| Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892) |
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| 06/16/1992 | US5121705 Loading lock for chemical vapor deposition apparatus |
| 06/16/1992 | US5121531 Refractory susceptors for epitaxial deposition apparatus |
| 06/11/1992 | WO1992009722A1 Method of producing a coated hard-metal cutter |
| 06/11/1992 | WO1992009719A1 Method for the deposition of group 15 and/or group 16 elements |
| 06/11/1992 | WO1992009717A1 Defect-induced control of the structure of boron nitride |
| 06/10/1992 | EP0489659A1 Process for treatment of metals by deposition of material and furnace for carrying out the process |
| 06/10/1992 | EP0489541A2 Integrated circuit fabrication utilizing amorphous layers |
| 06/10/1992 | EP0489483A1 Process for coating a substrate with tin oxide and uses for coated substrates |
| 06/10/1992 | EP0489439A1 Vacuum deposition apparatus for CVD processing |
| 06/10/1992 | EP0489407A2 Plasma reactor using UHF/VHF resonant antenna source, and processes |
| 06/10/1992 | EP0489337A1 Method for selective tungsten growth on silicon |
| 06/10/1992 | CN2106578U Corrosion-resisting nitrided pot |
| 06/10/1992 | CN1016972B Method of eliminating undesirable carbon product deposited on inside of reaction chamber for cvd |
| 06/09/1992 | US5120703 Process for preparing oxide superconducting films by radio-frequency generated aerosol-plasma deposition in atmosphere |
| 06/09/1992 | US5120680 Method for depositing dielectric layers |
| 06/09/1992 | US5120676 Use of phosphine and arsine compounds in chemical vapor deposition and chemical doping |
| 06/09/1992 | US5120625 Multilayer of passivation film has different concentration of halogen atoms; protective coatings, nonabrasive |
| 06/09/1992 | US5120568 Generating high temperature gas, depressurizing, pumping fluid reactants and impinging to form plasma polymerization |
| 06/09/1992 | US5119761 Substrate heating apparatus for forming thin films on substrate surface |
| 06/09/1992 | US5119760 Methods and apparatus for material deposition |
| 06/09/1992 | CA1302803C Method and apparatus for vapor deposition |
| 06/07/1992 | CA2056910A1 Process for treatment of metals by material deposition and furnace using said process |
| 06/03/1992 | EP0488112A1 Method of forming thin film of amorphous silicon by plasma CVD |
| 06/03/1992 | EP0487897A1 CVD diamond by alternating chemical reactions |
| 06/03/1992 | EP0313580B1 Radiation curable temporary solder mask |
| 06/02/1992 | US5118529 Vaporization titanium isopropoxide in fluidized bed |
| 06/02/1992 | US5118486 Separation by atomization of by-product stream into particulate silicon and silanes |
| 06/02/1992 | US5118485 Disproportionation with excess tetrachlorosilane to give trichlorosilane |
| 06/02/1992 | US5118286 Closed loop method and apparatus for preventing exhausted reactant gas from mixing with ambient air and enhancing repeatability of reaction gas results on wafers |
| 06/02/1992 | US5117769 Drive shaft apparatus for a susceptor |
| 05/29/1992 | CA2056182A1 Composite material with a refractory fibrous reinforcement and its production process |
| 05/27/1992 | EP0487292A1 Polycrystalline diamond tool and method for producing same |
| 05/27/1992 | EP0487213A1 A method of manufacturing free standing perovskite lead scandium tantalate film |
| 05/27/1992 | EP0487008A2 Blade member of tungsten carbide based cemented carbide with hard coating |
| 05/27/1992 | EP0486927A1 Deposition of tungsten films from mixtures of tungsten hexafluoride, organohydrosilanes and hydrogen |
| 05/27/1992 | DE4037480A1 Verfahren zur herstellung eines beschichteten hartmetallschneidkoerpers A process for preparing a coated hartmetallschneidkoerpers |
| 05/27/1992 | CN1061445A Process for forming metal deposited film containing aluminium as main component by use of alkly aluminium hydride |
| 05/27/1992 | CN1061444A Apparatus for forming thin film |
| 05/27/1992 | CA2049673A1 Cvd diamond by alternating chemical reactions |
| 05/26/1992 | US5116811 Cvd method for the formation of bi-containing superconducting thin films |
| 05/26/1992 | US5116785 Decomposing fluorinated organometallic complex of beryllium, calcium, strontium, barium or lanthanide in vicinity of semiconductor substrate |
| 05/26/1992 | US5116665 Multilayer protective coating for a substrate, process for protecting a substrate by a plasma deposition of such a coating, coatings obtained and applications thereof |
| 05/26/1992 | US5116640 Separate vapor deposition of insulating ang luminescent layers in chamber |
| 05/26/1992 | US5116181 Robotically loaded epitaxial deposition apparatus |
| 05/26/1992 | CA1301958C Method and apparatus for venting vacuum processing equipment |
| 05/21/1992 | CA2055422A1 Deposition of tungsten films from mixtures of tungsten hexafluoride, organohydrosilanes and hydrogen |
| 05/20/1992 | EP0486347A1 Process for protecting carbon containing composite material from oxidation and material protected thereby |
| 05/20/1992 | EP0486056A1 Method for producing a synthetic diamond structure |
| 05/20/1992 | EP0485907A1 Ultrahigh-purity ferroelectric thin film |
| 05/20/1992 | EP0485454A1 Process for making cages for the vapour-deposition of thin films |
| 05/20/1992 | EP0419461A4 Wafer handling system with bernoulli pick-up |
| 05/19/1992 | US5114770 Method for continuously forming functional deposited films with a large area by a microwave plasma cvd method |
| 05/19/1992 | US5114745 Method of producing a thin carbide layer on a carbon substrate, growing a diamond or diamond-like film on the carbide layer, and removing the carbon substrate |
| 05/19/1992 | US5114696 Diamond growth method |
| 05/19/1992 | US5113790 Apparatus for the plasma treatment of substrates |
| 05/19/1992 | US5113789 Self cleaning flow control orifice |
| 05/14/1992 | WO1992008068A1 Rotary/linear actuator for closed chamber, and reaction chamber utilizing same |
| 05/14/1992 | WO1992007664A1 Method of treating and depositing diamonds |
| 05/13/1992 | EP0485301A1 Deposition apparatus for growing a material with reduced hazard |
| 05/13/1992 | EP0485130A2 Method for forming a metal contact |
| 05/13/1992 | EP0484699A1 Friction pairing and its method of manufacture |
| 05/13/1992 | EP0484449A1 Process and apparatus for coating small solids |
| 05/13/1992 | EP0371065B1 Surface deposition or surface treatment reactor |
| 05/13/1992 | EP0362207B1 Process and installation for the chemical deposition of ultrahard coatings at moderate temperature |
| 05/13/1992 | EP0216932B1 Rhombohedral polycrystalline boron nitride and process for its production |
| 05/13/1992 | EP0168409B1 Material vapor deposition technique |
| 05/13/1992 | CN1016604B Glass coating method and resulting article |
| 05/12/1992 | US5112650 Reaction of metal halide and sulfide, disulfide or mercaptan, atmospheric pressure, simplified equipment |
| 05/12/1992 | US5112649 Method of depositing micro-crystalline solid particles by hot filament cvd |
| 05/12/1992 | US5112647 Apparatus for the preparation of a functional deposited film by means of photochemical vapor deposition process |
| 05/12/1992 | US5112645 Vapor deposition on semiconductor substrate by photochemical reaction of gas |
| 05/12/1992 | US5112641 Wafer transfer method in vertical cvd diffusion apparatus |
| 05/12/1992 | US5112458 Plasma excitation of hydrocarbon feed gas, ionization |
| 05/12/1992 | US5112439 Masking, reducing and disproportionation to form coatings for integrated circuits |
| 05/12/1992 | US5112432 Organometallic compounds |
| 05/12/1992 | US5112185 Method for replacing a deposit shield in an evacuated film forming chamber |
| 05/12/1992 | US5112025 Molds having wear resistant release coatings |
| 05/12/1992 | CA1300440C Method of surface treatment and apparatus used therefor |
| 05/12/1992 | CA1300439C Apparatus for and process of coating glass |
| 05/12/1992 | CA1300438C Process and apparatus for coating glass |
| 05/06/1992 | EP0483880A2 Method for forming thin film and apparatus therefor |
| 05/06/1992 | EP0483839A1 Method for plasmachemical cleaning for a subsequent PVD or PECVD coating |
| 05/06/1992 | EP0483782A2 Metallising process |
| 05/06/1992 | EP0483477A1 Flexible optical device for the transmission of light and use of the device |
| 05/06/1992 | CN1016519B Process for formation of functional deposited film containing groups iii and v atoms as main constituent atoms by microwave plasma chemical vapor deposition process |
| 05/05/1992 | US5110619 Electrochemical vapor deposition of ionically conductive films |
| 05/05/1992 | US5110579 Vapor deposition from mixture of methane and hydrogen |
| 05/05/1992 | US5110577 Harder than diamond |
| 05/05/1992 | US5109562 Chemical vapor deposition system cleaner |
| 05/03/1992 | CA2054437A1 Process of plasma-chemical cleaning prior to pvd or pecvd coating |
| 04/30/1992 | CA2050456A1 Fabrication of polycrystalline free-standing diamond films |
| 04/29/1992 | EP0483009A1 Process for the preparation of a composite refractory material protected against corrosion |
| 04/29/1992 | EP0482877A1 Heated fluid supply line |
| 04/29/1992 | EP0482265A1 Method of forming a thin copper film by low temperature CVD |
| 04/29/1992 | CN1016449B Process for formation of functional deposited film containing groups ii and vi atoms as main constituent atoms by microwave plasma chemicul vapor deposition process |
| 04/28/1992 | US5108983 Vaporizing and reacting reagents with oxygen to form superconducting oxide coats |
| 04/28/1992 | US5108952 Method of depositing a tungsten film |
| 04/28/1992 | US5108951 Depositing aluminum while integrated circuit is being heated |
| 04/28/1992 | US5108813 Sliding member |
| 04/28/1992 | US5108792 Used for chemical vapor deposition thermal annealing require high temperature treatment |