Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892)
06/2013
06/05/2013CN102011101B Growing device for diamond film
06/05/2013CN101956173B Coating device utilizing bearing assembly
06/05/2013CN101883881B Method for producing group iii nitride-based compound semiconductor, wafer including group iii nitride-based compound semiconductor, and group iii nitride-based compound semiconductor device
06/05/2013CN101768730B Film preparation device
06/05/2013CN101748386B Plasma processing equipment
06/05/2013CN101519772B Method and device for distributing inlet gases of reaction source of chemical vapor deposition material growing device
06/05/2013CN101425450B Gas supply device, substrate processing apparatus and substrate processing method
06/04/2013USRE44255 Support for microelectronic, microoptoelectronic or micromechanical devices
06/04/2013US8456007 Chemical vapor deposition of titanium
06/04/2013US8455849 Method and apparatus for modulating wafer treatment profile in UV chamber
06/04/2013US8455672 Atomic layer deposition using metal amidinates
06/04/2013US8455060 Method for depositing hydrogenated diamond-like carbon films using a gas cluster ion beam
06/04/2013US8455050 Manufacturing apparatus and manufacturing method for alined carbon nanotubes
06/04/2013US8455049 Strontium precursor for use in chemical vapor deposition, atomic layer deposition and rapid vapor deposition
06/04/2013US8455047 Method for growing carbon nanotubes on clay platelets
06/04/2013US8455041 Diffusion barrier coatings having graded compositions and devices incorporating the same
06/04/2013US8455039 Photoresist-coating apparatus and photoresist-coating method using the same
06/04/2013US8454928 Tellurium precursors for GST deposition
06/04/2013US8454794 Antenna for plasma processor and apparatus
06/04/2013US8454750 Multi-station sequential curing of dielectric films
06/04/2013US8454749 Method and system for sealing a first assembly to a second assembly of a processing system
06/04/2013US8453600 Substrate processing apparatus
05/2013
05/30/2013WO2013078308A1 Multi-chambered acoustic sensor for determining gas composition
05/30/2013WO2013078065A1 Chamber sealing member
05/30/2013WO2013077994A1 Apparatus and methods for improving reliability of rf grounding
05/30/2013WO2013077289A1 Film forming device and method for installing vaporizer
05/30/2013WO2013077008A1 Film-forming apparatus and film-forming method
05/30/2013WO2013076966A1 Plasma generation source and vacuum plasma processing apparatus provided with same
05/30/2013WO2013076922A1 Substrate conveying roller, thin film manufacturing device, and thin film manufacturing method
05/30/2013WO2013076525A1 Coating method and apparatus
05/30/2013WO2013076347A1 An atomic layer deposition reactor for processing a batch of substrates and method thereof
05/30/2013WO2013076274A1 Method for coating, using a chemical vapor deposition technique, a part with a coating for protecting against oxidation, and coating and part
05/30/2013WO2013075405A1 Method for preparing superfine line
05/30/2013WO2013075390A1 Hydride vapor phase epitaxy device
05/30/2013WO2013046050A3 Dry cleaning method for recovering etch process condition
05/30/2013US20130137334 Film formation apparatus, film formation method, and mask unit to be used for them
05/30/2013US20130137273 Semiconductor Processing System
05/30/2013US20130136872 Plasma processing in a capacitively-coupled reactor with trapezoidal-waveform excitation
05/30/2013US20130136862 Multi-cell mocvd apparatus
05/30/2013US20130136861 Method for coating at least the inner face of a piston ring and piston ring
05/30/2013US20130136860 Method of fabricating a carbon nanotube array
05/30/2013US20130136850 Method for depositing materials on a substrate
05/30/2013US20130135727 Wave plate and wave plate manufacturing method
05/30/2013US20130135712 Yttrium oxide coated optical elements with improved mid-infrared performance
05/30/2013US20130134129 Inductively coupled plasma apparatus
05/30/2013US20130134128 Device and method for treating wafer-shaped articles
05/30/2013US20130133696 Substrate processing apparatus
05/30/2013US20130133580 High productivity vapor processing system
05/30/2013US20130133579 Gas preheating system for chemical vapor deposition
05/30/2013US20130133577 Plasma cvd apparatus
05/30/2013US20130133576 Vacuum processing device
05/30/2013US20130133573 Mask for Deposition and Manufacturing Method of the Same
05/30/2013US20130133571 Film forming apparatus
05/29/2013EP2597175A1 Method for producing coated polymer
05/29/2013EP2596148A1 Method for manufacturing a barrier coating
05/29/2013EP2596147A1 Method for manufacturing a barrier layer
05/29/2013EP2596146A2 Substrate transport mechanism contacting a single side of a flexible web substrate for roll-to-roll thin film deposition
05/29/2013EP2595697A1 Method for manufacturing an electrode for medical use, and electrode obtained
05/29/2013DE102012109924A1 Halbleiter-Verarbeitungssystem Semiconductor processing system
05/29/2013DE102010013043B4 Elektrodenanordnung und CVD-Reaktor oder Hochtemperatur-Gasumwandler mit einer Elektrodenanordnung Electrode assembly and CVD reactor or high-temperature Gasumwandler with an electrode arrangement
05/29/2013CN202954090U 特气管路装置 Special air line device
05/29/2013CN202954089U Chemical vapor deposition device and carrying mechanism for same
05/29/2013CN202954088U Semiconductor sedimentation structure having separation distance convenient to regulate
05/29/2013CN202954087U Feeding device for metal-organic chemical vapor deposition (MOCVD) device
05/29/2013CN103125011A Adapter ring for silicon electrode
05/29/2013CN103124806A Method for forming Ge-Sb-Te film and storage medium
05/29/2013CN103124734A Hydrosilane derivative, method for producing same, and method for producing silicon-containing thin film
05/29/2013CN103124691A Directionally recrystallized graphene growth substrates
05/29/2013CN103122457A Chemical vapor deposition solid precursor continuous supply system
05/29/2013CN103122456A Gas mixing and distributing structure of double-chamber or multi-chamber thin film deposition equipment
05/29/2013CN103122455A An apparatus for performing a plasma chemical vapour deposition process
05/29/2013CN103122454A Zinc oxide precursor and method of depositing zinc oxide-based thin film using the same
05/29/2013CN103122453A Zinc oxide precursor containing alkyl zinc halide and method of depositing zinc oxide-based thin film using the same
05/29/2013CN102105990B Apparatus and method for manufacturing thin film solar cell, and thin film solar cell
05/29/2013CN102102196B Temperature control method for chemical vapor deposition apparatus
05/29/2013CN102001650B Method for preparing graphene through chemical vapor deposition under cold cavity wall condition
05/29/2013CN101092735B Multi-piece ceramic crucible and method for making thereof
05/29/2013CN101078109B Process for producing silicon oxide films from organoaminosilane precursors
05/28/2013US8449943 Composite brake disks and methods for coating
05/28/2013US8449942 Methods of curing non-carbon flowable CVD films
05/28/2013US8449941 Method for forming thermal barrier coating on hot-gas-path components of gas turbine during operation
05/28/2013US8449715 Internal member of a plasma processing vessel
05/28/2013US8449678 Combinatorial process system
05/28/2013US8449677 Method of depositing a thermal barrier by plasma torch
05/28/2013US8448599 Device for processing a substrate, method of processing a substrate and method of manufacturing semiconductor device
05/28/2013CA2546230C Antimicrobial composite material
05/23/2013WO2013075061A1 Carbon based coatings and methods of producing the same
05/23/2013WO2013074701A1 System, method and apparatus of a wedge-shaped parallel plate plasma reactor for substrate processing
05/23/2013WO2013074597A1 Toroidal plasma channel with varying cross-section areas along the channel
05/23/2013WO2013073734A1 Method for diamond-coating both side surfaces of insert and diamond-coated insert manufactured by same method
05/23/2013WO2013073534A1 Method for producing silicon carbide single crystals
05/23/2013WO2013072834A1 Inert-dominant pulsing in plasma processing
05/23/2013WO2013072831A1 Hybrid pulsing plasma processing systems
05/23/2013WO2013072623A1 Barrier layer to sioc alkali metals
05/23/2013WO2013048016A3 Substrate supporting unit and substrate processing device, and method for producing substrate supporting unit
05/23/2013WO2013019041A3 Method for manufacturing solid electrolyte thin film and manufacturing device thereof
05/23/2013US20130130509 Combinatorial spot rastering for film uniformity and film tuning in sputtered films
05/23/2013US20130130475 Vapor transport deposition method and system for material co-deposition
05/23/2013US20130130053 Metal Plating Using Seed Film
05/23/2013US20130130037 Carbon Nanotube-Graphene Hybrid Transparent Conductor and Field Effect Transistor
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