Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892) |
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06/05/2013 | CN102011101B Growing device for diamond film |
06/05/2013 | CN101956173B Coating device utilizing bearing assembly |
06/05/2013 | CN101883881B Method for producing group iii nitride-based compound semiconductor, wafer including group iii nitride-based compound semiconductor, and group iii nitride-based compound semiconductor device |
06/05/2013 | CN101768730B Film preparation device |
06/05/2013 | CN101748386B Plasma processing equipment |
06/05/2013 | CN101519772B Method and device for distributing inlet gases of reaction source of chemical vapor deposition material growing device |
06/05/2013 | CN101425450B Gas supply device, substrate processing apparatus and substrate processing method |
06/04/2013 | USRE44255 Support for microelectronic, microoptoelectronic or micromechanical devices |
06/04/2013 | US8456007 Chemical vapor deposition of titanium |
06/04/2013 | US8455849 Method and apparatus for modulating wafer treatment profile in UV chamber |
06/04/2013 | US8455672 Atomic layer deposition using metal amidinates |
06/04/2013 | US8455060 Method for depositing hydrogenated diamond-like carbon films using a gas cluster ion beam |
06/04/2013 | US8455050 Manufacturing apparatus and manufacturing method for alined carbon nanotubes |
06/04/2013 | US8455049 Strontium precursor for use in chemical vapor deposition, atomic layer deposition and rapid vapor deposition |
06/04/2013 | US8455047 Method for growing carbon nanotubes on clay platelets |
06/04/2013 | US8455041 Diffusion barrier coatings having graded compositions and devices incorporating the same |
06/04/2013 | US8455039 Photoresist-coating apparatus and photoresist-coating method using the same |
06/04/2013 | US8454928 Tellurium precursors for GST deposition |
06/04/2013 | US8454794 Antenna for plasma processor and apparatus |
06/04/2013 | US8454750 Multi-station sequential curing of dielectric films |
06/04/2013 | US8454749 Method and system for sealing a first assembly to a second assembly of a processing system |
06/04/2013 | US8453600 Substrate processing apparatus |
05/30/2013 | WO2013078308A1 Multi-chambered acoustic sensor for determining gas composition |
05/30/2013 | WO2013078065A1 Chamber sealing member |
05/30/2013 | WO2013077994A1 Apparatus and methods for improving reliability of rf grounding |
05/30/2013 | WO2013077289A1 Film forming device and method for installing vaporizer |
05/30/2013 | WO2013077008A1 Film-forming apparatus and film-forming method |
05/30/2013 | WO2013076966A1 Plasma generation source and vacuum plasma processing apparatus provided with same |
05/30/2013 | WO2013076922A1 Substrate conveying roller, thin film manufacturing device, and thin film manufacturing method |
05/30/2013 | WO2013076525A1 Coating method and apparatus |
05/30/2013 | WO2013076347A1 An atomic layer deposition reactor for processing a batch of substrates and method thereof |
05/30/2013 | WO2013076274A1 Method for coating, using a chemical vapor deposition technique, a part with a coating for protecting against oxidation, and coating and part |
05/30/2013 | WO2013075405A1 Method for preparing superfine line |
05/30/2013 | WO2013075390A1 Hydride vapor phase epitaxy device |
05/30/2013 | WO2013046050A3 Dry cleaning method for recovering etch process condition |
05/30/2013 | US20130137334 Film formation apparatus, film formation method, and mask unit to be used for them |
05/30/2013 | US20130137273 Semiconductor Processing System |
05/30/2013 | US20130136872 Plasma processing in a capacitively-coupled reactor with trapezoidal-waveform excitation |
05/30/2013 | US20130136862 Multi-cell mocvd apparatus |
05/30/2013 | US20130136861 Method for coating at least the inner face of a piston ring and piston ring |
05/30/2013 | US20130136860 Method of fabricating a carbon nanotube array |
05/30/2013 | US20130136850 Method for depositing materials on a substrate |
05/30/2013 | US20130135727 Wave plate and wave plate manufacturing method |
05/30/2013 | US20130135712 Yttrium oxide coated optical elements with improved mid-infrared performance |
05/30/2013 | US20130134129 Inductively coupled plasma apparatus |
05/30/2013 | US20130134128 Device and method for treating wafer-shaped articles |
05/30/2013 | US20130133696 Substrate processing apparatus |
05/30/2013 | US20130133580 High productivity vapor processing system |
05/30/2013 | US20130133579 Gas preheating system for chemical vapor deposition |
05/30/2013 | US20130133577 Plasma cvd apparatus |
05/30/2013 | US20130133576 Vacuum processing device |
05/30/2013 | US20130133573 Mask for Deposition and Manufacturing Method of the Same |
05/30/2013 | US20130133571 Film forming apparatus |
05/29/2013 | EP2597175A1 Method for producing coated polymer |
05/29/2013 | EP2596148A1 Method for manufacturing a barrier coating |
05/29/2013 | EP2596147A1 Method for manufacturing a barrier layer |
05/29/2013 | EP2596146A2 Substrate transport mechanism contacting a single side of a flexible web substrate for roll-to-roll thin film deposition |
05/29/2013 | EP2595697A1 Method for manufacturing an electrode for medical use, and electrode obtained |
05/29/2013 | DE102012109924A1 Halbleiter-Verarbeitungssystem Semiconductor processing system |
05/29/2013 | DE102010013043B4 Elektrodenanordnung und CVD-Reaktor oder Hochtemperatur-Gasumwandler mit einer Elektrodenanordnung Electrode assembly and CVD reactor or high-temperature Gasumwandler with an electrode arrangement |
05/29/2013 | CN202954090U 特气管路装置 Special air line device |
05/29/2013 | CN202954089U Chemical vapor deposition device and carrying mechanism for same |
05/29/2013 | CN202954088U Semiconductor sedimentation structure having separation distance convenient to regulate |
05/29/2013 | CN202954087U Feeding device for metal-organic chemical vapor deposition (MOCVD) device |
05/29/2013 | CN103125011A Adapter ring for silicon electrode |
05/29/2013 | CN103124806A Method for forming Ge-Sb-Te film and storage medium |
05/29/2013 | CN103124734A Hydrosilane derivative, method for producing same, and method for producing silicon-containing thin film |
05/29/2013 | CN103124691A Directionally recrystallized graphene growth substrates |
05/29/2013 | CN103122457A Chemical vapor deposition solid precursor continuous supply system |
05/29/2013 | CN103122456A Gas mixing and distributing structure of double-chamber or multi-chamber thin film deposition equipment |
05/29/2013 | CN103122455A An apparatus for performing a plasma chemical vapour deposition process |
05/29/2013 | CN103122454A Zinc oxide precursor and method of depositing zinc oxide-based thin film using the same |
05/29/2013 | CN103122453A Zinc oxide precursor containing alkyl zinc halide and method of depositing zinc oxide-based thin film using the same |
05/29/2013 | CN102105990B Apparatus and method for manufacturing thin film solar cell, and thin film solar cell |
05/29/2013 | CN102102196B Temperature control method for chemical vapor deposition apparatus |
05/29/2013 | CN102001650B Method for preparing graphene through chemical vapor deposition under cold cavity wall condition |
05/29/2013 | CN101092735B Multi-piece ceramic crucible and method for making thereof |
05/29/2013 | CN101078109B Process for producing silicon oxide films from organoaminosilane precursors |
05/28/2013 | US8449943 Composite brake disks and methods for coating |
05/28/2013 | US8449942 Methods of curing non-carbon flowable CVD films |
05/28/2013 | US8449941 Method for forming thermal barrier coating on hot-gas-path components of gas turbine during operation |
05/28/2013 | US8449715 Internal member of a plasma processing vessel |
05/28/2013 | US8449678 Combinatorial process system |
05/28/2013 | US8449677 Method of depositing a thermal barrier by plasma torch |
05/28/2013 | US8448599 Device for processing a substrate, method of processing a substrate and method of manufacturing semiconductor device |
05/28/2013 | CA2546230C Antimicrobial composite material |
05/23/2013 | WO2013075061A1 Carbon based coatings and methods of producing the same |
05/23/2013 | WO2013074701A1 System, method and apparatus of a wedge-shaped parallel plate plasma reactor for substrate processing |
05/23/2013 | WO2013074597A1 Toroidal plasma channel with varying cross-section areas along the channel |
05/23/2013 | WO2013073734A1 Method for diamond-coating both side surfaces of insert and diamond-coated insert manufactured by same method |
05/23/2013 | WO2013073534A1 Method for producing silicon carbide single crystals |
05/23/2013 | WO2013072834A1 Inert-dominant pulsing in plasma processing |
05/23/2013 | WO2013072831A1 Hybrid pulsing plasma processing systems |
05/23/2013 | WO2013072623A1 Barrier layer to sioc alkali metals |
05/23/2013 | WO2013048016A3 Substrate supporting unit and substrate processing device, and method for producing substrate supporting unit |
05/23/2013 | WO2013019041A3 Method for manufacturing solid electrolyte thin film and manufacturing device thereof |
05/23/2013 | US20130130509 Combinatorial spot rastering for film uniformity and film tuning in sputtered films |
05/23/2013 | US20130130475 Vapor transport deposition method and system for material co-deposition |
05/23/2013 | US20130130053 Metal Plating Using Seed Film |
05/23/2013 | US20130130037 Carbon Nanotube-Graphene Hybrid Transparent Conductor and Field Effect Transistor |