Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892)
04/1992
04/28/1992US5108778 Semiconductors
04/28/1992US5108512 Cleaning of CVD reactor used in the production of polycrystalline silicon by impacting with carbon dioxide pellets
04/28/1992CA1299773C Plasma processing method and apparatus
04/25/1992WO1992007971A1 Cvd of metal films from beta-diketonate complexes
04/25/1992CA2090038A1 Ligand stabilized +1 metal beta-diketonate coordination complexes and their use in chemical vapor deposition of metal films
04/22/1992EP0481722A1 Process and apparatus for production of a coating film
04/22/1992EP0481706A1 Method of producing CVD silicon oxynitride film
04/22/1992EP0481570A2 Optical fiber and apparatus for producing same
04/22/1992EP0481140A1 Method for preparing laminates of ZnSe and ZnS
04/22/1992EP0173715B1 Method and apparatus for the gas jet deposition of conducting and dielectric thin solid films and products produced thereby
04/22/1992CN1016388B Method and device for forming superconducting oxide material
04/22/1992CN1016364B Chemical gaseous deposition process of thin diamond film by means of arc discharge
04/21/1992US5107119 Method of evaluating characteristics of superconductors and process and apparatus for forming superconductor film by using the method
04/21/1992US5106687 Composite material with chemically vapor deposited layer of silicon carbide formed thereon
04/21/1992US5106674 Blade member of tungsten-carbide-based cemented carbide for cutting tools and process for producing same
04/21/1992US5106453 MOCVD method and apparatus
04/21/1992US5106452 Method of depositing diamond and diamond light emitting device
04/21/1992US5106392 Multigrain abrasive particles
04/21/1992US5105762 Support and seal structure for CCVD reactor
04/21/1992US5105761 Diffusion plasma-assisted chemical treatment apparatus
04/19/1992WO1992006843A1 Abrasion wear resistant polymeric substrate product
04/19/1992CA2090110A1 Abrasion wear resistant polymeric substrate product
04/17/1992CA2053419A1 Method of producing cvd silicon oxynitride film
04/16/1992WO1992006488A1 Vapor supplier and its control method
04/16/1992WO1992006224A1 Component-coating process and device
04/16/1992WO1992005951A1 Abrasion wear resistant coated substrate product
04/16/1992WO1992005904A1 Hard material clad with diamond, throwaway chip, and method of making said material and chip
04/16/1992DE4129227C1 Laser induced chemical vapour deposition of solids - by using gas mixt. contg. reactive components and sensitisers with high absorption for radiation
04/15/1992EP0480895A2 Improved diamond tools for rock drilling, metal cutting and wear part applications
04/15/1992EP0480878A2 Cubic boron nitride (CBN) abrasive tool
04/15/1992EP0480867A2 Process for applying gas phase diffusion aluminide coatings
04/15/1992EP0480735A1 Differential pressure CVD chuck
04/15/1992EP0480581A1 Recirculating high velocity convective flow reactor system
04/15/1992EP0480394A2 Cutting tool of polycrystalline diamond and method of manufacturing the same
04/15/1992EP0480181A2 Method and apparatus for batch processing of a semiconductor wafer
04/15/1992CN1060316A Method and apparatus for vapor deposition of diamond
04/14/1992US5104694 Selective chemical vapor deposition of a metallic film on the silicon surface
04/14/1992US5104690 CVD thin film compounds
04/14/1992US5104684 Scanning focused beam on substrate in presence of platinum-containing precursor
04/14/1992US5104634 Expansion of glow discharge activated low-temperature gas, then rapid mixing with reactant gas, deposition on substrate
04/14/1992US5104482 Simultaneous glass deposition and viscoelastic flow process
04/12/1992CA2053149A1 Diamond tools for rock drilling, metal cutting and wear part applications
04/09/1992DE4031770A1 Dust prevention appts. for CVD chamber - has process gas feed and suction openings near plasma forming electrode
04/08/1992EP0479375A1 Method of providing a substrate with a surface layer from a vapour and device for implementing such a method
04/08/1992EP0478984A1 Plasma enhanced chemical vapor processing system using hollow cathode effect
04/08/1992EP0478909A1 Process and apparatus for obtaining a diamondlayer
04/08/1992EP0478908A1 Process and apparatus for reactively treating objects by means of a glow discharge
04/08/1992EP0478777A1 Coated dielectric material for an ozone generator.
04/07/1992US5103102 Localized vacuum apparatus and method
04/07/1992US5102721 Textured tin oxide
04/07/1992US5102694 Reduction of gaseous flow rate of reactants periodically at zero, resetting it to normal flow rate, thus, continuing cycling for entire growth period of deposition
04/07/1992US5102691 Heating the substrate with a gas mixture containing water, a compound from the group consisting of fluorinated carboxylic acids and anhydrides, a gas
04/07/1992US5102689 Reactive gas is excited while passing through porous heated body
04/07/1992US5102687 Process for surface treatment by plasma of a substrate supported by an electrode
04/07/1992US5102496 Exciting plasma with electrical power to generate an electric field in a plasma sheath just above the wafer to repel charged particles away from wafers
04/02/1992WO1992005867A1 Device for generating microwave plasma and method of making diamond film utilizing said device
04/02/1992EP0502128A4 Anionically polymerizable monomers, polymers thereof, and use of such polymers in photoresists.
04/02/1992DE4030900A1 Verfahren und einrichtung zum beschichten von teilen Method and device for coating of share
04/02/1992DE4030675A1 Vapour coating of substrates in a reactor - in which substrate protrudes through reactor wall into reaction zone and is moved w.r.t. the reaction zone
04/02/1992CA2069942A1 Microwave plasma generating apparatus and process for preparing diamond layer by utilizing same
04/01/1992EP0478308A2 Method of forming interlayer-insulating film
04/01/1992EP0478233A2 Process for fabricating integrated circuits
04/01/1992EP0478174A2 Silicon dioxide deposition method and apparatus
04/01/1992EP0478010A2 Process for producing a continuous web of an electrically insulated metallic substrate
04/01/1992EP0477906A2 Plasma processing apparatus using plasma produced by microwaves
04/01/1992EP0477890A2 Processing method and apparatus
04/01/1992EP0463079A4 Zinc oxyfluoride transparent conductor
04/01/1992EP0324811B1 Gas inlet for a plurality of various reaction gases in reaction vessels
04/01/1992EP0137043B1 Method of manufacturing hydrogenated amorphous silicon thin film and solar cell
04/01/1992CN1059858A Binder enriched cvd and pvd coated cutting tool
03/1992
03/31/1992US5100868 Process for preparing superconducting films by radio-frequency-generated aerosol plasma deposition
03/31/1992US5100703 Diamond-coated sintered body excellent in adhesion and process for preparing the same
03/31/1992US5100599 Method for producing thin film particulates of controlled shape
03/31/1992US5099790 Microwave plasma chemical vapor deposition apparatus
03/31/1992US5099788 Method and apparatus for forming a diamond film
03/31/1992CA1298175C Electrophotographic photosensitive member, process and apparatus for the preparation thereof
03/26/1992CA2051989A1 Method of forming interlayer-insulating film
03/25/1992WO1992005110A1 Flame or plasma synthesis of diamond under turbulent and transition flow conditions
03/25/1992EP0476827A1 X-ray window and method of producing same
03/25/1992EP0476825A1 A process for the synthesis of hard boron nitride
03/25/1992EP0476676A2 Thin film deposition method
03/25/1992EP0476480A1 Vacuum film forming apparatus
03/25/1992EP0476307A1 Apparatus and method for substrate heating in semiconductor processes
03/25/1992CN1059763A Method and apparatus for treating surface
03/25/1992CA2093144A1 Flame or plasma synthesis of diamond under turbulent and transition flow conditions
03/24/1992US5099044 Aluminum, gallium or indium compounds with fluorine containing compounds
03/24/1992US5098812 Light sensitive element of a photoconductor film on a drum forming a carbon layer
03/24/1992US5098741 Method and system for delivering liquid reagents to processing vessels
03/24/1992US5098736 Oxygen gas as an ion source and a charge transport layer of aluminum oxide with a charge generating layer of of silicon
03/24/1992US5098516 Vapor phase organometallic copper compound
03/24/1992US5098483 Methods of treating spherical surfaces
03/24/1992CA1297831C Apparatus and method for photochemical vapor deposition
03/18/1992WO1992005296A1 Cvd and pvd coated cutting tools
03/18/1992WO1992005009A1 Binder enriched cvd and pvd coated cutting tool
03/18/1992EP0474740A1 Reaction chamber with controlled radiant energy heating and distributed reactant flow
03/18/1992EP0265504B1 Production of semiconductor devices
03/18/1992EP0256035B1 Process for forming an environmentally stable optical coating and structures formed thereby
03/18/1992EP0223787B1 Selective chemical vapor deposition method and apparatus
03/17/1992US5096856 Low pressure vapor deposition in furnace ussing silane
03/17/1992US5096849 Process for positioning a mask within a concave semiconductor structure