| Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892) |
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| 08/04/1992 | US5135801 Diffusion barrier coating material |
| 08/04/1992 | US5135775 Process for plasma-chemical cleaning prior to pvd or pecvd coating |
| 08/04/1992 | US5135730 Contacting resulting flame face-to-face with substrate, cooling controlled |
| 08/04/1992 | US5135695 Positioning, focusing and monitoring of gas phase selective beam deposition |
| 08/04/1992 | US5135629 Containing electrolytic copper foil having fine grains of copper and/or copper oxide on projections of matte surface to prevent contamination and particle formation |
| 08/04/1992 | US5135607 Process for forming deposited film |
| 08/04/1992 | US5135391 Semiconductor processing gas diffuser plate |
| 08/04/1992 | US5134965 Processing apparatus and method for plasma processing |
| 08/04/1992 | US5134963 LPCVD reactor for high efficiency, high uniformity deposition |
| 07/29/1992 | EP0496681A1 Device for the distribution of microwave energy for excitation of a plasma |
| 07/29/1992 | EP0496655A1 A method of forming high purity metal silicides targets for sputtering |
| 07/29/1992 | EP0496543A2 Method of forming silicon oxide film containing fluorine |
| 07/29/1992 | EP0496516A1 Production of honeycomb structure-extruding dies |
| 07/29/1992 | EP0496137A1 Protective coating for non-oxide sintered fibers generated by in situ chemical reaction |
| 07/29/1992 | EP0359777B1 Process for etching with gaseous plasma |
| 07/29/1992 | CN1063128A Method of treating metals by deposition of materials and furnace for implementing said method |
| 07/28/1992 | US5133994 Process for forming a folding or separation line in the manufacture of a composite material component |
| 07/28/1992 | US5133986 Plasma enhanced chemical vapor processing system using hollow cathode effect |
| 07/28/1992 | US5133561 Sealing device |
| 07/28/1992 | US5133284 Gas-based backside protection during substrate processing |
| 07/28/1992 | CA1305610C Diamond tools for rock drilling and machining |
| 07/22/1992 | EP0495755A1 Aluminium surfaces |
| 07/22/1992 | EP0495392A1 Method of rendering harmless the waste gas from chemical vapor deposition process |
| 07/22/1992 | EP0495095A1 Process for forming crack-free pyrolytic boron nitride on a carbon structure and article. |
| 07/21/1992 | US5132105 Materials with diamond-like properties and method and means for manufacturing them |
| 07/21/1992 | US5131941 High Temperature, Radiation |
| 07/21/1992 | US5131842 Corrosion resistant thermal treating apparatus |
| 07/16/1992 | DE4100548A1 Deposition of diamond or carbide films onto refractory metal substrates by CVD - comprising two diamond or carbide deposition steps, with an intermediate metal deposition step to give complete coverage |
| 07/15/1992 | EP0494753A2 Chemical vapor deposition-produced silicon and silicon carbide having improved optical properties |
| 07/15/1992 | EP0494699A2 High purity doping alloys |
| 07/15/1992 | EP0494415A2 Method for chemical marking of solid state surfaces at atomic level and use of such a method to store information units in an atomic range |
| 07/15/1992 | CN1017456B Kind of moisturizing method for vaccumatic aluminizing paper and its equipment |
| 07/14/1992 | US5130459 Selective chemical vapor deposition of aluminum, aluminum CVD materials and process for preparing the same |
| 07/14/1992 | US5130172 Low temperature organometallic deposition of metals |
| 07/14/1992 | US5130170 Chemical vapor deposition of films |
| 07/14/1992 | US5130111 Vapor deposition and crystallization followed by molding and cooling |
| 07/14/1992 | US5129958 Cleaning method for semiconductor wafer processing apparatus |
| 07/14/1992 | US5129918 Cubic boron nitride (cbn) abrasive tool |
| 07/14/1992 | US5129360 Actively cooled effusion cell for chemical vapor deposition |
| 07/14/1992 | US5129359 Microwave plasma CVD apparatus for the formation of functional deposited film with discharge space provided with gas feed device capable of applying bias voltage between the gas feed device and substrate |
| 07/09/1992 | WO1992011312A1 Method of depositing a silicon oxide film bonded to a polymer substrate |
| 07/08/1992 | EP0493754A1 Process for the chemical vapor deposition of copper |
| 07/08/1992 | EP0493609A1 Method and device for manufacturing diamond |
| 07/08/1992 | CA2058809A1 Chemical vapor deposition silicon and silicon carbide having improved optical properties |
| 07/07/1992 | US5128515 Heating apparatus |
| 07/07/1992 | US5127988 Direct current and radio frequency voltage |
| 07/07/1992 | US5127987 Patterning, dry etching, conveying in vacuum; semiconductor wafers; corrosion resistance |
| 07/07/1992 | CA1304572C System for coating particles employing a pneumatic transport reactor |
| 07/05/1992 | WO1992014689A1 Diamond-clad hard material, throwaway tip, and method of making said material and tip |
| 07/02/1992 | DE4142877A1 CVD assembly - has structured separate delivery of reaction gas and inert gas to zones of wafer substrate on hot table in chamber |
| 07/01/1992 | EP0493148A1 Composite material with refractory fibrous reinforcement and its process of production |
| 07/01/1992 | EP0493002A1 Process for forming deposition film |
| 07/01/1992 | EP0492880A2 Method of preparing metal oxide films |
| 07/01/1992 | EP0492844A2 Method and apparatus for forming a light beam |
| 07/01/1992 | EP0492763A1 Sputtered scandate coatings for dispenser cathodes and methods for making same |
| 07/01/1992 | EP0492632A1 Process chamber purge module for semiconductor processing equipment |
| 07/01/1992 | EP0492511A2 Plasma chamber reactor |
| 07/01/1992 | EP0492160A1 Symmetric CVD diamond articles and method of their preparation |
| 07/01/1992 | EP0492159A1 Metal growth accelerator shell for the chemical vaporization deposition of diamond |
| 07/01/1992 | CN1062381A Method and apparatus for preparing continuous carbofrax fibre |
| 07/01/1992 | CN1017264B Method and device for the preparation of protective layer by plasma deposition |
| 06/30/1992 | US5126574 Microtip-controlled nanostructure fabrication and multi-tipped field-emission tool for parallel-process nanostructure fabrication |
| 06/30/1992 | US5126207 Good bonding properties; abrasive tool for sawing, drilling grinding, cutting, abrading and dressing |
| 06/30/1992 | US5126206 Excellent electrical and thermal properties, high electrical resistance |
| 06/30/1992 | US5126169 Introducing less reactive precursor upstream of more reactive precursor; reproducible, uniform quality |
| 06/30/1992 | US5126168 Displacement with ammonia of Lewis base from its complex with borane; pyrolysis |
| 06/30/1992 | US5126164 Plasma polymerization of monomer gas in helium |
| 06/30/1992 | US5125360 Vacuum processing apparatus |
| 06/30/1992 | US5125359 Surface deposition or surface treatment reactor |
| 06/30/1992 | US5125358 Microwave plasma film deposition system |
| 06/25/1992 | WO1992010308A1 Minimization of particle generation in cvd reactors and methods |
| 06/25/1992 | CA2056473A1 Metal growth accelerator shell for the chemical vaporization deposition of diamond |
| 06/25/1992 | CA2048740A1 Method of preparing metal oxide films |
| 06/24/1992 | EP0491521A2 Process for producing diamond film |
| 06/24/1992 | EP0491503A2 Method for depositing metal |
| 06/24/1992 | EP0491393A2 Vertically oriented CVD apparatus including gas inlet tube having gas injection holes |
| 06/23/1992 | US5124278 Reactive deposition for semiconductors using metal organic amines as metallic donors |
| 06/23/1992 | US5124180 Method for the formation of fluorine doped metal oxide films |
| 06/23/1992 | US5124179 Interrupted method for producing multilayered polycrystalline diamond films |
| 06/23/1992 | US5124014 Method of forming oxide layers by bias ECR plasma deposition |
| 06/23/1992 | US5123995 Producing thin film on substrate using low temperature and high vacuum |
| 06/23/1992 | US5123972 Hardened insert and brake shoe for backstopping clutch |
| 06/23/1992 | US5123934 Ceramic coating of titanium carbide, titanium nitride, or aluminum oxide |
| 06/23/1992 | US5123375 Structure for filtering CVD chamber process gases |
| 06/23/1992 | CA1303918C Coated flat glass |
| 06/23/1992 | CA1303915C Silicon-containing coatings and a method for their preparation |
| 06/21/1992 | CA2056239A1 Symmetric cvd diamond articles and method of their preparation |
| 06/17/1992 | EP0490883A1 CVD apparatus |
| 06/17/1992 | EP0490833A1 Wiper arm for vehicle windscreen wipers |
| 06/17/1992 | EP0490028A1 Coatingsystem on the surface of a material and process for its fabrication |
| 06/17/1992 | EP0489914A1 Method of forming titanium nitride coating and pan made by this method |
| 06/17/1992 | EP0489862A1 Chemical vapor deposition system cleaner. |
| 06/17/1992 | DE4039930A1 Plasma treating appts. - has adjustable distance between edge of hollow electrode and substrate holding electrode to maintain constant radio frequency power |
| 06/17/1992 | DE4039828A1 Device for holding a semiconductor substrate base - is formed as three or multi point arrangement from a multi jaw chuck with adjustable clamping jaws etc. |
| 06/17/1992 | CN1017068B Metal-surface strengthening technique by ceramic film |
| 06/16/1992 | US5122636 Movable device for heating substrates |
| 06/16/1992 | US5122431 Thin film formation apparatus |
| 06/16/1992 | US5122394 Apparatus for coating a substrate |
| 06/16/1992 | US5122391 Method for producing highly conductive and transparent films of tin and fluorine doped indium oxide by APCVD |
| 06/16/1992 | US5122251 High density plasma deposition and etching apparatus |