Patents
Sitemap › C23 - Coating metallic material; Coating material with metallic material; Chemical surface treatment; Diffusion treatment of metallic material; Coating by vacuum evaporation, by sputtering, by ion implantation or by chemical vapour deposition, in general; Inhibiting corrosion of metallic material or incrustation in general › C23C - Coating metallic material; Coating material with metallic material; Surface treatment of metallic material by diffusion into the surface, by chemical conversion or substitution; Coating by vacuum evaporation, by sputtering, by ion implantation or by chemical vapour deposition, in general › C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes
Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892)
12/1991
12/11/1991EP0460254A1 Process for the preparation of thin oxide films by decomposition by plasma of metalorganic compounds
12/11/1991EP0460106A1 Novel glass deposition viscoelastic flow process
12/10/1991US5071788 Forming refractory metal silicide
12/10/1991US5071708 Composite diamond grain
12/10/1991US5071696 Multilayer coating of aluminum oxide and titanium carbide
12/10/1991US5071679 Process for producing composite materials with reinforcement in silicium carbide fibers and ceramic matrix
12/10/1991US5071678 Delaying contact of activator with aluminum source until article is heated to coating temperature
12/10/1991US5071677 Heating then cooling a gas mixture and flowing gas over the su bstrate to form a pure film
12/10/1991US5071670 Continous processing; variable pressurization; low growth temperatures for diamond coatings
12/10/1991US5071596 Fabrication of lightweight ceramic mirrors by means of a chemical vapor deposition process
12/10/1991US5070815 MOCVD device for growing a semiconductor layer by the metal-organic chemical vapor deposition process
12/04/1991EP0459807A1 Industrial diamond coating and method of manufacturing the same
12/04/1991EP0459773A2 Semiconductor device and method for producing the same
12/04/1991EP0459425A1 Process for the preparation of diamond
12/04/1991EP0275267B1 Process for photochemical vapor deposition of oxide layers at enhanced deposition rates
12/04/1991CN1015009B Method for forming deposited film
12/04/1991CN1015008B Method for forming deposited film
12/04/1991CN1015007B Method for forming deposited film
12/04/1991CN1015006B Low radiation film produced at high temp.
12/03/1991US5070274 Method for making diamond and apparatus therefor
12/03/1991US5069930 Method for the evaporation of monomers that are liquid at room temperature
12/03/1991US5069928 Microwave chemical vapor deposition apparatus and feedback control method
12/03/1991US5069244 Liquid source container device
12/03/1991US5069157 Thin film forming apparatus
12/03/1991CA1292663C Process for the production of semiconductor materials
12/03/1991CA1292662C Process for forming deposited film
12/03/1991CA1292646C Process for the production of multi-metallic amorphous alloy coatings
12/01/1991CA2043447A1 Process for the preparation of diamond
11/1991
11/28/1991WO1991018129A1 Photon assisted cvd apparatus and method
11/28/1991WO1991018124A1 A process and an apparatus for the surface treatment of powder particles
11/28/1991WO1991017839A1 Materials for chemical vapor deposition processes
11/28/1991DE4016765A1 Chemical vapour coating method - where process plasma is conc. in an area and passed through a small diaphragm opening into a substrate chamber
11/28/1991DE4015666A1 Protecting expansion strips used to monitor force in recording arm - by coating with layer which stops condensed air from corroding the strips
11/27/1991EP0458342A1 Method for preparation of diamond film-coated body
11/27/1991EP0458085A1 Plasma CVD apparatus
11/27/1991CN1014909B Cleaning technique for steel product before film-plating
11/26/1991US5068871 Process for synthesizing diamond and apparatus therefor
11/26/1991US5068148 Diamond-coated tool member, substrate thereof and method for producing same
11/26/1991US5068146 Polymerized films, medium related members, and process for making
11/26/1991US5068126 Process for producing graphite electrodes
11/26/1991US5068124 Method for depositing high quality silicon dioxide by pecvd
11/26/1991CA2043277A1 Method for preparation of diamond film-coated body
11/25/1991WO1991018128A1 Halogen-assisted chemical vapor deposition of diamond
11/25/1991CA2081778A1 Halogen-assisted chemical vapor deposition of diamond
11/21/1991EP0457444A1 Boat of boron nitride and its production
11/21/1991EP0457415A1 Semiconductor device manufacturing method
11/21/1991EP0457076A2 Method for producing synthetic diamond thin film, the thin film and device using it
11/21/1991EP0456679A1 Forming a metal coating
11/20/1991CN1014805B Body with superhard coating
11/19/1991US5066533 Boron nitride membrane in wafer structure and process of forming the same
11/19/1991US5065698 Film forming apparatus capable of preventing adhesion of film deposits
11/19/1991US5065696 Temperature controlled distributor beam for chemical vapor deposition
11/16/1991CA2016970A1 Inverted diffusion stagnation point flow reactor for vapor deposition of thin films
11/14/1991WO1991017566A1 Tungsten disilicide cvd
11/14/1991WO1991017562A1 Plasma reaction chamber having conductive diamond-coated surfaces
11/14/1991WO1991017284A1 Apparatus for low temperature cvd of metals
11/14/1991DE4034211C1 Coating interior of pipe-glass tube - comprises coupling HF energy to tube using resonator to deliver pulsed microwave discharges
11/13/1991EP0456372A1 Perimeter wafer seal with gas exclusion
11/12/1991US5064989 Surface shaping and finishing apparatus and method
11/12/1991US5064728 Article with internal wear resistant surfaces
11/12/1991US5064686 Sub-valent molybdenum, tungsten, and chromium amides as sources for thermal chemical vapor deposition of metal-containing films
11/10/1991WO1991017285A1 Microwave plasma assisted gas jet deposition of thin film materials
11/06/1991EP0455551A1 Multilayer coating for a polycarbonate substrate and process for manufacturing such a coating
11/06/1991EP0455401A2 Encapsulated electroluminescent phosphor and method for making same
11/06/1991EP0454995A1 Coating process
11/06/1991EP0454925A1 Method of bonding an interconnection layer on an electrode
11/06/1991EP0454843A1 Method and apparatus for the rapid deposition by chemical vapor deposition with low vapor pressure reactants
11/06/1991CN1014650B Light receiver with transition layer and manufactural method thereof
11/05/1991US5063330 Plasma reactor
11/05/1991US5063086 Vacuum deposition process and apparatus for producing films having high uniformity
11/05/1991US5063031 Apparatus for growing vapor phase layer on semiconductor substrate
11/05/1991US5062771 Vacuum system with a secondary gas also connected to the roughing pump for a semiconductor processing chamber
11/05/1991US5062687 Vitreous, glass fibers, propadiene pyrolysis
11/05/1991US5062508 Cvd coating process for producing coatings and apparatus for carrying out the process
11/05/1991US5062386 Induction heated pancake epitaxial reactor
11/03/1991CA2041535A1 Multilayer coating for polycarbonate substrate and process for making such a coating
10/1991
10/31/1991WO1991016723A1 Gaseous radical producing apparatus
10/30/1991EP0453780A2 Apparatus for contamination control in processing apparatus containing voltage driven electrode
10/30/1991EP0453679A1 Self cleaning flow control orifice
10/30/1991EP0263141B1 Method for depositing materials containing tellurium
10/29/1991US5061514 Chemical vapor deposition (CVD) process for plasma depositing silicon carbide films onto a substrate
10/29/1991US5061513 Process for depositing hard coating in a nozzle orifice
10/29/1991US5061511 Method for forming functional deposited films by means of microwave plasma chemical vapor deposition method
10/29/1991US5061359 Plasma processing apparatus including three bus structures
10/29/1991US5061292 Idiomorphic crystal grit having irregularly shaped core and growth layer
10/29/1991US5060595 Via filling by selective laser chemical vapor deposition
10/29/1991US5060354 Heated plate rapid thermal processor
10/28/1991CA2035233A1 Method of bonding an interconnection layer on an electrode of an electrochemical cell
10/27/1991CA2015595A1 Process for applying a composite insulative coating to a substrate and coated article produced thereby
10/23/1991EP0453187A2 Distributed source assembly
10/23/1991EP0453107A1 Chemical deposition methods using supercritical fluid solutions
10/23/1991EP0452921A2 Formation of titanium nitride on semiconductor wafer by reaction of titanium with nitrogen-bearing gas in an integrated processing system
10/23/1991EP0452745A1 Process for reactive surface treatment
10/23/1991EP0452493A1 Feeder for process gas
10/23/1991CN1055565A Depositing device by chemical and gas phase process with dual direct current plasma
10/22/1991US5059292 Single-chamber apparatus for in-situ generation of dangerous polyatomic gases and radicals from a source material contained within a porous foamed structure
10/22/1991US5059231 Internal coating of a glass tube by plasma pulse-induced chemical vapor deposition
10/22/1991US5058616 Method of supplying ultrahigh purity gas
10/22/1991US5058527 Thin film forming apparatus
10/22/1991US5058526 Vertical load-lock reduced-pressure type chemical vapor deposition apparatus
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