12/24/2003WO2003107400A2 Acid etching mixture having reduced water content
12/24/2003CN1131733C Soup treatment appts.
12/23/2003US6666987 Mixtures of sulfuric acid, hydrogen peroxide and 5-amino tetrazole, used for cleaning or texturing surfaces of foils to improve acid resistance and bonding strength of multilayer printed circuits laminations
12/23/2003US6666986 Mixtures of cleaning compounds used on semiconductor substrates
12/18/2003WO2003104527A1 Acidic solution for silver deposition and method for silver layer deposition on metal surfaces
12/18/2003US20030230549 Method for etching chemically inert metal oxides
12/18/2003US20030230548 Etching a silicon substrate using an aqueous acid mixture comprising hydrofluoric acid, reducing water content by adding fluorosulfonic acid, controlling the concentration of hydrogen fluoride
12/18/2003CA2481133A1 Acidic solution for silver deposition and method for silver layer deposition on metal surfaces
12/17/2003CN1461822A Stripping lqiuid nickel or nickel alloy
12/17/2003CN1131340C Method for preventing contamination by lead from metallic piping devices
12/16/2003US6664197 Process for etching thin-film layers of a workpiece used to form microelectronic circuits or components
12/16/2003US6664128 Bump fabrication process
12/16/2003US6664123 Method for etching metal layer on a scale of nanometers
12/11/2003WO2003102540A2 Micro machined polymer beam structure method and resulting device for spring applications
12/11/2003WO2003025971A3 Plasma processing apparatus with coil magnet system
12/11/2003US20030226687 Method of manufacturing printed wiring board and printed wiring board obtained by the manufacturing method
12/10/2003EP1369180A2 Spray nozzle and method of manufacturing the same
12/10/2003EP0968322B1 Method and device for operating milling baths
12/10/2003CN1461584A Improved adhesion of polymeric materials to metal surfaces
12/10/2003CN1461493A Cleaning method and etching method
12/10/2003CN1460892A Laser processing method and equipment
12/10/2003CN1130474C Silicon etching liquid and its preparing method
12/09/2003US6661162 Piezoelectric resonator and method of producing the same
12/09/2003US6660655 Method and solution for preparing SEM samples for low-K materials
12/09/2003US6660102 Method of decoating a turbine blade
12/09/2003US6659111 Removing deposits from interior surfaces of metal apparatus used for forming metal or alloy films, by flowing mixtures of hydrogen fluoride and oxygen, then evacuating with inert gases
12/04/2003WO2003100900A1 Bipolar plate assembly, fuel cell stacks and fuel cell systems incorporating the same
12/04/2003WO2003100842A1 Conveying type substrate treating device
12/04/2003US20030224610 Fabrication process for bonded wafer precision layer thickness control and its non-destructructive measurement method
12/04/2003US20030224263 Process for producing precision metal components
12/04/2003US20030222048 Method for manufacturing porous structure and method for forming pattern
12/03/2003EP1366860A1 Non-destructive method for measuring the thickness of a bonded wafer
12/03/2003EP1366510A2 Ruthenium silicide wet etch
12/02/2003US6656370 Method for the manufacture of printed circuit boards
12/02/2003US6656294 Method of reducing elution of lead in lead-containing copper alloy, and drinking water service fittings made of lead-containing copper alloy
12/02/2003US6656279 Apparatus for the spray treatment of printed circuit boards
12/02/2003CA2168013C Alkaline ammoniacal cupric chloride etching bath containing a copper (i) stabilizer
11/2003
11/27/2003US20030219639 Bipolar plate assembly, fuel cell stacks and fuel cell systems incorporating the same
11/27/2003US20030218735 Stent manufacturing apparatus
11/27/2003US20030217990 Enhanced endpoint detection for wet etch process control
11/27/2003US20030217809 Laser machining method and apparatus
11/26/2003EP1364398A1 Method for microfabricating structures using silicon-on-insulator material
11/26/2003CN1128893C Corrosion apparatus
11/25/2003US6653055 Forming printed circuits by selectively etching copper lamination by exposing photoresists and electrodeposited coatings to light
11/25/2003US6652993 Cooper clad laminate with cooper-plated circuit layer, and method for manufacturing printed wiring board using the copper clad laminate with cooper-plated circuit layer
11/20/2003US20030213773 Power module member manufactured by wet treatment, and wet treatment method and wet treatment equipment thereof
11/20/2003US20030213771 Degreasing, then chemically etching with aqueous phosphoric acid compound to form magnesium phosphate coating
11/20/2003US20030213553 Smooth copper surface is contacted with an adhesion promoting composition comprising an oxidizer, a pH adjuster, a topography modifier, and a sulfur-containing coating stabilizer
11/18/2003US6649081 Nitric acid, fluoroborate anions, hydrogen peroxide, propylene glycol and benzotriazole
11/18/2003US6649077 Method and apparatus for removing coating layers from alignment marks on a wafer
11/18/2003US6648503 Superconducting radiation detector; forming mechanically strong, thermal conductivity controlling membrane without cracks
11/13/2003WO2003065419A3 Plasma etching of ni-containing materials
11/13/2003US20030209521 Etching mixture of water soldium metatitanate, potassium titanate and sulfuric acid