| Patents for C23C 14 - Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material (67,378) |
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| 03/24/1999 | EP0902969A1 Radial multiple chamber microelectronics processing apparatus and process of making and using the apparatus |
| 03/24/1999 | EP0902843A1 Method for making a thin film of solid material, and uses thereof |
| 03/24/1999 | EP0902728A1 Catalyst compositions of nanoparticulate metal on a refractory support |
| 03/24/1999 | EP0786017B1 Protective layer for protecting parts against corrosion, oxidation and excessive thermal stresses, as well as process for producing the same |
| 03/24/1999 | CN1212026A Sputtering target and its preparing method |
| 03/24/1999 | CN1211819A System and method for neturalizing ion beam using water vapor |
| 03/24/1999 | CN1211637A Article having coating thereon |
| 03/24/1999 | CN1211555A Y-Ba-Cu-O high-temp. superconductor double-face epitaxial film |
| 03/23/1999 | US5886864 Substrate support member for uniform heating of a substrate |
| 03/23/1999 | US5886473 Surface wave plasma processing apparatus |
| 03/23/1999 | US5885939 Sputtering a vertically oriented single crystal thin film of yttrium-barium-copper oxide onto horizontally oriented yttrium-barium-copper oxide initially vapor deposited onto single crystal substrate |
| 03/23/1999 | US5885672 Coated barrier film and packaging utilizing the same and method |
| 03/23/1999 | US5885666 Conversion of hexagonal-like BN to cubic-like BN by ion implantation |
| 03/23/1999 | US5885665 VO2 precipitates for self-protected optical surfaces |
| 03/23/1999 | US5885497 Method of making a metallized plastic article |
| 03/23/1999 | US5885425 Angled sputtering using a collimation grid having angled vanes which limit the distribution of trajectories of particles in at least one coordinate direction around a central axis oriented at an angle of less than 90 degrees to said surface |
| 03/23/1999 | US5885357 Process and device for coating a substrate surface with vaporized inorganic material |
| 03/23/1999 | US5885316 Nozzle tip for glass injection cartridge |
| 03/18/1999 | WO1999013491A1 Vacuum sputtering apparatus |
| 03/18/1999 | WO1999013488A1 Method and apparatus for controlling a workpiece in a vacuum chamber |
| 03/18/1999 | WO1999013468A1 Method for regulating a coating process |
| 03/18/1999 | WO1999013128A1 A method of depositing an electrocatalyst and electrodes formed by such method |
| 03/18/1999 | WO1999013127A1 Thin films of amorphous and crystalline microstructures based on ultrafast pulsed laser deposition |
| 03/18/1999 | WO1998059087A3 Method for bias sputtering |
| 03/18/1999 | DE19830206A1 Crystalline aluminum oxide is deposited on a substrate |
| 03/18/1999 | DE19740793A1 Method for coating surfaces by means of an installation with sputter cathodes |
| 03/18/1999 | DE19739833A1 Foil transport apparatus |
| 03/17/1999 | EP0902104A2 A metallic article having a thermal barrier coating and a method of application thereof |
| 03/17/1999 | EP0902102A1 Ta sputtering targets, method of manufacturing the same, and assemblies |
| 03/17/1999 | EP0901992A2 Method of soldering optical materials to metallic frames and framed units |
| 03/17/1999 | EP0901532A1 Vacuum coating system |
| 03/17/1999 | EP0901415A1 Droplet deposition apparatus |
| 03/17/1999 | CN1211287A Diffusion bonded sputtering target assembly with precipitation hardened backing plate and method of making same |
| 03/17/1999 | CN1210905A Coated article |
| 03/17/1999 | CN1210900A Low stress cubic boron ntride film and its preparing apparatus and preparing method |
| 03/17/1999 | CN1210899A Silicon dioxide deposition by plasma activated evaporation process |
| 03/16/1999 | US5883398 Device having a switch comprising a chromium layer and method for depositing chromium layers by sputtering |
| 03/16/1999 | US5882946 Strontium titanate, titanium oxide |
| 03/16/1999 | US5882826 The laminated film is obtained by continuously forming a sicn film on one of or each of sides of a sic film. |
| 03/16/1999 | US5882778 Hard coating of excellent wear resistance and hard coating coated member thereof |
| 03/16/1999 | US5882738 Apparatus and method to improve electromigration performance by use of amorphous barrier layer |
| 03/16/1999 | US5882493 Heat treated and sintered sputtering target |
| 03/16/1999 | US5882488 Resputtering to achieve better step coverage |
| 03/16/1999 | US5882415 Electron-beam continuous process vaporization installation for thermally high stressed substrata |
| 03/16/1999 | US5882413 Substrate processing apparatus having a substrate transport with a front end extension and an internal substrate buffer |
| 03/16/1999 | US5882412 Vertical two chamber reaction furnace |
| 03/16/1999 | US5882403 System for providing a controlled deposition on wafers |
| 03/16/1999 | US5882400 Method of producing a layer structure and the use of the method |
| 03/16/1999 | US5882399 Method of forming a barrier layer which enables a consistently highly oriented crystalline structure in a metallic interconnect |
| 03/16/1999 | US5882171 Transport and transfer apparatus |
| 03/16/1999 | US5881668 System for providing a controlled deposition on wafers |
| 03/16/1999 | CA2151063C C-axis perovskite thin films grown on silicon dioxide |
| 03/11/1999 | WO1999011837A1 Device for applying layers of hard material by dusting |
| 03/11/1999 | WO1998054377A3 Stress tuned tantalum and tantalum nitride films |
| 03/11/1999 | DE19738815A1 Cathode plate target segment fixing method |
| 03/10/1999 | EP0901148A2 Biased and serrated extension tube for ion implanter electron shower |
| 03/10/1999 | EP0900858A1 Ceramic flash evaporator |
| 03/10/1999 | EP0900287A1 Substrate with a superhard coating containing boron and nitrogen and method of making the same |
| 03/10/1999 | EP0900132A1 Method employing uv laser pulses of varied energy density to form blind vias in multilayered targets |
| 03/10/1999 | CN2310077Y Gridless ion source for large area auxiliary film plating |
| 03/09/1999 | US5880069 Forming nonsuperconducting film on magnesia substrate, then forming superconducting film |
| 03/09/1999 | US5879840 Film-forming method for X-ray mask |
| 03/09/1999 | US5879827 Catalyst for membrane electrode assembly and method of making |
| 03/09/1999 | US5879823 Coated cutting tool |
| 03/09/1999 | US5879819 Sliding parts and process for producing same |
| 03/09/1999 | US5879811 Oxide thin film having quartz crystal structure |
| 03/09/1999 | US5879760 Protecting against environmental degradation at higher temperatures |
| 03/09/1999 | US5879741 Apparatus for forming film over flexible substrate by chemical vapor deposition including means for curving substrate during deposition to cancel internal stresses and reduce warpage |
| 03/09/1999 | US5879532 Electroplating metal or metal alloy layer on surface of article, pulse blow drying, vapor depositing refractory metal or refractory metal alloy layer and layer of compound of refractory metal or alloy |
| 03/09/1999 | US5879524 Composite backing plate for a sputtering target |
| 03/09/1999 | US5879523 Ceramic coated metallic insulator particularly useful in a plasma sputter reactor |
| 03/09/1999 | US5879519 Uniform and consistent deposition |
| 03/09/1999 | US5879467 Cycling vacuum system between two pressures, pumping down to lower pressure |
| 03/09/1999 | US5879460 System for providing a controlled deposition on wafers |
| 03/09/1999 | US5879415 Detecting by an oxygen densitometer to control an inert gas flow rate and an oxygen flow rate |
| 03/09/1999 | US5879134 In situ getter pump system and method |
| 03/09/1999 | US5879121 Substrate transporting apparatus |
| 03/04/1999 | WO1999010921A1 Method of forming a barrier layer in a contact structure |
| 03/04/1999 | WO1999010913A1 An apparatus and method for allowing a stable power transmission into a plasma processing chamber |
| 03/04/1999 | WO1999010548A1 High purity cobalt sputter target and process of manufacturing the same |
| 03/04/1999 | DE19748483C1 High temperature superconductor material structure for a current limiting device |
| 03/04/1999 | DE19737275A1 Cutter insert has an ion implanted surface zone |
| 03/03/1999 | EP0899772A2 Cathodic arc vapor deposition apparatus |
| 03/03/1999 | EP0899357A2 Vapor deposition production coating system |
| 03/03/1999 | EP0899356A1 Method and apparatus for coating the inside of a metal tube |
| 03/03/1999 | EP0730513B1 An abrasive material for precision surface treatment and a method for the manufacturing thereof |
| 03/03/1999 | EP0500928B1 Endocurietherapy |
| 03/03/1999 | CN1209847A Sputtering target and antiferromagnetic film and magneto-resistance effect element formed by using same |
| 03/03/1999 | CN1209624A Light information recording medium and mfg. method therefor |
| 03/03/1999 | CN1042352C Ornament |
| 03/02/1999 | US5878074 Evaporator crucible and improved method for performing electron-beam evaporation |
| 03/02/1999 | US5877087 Low temperature integrated metallization process and apparatus |
| 03/02/1999 | US5877086 Metal planarization using a CVD wetting film |
| 03/02/1999 | US5876861 Stress reduced sputtered nickel layer |
| 03/02/1999 | US5876860 Thermal barrier coating ceramic structure |
| 03/02/1999 | US5876850 Coating for carbon-carbon composites and method for producing same |
| 03/02/1999 | US5876848 Thin film magnetic structure having ferromagnetic and antiferromagnetic layers |
| 03/02/1999 | US5876790 Vacuum evaporation method for producing textured C60 films |
| 03/02/1999 | US5876576 Apparatus for sputtering magnetic target materials |
| 03/02/1999 | US5876574 Magnet design for a sputtering chamber |