| Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892) |
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| 03/17/1992 | US5096737 Ligand stabilized +1 metal beta-diketonate coordination complexes and their use in chemical vapor deposition of metal thin films |
| 03/17/1992 | US5096736 Cvd diamond for coating twist drills |
| 03/17/1992 | US5095930 Process for the uniform introduction of a fluid, and apparatus for carrying out the process |
| 03/11/1992 | EP0474369A1 Diamond-like carbon coatings |
| 03/11/1992 | EP0474251A1 Thermal reactor for processing semiconductor wafers and a method of operating such a reactor |
| 03/11/1992 | EP0474140A1 Process of forming capacitive insulating film |
| 03/11/1992 | EP0463000A4 Multilayer coated cemented carbide cutting insert |
| 03/10/1992 | US5094915 Laser-excited synthesis of carbon films from carbon monoxide-containing gas mixtures |
| 03/10/1992 | US5094906 Ceramic microtubular materials and method of making same |
| 03/10/1992 | US5094885 Chemical vapor deposition |
| 03/10/1992 | US5094879 Oxidation |
| 03/10/1992 | US5094878 Process for forming diamond film |
| 03/10/1992 | CA1296996C Multiple, parallel packed column vaporizer |
| 03/05/1992 | WO1992003591A1 Textile fiber treatment, devices therefore as well as products obtained with the process |
| 03/04/1992 | EP0473067A1 Wafer processing reactor |
| 03/04/1992 | EP0473040A1 System for delivery of reactive gases from a source of supply to a tool |
| 03/04/1992 | EP0472941A2 VHF/UHF plasma process for use in forming integrated circuit structures on semiconductor wafers |
| 03/04/1992 | EP0472897A1 Process for depositing copper containing layer II |
| 03/03/1992 | US5093557 Substrate heater and heating element |
| 03/03/1992 | US5093156 Process for preparing carbon material |
| 03/03/1992 | US5093152 Process for protecting an optical substrate by plasma deposition |
| 03/03/1992 | US5093151 Plasma cvd process for coating a basic tool body |
| 03/03/1992 | US5093150 Synthesis method by plasma chemical vapor deposition |
| 03/03/1992 | US5093149 High speed vapor deposition of high quality thin films |
| 03/01/1992 | WO1992003587A1 Transition metal aluminum/aluminide coatings and method for making them |
| 03/01/1992 | CA2090487A1 Transition metal aluminum/aluminide coatings and method for making them |
| 02/26/1992 | EP0472465A2 Method of depositing insulating layer on underlaying layer using plasma-assisted CVD process using pulse-modulated plasma |
| 02/26/1992 | EP0472045A1 Method and apparatus for controlling plasma processing |
| 02/26/1992 | EP0460106A4 Novel glass deposition viscoelastic flow process |
| 02/25/1992 | US5091320 Optical method for controlling thickness of semiconductor |
| 02/25/1992 | US5091219 Chemical vapor deposition method |
| 02/25/1992 | US5091217 Irradiating with radio frequency |
| 02/25/1992 | US5091210 Plasma CVD of aluminum films |
| 02/25/1992 | US5091209 Method of forming a thin copper film by low temperture CVD |
| 02/25/1992 | US5091208 Novel susceptor for use in chemical vapor deposition apparatus and its method of use |
| 02/25/1992 | US5091207 Venting of waste gases |
| 02/25/1992 | US5091044 Methods of substrate heating for vapor phase epitaxial growth |
| 02/25/1992 | US5090985 Method for preparing vaporized reactants for chemical vapor deposition |
| 02/25/1992 | US5090360 Atomized thin film forming apparatus |
| 02/25/1992 | US5090356 Chemically active isolation passageway for deposition chambers |
| 02/20/1992 | WO1992002661A1 Method for depositing a transparent antistatic thin film on the surface of a shaped object of which at least the surface portion is made of a styrene polymer or copolymer, to provide said object with lasting antistatic properties without altering its appearance |
| 02/19/1992 | EP0471365A1 Semiconductor wafer processing apparatus |
| 02/19/1992 | EP0471276A1 Method of forming a nitride or carbonnitride layer |
| 02/18/1992 | US5089466 Heat resistance |
| 02/18/1992 | US5089442 Silicon dioxide deposition method using a magnetic field and both sputter deposition and plasma-enhanced cvd |
| 02/18/1992 | US5089438 Method of making an article comprising a TiNx layer |
| 02/18/1992 | US5089289 Method of forming thin films |
| 02/18/1992 | US5089061 Chemical vapor deposition in an atmosphere containing silicon tetrachloride; diffusion treatment |
| 02/18/1992 | US5088697 Heat treating apparatus |
| 02/18/1992 | US5088444 Semiconductor film on a substrate |
| 02/18/1992 | CA1295896C Controlled flow vaporizer |
| 02/18/1992 | CA1295892C Hermetic coatings for optical fibers |
| 02/18/1992 | CA1295889C Refractory coated article |
| 02/13/1992 | DE4025554A1 Separating microcrystalline solid particles from substrate - by removing microcrystalline solid particle layer of uneven thickness by resistive heater positioning |
| 02/12/1992 | EP0470784A2 Method for selectively depositing a thin film |
| 02/12/1992 | EP0470661A1 Method of providing a silicion dioxide layer on a substrate by means of chemical reaction from the vapour phase at a low pressure (LPCVD) |
| 02/12/1992 | EP0470644A2 Superhard material film structure, process of making and use of same |
| 02/12/1992 | EP0470632A2 Method of manufacturing a silicon oxide film and an oxide based glass for semiconductor devices |
| 02/12/1992 | EP0470580A2 Plasma processing apparatus |
| 02/12/1992 | EP0470531A1 Diamond synthesizing method |
| 02/12/1992 | EP0470447A1 CVD diamond for coating twist drills |
| 02/12/1992 | EP0470386A2 Method for depositing an inorganic thin film on a substrate |
| 02/12/1992 | EP0470274A1 Method of depositing directly activated species onto a remotely located substrate |
| 02/11/1992 | US5087857 Plasma generating apparatus and method using modulation system |
| 02/11/1992 | US5087485 Heating a surface, applying a gaseous mixture of a carrier gas, a copper chelate and an alcohol wherein heating causes dissociation of copper chelate |
| 02/09/1992 | WO1992002662A1 Process for forming crack-free pyrolytic boron nitride on a carbon structure and article |
| 02/08/1992 | CA2046817A1 Cvd diamond for coating twist drills |
| 02/06/1992 | WO1992002109A1 Coreless refractory fibres |
| 02/06/1992 | WO1992001828A1 Method and device for manufacturing diamond |
| 02/06/1992 | WO1992001827A1 Oriented diamond crystals |
| 02/05/1992 | EP0469926A1 Silicon oxide based thin film vapour barriers |
| 02/05/1992 | EP0469824A1 Method of depositing fluorinated silicon nitride |
| 02/05/1992 | EP0469626A2 Chemical vapor deposition method of high quality diamond |
| 02/05/1992 | EP0469597A2 Plasma processing reactor |
| 02/05/1992 | EP0469204A1 Method for vapour deposition of diamond film |
| 02/05/1992 | EP0468996A1 Method for providing a proportioned vapour flow and also apparatus for carrying it out. |
| 02/04/1992 | US5086230 Apparatus for forming, correcting pattern |
| 02/04/1992 | US5085887 Wafer reactor vessel window with pressure-thermal compensation |
| 02/04/1992 | US5085885 Plasma-induced, in-situ generation, transport and use or collection of reactive precursors |
| 02/04/1992 | US5085731 Volatile liquid precursors for the chemical vapor deposition of copper |
| 02/04/1992 | CA2048168A1 Silicon oxide based thin film vapour barriers |
| 02/02/1992 | CA2066585A1 Method for depositing a transparent antistatic thin film on the surface of a shaped object of which at least the surface portion is made of a styrene polymer or copolymer, to provide said object with lasting antistatic properties without altering its appearance |
| 02/01/1992 | CA2047536A1 Method of depositing fluorinated silicon nitride |
| 01/29/1992 | EP0468396A1 Process for depositing a copper-containing layer |
| 01/29/1992 | EP0468395A1 Process for depositing layers containing titanium, zirconium or hafnium |
| 01/29/1992 | EP0468386A1 Process for depositing transition metal containing layers |
| 01/29/1992 | EP0468328A1 Mirror for altering the geometric shape of a light beam |
| 01/29/1992 | EP0467914A1 Method for producing a heatable and refrigerable element for a system handling small quantities of liquid, and an element manufactured by the method. |
| 01/28/1992 | US5084825 Process control with guard band and fault limit |
| 01/28/1992 | US5084417 Method for selective deposition of refractory metals on silicon substrates and device formed thereby |
| 01/28/1992 | US5084130 Method for depositing material on depressions |
| 01/28/1992 | US5084126 Over the surface of a semiconductor wafer |
| 01/28/1992 | US5084125 Continuous processing, cleaning, removing deposits |
| 01/23/1992 | WO1992001314A1 N-type semiconducting diamond, and method of making the same |
| 01/23/1992 | WO1992001084A1 Chemical vapor deposition (cvd) process for plasma depositing silicon carbide films onto a substrate |
| 01/23/1992 | WO1992001083A1 Chemical vapor deposition (cvd) process for thermally depositing silicone carbide films onto a substrate |
| 01/23/1992 | WO1992000800A1 Radiation-resistant polycrystalline diamond optical and thermally conductive articles and their method of manufacture |
| 01/22/1992 | EP0467634A2 Tool insert |
| 01/22/1992 | EP0467624A1 Apparatus for and method of backside protection during substrate processing |
| 01/22/1992 | EP0467623A2 Apparatus for and method of protection during substrate processing |